CN-121995712-A - Yellow light system Cheng Bao light energy determination method, electronic equipment and storage medium

CN121995712ACN 121995712 ACN121995712 ACN 121995712ACN-121995712-A

Abstract

The invention provides a method for determining light energy of a yellow light system Cheng Bao, electronic equipment and a storage medium, wherein the method comprises the steps of determining all yellow light process layers involved in a new product and target critical dimension values, target processing machines and photoresist types corresponding to each yellow light process layer involved in the new product; for each yellow light process layer related to a new product, determining an exposure energy advance value corresponding to the yellow light process layer according to a target critical dimension value corresponding to the yellow light process layer, a type of a target process machine and an exposure energy distribution model of the target critical dimension value under the target process machine, which is created in advance and corresponds to a photoresistance type of the yellow light process layer. The invention can ensure that the key size value of the produced new product can be within the corresponding specification range, effectively reduce the rework rate of the new product, shorten the production period of the new product and meet the urgent shipment demand.

Inventors

HU YUMING

Assignees

合肥晶合集成电路股份有限公司

Dates

Publication Date: 20260508
Application Date: 20260410

Claims (10)

1. A method for determining the light energy of a yellow light system Cheng Bao, comprising: determining all yellow light process layers related to a new product, and a target critical dimension value, a target processing machine and a photoresist type corresponding to each yellow light process layer related to the new product; and determining the exposure energy advanced value corresponding to each yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer, the type of the target process machine and the pre-established exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresistance type of the yellow light process layer.
2. The method of claim 1, wherein determining the exposure energy advance value corresponding to the yellow light process layer according to the target critical dimension value and the type of the target process machine corresponding to the yellow light process layer and the pre-created exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the type of the photoresist of the yellow light process layer comprises: If the type of the target processing machine corresponding to the yellow light process layer is I-line type, taking the median value of the exposure energy distribution model of the target critical dimension value under the target processing machine corresponding to the photoresistance type of the yellow light process layer as the exposure energy advance value corresponding to the yellow light process layer; If the type of the target processing machine corresponding to the yellow light process layer is Krf machine type or Arf machine type, determining the exposure energy advance value corresponding to the yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer and the exposure energy average value of the exposure energy distribution model of the target critical dimension value under the target processing machine corresponding to the light resistance type of the yellow light process layer.
3. The method of claim 2, wherein determining the exposure energy advance value corresponding to the yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer and the exposure energy average value of the exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresist type of the yellow light process layer comprises: calculating an exposure energy test value according to a target critical dimension value corresponding to the yellow light process layer and a pre-established exposure energy linear model under a target process machine corresponding to the photoresist type of the yellow light process layer, wherein the exposure energy linear model is used for representing a linear fitting relation between the critical dimension value and the exposure energy value; Judging whether the absolute value of the difference rate between the exposure energy mean value and the exposure energy test value is smaller than a preset threshold value or not; if yes, the exposure energy average value is used as the exposure energy advance value corresponding to the yellow light process layer.
4. A method of determining the energy of a yellow light Cheng Bao according to claim 3, wherein for each of said yellow light process layers involved in said new product, creating a linear model of the exposure energy under different process tools corresponding to the type of photoresist of the yellow light process layer by: acquiring running data related to the type of the photoresistance of the yellow light process layer in a latest preset time period, wherein the running data comprises a process machine name, an exposure energy value and a key size value; And for each processing machine corresponding to the photoresist type of the yellow light process layer, creating an exposure energy linear model under the processing machine according to the running data.
5. The method of claim 4, wherein the creating a linear model of exposure energy under each process tool corresponding to the type of photoresist of the yellow light process layer according to the run data comprises: And aiming at each processing machine corresponding to the photoresistance type of the yellow light processing layer, acquiring an exposure energy value-key size value data set under the processing machine according to the running data, and performing linear fitting on the exposure energy value-key size value data set under the processing machine to create an exposure energy linear model under the processing machine.
6. The method for determining the light energy of the yellow light system Cheng Bao as defined in claim 4, wherein the obtaining running data related to the type of photoresist of the yellow light process layer in the last predetermined period of time includes: EDA software is adopted to obtain running data related to the photoresistance type of the yellow light process layer in the latest preset time period.
7. The method of claim 1, wherein for each of the yellow process layers involved in the new product, creating exposure energy distribution models for different critical dimension values under different process tools corresponding to the type of photoresist of the yellow process layer by: acquiring running data related to the type of the photoresistance of the yellow light process layer in a latest preset time period, wherein the running data comprises a process machine name, an exposure energy value and a key size value; and creating an exposure energy distribution model of different critical dimension values under each processing machine according to the running data aiming at each processing machine corresponding to the photoresist type of the yellow light process layer.
8. The method of claim 7, wherein creating an exposure energy distribution model for each process tool corresponding to the type of photoresist of the photolithography process layer according to the run data comprises: Acquiring an exposure energy value-key size value data set under each processing machine corresponding to the photoresist type of the yellow light process layer according to the running data; And aiming at each critical dimension value under each processing machine corresponding to the photoresist type of the yellow light process layer, acquiring an exposure energy value statistical result corresponding to the critical dimension value according to an exposure energy value-critical dimension value data set under the processing machine, and creating an exposure energy distribution model of the critical dimension value according to the exposure energy value statistical result corresponding to the critical dimension value.
9. An electronic device comprising a processor and a memory, the memory having stored thereon a computer program which, when executed by the processor, implements the method of determining light energy of yellow light system Cheng Bao as claimed in any one of claims 1 to 8.
10. A readable storage medium, wherein a computer program is stored in the readable storage medium, which when executed by a processor, implements the method for determining the light energy of yellow light system Cheng Bao according to any one of claims 1 to 8.

