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CN-121995701-A - Photoresist smearing device for coating

CN121995701ACN 121995701 ACN121995701 ACN 121995701ACN-121995701-A

Abstract

The invention relates to the technical field of semiconductor manufacturing, in particular to a photoresist smearing device for coating, which comprises a box body, a conveying assembly, a coating and cleaning integrated switching mechanism and a photoresist residue pumping assembly, wherein the conveying assembly is used for conveying a substrate to be coated to a coating station and arranged on the box body, the coating and cleaning integrated switching mechanism is arranged above the box body and comprises a rotary switching assembly, the rotary switching assembly is used for driving two slit coating dies to switch between the coating station and a cleaning station, and the photoresist residue pumping assembly is used for supplying photoresist to the coating die and pumping residual photoresist to the cleaning die. The device realizes automatic compensation of 'rotary avoidance-accurate positioning' through the cooperation of the annular reducing guide groove and the first elastic telescopic rod, the die head automatically avoids and resets during switching, the constant distance between the nozzle and the substrate or the cleaning piece is ensured, the working position and the cleaning position are accurately butted by the design of the outer convex section, and the uniformity of the coating film thickness and the cleaning effect are effectively ensured.

Inventors

  • ZHAO ZONGXUAN
  • LIN JIAN
  • HE XIAORUI

Assignees

  • 江苏佳合盛科技有限公司

Dates

Publication Date
20260508
Application Date
20260317

Claims (9)

