CN-122000263-A - Method and apparatus for traffic distribution

Abstract

Various embodiments of the present technology may provide a divider plate having a recess and an inlet aperture in fluid communication with the recess, a flow distribution ring disposed within the recess, wherein the flow distribution ring has a plurality of apertures, and a top ring disposed over the divider plate and the flow distribution ring.

Inventors

• J. L. Winkler
• A. Gindy

Assignees

• ASMIP私人控股有限公司

Dates

Publication Date

20260508

Application Date

20251031

Priority Date

20241105

Claims (20)

1. 1. An apparatus, comprising: a separator plate, comprising: Groove, and An inlet aperture in fluid communication with the recess; a flow distribution ring disposed within the recess, wherein the flow distribution ring includes a plurality of apertures, and And a top ring disposed above the partition plate and the flow distribution ring.
2. 2. The apparatus of claim 1, wherein the plurality of apertures of the flow distribution ring are vertically oriented and in fluid communication with the groove.
3. 3. The apparatus of claim 1, wherein the recess is disposed within a top surface of the divider plate.
4. 4. The apparatus of claim 1, wherein the recess is annular.
5. 5. The apparatus of claim 1, wherein the inlet aperture is horizontally disposed and coupled to a gas line.
6. 6. The apparatus of claim 1, wherein the top ring includes a radially inwardly extending lip.
7. 7. The apparatus of claim 6, wherein the lip is separated from the divider plate by a gap.
8. 8. The apparatus of claim 1, wherein the divider plate includes a lip extending radially inward and overlapping an outer edge of the support assembly.
9. 9. The apparatus of claim 1, wherein: The partition plate is formed of at least one of aluminum, nickel, stainless steel, and titanium, and The flow distribution ring is formed of at least one of aluminum, nickel, stainless steel, and titanium.
10. 10. The apparatus of claim 1, wherein the top ring is formed of at least one of ceramic and quartz.
11. 11. A reactor, comprising: A lower chamber; a shower head disposed above the lower chamber; A divider plate disposed between the lower chamber and the showerhead, wherein the divider plate comprises: An annular groove in the top surface of the divider plate; An inlet aperture, and A radially inwardly extending first lip; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; A support assembly disposed within the reaction chamber, wherein the first lip of the divider plate overlaps an outer edge of the base support assembly, and A top ring coupled to a top surface of the partition plate.
12. 12. The reactor of claim 11, wherein the inlet aperture is horizontally disposed and coupled to an inlet port disposed on an outer surface of the reaction chamber.
13. 13. The reactor of claim 11, wherein the top ring comprises a radially inwardly extending second lip.
14. 14. The reactor of claim 11, wherein the second lip of the top ring is separated from the divider plate by a first gap.
15. 15. The reactor of claim 11, further comprising a seal disposed between the first lip of the divider plate and an outer edge of the base support assembly.
16. 16. The reactor of claim 11, wherein the second lip of the top ring is separated from the base support assembly by a second gap, wherein the second gap is arranged as an annular ring.
17. 17. A system, comprising: a reactor, comprising: A lower chamber; a shower head disposed above the lower chamber; A divider plate disposed between the lower chamber and the showerhead, wherein the divider plate comprises: An annular groove in the top surface of the divider plate; An inlet aperture, and A radially inwardly extending first lip; a flow distribution ring disposed within the annular groove and comprising a plurality of apertures in fluid communication with the inlet aperture; a base support assembly disposed within the reaction chamber, wherein the first lip of the divider plate overlaps an outer edge of the base support assembly, and A top ring coupled to a top surface of the partition plate; A gas line coupled to the inlet aperture, wherein the gas line comprises a first tube segment and a second tube segment, wherein the first tube segment and the second tube segment are parallel to each other, and A pressure control device located upstream of the first pipe section and the second pipe section.
18. 18. The system of claim 17, further comprising a first valve disposed in line with the first pipe segment and a second valve disposed within the second pipe segment.
19. 19. The system of claim 17, wherein the gas line is further coupled to an inert gas source.
20. 20. The system of claim 17, further comprising a controller in communication with the first valve and the second valve and configured to operate the first valve and the second valve.

