CN-121997884-A - Mask pattern verification method and device, electronic equipment, storage medium and program product

CN121997884ACN 121997884 ACN121997884 ACN 121997884ACN-121997884-A

Abstract

The disclosure relates to a mask pattern verification method, a device, an electronic device, a storage medium and a program product. The mask pattern verification method comprises the steps of obtaining mask patterns and complementary values corresponding to the mask patterns, verifying the complementary values corresponding to the mask patterns through at least two tools based on the mask patterns to obtain verification results of the complementary values corresponding to the mask patterns, wherein the verification results are used for representing whether the complementary values corresponding to the mask patterns are reasonable complementary values or not, and the at least two tools correspond to different complementary value verification strategies respectively. The mask pattern verification method, the device, the electronic equipment, the storage medium and the program product can comprehensively verify the complement value of the mask pattern, and improve the accuracy of the complement value verification of the mask pattern.

Inventors

ZHANG GUOQIAN
WANG SHUANG
Zhuang Boqing

Assignees

成都新紫光半导体科技有限公司

Dates

Publication Date: 20260508
Application Date: 20241104

Claims (11)

1. The method for verifying the mask pattern is characterized by comprising the following steps of: acquiring a mask pattern and a complementary value corresponding to the mask pattern; And verifying the complement values corresponding to the mask pattern based on the mask pattern by at least two tools to obtain a verification result of the complement values corresponding to the mask pattern, wherein the verification result is used for representing whether the complement values corresponding to the mask pattern are reasonable complement values or not, and the at least two tools respectively correspond to different complement value verification strategies.
2. The method for verifying a mask pattern according to claim 1, wherein verifying, by at least two tools, the complementary value corresponding to the mask pattern based on the mask pattern, to obtain a verification result of the complementary value corresponding to the mask pattern, includes: Information extraction is carried out on the basis of the mask pattern through a first tool, so that pattern information related to complement verification is obtained; And verifying the complement value corresponding to the mask pattern by a second tool based on the pattern information, the mask pattern, the complement value corresponding to the mask pattern and a complement value verification strategy corresponding to the second tool, so as to obtain the verification result.
3. The method for verifying a mask pattern according to claim 2, wherein the extracting information based on the mask pattern by the first tool to obtain the pattern information related to the complement verification comprises: dividing the mask pattern into a plurality of parts by the first tool to obtain a divided mask pattern; acquiring a preset parameter set, wherein the preset parameter set comprises a plurality of parameters involved in the semiconductor manufacturing process based on optical proximity correction; and extracting information of the segmented mask pattern based on the preset parameter set through the first tool to obtain pattern information related to complement verification.
4. A method for verifying a mask pattern according to claim 2 or 3, wherein the verifying, by a second tool, the complementary value corresponding to the mask pattern based on the pattern information, the mask pattern, the complementary value corresponding to the mask pattern, and a complementary value verification policy corresponding to the second tool, to obtain the verification result includes: Determining a target graph based on the mask graph and the complementary value corresponding to the mask graph through the second tool; Verifying the target graph by the second tool based on the graph information and a complementary value verification strategy corresponding to the second tool to obtain a target graph verification result; And determining the verification result according to the target graph verification result.
5. The method for verifying a reticle pattern according to claim 2, wherein the number of the second tools is plural, complementary verification strategies corresponding to different second tools are different, the verification result includes verification results corresponding to the plural second tools, and the method for verifying a reticle pattern further includes: If the verification results respectively corresponding to the second tools represent that the complement values corresponding to the mask pattern are reasonable complement values, determining that the final verification result represents that the complement values corresponding to the mask pattern are reasonable complement values; if the verification results respectively corresponding to the second tools comprise verification results indicating that the complement value corresponding to the mask pattern is not a reasonable complement value, determining that the final verification result indicates that the complement value corresponding to the mask pattern is not a reasonable complement value.
6. The method for verifying a mask pattern according to claim 1, wherein verifying, by at least two tools, the complementary value corresponding to the mask pattern based on the mask pattern, to obtain a verification result of the complementary value corresponding to the mask pattern, includes: Verifying the complement value corresponding to the mask pattern by a first tool based on the mask pattern and a complement value verification strategy corresponding to the first tool to obtain a first verification result of the complement value corresponding to the mask pattern; Verifying the complement value corresponding to the mask pattern by a second tool based on the mask pattern and a complement value verification strategy corresponding to the second tool to obtain a second verification result of the complement value corresponding to the mask pattern; and determining a final verification result according to the first verification result and the second verification result.
7. The method for verifying a reticle pattern according to claim 1, wherein the method for verifying a reticle pattern further comprises: And if the verification result represents that the complement value corresponding to the mask pattern is not a reasonable complement value, correcting the complement value corresponding to the mask pattern by the at least two tools based on the mask pattern to obtain a corrected complement value, wherein the at least two tools respectively correspond to different complement value correction strategies.
8. A reticle pattern verification apparatus, comprising: the acquisition module is configured to acquire mask patterns and complementary values corresponding to the mask patterns; The verification module is configured to verify the complement values corresponding to the mask pattern based on the mask pattern through at least two tools to obtain a verification result of the complement values corresponding to the mask pattern, wherein the verification result is used for representing whether the complement values corresponding to the mask pattern are reasonable complement values or not, and the at least two tools respectively correspond to different complement value verification strategies.
9. A computer-readable storage medium having stored thereon a computer program, wherein the program when executed by a processor implements the method of verifying a reticle pattern according to any one of claims 1 to 7.
10. An electronic device, comprising: A memory having a computer program stored thereon; a processor, configured to execute the computer program in the memory, so as to implement the method for verifying a reticle pattern according to any one of claims 1 to 7.
11. A computer program product comprising a computer program, characterized in that the computer program, when executed by a processor, implements a method for verifying a reticle pattern according to any one of claims 1 to 7.