Description

Yellow light system Cheng Bao light energy determination method, electronic equipment and storage medium Technical Field The invention relates to the technical field of semiconductor processing and manufacturing, in particular to a method for determining light energy of a yellow light system Cheng Bao, electronic equipment and a storage medium. Background In the chip manufacturing industry, the NTO (New product Out) is off-line to represent a brand New product for first-time streaming or first-time trial production. Prior to production testing, the on-line specifications (Inline specifications) of the product are usually set in advance, and the core goal of the process engineer is to control the on-line critical dimension/quality control (Inline CD/QC) within a predetermined target range while ensuring overlay accuracy (overlay) within the corresponding specification range (spec). The magnitude of the exposure energy (DOSE) value, which is a critical tuning parameter (tuning parameter) in the yellow light process, has a significant impact on the Critical Dimension (CD) value. The exposure energy is typically given by referencing the exposure energy value of the product when the new product is taken off line by using a build program (recipe). But the critical dimension reject ratio (NG ratio) of the new product is high due to long-term non-run (run) or the difference in the illumination/design criteria of the new product and the reference product. However, customers often have special demands for new products and need to be shipped urgently, and once the new products are rejected due to the critical dimension, the production cycle (CYCLE TIME) is prolonged and the corresponding shipment time cannot be met, so that customer complaints and order quantity are reduced. Disclosure of Invention The invention aims to provide a method for determining the light energy of a yellow light system Cheng Bao, electronic equipment and a storage medium, which can ensure that the key size value of a produced new product can be within a corresponding specification range, effectively reduce the rework rate of the new product, shorten the production period of the new product and meet the urgent shipment requirement. The invention provides a method for determining the light energy of a yellow light process Cheng Bao, which comprises the steps of determining all yellow light process layers related to a new product and a target critical dimension value, a target processing machine and a light resistance type corresponding to each yellow light process layer related to the new product, and determining an exposure energy advance value corresponding to each yellow light process layer related to the new product according to the target critical dimension value and the type of the target processing machine corresponding to the yellow light process layer and a pre-established exposure energy distribution model of the target critical dimension value under the target processing machine corresponding to the light resistance type of the yellow light process layer. Optionally, determining the exposure energy look-ahead value corresponding to the yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer, the type of the target process machine corresponding to the photoresist type of the yellow light process layer, and the pre-created exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresist type of the yellow light process layer comprises determining the exposure energy median value of the exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresist type of the yellow light process layer as the exposure energy look-ahead value corresponding to the yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer and the light energy mean value of the exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresist type of the yellow light process layer, if the type of the target process machine corresponding to the yellow light process layer is Krf machine or Arf. Optionally, determining the exposure energy advance value corresponding to the yellow light process layer according to the target critical dimension value corresponding to the yellow light process layer and the exposure energy average value of the exposure energy distribution model of the target critical dimension value under the target process machine corresponding to the photoresist type of the yellow light process layer, wherein the exposure energy linear model is used for representing a linear fitting relation between the critical dimension value and the exposure energy value, judging whether the absolute value of the difference