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CN-121999091-A - Lithology symbol splicing method

CN121999091ACN 121999091 ACN121999091 ACN 121999091ACN-121999091-A

Abstract

The invention relates to the technical field of computer graphic processing and geoscience drawing, and discloses a lithology symbol spelling method. The method comprises the steps of obtaining lithology naming data and industry template rules, generating a spelling priority sequence through standardized processing and analysis binding, carrying out basic symbol selection and parameter instantiation based on the sequence to form an assembly candidate set, generating a pose solution set and a conflict list through adsorption matching, topology constraint solving and conflict detection, carrying out rule checking and conflict resolving according to the pose solution set and the conflict list to obtain a compliance spelling format and a quality mark, carrying out dependent analysis and increment regeneration on the compliance spelling format to obtain a regeneration result packet, and finally carrying out pattern matching, parameter synthesis and cross-platform adaptation construction to generate a derived result packet. The invention realizes automation, standardization and cross-platform compatibility of lithology symbol generation, and remarkably improves the efficiency and consistency of geological map making.

Inventors

  • YU BENZHI
  • HE HAONAN
  • HE ZHIJUN
  • LIU JUN
  • WANG JIAXIN

Assignees

  • 武汉时代地智科技股份有限公司

Dates

Publication Date
20260508
Application Date
20251224

Claims (10)

