CN-121995559-A - Super surface reflector, retina scanning display and manufacturing method of super surface reflector
Abstract
The invention relates to a super-surface reflector, a retina scanning display and a manufacturing method of the super-surface reflector. A super-surface reflector and the like having high process resistance and being less likely to cause deterioration of reflection characteristics are provided. The device is provided with a protective layer (8), a first metal layer (10) constituting a nanostructure, a dielectric layer (20) and a second metal layer (30), wherein the protective layer (8) covers the first metal layer (10), the dielectric layer (20) is positioned between the first metal layer (10) and the second metal layer (30), and the nanostructure (11) contains Ag and Zn or Ag and Sn.
Inventors
- NOJIRI TAKESHI
- MIZUNO TOMOHITO
- The amount of health
- SHIBATA TETSUYA
Assignees
- TDK株式会社
Dates
- Publication Date
- 20260508
- Application Date
- 20251103
- Priority Date
- 20241106
Claims (10)
- 1. A super-surface reflector is provided with a protective layer, a first metal layer, a dielectric layer and a second metal layer, wherein the protective layer is covered on the first metal layer, the dielectric layer is positioned between the first metal layer and the second metal layer, and the nanostructure comprises Ag and Zn or Ag and Sn.
- 2. The super surface reflector according to claim 1, wherein the nanostructure is a multilayer structure of Ag layer and Zn layer, a multilayer structure of Ag layer and Sn layer, an alloy structure of Ag and Zn, an alloy structure of Ag and Sn, a multilayer structure of Ag-Zn alloy layer and Zn layer, or a multilayer structure of Ag-Sn alloy layer and Sn layer.
- 3. The super surface reflector of claim 1, wherein the nanostructure is of the structure: A multi-layer structure of an Ag layer, a Zn layer with a thickness of 5.4A, an Ag layer, a Zn layer with a thickness of 5.4A and an Ag layer, wherein the total film thickness of the Ag layer is 40nm; a multi-layer structure of an Ag layer, a 9.4-thick Sn layer, an Ag layer, a 9.4-thick Sn layer and an Ag layer, wherein the total film thickness of the Ag layer is 40nm; an alloy structure of Ag and Zn with an addition amount of Zn added to Ag of 3at%, or The addition amount of Sn added to Ag was 3at% of the alloy structure of Ag and Sn.
- 4. The super surface reflector of claim 1, wherein the nanostructure comprises a metal unit having a trapezoid shape in a plan view.
- 5. The super surface reflector according to claim 4, wherein the length of the metal unit in the longitudinal direction is 500nm to 2500nm, The thickness of the metal unit is 10nm to 100nm, Among the shorter sides and the longer sides of the trapezoid shape of the metal element, the length of the shorter side is 10nm to 200nm, and the length of the longer side is greater than the length of the shorter side and is 100nm to 500 nm.
- 6. The subsurface reflector according to claim 1, wherein the dielectric layer is comprised of at least 1 compound material selected from SiO 2 、TiO 2 、MgO、Al 2 O 3 .
- 7. The super surface reflector of claim 1, wherein the protective layer covers an upper surface and sides of the first metal layer.
- 8. The super surface reflector of claim 1, wherein said protective layer is composed of at least 1 material selected from Au, ru, ir, tiN.
- 9. A retina scanning display comprises a spectacle frame, a lens mounted on the spectacle frame, and a retina projection device mounted on the spectacle frame, The retina projection device is provided with: A light source unit for emitting laser light; a movable mirror for scanning the laser light, and A super-surface reflector reflecting said scanned laser light, The super-surface reflector is arranged on the inner surface of the lens, and comprises a protective layer, a first metal layer, a dielectric layer and a second metal layer, wherein the first metal layer is covered by the protective layer, the dielectric layer is positioned between the first metal layer and the second metal layer, and the nanostructure comprises Ag and Zn or Ag and Sn.
- 10. A method of manufacturing a subsurface reflector, comprising: Sequentially forming a second metal layer, a dielectric layer and a first metal layer on a substrate, Forming a nanostructure on the first metal layer by photolithography and etching, A protective layer is formed in such a manner as to cover the upper surface and the side surfaces of the nanostructure, The nanostructure includes Ag and Zn, or Ag and Sn.