  1. 1.A photoresist coating device for coating, comprising: a case (101); A conveying assembly (102) for conveying the substrate to be coated to a coating station, which is arranged on the box body (101); and a coating and cleaning integrated switching mechanism arranged above the box body (101); the coating and cleaning integrated switching mechanism comprises a rotary switching assembly, a rotary switching assembly and a rotary switching assembly, wherein the rotary switching assembly is used for driving two slit coating dies (106) to switch between a coating station and a cleaning station; the glue supply and waste discharge assembly is used for supplying photoresist to the slit coating die head (106) positioned at the coating station and sucking residual glue from the slit coating die head (106) positioned at the cleaning station; The device comprises a cleaning component, a control system and a control system, wherein the cleaning component is used for performing air injection cleaning on a slit coating die head (106) switched to a cleaning station, and the control system controls the action of the rotary switching component according to a pressure detection signal and sequentially starts waste discharge and cleaning operation after switching, so that the nozzle blockage is automatically treated without stopping.
  2. 2. A photoresist applicator for coating according to claim 1, wherein the rotary switching assembly comprises: A fixed frame (103) fixedly connected above the box body (101), wherein guide supporting pieces (104) are symmetrically arranged on the front side wall and the rear side wall of the fixed frame (103); A two-position switching drive motor (111) mounted on the rear guide support (104); A blind pipe rotating body (112) coaxially and fixedly connected with the output shaft of the double-position switching driving motor (111), wherein the blind pipe rotating body (112) is in a cylinder shape with a closed rear end, and branch runner pipes (113) communicated with the inner cavities of the blind pipe rotating body are symmetrically arranged on the upper side and the lower side of the blind pipe rotating body; And the double-channel static collecting pipe (105) is fixedly connected to the middle part of the front side guide support piece (104), the rear end of the double-channel static collecting pipe (105) stretches into the cavity of the blind pipe rotating body (112) to form a rotary sealing coupling structure, the outer diameter of the double-channel static collecting pipe is precisely matched with the inner diameter of the blind pipe rotating body (112), and the blind pipe rotating body (112) is allowed to freely rotate around the double-channel static collecting pipe.
  3. 3. A coating photoresist coating apparatus according to claim 2, wherein the glue supply and waste discharge assembly comprises a positive pressure glue supply channel (108) and a negative pressure waste discharge channel (109) arranged in parallel in the two-channel static manifold (105); The positive pressure glue supply channel (108) is used for being connected with a glue supply system, and the outlet end of the negative pressure waste discharge channel (109) is connected to an independent waste liquid recovery unit and is physically isolated from the glue supply system; The two branch runner pipes (113) are respectively connected with the slit coating dies (106) on the upper side and the lower side, when the blind pipe rotating body (112) rotates to a first working position, the lower side branch runner pipe (113) is communicated with the positive pressure glue supply channel (108), the upper side branch runner pipe (113) is communicated with the negative pressure waste discharge channel (109), and when the blind pipe rotating body (112) rotates 180 DEG to a second working position, the upper and the lower communication relations are exchanged.
  4. 4. The photoresist coating device for coating according to claim 2, wherein each slit coating die head (106) is arranged on a corresponding branch runner pipe (113) and can axially slide along the branch runner pipe (113), each slit coating die head (106) is fixedly connected with first elastic telescopic rods (110) symmetrically distributed along the branch runner pipe (113) at one side close to the blind pipe rotating body (112), and the telescopic ends of each first elastic telescopic rod (110) are fixedly connected with the blind pipe rotating body (112) for buffering radial displacement in the rotating process and assisting in resetting.
  5. 5. A photoresist coating device for coating according to claim 4, characterized in that, positioning convex columns are arranged on the front side and the rear side of each slit coating die head (106), each guide support piece (104) is internally provided with an annular reducing guide groove (1041), and each positioning convex column is correspondingly embedded into the annular reducing guide groove (1041); The annular reducing guide grooves (1041) are provided with radial outer protruding sections at the top and bottom sides, and are used for enabling the slit coating die head (106) to extend outwards during a coating station and a cleaning station to keep accurate spacing with a substrate and a cleaning piece, and the right corner of the outer protruding section at the top of each annular reducing guide groove (1041) is provided with a one-way non-return right-angle surface for forcedly limiting the slit coating die head (106) to only rotate anticlockwise and guaranteeing the certainty of a switching sequence.
  6. 6. A photoresist coating device for coating according to claim 1, characterized in that the cleaning assembly is a pneumatic self-locking on-line cleaning module (200) provided on top of the fixed frame (103), comprising: Four second elastic telescopic rods (201) which are symmetrically and fixedly connected to the top wall of the fixed frame (103) in the front-back manner; The flexible butt joint cleaning spray heads (202) are fixedly connected to the telescopic ends of the four second elastic telescopic rods (201), and a pre-tightening reset spring is integrated in each second elastic telescopic rod (201), so that the flexible butt joint cleaning spray heads (202) have axial floating capacity; The front wall of the flexible butt joint cleaning nozzle (202) is provided with a high-pressure air inlet (204) for being connected with a high-pressure air source, and the bottom of the flexible butt joint cleaning nozzle is provided with a profiling sealing butt joint groove (203) matched with a slit nozzle of a slit coating die head (106).
  7. 7. A photoresist coating device for coating according to claim 6, characterized in that the rear wall of the flexible butt joint cleaning nozzle (202) is uniformly distributed with independent exhaust micropores along the circumferential direction, the independent exhaust micropores are communicated with an external independent negative pressure dust collection pipeline for discharging impurity-containing waste gas and solid particles generated by purging, and the pollution discharge path is independent of the negative pressure waste discharge channel (109).
  8. 8. A photoresist coating apparatus according to claim 6, further comprising a follow-up vent valve assembly (300) for controlling the opening and closing of the high pressure gas path, wherein the follow-up vent valve assembly (300) comprises: a three-way collecting pipe (302) fixedly connected to the front wall of the fixed frame (103), and the rear end of the three-way collecting pipe is tightly attached to the high-pressure air inlet (204); The push type reversing valve core (303) is connected in the three-way collecting pipe (302) in a vertical sliding manner, and is connected with the top wall of the three-way collecting pipe (302) through a linear reset spring (305), and a vent hole (304) is formed in the push type reversing valve core (303) in the longitudinal direction; And a cam guide block (301) fixedly connected to the front side of each slot coating die head (106), wherein the vent hole (304) is aligned with the main channel of the three-way collecting pipe (302) initially, the air channel is conducted, and the linear reset spring (305) is in a compressed state.
  9. 9. A coating apparatus according to any one of claims 1 to 8, wherein each slot coating die (106) comprises a left die body and a right die body which are connected to each other in a butt joint, a flow channel chamber (1061) for accommodating the photoresist and a coating slit (1062) communicating with the outside are formed between the left die body and the right die body, and the left die body and the right die body are fixedly connected by a locking bolt (107).