  1. 1. A method of stitching lithology symbols, comprising: acquiring lithology naming data and industry template rules, and generating a spelling priority sequence through standardized processing of synonymous unification, dimension unification and separator unification, and analyzing and occupying binding from outer layer description to inner layer construction; Based on the spelling priority sequence, selecting basic symbols according to sequence control information and constraint marks, and carrying out parameter instantiation and attribute setting by combining a size range, an angle range and a density threshold value to generate an assembly candidate set; acquiring an assembly candidate set, carrying out adsorption point matching and initial positioning according to template coordinates, template strips and adsorption points, obtaining a pose solution set through layered topological constraint solving and interval checking, and then generating a pose solution set and a conflict list through out-of-range checking and superposition detection; Based on the pose solution set and the conflict list, performing rule check and conflict resolution through rule entry comparison, priority decision and pose fine adjustment rollback to generate a compliance spelling format and a quality mark; Acquiring a compliance splicing format, performing dependency analysis on node and edge connection generation, affected set identification and dirty region positioning, and performing incremental regeneration of re-instantiation inspection and local pose solving to obtain a regenerated result packet; Based on the regenerated result package and the quality mark, the derived result package is generated by matching the stripe-level patterns, synthesizing parameters and combining target platform adaptation checking and neutral vector construction.
  2. 2. The method of claim 1, wherein the lithology naming data comprises: The lithology naming data is a unified data set oriented to geological records, result documents and project databases, and comprises basic lithology, main chippings, grain grades, secondary chippings and structural construction naming elements, and qualifiers, modifier words and arrangement order information related to naming.
  3. 3. The method of claim 1, wherein the industry template rules comprise: Industry template rules are a set of rules formed based on established drawing specifications and project conventions, including configuration entries for template coordinates, adsorption points, allowed fields, density thresholds, overlay levels, template strips, and grid cells.
  4. 4. The method of claim 1, wherein generating the collage priority sequence further comprises: Acquiring lithology naming data and industry template rules, analyzing and element extraction, namely carrying out synonymous unified, dimensional unified and separator unified standardized treatment on source heterogeneous entries, generating a naming fragment sequence by item-by-item comparison with a glossary, analyzing, and simultaneously establishing one-to-one occupation binding with the template entries to obtain a semantic element set; The rule matching and mapping retrieval from the semantic element set comprises the steps of determining a retrieval sequence to enter a basic symbol library to be matched with a symbol mapping table according to an initial priority mark, performing legality check on the parameters of a superposition level, a density threshold value, relative azimuth and size angle, and performing merging processing on candidate components to form an ordered candidate list to obtain an element mapping list; The element mapping list sorting and conflict removing processing comprises the steps of carrying out primary sorting according to the comprehensive rules of the template strips, the adsorption point grades and the stacking layers, executing cross-element conflict scanning, judging by combining with priority judging terms, and combining with the consistent expression combination to generate a spelling priority sequence.
  5. 5. The method of claim 1, wherein generating the assembly candidate set further comprises: acquiring a spelling priority sequence, performing basic symbol selection and resource loading, and searching and completing resource readiness of component materials, linear patterns and filling patterns in a basic symbol library based on sequence control information and constraint marks of template strips, adsorption point grades, stacking levels and allowed domains in the sequence to obtain a basic symbol set; Parameter instantiation and attribute setting from a basic symbol set comprises the steps of reading constraint mark analysis size range, angle range, density threshold and relative azimuth boundary to establish an adjustable interval, assigning linear, filling and contour thickness attributes according to parameter inheritance clues, and generating reference marks to obtain a parameterized basic symbol set; The method comprises the steps of performing assembly preparation and reference registration on a parameterized basic symbol set, determining candidate adsorption points and allowed domains according to reference identifiers, combining adsorption point grade screening sites, establishing assembly candidate records, writing component identifiers, candidate sites, allowed domain definitions and other fields, and simultaneously establishing a multi-level reference relationship to generate an assembly candidate set.
  6. 6. The method of claim 1, wherein generating the set of pose solutions and the list of conflicts further comprises: Obtaining a standard template and an assembly candidate set, performing adsorption point matching and initial positioning, namely performing item-by-item comparison binding on effective adsorption points based on template coordinates, template strips, grid units, adsorption points and allowed domains, deriving initial positions and initial orientations according to the allowed domains to generate initial positioning results, and obtaining an initial layout set; Carrying out layered topological constraint solving and interval checking from an initial layout set, namely reading layered topological relation and superposition level definition, dividing the layout according to layers, carrying out local fine tuning to meet the same-layer constraint by taking an effective adsorption point as a reference, and carrying out cross-layer constraint superposition and uniform interval checking to obtain a pose solution set; The out-of-range checking and superposition detection of the pose solution set comprises the steps of checking out-of-range types and ranges according to the allowed domain, the template strip and the grid cell boundary, detecting the same-layer and cross-layer superposition relation to generate superposition records, preferentially detecting objects to be detected to be collided, attempting for standby positioning and rollback, and generating a collision list.
  7. 7. The method of claim 1, wherein generating the compliance collage and quality markup further comprises: Obtaining a pose solution set and a conflict list, performing rule checking and priority decision comprises layering the pose solution set and establishing a check queue by a spelling priority sequence, calling a spelling rule base to carry out item comparison and substituting according to rule spam terms of an industry template to generate a checking summary list for centralized filing to obtain a checking result set; Establishing a processing queue according to a priority decision-making mark by conflict resolution and pose adjustment from the checking result set, reading available pose boundaries and standby positioning indexes, carrying out local fine adjustment or rollback, adjusting a cross-layer stacking condition into a temporary processing group, and writing successful adjustment items into a layout cache to obtain a compliance splicing layout; The method comprises the steps of performing consistency check and mark generation on the splice layout, including performing global rechecking on consistency with the splice priority sequence, industry template rules and references, performing cross-layer and cross-stripe consistency scanning according to distribution conditions, and generating mark items containing consistency check results and reference chain pointers for each layout item to obtain quality marks.
  8. 8. The method of claim 1, wherein obtaining the regenerated result package further comprises: Acquiring a compliance spelling and parameterization basic symbol set, analyzing a reference relation and registering nodes, wherein the analysis of the reference relation and the registration of the nodes comprise one-to-one comparison and check of instantiation attributes by taking a layout item as a node candidate, generating edge connection according to a reference chain, writing an ordering identifier, executing merging registration on a shared item to establish a fan-out relation, and writing a source index into the attributes to obtain dependency graph data; Carrying out affected set identification and dirty region positioning from the dependency graph data comprises carrying out traversal marking on affected nodes by taking a change item as a starting point, establishing a temporary affected subgraph and carrying out priority subdivision, and calculating a dirty region range of a primary processing object to be incorporated into adjacent nodes to obtain an affected set; The step of carrying out increment regeneration and result encapsulation on the affected set comprises the steps of scheduling according to a priority processing sequence, carrying out re-instantiation inspection to generate a new instantiation parameter set, re-executing adsorption point matching, layering constraint solving and interval checking in the boundary of a dirty area to generate a new pose solution segment, and merging the new pose solution segment and the old pose solution segment by taking a strip as a unit to obtain a regenerated result packet.
  9. 9. The method of claim 1, wherein generating the export package further comprises: obtaining a regenerated result packet and a quality mark, performing topic style matching and parameter synthesis, namely performing strip-level arrangement on a synthesized format fragment, searching and selecting compatible styles according to strip, level and component types in a topic style resource library, and generating a strip-level synthesis parameter set by taking an instantiation parameter set as a basic value and topic style items as modification values to obtain a topic style instruction; Performing adaptation checking and neutral vector construction from a theme style instruction, wherein the adaptation checking and neutral vector construction comprises performing item-by-item comparison checking style support on constraint tables of different target platforms, performing style mapping or degradation, performing adaptation checking correction on pose related parameters, storing geometric outlines in independent vector paths, storing style control in style fragments, and establishing binding to obtain derived configuration data; The step of using the export configuration data to generate cross-platform export results and audit records comprises the steps of reading vector paths and style fragments according to a platform to generate graphic objects, writing display orders according to superposition semantic mapping, conducting consistency review on the generated files, adding annotation fragments, and generating audit records of record generation time, platform version, mapping results and degradation lists to obtain an export result package.
  10. 10. The method of claim 6, wherein the standard template comprises: The standard template is a predefined digital frame based on industry drawing specification and project convention, and the content of the standard template comprises a template coordinate system, template stripe division, a grid cell array, adsorption point hierarchical configuration and allowed domain boundary definition; the template is internally provided with a superposition level definition, a layering topological relation and a density threshold constraint, and a space benchmark and a combination rule are provided for the geometric layout of lithology symbols; the template guides the priority order of initial positioning through the attribution relation of the strip and the grid unit bearing symbol, and provides a unified space and rule reference basis in the adsorption matching, topology solving and conflict detecting stages by allowing the domains to restrict the pose adjustable range of the symbol.

