CN-121995702-A - Photoresist supply system, control method thereof and photoresist coating and developing equipment

Abstract

The invention provides a photoresist supply system, a control method thereof and photoresist coating and developing equipment, wherein the photoresist coating and developing equipment comprises a photoresist supply system, a photoresist bottle, a photoresist liquid supply tank, a suction pump and a photoresist coating nozzle, wherein the photoresist bottle, the photoresist liquid supply tank, the suction pump and the photoresist coating nozzle are sequentially connected through photoresist pipelines, a filter is arranged between an outlet of the photoresist liquid supply tank and an inlet of the photoresist coating nozzle through the photoresist pipeline, and the nitrogen supply module comprises a nitrogen pipeline connected to the photoresist pipeline, and the nitrogen pipeline is used for conveying nitrogen to the photoresist pipeline so as to reduce pressure difference at two ends of the filter. According to the invention, the forward thrust is provided by the nitrogen pressure output by the nitrogen pipeline, and the pressure difference at two ends of the filter is reduced in cooperation with the negative pressure suction of the suction pump, so that the bubbles in the photoresist pipeline are reduced.

Inventors

• ZHU DONGLIANG

Assignees

• 上海华力集成电路制造有限公司

Dates

Publication Date

20260508

Application Date

20260330

Claims (13)

1. 1. A photoresist supply system, comprising: The photoresist pipeline is provided with a filter between an outlet of the photoresist liquid supply tank and an inlet of the photoresist nozzle; and a nitrogen supply module including a nitrogen line connected to the photoresist line for delivering nitrogen to the photoresist line to reduce a pressure differential across the filter.
2. 2. The photoresist supply system of claim 1, further comprising an acquisition module and a closed loop control module, the closed loop control module being communicatively coupled to the nitrogen supply module and the acquisition module, respectively; The collecting module is used for collecting target parameters when the photoresist supply system operates, wherein the target parameters at least comprise pressure difference at two ends of a filter and the rotating speed of a suction pump; The closed-loop control module is used for generating a corresponding nitrogen pressure adjusting instruction according to the target parameter and the preset condition, and further adjusting the nitrogen output pressure of the nitrogen supply module so that the pressure difference between two ends of the filter is within the safety range of the preset pressure difference threshold; The preset conditions at least comprise a preset differential pressure threshold value, and a matching relation between the rotating speed of the suction pump and the nitrogen output pressure.
3. 3. The photoresist supply system according to claim 2, wherein the collection module comprises a differential pressure sensor and a rotation speed sensor, the differential pressure sensor is installed at two ends of the filter for collecting differential pressure at two ends of the filter, and the rotation speed sensor is integrated with the suction pump for collecting rotation speed of the suction pump.
4. 4. The photoresist supply system of claim 2, wherein the target parameters further comprise a nitrogen line pressure and a photoresist flow, the preset conditions further comprise a preset nitrogen line threshold and a preset photoresist flow threshold, and the closed loop control module is further configured to modify the nitrogen pressure adjustment command based on a deviation of the nitrogen line pressure from the preset nitrogen line pressure threshold and a deviation of the photoresist flow from the preset photoresist flow threshold.
5. 5. The photoresist supply system according to claim 1 or 2, wherein the nitrogen gas supply module further comprises: the nitrogen source is connected to one end, far away from the photoresist pipeline, of the nitrogen pipeline; the regulating valve and the on-off control valve are sequentially arranged on the nitrogen pipeline; The regulating valve is used for regulating the opening of the regulating valve according to the nitrogen pressure regulating instruction so as to regulate the nitrogen output pressure, and the on-off control valve is used for controlling the on-off of the nitrogen pipeline.
6. 6. The photoresist supply system of claim 5, wherein the nitrogen supply module further comprises a one-way valve disposed on the nitrogen line, the one-way valve for preventing photoresist from flowing back into the nitrogen line.
7. 7. The resist supply system according to claim 1 or 2, wherein the nitrogen gas line is provided between an outlet of the resist liquid supply tank and an inlet of the suction pump, or between an outlet of the suction pump and an inlet of the resist coating nozzle.
8. 8. The photoresist supply system of claim 7, wherein when the nitrogen line is disposed between the outlet of the suction pump and the inlet of the photoresist nozzle, the photoresist line is provided with a manual valve between the outlet of the suction pump and the inlet of the photoresist nozzle, and the nitrogen line is disposed between the outlet of the suction pump and the inlet of the manual valve.
9. 9. A control method of a photoresist supply system, applied to the photoresist supply system of claim 2, comprising the steps of: S1, setting preset conditions for the closed-loop control module; S2, acquiring target parameters of the photoresist supply system during operation through the acquisition module; S3, generating a corresponding nitrogen pressure regulating instruction through the closed-loop control module according to the target parameter and the preset condition, and transmitting the nitrogen pressure regulating instruction to the nitrogen supply module; s4, adjusting the nitrogen output pressure of the nitrogen pipeline through the nitrogen supply module according to the nitrogen pressure adjusting instruction so that the pressure difference between two ends of the filter is within a safety range of a preset pressure difference threshold; And S5, continuously acquiring the target parameters through the acquisition module and feeding back the target parameters to the closed-loop control module, and repeating the steps S3 to S4.
10. 10. The method according to claim 9, wherein the target parameters further comprise a nitrogen line pressure and a photoresist flow rate, and the preset conditions further comprise a preset nitrogen line pressure threshold and a preset photoresist flow rate threshold; In step S3, the closed-loop control module corrects the nitrogen pressure adjustment instruction further according to the deviation between the nitrogen line pressure and the preset nitrogen line pressure threshold and the deviation between the photoresist flow and the preset photoresist flow threshold.
11. 11. The method according to claim 9, wherein in step S5, the rate of change of the rotational speed of the suction pump is further monitored by the closed-loop control module, and when the rate of change of the rotational speed of the suction pump exceeds a preset rate threshold, the matching relationship between the rotational speed of the suction pump and the nitrogen output pressure is corrected.
12. 12. The method according to claim 9, wherein in step S3, the preset pressure difference threshold value corresponding to the current photoresist and the matching relationship are determined according to the photoresist adhesiveness parameter input from the outside through the closed loop control module, wherein the preset conditions include preset pressure difference threshold values corresponding to multiple types of photoresist adhesiveness and the matching relationship.
13. 13. A photoresist developing apparatus comprising the photoresist supply system according to any one of claims 1 to 8.

