CN-121995554-A - Antireflection film

CN121995554ACN 121995554 ACN121995554 ACN 121995554ACN-121995554-A

Abstract

The present invention relates to an antireflection film. The antireflection film (1) is provided with a base film (2), an adhesive layer (3), and an antireflection layer (4) in this order toward one side in the thickness direction. The anti-reflection layer (4) is provided with a high refractive index layer (41) and a low refractive index layer (42). The maximum roughness Rz of the exposed surface on one side in the thickness direction of the antireflection film (1) is 0.1 [ mu ] m or more. The ratio of the second interface length at the interface between the high refractive index layer (41) and the low refractive index layer (42) to the first interface length at the interface between the substrate film (2) and the sealing layer (3) is 1.06 or more when viewed in cross section in the thickness direction of the antireflection film (1).

Inventors

WATANABE YASUNORI
Changming Xiangtai
MIYAMOTO YUKIO

Assignees

日东电工株式会社

Dates

Publication Date: 20260508
Application Date: 20251107
Priority Date: 20241107

Claims (3)

1. An antireflection film comprising a base film, an adhesive layer and an antireflection layer in this order on one side in the thickness direction, The anti-reflection layer is provided with a high refractive index layer and a low refractive index layer, The maximum roughness Rz of the exposed surface on one side in the thickness direction of the antireflection film is 0.1 [ mu ] m or more, The ratio of the second interface length at the interface between the high refractive index layer and the low refractive index layer to the first interface length at the interface between the base film and the sealing layer is 1.06 or more when viewed in cross section in the thickness direction of the antireflection film.
2. The antireflection film according to claim 1, wherein, The ratio is 1.35 or less.
3. The antireflection film according to claim 1 or 2, wherein, An anti-fouling layer is further provided on one side in the thickness direction of the anti-reflection layer.

Description

Antireflection film Technical Field The present invention relates to an antireflection film. Background In order to prevent reflection glare of external light, in image display devices such as liquid crystal displays and organic EL displays, an antireflection film is disposed on the outermost surface of a display screen. As such an antireflection film, an antireflection film including a base film, a Hard Coat (HC) layer, a primer layer, and an antireflection layer in this order in the thickness direction has been proposed (patent document 1). Prior art literature Patent literature Patent document 1 Japanese patent No. 7515646 In the antireflection film described in patent document 1, the HC layer contains microparticles having a particle diameter of 1 μm or more and nanoparticles having a particle diameter of 100nm or less. Thus, the HC layer has surface irregularities on the primer layer side. The adhesion between the base material film and the antireflection layer is improved by the anchoring effect of the surface irregularities of the HC layer and the physicochemical effect of the nanoparticles and the primer layer. However, in the antireflection film described in patent document 1, adhesion between the surface roughness-forming microparticles and the primer layer is low, and peeling is likely to occur particularly in the convex portions where the microparticles are present on the surface. Disclosure of Invention The invention provides an antireflection film which has high adhesion between a base film and an antireflection layer and has good antireflection performance. The invention [1] comprises an antireflection film comprising a base film, an adhesion layer, and an antireflection layer in this order toward one side in the thickness direction, wherein the antireflection layer comprises a high refractive index layer and a low refractive index layer, and the maximum roughness Rz of the exposed surface on one side in the thickness direction of the antireflection film is 0.1 [ mu ] m or more, and the ratio of the second interface length at the interface between the high refractive index layer and the low refractive index layer to the first interface length at the interface between the base film and the adhesion layer is 1.06 or more when viewed in cross section in the thickness direction of the antireflection film. The invention [2] includes the antireflection film as described in [1], wherein the ratio is 1.35 or less. The invention [3] includes the antireflection film described in [1] or [2], wherein an antireflection layer is further provided on one side in the thickness direction of the antireflection layer. Effects of the invention In the antireflection film of the present invention, the maximum roughness Rz of the exposed surface on one side in the thickness direction of the antireflection film is 0.1 μm or more, and the ratio of the second interface length at the interface between the high refractive index layer and the low refractive index layer to the first interface length at the interface between the base film and the adhesive layer is 1.06 or more. The base film of the antireflection film has high adhesion to the antireflection layer and good antireflection performance. Drawings Fig. 1 is a cross-sectional view of a first embodiment of an antireflection film of the present invention. Fig. 2 is an enlarged view of fig. 1 showing the convex portions and concave portions at the cured resin layer in the antireflection film of the present invention. Fig. 3 is a cross-sectional view of a second embodiment of the antireflection film of the present invention. Fig. 4a to 4d illustrate a method for manufacturing the antireflection film shown in fig. 3. Fig. 4A shows a step of preparing a base film, fig. 4B shows a step of forming an adhesion layer on one surface of the base film in the thickness direction, fig. 4C shows a step of forming an antireflection layer on one side of the base film in the thickness direction, and fig. 4D shows a step of forming an antifouling layer on one side of the base film in the thickness direction. Fig. 5 is a schematic configuration diagram of an apparatus for performing a plasma treatment step and a film formation step in an example of the method for manufacturing an antireflection film shown in fig. 3. Fig. 6 is a perspective view showing a positional relationship between a low inductance antenna and a substrate film in the plasma processing chamber shown in fig. 5. Fig. 7 is a cross-sectional view showing a positional relationship between a low inductance antenna and a substrate film in the plasma processing chamber shown in fig. 5. Fig. 8 is a schematic view of an observation image of a cross section of the antireflection film in example 1. Fig. 9 is a schematic view of an observation image of a cross section of the antireflection film in comparative example 3. Description of the reference numerals 1, Antireflection film, 2, base film, 3, adhesion layer, 4, antireflect