CN-121997605-A - Grating period optimization design system of low-dispersion SiC diffraction optical waveguide

CN121997605ACN 121997605 ACN121997605 ACN 121997605ACN-121997605-A

Abstract

The invention discloses a grating period optimization design system of a low-dispersion SiC diffraction optical waveguide, which relates to the technical field of optical waveguide design and comprises a multi-physical field coupling modeling module, an intelligent optimization module, a heterogeneous integrated design module, a tolerance analysis module, a thermo-optical coupling module and an experimental verification interface; according to the invention, a system with cooperation of multi-physical field modeling, intelligent optimization, heterogeneous integration, tolerance analysis, thermo-optical coupling and experimental verification is constructed, a traditional trial-and-error design mode is innovated, a reliable optimization basis is established by accurately fusing materials, modes and diffraction dispersion, a proxy model and multi-objective algorithm are utilized, and material screening and chirp design are combined to directly realize wide-spectrum low dispersion.

Inventors

WANG YAPING
TONG XIAOGANG

Assignees

太原师范学院

Dates

Publication Date: 20260508
Application Date: 20260129

Claims (10)

1. A grating period optimization design system of a low-dispersion SiC diffraction optical waveguide is characterized by comprising the following components: The multi-physical field coupling modeling module is used for establishing a physical model fusing SiC material dispersion, waveguide mode dispersion and grating diffraction dispersion so as to quantify the influence of grating structure parameters on total dispersion; The intelligent optimization module is used for carrying out collaborative optimization on grating period, duty ratio and etching depth through a multi-objective optimization algorithm based on the physical model so as to simultaneously minimize wide-spectrum average dispersion and maximize the coupling efficiency of the center wavelength; the heterogeneous integrated design module is internally provided with a dynamic material library containing dispersion parameters of different dielectric materials, and is used for screening cladding materials matched with the SiC core layer to form a dispersion compensation structure and cooperatively optimizing cladding thickness and grating structure parameters; The tolerance analysis module is used for carrying out Monte Carlo simulation based on a preset manufacturing error, evaluating the robustness of the design scheme and generating an error compensation strategy; The thermal-optical coupling module is used for combining the thermal expansion and the thermal-optical effect of SiC, modeling the grating performance under the temperature change and optimizing parameters to realize temperature insensitive design; And the experiment verification interface is used for generating a processing layout according to the optimization result, collecting measured data and feeding back the performance deviation to the intelligent optimization module so as to drive closed loop iterative optimization.
2. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 1, wherein the multi-physical field coupling modeling module comprises a material dispersion unit for calculating intrinsic dispersion of SiC material, a mode dispersion unit for calculating waveguide mode dispersion and a diffraction dispersion unit for calculating grating diffraction dispersion, the material dispersion unit calculates refractive index of the material dispersion unit based on SELLMEIER equation of SiC, the mode dispersion unit calculates effective refractive index of waveguide mode by adopting a finite element method, and the diffraction dispersion unit calculates diffraction response of the grating by adopting a strict coupled wave analysis method.
3. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 1, wherein the intelligent optimization module comprises: The agent model building unit is used for training the neural network based on the simulation data, building a rapid mapping relation between the grating structure parameters and the optical performance indexes, and building an agent model; The multi-target self-adaptive searching unit is used for carrying out parameter optimization by adopting a genetic algorithm based on the agent model and a multi-target function of the user adjustable weight; and the chirped grating design unit is used for supporting the chirped structure design of the grating period changing along the propagation direction.
4. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 3, wherein the proxy model construction unit generates training samples by Latin hypercube sampling and optimizes the neural network through cross validation.
5. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 1, wherein the heterogeneous integrated design module screens cladding materials for compensating SiC dispersion by comparing and analyzing dispersion curves in a dynamic material library, and establishes a joint optimization function to cooperatively optimize cladding thickness and grating parameters.
6. The grating period optimization design system of a low-dispersion SiC diffraction optical waveguide of claim 1, wherein the tolerance analysis module performs Monte Carlo simulation by defining an error parameter library to evaluate robustness and performs parameter sensitivity analysis to generate an error compensation strategy.
7. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 6, wherein the Monte Carlo simulation supports selecting different error distribution models according to process characteristics.
8. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 1, wherein the thermo-optical coupling module establishes a coupling model by quantifying the thermo-induced grating period and the refractive index change, and mutually counteracts the thermo-induced dispersion drift in a target temperature region by optimizing an initial grating period.
9. The grating period optimization design system of a low-dispersion SiC diffraction optical waveguide as described in claim 8, wherein said thermo-optic coupling module further incorporates a thermal expansion coefficient of cladding material during modeling to correct thermal mismatch effects.
10. The grating period optimization design system of the low-dispersion SiC diffraction optical waveguide of claim 1, wherein the experiment verification interface forms closed loop iteration by generating a processing layout and collecting measured data, feeding back deviation to update a proxy model and triggering re-optimization.

