CN-122003038-A - Display panel, preparation method of display panel and electronic equipment
Abstract
The embodiment of the application provides a display panel, a preparation method of the display panel and electronic equipment, and relates to the technical field of display, wherein the display panel comprises a substrate and a pixel definition layer, and the pixel definition layer is positioned on one side of the substrate; along the thickness direction of the substrate, the pixel defining layer comprises a first pixel defining sub-layer and a second pixel defining sub-layer which are sequentially stacked, and the density of the first pixel defining sub-layer is greater than that of the second pixel defining sub-layer. According to the application, the density of the first pixel defining sub-layer is set to be greater than that of the second pixel defining sub-layer, so that the effect of the pixel defining layer on isolating water vapor in the substrate can be greatly improved, the appearance of the film layer on the side, far away from the substrate, of the pixel defining layer is not easily influenced, and the quality of the display panel can be improved.
Inventors
- HUANG LIN
Assignees
- 合肥维信诺科技有限公司
Dates
- Publication Date
- 20260508
- Application Date
- 20241106
Claims (16)
- 1. A display panel, the display panel comprising: a substrate; The pixel defining layer comprises a first pixel defining sub-layer and a second pixel defining sub-layer which are sequentially stacked along the thickness direction of the substrate, wherein the density of the first pixel defining sub-layer is greater than that of the second pixel defining sub-layer.
- 2. The display panel according to claim 1, wherein the first pixel defining sub-layer includes a first pixel defining sub-layer and a second pixel defining sub-layer stacked in this order in a thickness direction of the substrate, a density of the first pixel defining sub-layer being greater than a density of the second pixel defining sub-layer; Preferably, the thickness of the first pixel defining sub-layer is smaller than the thickness of the second pixel defining sub-layer along the thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer along a thickness direction of the substrate is greater than or equal to 7/20 and less than or equal to 4/5; Preferably, the first pixel defines a sub-layer having a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the second pixel defines a sub-layer having a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the ratio of the density of the first pixel defining sub-layer to the density of the second pixel defining sub-layer is greater than or equal to 7/4 and less than or equal to 5.
- 3. The display panel of claim 1, wherein a ratio of a density of the first pixel defining sub-layer to a density of the second pixel defining sub-layer is greater than or equal to 2 and less than or equal to 10; Preferably, the display panel further includes a first electrode located at one side of the substrate, and the first pixel defining sub-layer covers a sidewall of the first electrode; Preferably, the first pixel defining sub-layer extends to a side of the first electrode away from the substrate through a sidewall of the first electrode, and covers a portion of the first electrode away from the substrate; preferably, the first pixel defining sub-layer fills a gap between adjacent first electrodes; preferably, the pixel defining layer includes a pixel opening exposing a portion of the first electrode.
- 4. The display panel according to claim 1, wherein a thickness of the first pixel defining sub-layer is greater than a thickness of the second pixel defining sub-layer in a thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer is greater than or equal to 2 and less than or equal to 6 along a thickness direction of the substrate; preferably, the first pixel defining sub-layer has a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the thickness of the second pixel defining sub-layer is greater than or equal to And less than or equal to Preferably, the material of the first pixel defining sub-layer comprises silicon nitride; Preferably, the material of the second pixel defining sub-layer comprises silicon oxide.
- 5. The display panel according to claim 1, wherein a thickness of the first pixel defining sub-layer is smaller than a thickness of the second pixel defining sub-layer in a thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer is greater than or equal to 1/5 and less than or equal to 4/5 along a thickness direction of the substrate; preferably, the first pixel defining sub-layer has a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the thickness of the second pixel defining sub-layer is greater than or equal to And less than or equal to Preferably, the material of the first pixel defining sub-layer comprises silicon nitride or silicon oxide; Preferably, the material of the second pixel defining sub-layer comprises silicon oxide.
- 6. The display panel of claim 1, wherein an etch rate of the second pixel defining sub-layer is less than an etch rate of the first pixel defining sub-layer; Preferably, the ratio of the etching rate of the second pixel defining sub-layer to the etching rate of the first pixel defining sub-layer is less than or equal to 1/5; preferably, a side of the second pixel defining sub-layer remote from the substrate comprises a planar surface.