Description

Photoresist smearing device for coating Technical Field The invention relates to the technical field of semiconductor manufacturing, in particular to a photoresist smearing device for coating. Background In semiconductor manufacturing, flat panel display and advanced packaging processes, uniform coating of photoresist is a key element in determining pattern transfer quality. Slit coating technology has become a mainstream solution by virtue of high material utilization, excellent film thickness uniformity, and adaptability to large-area substrates. The process is to continuously extrude the photoresist through a precise slit nozzle to form a nano-scale film on a high-speed moving substrate. However, photoresist is easily affected by particle pollution, solvent volatilization or temperature fluctuation, so that the nozzle outlet is easily blocked locally, coating interruption, uneven film thickness and even whole piece scrapping are caused, and the yield and the production efficiency are severely restricted. The existing coping strategies have obvious limitations that firstly, the filtering and the environmental control before coating are relied on, the blockage in long-time continuous production cannot be completely eradicated, secondly, the equipment is required to be shut down, manually disassembled and cleaned or replaced after the blockage, the comprehensive efficiency of the equipment is reduced, the manual error is easily introduced during frequent disassembly and assembly, the precise structure is easily damaged, and the maintenance cost is increased. Even if some devices are equipped with on-line pressure monitoring, only alarms can be given and autonomous recovery is not possible. In recent years, research is being conducted on leading-in of a main/standby multi-nozzle redundancy design, and blocking is handled through a switching channel, but the scheme has obvious defects that firstly, a switching mechanism is complex and occupies a large space and is difficult to integrate in a compact module, secondly, an original blocking nozzle is not cleaned after switching, hidden danger still exists after the original blocking nozzle is started again, and furthermore, accurate identification of a blocking position is lacking, and full channel flushing is generally adopted, so that expensive photoresist is wasted and the cleaning efficiency is low. The most critical is that the prior art cannot realize closed loop operation of 'blockage detection-channel switching-in-situ cleaning-state resetting' on the premise of not stopping a machine and interrupting a coating flow. Therefore, developing a coating device that can automatically identify and clear nozzle clogging without interrupting production is a technical problem to be solved in the art. Disclosure of Invention The invention provides a photoresist smearing device for coating, which aims to overcome the defect that the prior art is difficult to realize full-automatic closed loop of blockage detection, channel switching, in-situ cleaning and state resetting under the condition of no shutdown. A photoresist smearing device for coating comprises a box body, a conveying assembly, a coating and cleaning integrated switching mechanism, a photoresist supply and waste discharge assembly, a cleaning assembly and a control system, wherein the conveying assembly is used for conveying a substrate to be coated to a coating station and is arranged on the box body, the coating and cleaning integrated switching mechanism is arranged above the box body and comprises a rotary switching assembly, the rotary switching assembly is used for driving two slit coating dies to switch between the coating station and the cleaning station, the photoresist supply and waste discharge assembly is used for supplying photoresist to the slit coating dies positioned at the coating station and sucking residual photoresist from the slit coating dies positioned at the cleaning station, the cleaning assembly is used for performing air jet cleaning on the slit coating dies switched to the cleaning station, and the control system is used for controlling the rotary switching assembly to act according to pressure detection signals and sequentially starting waste discharge and cleaning operations after switching, so that automatic nozzle blockage treatment is realized without shutdown. The rotary switching assembly comprises a fixed frame fixedly connected above the box body, guide supporting pieces symmetrically arranged on the front side wall and the rear side wall of the fixed frame, a double-position switching driving motor arranged on the rear side guide supporting piece, a blind pipe rotating body coaxially fixedly connected with an output shaft of the double-position switching driving motor, a cylindrical blind pipe rotating body with a closed rear end, branch flow passage pipes symmetrically arranged on the upper side and the lower side of the blind pipe rotating body and communicated wit