Description
Super surface reflector, retina scanning display and manufacturing method of super surface reflector Technical Field The application relates to a super-surface reflector, a retina scanning display and a manufacturing method of the super-surface reflector. Background Currently, glasses type terminals are being studied in AR (Augmented Reality: augmented Reality) and VR (Virtual Reality). In particular, in recent years, a retina scanning display that allows a user to recognize an image by imaging scanned light on the retina of the user has been attracting attention. In general, in a retina scanning display, three-color visible light emitted from a light source such as an LD (Laser Diode) corresponding to each of R (red), G (green), and B (blue) is multiplexed on one optical axis via a PLC (PLANER LIGHTWAVE Circuit) or the like. The combined 3-color visible light is scanned by a MEMS (Micro Electro MECHANICAL SYSTEMS: micro Electro mechanical system) mirror, reflected by a half mirror positioned in front of the eyes of the user, and the like, and is incident on the pupils of the user. The incident light is imaged on the retina of the user, whereby the user recognizes the image. As the half mirror, a super surface reflector is used. The super-surface reflector is a thin film having a nano-scale microstructure (nanostructure), and functions as a reflector of light. Fig. 13 (a) is a cross-sectional view showing the structure of a conventional super-surface reflector (prior art 1). As shown in fig. 13 (a), the metal of the prior art 1 having the nanostructure on the outermost surface is exposed (for example, see patent documents 1 and 2). Fig. 13 (b) is a cross-sectional view showing the structure of a conventional super-surface reflector (prior art 2). As shown in fig. 13 (b), the super surface reflector of the related art 2 is formed with a process protection layer only on the upper surface of the nanostructure. Prior art literature Patent literature Patent document 1 U.S. patent application publication No. 2018/013310 Patent document 2 Japanese patent application laid-open No. 2024-94887 Disclosure of Invention Problems to be solved by the invention As shown in fig. 13 (a), the super surface reflector of prior art 1 has an Ag layer 130, an SiO 2 layer 120, and an Ag layer 112 formed in this order on a substrate 140. The upper Ag layer 112 is exposed. In the super surface reflector of prior art 1, the metal is exposed from the outermost nanostructure. Therefore, in the case of forming the nanostructure, when the resist pattern is removed by an organic solvent (for example, NMP (N-methyl-2-pyrrolidone)), the metal layer (Ag layer 112) on the outermost surface is exposed, and there is a problem that corrosion damage shown by the corrosion portion 119 is generated by the organic solvent, regardless of the peeling process or the polishing process. (no art resistance) As shown in fig. 13 (b), the super surface reflector of prior art 2 has an Ag layer 130, an SiO 2 layer 120, an Ag layer 112, and an Au layer 108 formed in this order on a substrate 140. Only the upper surface of the upper Ag layer 112 is covered with the Au layer 108 for protection. In the case of the structure in which the Au layer 108 for protection is formed only on the upper surface of the Ag layer 112 as in the conventional art 2, there is a problem that the side surface of the Ag layer 112 is exposed to air in an exposed state even if there is no corrosion damage at the time of removing the resist, and the corrosion shown by the corrosion portion 119 is increased, and deterioration of the reflection characteristics occurs. (no standing resistance) The present application has been made in view of the above-described problems, and an object thereof is to provide a super-surface reflector, a retina scanning display, and a method for manufacturing a super-surface reflector, which are high in process resistance and less prone to deterioration in reflection characteristics. Solution for solving the problem The super-surface reflector of the present invention comprises a protective layer, a first metal layer, a dielectric layer, and a second metal layer, wherein the protective layer is formed on the first metal layer, the dielectric layer is located between the first metal layer and the second metal layer, and the nanostructure comprises Ag and Zn, or Ag and Sn. A retina scanning display comprises a spectacle frame, a lens mounted on the spectacle frame, and a retina projection device mounted on the spectacle frame, wherein the retina projection device comprises a light source unit for emitting laser light, a movable mirror for scanning the laser light, and a super-surface reflector for reflecting the scanned laser light, the super-surface reflector is arranged on the inner surface of the lens, and comprises a protective layer, a first metal layer, a dielectric layer and a second metal layer, wherein the first metal layer is covered by the protective la