CN-121995706-A - Control method, exposure apparatus, and method for manufacturing article

Abstract

The present disclosure relates to a control method, an exposure apparatus, and a method of manufacturing an article. A control method for controlling the lighting of a1 st LED and a 2 nd LED includes an acquisition step of acquiring the illuminance of each of the 1 st LED and the 2 nd LED, and a determination step of determining the current value flowing to the 1 st LED and the 2 nd LED based on the measurement result of the acquisition step, wherein the determination step determines that the current value flowing to the LED with the smaller illuminance in the 1 st LED and the 2 nd LED is smaller than the current value flowing to the other LED.

Inventors

• USUI KATSUTOSHI

Assignees

• 佳能株式会社

Dates

Publication Date

20260508

Application Date

20251028

Priority Date

20241101

Claims (10)

1. 1. A control method of controlling lighting of 1 st and 2 nd LEDs, the control method comprising: an obtaining step of obtaining illuminance of each of the 1 st LED and the 2 nd LED, and A determination step of determining a current value flowing to the 1 st LED and the 2 nd LED based on a result of the acquisition step, The determining step determines that the current value flowing to the LED of the 1 st LED and the 2 nd LED, which has a small illuminance, is smaller than the current value flowing to the other LED.
2. 2. The control method according to claim 1, wherein, The obtaining step and the determining step are performed a plurality of times.
3. 3. The control method according to claim 1, wherein, The method further includes a reference acquisition step of acquiring illuminance of each of the 1 st LED and the 2 nd LED before the acquisition step.
4. 4. A control method according to claim 3, characterized by further comprising: A calculation step of calculating illuminance degradation information of each of the 1 st LED and the 2 nd LED based on the measurement result of the reference acquisition step and the measurement result of the acquisition step, The determining step determines current values flowing to the 1 st LED and the 2 nd LED based on the illuminance degradation information.
5. 5. The control method according to claim 4, wherein, The determining step determines that a current value flowing to an LED having a large illuminance degradation rate among the 1 st LED and the 2 nd LED is smaller than a current value flowing to the other LED.
6. 6. A control method according to claim 3, characterized by further comprising: And a lighting step of lighting the 1 st LED and the 2 nd LED at a timing between the reference acquisition step and the acquisition step.
7. 7. The control method according to claim 6, wherein, The lighting step is performed such that the light from the 1 st LED overlaps the light from the 2 nd LED on the surface to be irradiated.
8. 8. The control method according to claim 1, characterized by further comprising: a measurement step of measuring a luminance distribution of an irradiation region irradiated by the 1 st LED and the 2 nd LED, and And adjusting the shape of the light beam irradiating the irradiation region according to the brightness distribution.
9. 9. An exposure apparatus for transferring a pattern of an original plate to a substrate, the exposure apparatus comprising: An acquisition unit for acquiring the illuminance of each of the 1 st LED and the 2 nd LED, and A control unit for controlling the lighting of the 1 st LED and the 2 nd LED, The control unit obtains the illuminance of each of the 1 st LED and the 2 nd LED, and determines that the current value flowing to the LED having the smaller illuminance among the 1 st LED and the 2 nd LED is smaller than the current value flowing to the other LED based on the obtained illuminance of each of the 1 st LED and the 2 nd LED.
10. 10. A method of manufacturing an article, comprising: An exposure step of exposing a substrate to light using the exposure apparatus according to claim 9 to obtain an exposed substrate, and A developing step of developing the exposed substrate to obtain a developed substrate, An article is manufactured from the developing substrate.

Description

Control method, exposure apparatus, and method for manufacturing article Technical Field The present disclosure relates to a control method, an exposure apparatus, and a method of manufacturing an article. Background The exposure apparatus is an apparatus for transferring a pattern of a master (reticle or mask) to a photosensitive substrate (wafer, glass plate, or the like having a resist layer formed on a surface) via a projection optical system in a photolithography process, which is a process for manufacturing a semiconductor device, a liquid crystal display device, or the like. For example, in projection exposure apparatuses for transferring a pattern to a liquid crystal display device, it has been demanded in recent years to collectively expose a pattern having a larger area on a mask to a substrate. In order to meet this demand, a scanning projection exposure apparatus of a step-and-scan type capable of obtaining high resolution and exposing a large screen has been proposed. The scanning exposure apparatus transfers a pattern illuminated by a slit beam onto a substrate through a projection optical system by a scanning operation. As a light source of the exposure apparatus, for example, a mercury lamp is used, but in recent years, replacement of a mercury lamp with a light emitting Diode (LED: LIGHT EMITTING Diode) as a solid-state light emitting element has been desired. Since the LED has a short time from when a current flows to the substrate circuit for controlling light emission until the light output is stabilized, it is not required to always emit light as in a mercury lamp, and therefore, there is an advantage of energy saving and a long lifetime. In international publication No. 2019/229971, a method of reducing luminance unevenness of the whole by adjusting the lighting luminance according to the degree of degradation of each LED is disclosed. Disclosure of Invention Problems to be solved by the invention However, when the lighting luminance is adjusted to reduce the overall luminance unevenness, a large amount of current needs to flow through the LEDs having a large degradation level, and the degradation level of the plurality of LEDs may deviate greatly. It is therefore an object of the present disclosure to provide a control method advantageous in terms of lighting control of LEDs. Means for solving the problems In order to achieve the above object, a control method according to one aspect of the present disclosure is a control method for controlling lighting of a1 st LED and a 2 nd LED, the control method including an acquisition step of acquiring illuminance of each of the 1 st LED and the 2 nd LED, and a determination step of determining a current value flowing to the 1 st LED and the 2 nd LED based on a measurement result of the acquisition step, the determination step determining a current value flowing to an LED having smaller illuminance among the 1 st LED and the 2 nd LED to be smaller than a current value flowing to the other LED. Further features of the present disclosure will become apparent from the following description of exemplary embodiments (with reference to the attached drawings). Drawings Fig. 1 is a schematic diagram showing the configuration of an exposure apparatus. Fig. 2 is a schematic diagram showing the structure of an LED array. Fig. 3 is a schematic diagram showing the structure of the variable slit. Fig. 4 is a flowchart of the control method in embodiment 1. Fig. 5 is a diagram showing illuminance degradation information. Fig. 6 is a diagram showing illuminance degradation information. Fig. 7 is a flowchart of a control method in embodiment 2. Fig. 8 is a diagram showing the luminance distribution in embodiment 2. Fig. 9 is a flow chart of a method of manufacturing an article. Detailed Description Hereinafter, preferred embodiments of the present disclosure will be described in detail based on the accompanying drawings. In the drawings, the same components are denoted by the same reference numerals, and overlapping description thereof is omitted. < Embodiment 1 > Referring to fig. 1, an exposure apparatus 100 according to the present embodiment will be described. Fig. 1 is a diagram showing an exposure apparatus 100 according to the present embodiment. The exposure apparatus 100 of the present embodiment is a step-and-scan type scanning exposure apparatus for scanning and exposing a substrate with slit light, and includes an illumination optical system 1, an alignment scope 2, a projection optical system 4, a substrate stage 11, and a control unit 20. The master 3 is held by a master stage 30, and is disposed between the alignment scope 2 and the projection optical system 4, and the substrate 10 is held by a substrate stage 11. The control unit 20 includes a CPU and a memory, and controls the entire exposure apparatus 100 (each unit of the exposure apparatus 100). The exposure apparatus 100 may be a step-and-repeat type, instead of a step-and-scan type. The il