Description

Grating period optimization design system of low-dispersion SiC diffraction optical waveguide Technical Field The invention relates to the technical field of optical waveguide design, in particular to a grating period optimization design system of a low-dispersion SiC diffraction optical waveguide. Background SiC is a third generation wide bandgap semiconductor compound composed of silicon (Si) and carbon (C). It is not only an artificial material, but also exists in trace amounts in nature (called morganite). The low-dispersion SiC diffractive optical waveguide specifically refers to a diffractive optical waveguide using SiC material as a substrate and a grating structure, and is designed with low dispersion, and represents a technical path pursuing the limit of AR optical performance. It aims to make use of the inherent advantages (high refractive index and high stability) of SiC materials in optics, and through advanced nano processing and optical design, an AR (AR) glasses core imaging module with thinner, stronger and better display effect (purer and clearer color) is manufactured. The grating period optimization design of the low-dispersion SiC diffraction optical waveguide refers to that when the diffraction optical waveguide is prepared by utilizing silicon carbide (SiC) materials, the periodic structure (namely grating constant) of the surface nano grating is accurately calculated and adjusted so as to realize high-efficiency optical coupling and conduction and simultaneously inhibit dispersion to the greatest extent. The core aim is to keep nearly uniform propagation angles and paths after diffraction of gratings by carefully designed periodic arrangement of light rays with different wavelengths of red, green and blue constituting an image, so as to avoid color separation ("rainbow effect") of final imaging. The method is essentially a multi-objective and multi-parameter system optimization project taking grating period as a key variable, and the design result directly determines the imaging quality, color fidelity and overall performance upper limit of the waveguide. Based on the findings of the prior art, the conventional SiC optical waveguide design technology relies on the experiences of discrete tools and designers, lacks systematicness, is often limited to single physical effect or fixed material combination, is difficult to realize accurate global control of chromatic dispersion, and the design process usually ignores the sensitivity of nano-scale manufacturing errors and the influence of environmental temperature variation, so that simulation and actual measurement deviation are large, design robustness is poor, in addition, the conventional technology cannot perform self-adaptive optimization according to process reality due to lack of direct data closed loops of processing and testing links, so that reliable mass production is difficult to realize in the high-performance SiC optical waveguide design. Therefore, the invention provides a grating period optimization design system and an interpretation method of a low-dispersion SiC diffraction optical waveguide, which are used for solving the problems in the prior art. Disclosure of Invention Aiming at the problems, the invention aims to provide a grating period optimization design system of a low-dispersion SiC diffraction optical waveguide, which solves the problems that the traditional SiC optical waveguide design technology is difficult to realize the accurate global control of dispersion, the design process usually ignores the sensitivity of nano-scale manufacturing errors and the influence of environmental temperature change, and the self-adaptive optimization cannot be carried out according to the process reality due to the lack of direct data closed loops of processing and testing links. In order to achieve the purpose of the invention, the invention is realized by the following technical scheme that the grating period optimization design system of the low-dispersion SiC diffraction optical waveguide comprises: the multi-physical field coupling modeling module is used for establishing a physical model integrating the intrinsic dispersion, waveguide mode dispersion and grating diffraction dispersion of the SiC material, and quantifying the comprehensive influence of grating period, duty cycle and etching depth on the total dispersion of the system by integrating the nonlinear characteristic of the change of the SiC refractive index along with the wavelength, the space constraint effect of the waveguide on the light field and the vector diffraction effect of the grating structure; The intelligent optimization module is connected with the multi-physical field coupling modeling module, is used for carrying out global collaborative optimization on grating period, duty ratio and etching depth by adopting a multi-target self-adaptive optimization algorithm and taking the minimization of wide-spectrum average dispersion and the maximization