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CN-121995703-A - A lithography system, micro mirror assembly for laser direct writing

CN121995703ACN 121995703 ACN121995703 ACN 121995703ACN-121995703-A

Abstract

The application discloses a photoetching system and a micro-mirror assembly for laser direct writing, wherein the photoetching system for laser direct writing comprises a micro-mirror array, a lens and a shaping mechanism, the micro-mirror array comprises a substrate, a plurality of connecting rods and a plurality of reflecting mirrors, each reflecting mirror is connected with the substrate through one connecting rod, the substrate can be bent towards the reflecting mirror, the lens is arranged on one side, away from the substrate, of the reflecting mirror, the surface, facing the micro-mirror array, of the lens is a first convex surface and is used for being matched with the micro-mirror array after the substrate is bent to form a dot matrix, and the shaping mechanism is used for driving the substrate to bend towards the lens. The lithography system for laser direct writing can reduce the precision requirements on assembly and alignment.

Inventors

  • ZHANG ZHEWEI

Assignees

  • 张江国家实验室

Dates

Publication Date
20260508
Application Date
20241104

Claims (10)

  1. 1. A lithography system for laser direct writing, comprising a micromirror array, a lens, and a shaping mechanism; The micro-mirror array comprises a substrate, a plurality of connecting rods and a plurality of mirrors, wherein each mirror is connected with the substrate through only one connecting rod; The lens is arranged on one side of the reflector, which is away from the substrate, and the surface of the lens, which faces the micro-reflector array, is a first convex surface and is used for being matched with the micro-reflector array after the substrate is bent to form a lattice; The shaping mechanism is used for driving the substrate to bend towards the lens.
  2. 2. The system of claim 1, wherein the shaping mechanism comprises a base, the base is disposed on a side of the base facing away from the lens, a surface of the base facing the base is a second convex surface, and the base is fixedly disposed on the second convex surface of the base.
  3. 3. The lithography system of claim 2, wherein the substrate is affixed to the base by means comprising adhesive and bonding.
  4. 4. The lithography system of claim 2, wherein the shaping mechanism further comprises a first drive for driving the substrate into engagement with the second convex surface of the base.
  5. 5. The lithography system for laser direct writing of claim 1, wherein the shaping mechanism comprises a clamp and a second drive; The clamping pieces are fixedly arranged at two ends of the substrate and used for fixing the substrate; the second driving member is used for driving the substrate to bend towards the lens.
  6. 6. The lithography system of claim 4 or 5, wherein the first drive and the second drive of the shaping mechanism each comprise a motor.
  7. 7. The lithography system of claim 1, wherein the radius of curvature of the substrate after bending is 1cm-10m.
  8. 8. The lithography system of claim 1, wherein the image side of the lens is convex at a paraxial region, or wherein the image side of the lens is planar at a paraxial region, or wherein the image side of the lens is concave at a paraxial region.
  9. 9. The lithography system for laser direct writing of claim 1, wherein the numerical aperture of the lens is 0.1-1.
  10. 10. A micromirror assembly comprising an array of micromirrors and a lens; The micro-mirror array comprises a substrate, a plurality of connecting rods and a plurality of mirrors, wherein each mirror is connected with the substrate through only one connecting rod; The lens is arranged on one side of the reflector, which is away from the substrate, and the surface of the lens, which faces the micro-reflector array, is a first convex surface, and the lens is used for being matched with the micro-reflector array after the substrate is bent to form a lattice.

Description

A lithography system, micro mirror assembly for laser direct writing Technical Field The application relates to the technical field of semiconductors, in particular to a photoetching system and a micro-mirror assembly for laser direct writing. Background In conventional laser direct writing systems, the alignment between the micromirror array and the microlens array determines the function of the overall system. If the two are offset from each other, a high quality lattice cannot be realized. As the wavelength of laser direct writing decreases, especially the wavelength <100nm, the requirements of the system for alignment deviation of the two become higher, which requires that the processing errors (especially the array period) of the micromirror array and the microlens array should be greatly reduced, and the assembly errors between the two should also be greatly reduced. This demanding requirement presents challenges for implementing a laser direct write system with a wavelength <100 nm. Disclosure of Invention The application discloses a photoetching system and a micro-mirror assembly for laser direct writing, which are used for enabling a micro-lens array to be not needed in the laser direct writing system, thereby greatly reducing the precision requirements of the photoetching system on assembly and alignment and enabling the construction of the short-wavelength (wavelength <100 nm) laser direct writing photoetching system to be easier. In order to achieve the above purpose, the present application provides the following technical solutions: in a first aspect, the present application provides a lithography system for laser direct writing comprising a micro mirror array, a lens, and a shaping mechanism; The micro-mirror array comprises a substrate, a plurality of connecting rods and a plurality of mirrors, wherein each mirror is connected with the substrate through only one connecting rod; The lens is arranged on one side of the reflector, which is away from the substrate, and the surface of the lens, which faces the micro-reflector array, is a first convex surface and is used for being matched with the micro-reflector array after the substrate is bent to form a lattice; The shaping mechanism is used for driving the substrate to bend towards the lens. The lithography system for laser direct writing comprises a micro-mirror array, a lens and a shaping mechanism. The micro-mirror array comprises a substrate, a plurality of connecting rods and a plurality of mirrors, wherein each mirror is connected with the substrate through only one connecting rod. Under the driving action of the shaping mechanism, the substrate can bend and deform towards the reflecting mirror, so that the self angle of the reflecting mirror connected with the substrate is changed. The lens is arranged on one side of the reflector, which is away from the substrate, and the surface of the lens, which faces the reflector, is a first convex surface. After the substrate is bent, the self angle of the reflecting mirror is changed, the direction of the light beam reflected by the reflecting mirror is changed, and then the reflected light beam is processed by the first convex surface of the lens to form a focusing point, so that a plurality of reflecting mirrors after the substrate is bent are matched with the lens to form a dot matrix. Compared with the traditional combination mode of the micro-mirror array and the micro-lens array, the combination mode of the deformed micro-mirror array and the lens can greatly reduce the precision requirements of the photoetching system on assembly and alignment, thereby facilitating the construction of the short-wavelength (wavelength <100 nm) laser direct writing photoetching system. In some embodiments, the shaping mechanism includes a base, the base is disposed on a side of the base away from the lens, a surface of the base facing the base is a second convex surface, and the base is fixedly disposed on the second convex surface of the base. In some embodiments, the means of securing the base to the base includes adhesion and bonding. In some embodiments, the shaping mechanism further comprises a first driving member for driving the substrate to conform to the second convex surface of the base. In some embodiments, the shaping mechanism comprises clamping pieces and second driving pieces, wherein the clamping pieces are fixedly arranged at two ends of the substrate and used for fixing the substrate, and the second driving pieces are used for driving the substrate to bend towards the lens. In some embodiments, the first and second drivers of the shaping mechanism each comprise a motor. In some embodiments, the radius of curvature of the substrate after bending is 1cm-10m. In some embodiments, the image side of the lens is convex at a paraxial region, or the image side of the lens is planar at a paraxial region, or the image side of the lens is concave at a paraxial region. In some embodiments, the lens ha