Description

Mask pattern verification method and device, electronic equipment, storage medium and program product Technical Field The disclosure relates to the technical field of semiconductors, and in particular relates to a method and a device for verifying mask patterns, electronic equipment, a storage medium and a program product. Background The mask is an important part in the semiconductor manufacturing technology, and a semiconductor product meeting the design requirement is formed by presetting a pattern on the mask and then transferring the pattern from the mask to the surface of a silicon wafer by utilizing the photoetching technology. The pattern design on a reticle may affect the quality of the final semiconductor product, and thus, pattern verification is typically performed on the designed reticle pattern. Disclosure of Invention The purpose of the present disclosure is to provide a method, an apparatus, an electronic device, a storage medium and a program product for verifying a mask pattern, where the method, the apparatus, the electronic device, the storage medium and the program product for verifying a mask pattern can perform more comprehensive verification on a complement value of the mask pattern, and improve accuracy of complement value verification of the mask pattern. In order to achieve the above object, in a first aspect, the present disclosure provides a method for verifying a mask pattern, including obtaining a mask pattern and a complement value corresponding to the mask pattern, verifying the complement value corresponding to the mask pattern by at least two tools based on the mask pattern, to obtain a verification result of the complement value corresponding to the mask pattern, where the verification result is used to characterize whether the complement value corresponding to the mask pattern is a reasonable complement value, and the at least two tools respectively correspond to different complement value verification strategies. Optionally, verifying the complement value corresponding to the mask pattern through at least two tools based on the mask pattern to obtain a verification result of the complement value corresponding to the mask pattern, wherein the verification result comprises the steps of extracting information based on the mask pattern through a first tool to obtain pattern information related to complement value verification, and verifying the complement value corresponding to the mask pattern through a second tool based on the pattern information, the mask pattern, the complement value corresponding to the mask pattern and a complement value verification strategy corresponding to the second tool to obtain the verification result. The method comprises the steps of dividing the mask pattern into a plurality of parts by a first tool to obtain divided mask patterns, obtaining a preset parameter set, wherein the preset parameter set comprises a plurality of parameters related to a semiconductor manufacturing process based on optical proximity correction, and extracting information of the divided mask patterns by the first tool based on the preset parameter set to obtain the pattern information related to the complement verification. Optionally, the verifying the complement value corresponding to the mask pattern by a second tool based on the pattern information, the mask pattern, the complement value corresponding to the mask pattern and the complement value verification policy corresponding to the second tool to obtain a verification result comprises determining a target pattern by the second tool based on the complement values corresponding to the mask pattern and the mask pattern, verifying the target pattern by the second tool based on the pattern information and the complement value verification policy corresponding to the second tool to obtain a target pattern verification result, and determining the verification result according to the target pattern verification result. Optionally, the number of the second tools is a plurality, the complementary value verification strategies corresponding to different second tools are different, the verification results comprise verification results corresponding to the second tools respectively, and the mask pattern verification method further comprises the steps of determining that a final verification result represents that the complementary value corresponding to the mask pattern is a reasonable complementary value if the complementary values corresponding to the mask pattern are all represented as reasonable complementary values by the verification results corresponding to the second tools respectively, and determining that the complementary value corresponding to the mask pattern is not reasonable complementary value if the verification results corresponding to the second tools respectively comprise verification results representing that the complementary value corresponding to the mask pattern is not reasonable complementary valu