CN-122003036-A - Display substrate, manufacturing method thereof and display device

CN122003036ACN 122003036 ACN122003036 ACN 122003036ACN-122003036-A

Abstract

The display substrate comprises a substrate, an anode layer, a pixel definition layer, an isolation column, a luminescent layer and a cathode layer, wherein the anode layer comprises a plurality of anodes, a plurality of pixel openings corresponding to the plurality of pixels are defined on the pixel definition layer, the isolation column is located at one side, away from the substrate, of the pixel definition layer and located between adjacent pixel openings, the luminescent layer and the cathode layer are sequentially stacked at one side, away from the substrate, of the pixel definition layer and the isolation column along the direction away from the substrate, the luminescent layer and the cathode layer are separated by the isolation column, the cathode layer of the adjacent pixels is in contact connection with the isolation column, a pit is formed on one side, away from the substrate, of the pixel definition layer, surrounding the pixel openings, of the pixel definition layer, a thinning area is formed at the position corresponding to the pit, and the thickness of a film layer of the thinning area is smaller than that of other areas in the luminescent layer. The display substrate, the manufacturing method thereof and the display device can improve crosstalk phenomenon.

Inventors

LI XUEPING
SHI JIKAI
HAO RUI
WU TONG
XIN YANXIA
HUANG LIWEI
LI HAIBO
WU YIHAO
WANG XIAOYUN
ZHOU YUZHU
ZHAO YU
ZHANG FENG

Assignees

京东方科技集团股份有限公司
成都京东方光电科技有限公司

Dates

Publication Date: 20260508
Application Date: 20241105

Claims (13)

1. A display substrate, comprising: a substrate including a plurality of pixels; an anode layer including a plurality of anodes disposed corresponding to the plurality of pixels; A pixel defining layer, which is positioned on one side of the anode layer, which is away from the substrate, and a plurality of pixel openings corresponding to the plurality of pixel arrangements are defined on the pixel defining layer; A spacer located on a side of the pixel defining layer away from the substrate and between adjacent pixel openings, and The light-emitting layer and the cathode layer are sequentially stacked on one side, far away from the substrate, of the pixel definition layer and the isolation column along the direction away from the substrate, the light-emitting layer and the cathode layer are separated by the isolation column, the cathode layer in adjacent pixels is in contact connection with the isolation column, The pixel definition layer is provided with a pit around the pixel opening on one side surface facing away from the substrate, the light-emitting layer covers one side of the pixel definition layer facing away from the substrate in a conformal manner, a thinning area is formed at a position corresponding to the pit, and the thickness of a film layer of the thinning area is smaller than that of other areas except the thinning area in the light-emitting layer.
2. The display substrate of claim 1, wherein the pixel definition layer comprises: Covering a first region between adjacent anodes, and A second region overlying a side of the anode remote from the substrate, wherein, The pit is located at an interface position between the first region and the second region in a direction from the isolation pillar toward the pixel opening, the pit being located between the isolation pillar and the pixel opening.
3. The display substrate of claim 2, wherein the pixel definition layer comprises at least a first sub-pixel definition layer, a second sub-pixel definition layer, wherein, The first sub-pixel defining layer is positioned in the first area, a gap is formed between the pattern of the first sub-pixel defining layer and the anode adjacent to the first sub-pixel defining layer, the second sub-pixel defining layer covers one side of the first sub-pixel defining layer far away from the substrate along the shape, is at least partially positioned in the first area, is at least partially positioned in the second area, and forms the pit at the position covering the gap.
4. A display substrate according to claim 3, wherein the pixel defining layer further comprises at least a third sub-pixel defining layer, the third sub-pixel defining layer being stacked on a side of the first sub-pixel defining layer close to the substrate, and the third sub-pixel defining layer being at least partly located in the first region and at least partly located in the second region.
5. The display substrate according to claim 4, wherein the size of the gap is 0.6 to 0.8 μm in a direction from the barrier rib toward the pixel opening.
6. The display substrate according to claim 4, wherein a film thickness of the first sub-pixel defining layer is less than or equal to The thickness of the second sub-pixel definition layer is 1.5 mu m +/-10%, and the thickness of the third sub-pixel definition layer is 1.5 mu m +/-10%.
7. The display substrate according to claim 4, wherein the anode has a first sidewall, the first sub-pixel defining layer has a second sidewall, the first sidewall and the second sidewall cooperate to form the gap, a slope angle of the first sidewall is 50-70 °, and a slope angle of the second sidewall is 50-70 °.
8. The display substrate of claim 4, wherein the material of the first subpixel defining layer comprises a gate metal material, the material of the second subpixel defining layer comprises an inorganic insulating material, and the material of the third subpixel defining layer comprises an inorganic insulating material.
9. The display substrate according to claim 1, wherein the light emitting layer is provided with a film connecting portion and a film disconnecting portion in the thinning region in sequence along a direction away from the substrate, the film thickness of the film connecting portion is a first thickness h1, and the film thickness of the light emitting layer in the other regions except the thinning region is a second thickness h2, wherein h1/h2=0.05 to 0.1.
10. A method for manufacturing a display substrate, the method comprising the steps of: Providing a substrate; forming an anode layer on the substrate, wherein the anode layer includes a pattern of a plurality of anodes disposed corresponding to a plurality of pixels; Forming a pixel definition layer on one side of the anode layer, which is away from the substrate, wherein a plurality of pixel openings corresponding to the plurality of pixel arrangements are defined on the pixel definition layer, and pits are arranged on one side surface of the pixel definition layer, which is away from the substrate, around the pixel openings; Forming isolation columns on one side of the pixel definition layer, which is away from the substrate, wherein the isolation columns are positioned between adjacent pixel openings; And sequentially forming a light-emitting layer and a cathode layer on one side, far away from the substrate, of the pixel definition layer and one side, far away from the substrate, of the isolation column, wherein the light-emitting layer and the cathode layer are separated and disconnected by the isolation column, the cathode layer in adjacent pixels is in contact connection with the isolation column, the light-emitting layer covers one side, far away from the substrate, of the pixel definition layer along with the shape, a thinning area is formed at a position corresponding to the pit, and the thickness of a film layer of the thinning area is smaller than that of other areas except the thinning area, in the light-emitting layer.
11. The method according to claim 10, wherein forming a pixel defining layer on a side of the anode layer facing away from the substrate, in particular comprises: Forming a first sub-pixel defining layer located in a first region between adjacent anodes, the first sub-pixel defining layer having a pattern with a gap from the anode adjacent to the first sub-pixel defining layer; and forming a second sub-pixel definition layer on one side of the first sub-pixel definition layer far away from the substrate, wherein the second sub-pixel definition layer covers one side of the first sub-pixel definition layer far away from the substrate in a conformal manner, the second sub-pixel definition layer is at least partially positioned in the first area, is at least partially positioned in a second area of one side of the anode far away from the substrate, and forms the pit at a position covering the gap.
12. The method according to claim 11, wherein forming a pixel defining layer on a side of the anode layer facing away from the substrate, in particular further comprises: A third sub-pixel defining layer is formed before the first sub-pixel defining layer is formed, wherein the third sub-pixel defining layer is stacked on one side of the first sub-pixel defining layer close to the substrate, and the third sub-pixel defining layer is at least partially located in the first region and at least partially located in the second region.
13. A display device comprising the display substrate according to any one of claims 1 to 9.