Description

Photoresist supply system, control method thereof and photoresist coating and developing equipment Technical Field The invention belongs to the technical field of semiconductor manufacturing, and particularly relates to a photoresist supply control system, a photoresist supply control method and photoresist coating and developing equipment. Background In the semiconductor photoetching process, in a photoresist supply system with a suction pump, a specific structure of a liquid supply part is shown in fig. 1, a photoresist bottle 1 is sequentially connected to a photoresist liquid supply tank 2, then the photoresist liquid supply tank 2 is connected to a suction pump 4, the output end of the suction pump 4 is connected to a terminal gluing nozzle 6, a manual valve 5 is arranged between the suction pump 4 and the gluing nozzle 6, a filter 3 is arranged between the photoresist liquid supply tank 2 and the suction pump 4, and the filter 3 is used for filtering impurities in photoresist and avoiding gluing defects caused by the impurities. However, in the actual operation process of the existing photoresist supply system, particularly in the photoresist replenishing (Reload) procedure, bubbles are easily generated in the photoresist pipeline 7, so that wafer photoresist coating defects are caused, and the product yield is seriously affected. Disclosure of Invention The invention aims to provide a photoresist supply system, a control method thereof and a photoresist coating and developing device, which aim to reduce the generation of bubbles in a photoresist pipeline and improve the wafer production yield. To achieve the above object, the present invention provides a photoresist supply system comprising: The photoresist pipeline is provided with a filter between an outlet of the photoresist liquid supply tank and an inlet of the photoresist nozzle; and a nitrogen supply module including a nitrogen line connected to the photoresist line for delivering nitrogen to the photoresist line to reduce a pressure differential across the filter. Optionally, the photoresist supply system further comprises an acquisition module and a closed-loop control module, wherein the closed-loop control module is respectively in communication connection with the nitrogen supply module and the acquisition module; The collecting module is used for collecting target parameters when the photoresist supply system operates, wherein the target parameters at least comprise pressure difference at two ends of a filter and the rotating speed of a suction pump; The closed-loop control module is used for generating a corresponding nitrogen pressure adjusting instruction according to the target parameter and the preset condition, and further adjusting the nitrogen output pressure of the nitrogen supply module so that the pressure difference between two ends of the filter is within the safety range of the preset pressure difference threshold; The preset conditions at least comprise a preset differential pressure threshold value, and a matching relation between the rotating speed of the suction pump and the nitrogen output pressure. Optionally, the collecting module comprises a differential pressure sensor and a rotating speed sensor, wherein the differential pressure sensor is arranged at two ends of the filter and used for collecting differential pressure at two ends of the filter, and the rotating speed sensor is integrated with the suction pump and used for collecting rotating speed of the suction pump. Optionally, the target parameters further include nitrogen pipeline pressure and photoresist flow, the preset conditions further include a preset nitrogen pipeline threshold value and a preset photoresist flow threshold value, and the closed-loop control module is further configured to correct the nitrogen pressure adjustment instruction according to deviation of the nitrogen pipeline pressure and the preset nitrogen pipeline pressure threshold value and deviation of the photoresist flow and the preset photoresist flow threshold value. Optionally, the nitrogen supply module further includes: the nitrogen source is connected to one end, far away from the photoresist pipeline, of the nitrogen pipeline; the regulating valve and the on-off control valve are sequentially arranged on the nitrogen pipeline; The regulating valve is used for regulating the opening of the regulating valve according to the nitrogen pressure regulating instruction so as to regulate the nitrogen output pressure, and the on-off control valve is used for controlling the on-off of the nitrogen pipeline. Optionally, the nitrogen supply module further comprises a one-way valve arranged on the nitrogen pipeline, and the one-way valve is used for preventing photoresist from flowing backwards to the nitrogen pipeline. Optionally, the nitrogen pipeline is arranged between the outlet of the photoresist liquid supply tank and the inlet of the suction pump, or the nitrogen pipeline is arran