Description

Lithology symbol splicing method Technical Field The invention relates to the technical field of computer graphic processing and geographic drawing, in particular to a lithology symbol splicing method. Background The common practice of geoexploration and hydrocarbon geology cataloging is to draw lithology symbols in cross-section, histogram and synthetic charts. The traditional flow is based on manual combination of basic geometric primitives by a plotter, the symbol spacing, the symbol orientation and the alignment reference lack of unified constraint, the naming rule and the schema elements lack of mechanized mapping, and the workload of symbol multiplexing and batch modification is large. Common software tools often provide a general drawing function, lack of rule-driven mechanisms for correspondence between lithology naming elements and symbol libraries, and lack of programmed paths from naming elements to "basic symbol-layout". In the layout stage, the existing method is mainly placed around reference lines or grids, symbol adsorption points are not defined normally, the domains, the minimum spacing and the overlapping layers are allowed to lack uniform description, cross-layer relation and strip boundary constraint are difficult to synchronously execute, conflict discovery is mostly carried out at the tail end of the diagram, and groups of check records and traceable basis are lacked. Layout adjustment is often accomplished by repeated movement and trial and error, lacks a local solution order according to priority, lacks a structured result of "pose state-conflict type-adjustable boundary", and is difficult to form an input facing subsequent computation. In the maintenance stage, the reference relation between the symbol library and the imaging is unclear, the range of the related object after the basic symbol parameters are changed is unclear, and the increment update lacks propagation boundaries and processing sequences, so that the whole graph piece is repeatedly redrawn. When the multiple software is cooperated, the pattern semantics and the vector structure are different, the pattern items and the superposed semantics are easy to deviate in the cross-platform deriving process, audit records and quality marks bound with format data are absent, and the subsequent review and tracking cost is high. Disclosure of Invention In order to solve the technical problems, the invention provides a lithology symbol splicing method, which comprises the following steps: acquiring lithology naming data and industry template rules, and generating a spelling priority sequence through standardized processing of synonymous unification, dimension unification and separator unification, and analyzing and occupying binding from outer layer description to inner layer construction; Based on the spelling priority sequence, selecting basic symbols according to sequence control information and constraint marks, and carrying out parameter instantiation and attribute setting by combining a size range, an angle range and a density threshold value to generate an assembly candidate set; acquiring an assembly candidate set, carrying out adsorption point matching and initial positioning according to template coordinates, template strips and adsorption points, obtaining a pose solution set through layered topological constraint solving and interval checking, and then generating a pose solution set and a conflict list through out-of-range checking and superposition detection; Based on the pose solution set and the conflict list, performing rule check and conflict resolution through rule entry comparison, priority decision and pose fine adjustment rollback to generate a compliance spelling format and a quality mark; Acquiring a compliance splicing format, performing dependency analysis on node and edge connection generation, affected set identification and dirty region positioning, and performing incremental regeneration of re-instantiation inspection and local pose solving to obtain a regenerated result packet; Based on the regenerated result package and the quality mark, the derived result package is generated by matching the stripe-level patterns, synthesizing parameters and combining target platform adaptation checking and neutral vector construction. Further, the lithology naming data includes: The lithology naming data is a unified data set oriented to geological records, result documents and project databases, and comprises basic lithology, main chippings, grain grades, secondary chippings and structural construction naming elements, and qualifiers, modifier words and arrangement order information related to naming. Further, the industry template rules include: Industry template rules are a set of rules formed based on established drawing specifications and project conventions, including configuration entries for template coordinates, adsorption points, allowed fields, density thresholds, overlay levels, template strips, and gri