Description

Display substrate, manufacturing method thereof and display device Technical Field The invention relates to the technical field of display, in particular to a display substrate, a manufacturing method thereof and a display device. Background Self-luminous display panels are a display technology capable of self-luminescence without a backlight. Common self-luminous display panels include OLED (Organic Light-Emitting Diode), QLED (Quantum Dot LIGHT EMITTING Diodes), and other display panels. The self-luminous display panel is provided with a light-emitting element, and the light-emitting element comprises an anode, a light-emitting layer and a cathode which are stacked. In the related art, in order to achieve a better display effect, a pixel packaging technology is adopted, isolation columns are arranged between adjacent sub-pixels, auxiliary cathodes are arranged in the isolation columns, and the cathodes can be overlapped with the auxiliary cathodes. However, the self-luminous display panel employing the above pixel packaging technique has a crosstalk phenomenon. Disclosure of Invention The embodiment of the disclosure provides a display substrate, a manufacturing method thereof and a display device, which can improve crosstalk phenomenon. The technical scheme provided by the embodiment of the disclosure is as follows: in a first aspect, an embodiment of the present disclosure provides a display substrate, including: a substrate including a plurality of pixels; an anode layer including a plurality of anodes disposed corresponding to the plurality of pixels; A pixel defining layer, which is positioned on one side of the anode layer, which is away from the substrate, and a plurality of pixel openings corresponding to the plurality of pixel arrangements are defined on the pixel defining layer; A spacer located on a side of the pixel defining layer away from the substrate and between adjacent pixel openings, and The light-emitting layer and the cathode layer are sequentially stacked on one side, far away from the substrate, of the pixel definition layer and the isolation column along the direction away from the substrate, the light-emitting layer and the cathode layer are separated by the isolation column, the cathode layer in adjacent pixels is in contact connection with the isolation column, The pixel definition layer is provided with a pit around the pixel opening on one side surface facing away from the substrate, the light-emitting layer covers one side of the pixel definition layer facing away from the substrate in a conformal manner, a thinning area is formed at a position corresponding to the pit, and the thickness of a film layer of the thinning area is smaller than that of other areas except the thinning area in the light-emitting layer. Illustratively, the pixel definition layer includes: Covering a first region between adjacent anodes, and A second region overlying a side of the anode remote from the substrate, wherein, The pit is located at an interface position between the first region and the second region in a direction from the isolation pillar toward the pixel opening, the pit being located between the isolation pillar and the pixel opening. The pixel definition layer comprises at least a first sub-pixel definition layer and a second sub-pixel definition layer, wherein, The first sub-pixel defining layer is positioned in the first area, a gap is formed between the pattern of the first sub-pixel defining layer and the anode adjacent to the first sub-pixel defining layer, the second sub-pixel defining layer covers one side of the first sub-pixel defining layer far away from the substrate along the shape, is at least partially positioned in the first area, is at least partially positioned in the second area, and forms the pit at the position covering the gap. The pixel defining layer may further include a third sub-pixel defining layer stacked on a side of the first sub-pixel defining layer adjacent to the substrate, and the third sub-pixel defining layer may be at least partially located in the first region and at least partially located in the second region. Illustratively, the gap has a dimension of 0.6-0.8 microns in a direction from the spacer pillar toward the pixel opening. Exemplary, the first subpixel defining layer has a film thickness less than or equal toThe thickness of the second sub-pixel definition layer is 1.5 mu m +/-10%, and the thickness of the third sub-pixel definition layer is 1.5 mu m +/-10%. Illustratively, the anode has a first sidewall, the first sub-pixel defining layer has a second sidewall, the first sidewall and the second sidewall cooperate to form the gap, a slope angle of the first sidewall is 50-70 °, and a slope angle of the second sidewall is 50-70 °. Illustratively, the material of the first sub-pixel defining layer comprises a gate metal material, the material of the second sub-pixel defining layer comprises an inorganic insulating material, and the material