Description

Method and apparatus for traffic distribution Technical Field The present disclosure relates generally to methods and apparatus for traffic distribution. More particularly, the present disclosure relates to a flow distribution ring disposed within a divider plate to provide an air curtain around a base. Background Reaction chambers used in semiconductor fabrication may contain spaces or volumes that need to be purged with an inert gas to prevent deposition of chemicals in those areas. The deposition of chemicals in these spaces may lead to contamination of the reaction space and/or impair the function of components within the reaction chamber. Disclosure of Invention Various embodiments of the present technology may provide a divider plate having a recess and an inlet aperture in fluid communication with the recess, a flow distribution ring disposed within the recess, wherein the flow distribution ring has a plurality of apertures, and a top ring disposed over the divider plate and the flow distribution ring. According to one aspect, an apparatus includes a divider plate including a recess and an inlet aperture in fluid communication with the recess, a flow distribution ring disposed within the recess, wherein the flow distribution ring includes a plurality of apertures, and a top ring disposed above the divider plate and the flow distribution ring. In one embodiment, the plurality of apertures of the flow distribution ring are vertically oriented and are in fluid communication with the groove. In one embodiment, the recess is arranged in the top surface of the partition plate. In one embodiment, the recess is annular. In one embodiment, the inlet aperture is arranged horizontally and coupled to the gas line. In one embodiment, the top ring includes a radially inwardly extending lip. In one embodiment, the lip is separated from the divider plate by a gap. In one embodiment, the divider plate includes a lip that extends radially inward and overlaps the outer edge of the support assembly. In one embodiment, the divider plate is formed of at least one of aluminum, nickel, stainless steel, and titanium, and the flow distribution ring is formed of at least one of aluminum, nickel, stainless steel, and titanium. In one embodiment, the top ring is formed of at least one of ceramic and quartz. According to another aspect, a reactor includes a lower chamber, a showerhead disposed above the lower chamber, a divider plate disposed between the lower chamber and the showerhead, wherein the divider plate includes an annular recess in a top surface of the divider plate, an inlet aperture, and a first lip extending radially inward, a flow distribution ring disposed within the annular recess and including a plurality of apertures in fluid communication with the inlet aperture, a support assembly disposed within the reaction chamber, wherein the first lip of the divider plate overlaps an outer edge of the base support assembly, and a top ring coupled to the top surface of the divider plate. In one embodiment, the inlet aperture is arranged horizontally and coupled to an inlet port arranged on an outer surface of the reaction chamber. In one embodiment, the top ring includes a radially inwardly extending second lip. In one embodiment, the second lip of the top ring is separated from the divider plate by a first gap. In one embodiment, the apparatus further comprises a seal disposed between the first lip of the divider plate and the outer edge of the base support assembly. In one embodiment, the second lip of the top ring is separated from the base support assembly by a second gap, wherein the second gap is arranged as an annular ring. According to yet another aspect, a system includes a reactor including a lower chamber, a showerhead disposed above the lower chamber, a divider plate disposed between the lower chamber and the showerhead, wherein the divider plate includes an annular groove in a top surface of the divider plate, an inlet aperture, and a first lip extending radially inward, a flow distribution ring disposed within the annular groove and including a plurality of apertures in fluid communication with the inlet aperture, a base support assembly disposed within the reaction chamber, wherein the first lip of the divider plate overlaps an outer edge of the base support assembly, and a top ring coupled to the top surface of the divider plate, a gas line coupled to the inlet aperture, wherein the gas line includes a first tube segment and a second tube segment, wherein the first tube segment and the second tube segment are parallel to each other, and a pressure control device located upstream of the first tube segment and the second tube segment. In one embodiment, the system further comprises a first valve disposed in line with the first tube segment and a second valve disposed within the second tube segment. In one embodiment, the gas line is further coupled to an inert gas source. In one embodiment, the system furthe