- 7. The display panel of any one of claims 1-6, further comprising an isolation structure on a side of the pixel defining layer remote from the substrate, an orthographic projection of the isolation structure on the substrate being within an orthographic projection of the pixel defining layer on the substrate; Preferably, the isolation structure encloses to form an isolation opening, and the display panel further comprises a light emitting unit at least partially positioned in the isolation opening; Preferably, the display panel further includes a packaging unit located at a side of the light emitting unit away from the substrate, at least part of the packaging unit extending from a side of the isolation structure toward the isolation opening to a side of the isolation structure away from the substrate; Preferably, adjacent packaging units are arranged at intervals on one side of the isolation structure away from the substrate; preferably, a gap is formed between the packaging unit on the side of the isolation structure away from the substrate and the side of the isolation structure away from the substrate.
- 8. The display panel of claim 7, further comprising a second encapsulation layer on a side of the encapsulation unit away from the substrate and a third encapsulation layer on a side of the second encapsulation layer away from the substrate; Preferably, the materials of the encapsulation unit and the third encapsulation layer each comprise an inorganic material; Preferably, the material of the second encapsulation layer includes an organic material; preferably, the isolation structure comprises a first isolation part and a second isolation part which are sequentially stacked along a direction far away from the substrate, wherein the orthographic projection of one side of the first isolation part far away from the substrate on the substrate is positioned in the orthographic projection of the second isolation part on the substrate; Preferably, the light emitting unit includes a first electrode, a light emitting part, and a second electrode sequentially stacked in a direction away from the substrate; Preferably, the second electrode is electrically connected with the first isolation part, and/or the isolation structure further comprises a third isolation part positioned at one side of the first isolation part facing the substrate, and the second electrode is electrically connected with the third isolation part; Preferably, the material of the third isolation part comprises molybdenum, and/or the material of the first isolation part comprises aluminum, and/or the material of the second isolation part comprises titanium.
- 9. A method for manufacturing a display panel, the method comprising: Providing a substrate; forming a first sub-layer of pixel defining material on one side of the substrate at a first plating rate; forming a second pixel defining material sub-layer on a side of the first pixel defining material sub-layer away from the substrate at a second plating rate, the first plating rate being less than the second plating rate; Patterning the first and second sub-layers of pixel defining material to form a pixel defining layer comprising first and second sub-layers of pixel defining material.
- 10. The method of claim 9, wherein the forming a first sub-layer of pixel defining material on one side of the substrate at a first coating rate comprises: Forming a first sub-layer of pixel defining material on one side of the substrate at a first plating rate; Forming a second sub-layer of pixel defining material on a side of the first sub-layer of pixel defining material remote from the substrate at a third plating rate, the third plating rate being greater than the first plating rate; Preferably, the first coating rate is greater than or equal to 10A/S and less than or equal to 20A/S, and/or the second coating rate is greater than or equal to 40A/S and less than or equal to 60A/S, and/or the third coating rate is greater than or equal to 35A/S and less than or equal to 50A/S.
- 11. The method of claim 9, wherein the forming a first sub-layer of pixel defining material on one side of the substrate at a first coating rate comprises: and forming a first pixel definition material sub-layer on one side of the substrate through an atomic layer coating process at a first coating rate.
- 12. The method of any one of claims 9-11, wherein the patterning the first and second sub-layers of pixel defining material to form a pixel defining layer comprising first and second sub-layers of pixel defining material comprises: Forming an isolation material layer on a side of the second pixel defining material sub-layer away from the substrate; And sequentially carrying out patterning treatment on the isolation material layer, the first pixel definition material sub-layer and the second pixel definition material sub-layer to respectively form an isolation structure and a pixel definition layer, wherein the isolation structure encloses to form an isolation opening.
- 13. The method of claim 12, wherein the second pixel defining sub-layer has an etch rate less than an etch rate of the first pixel defining sub-layer, the isolation openings comprising a first isolation opening and a second isolation opening; After the step of sequentially patterning the isolation material layer, the first pixel defining material sub-layer, and the second pixel defining material sub-layer to form an isolation structure and a pixel defining layer, respectively, further includes: Forming a luminescent material layer of a first luminescent unit in the first isolation opening, wherein the luminescent material layer of the first luminescent unit extends to one side of the isolation structure away from the substrate; Sequentially forming a second electrode material layer and a first packaging material layer on one side of the light-emitting material layer of the first light-emitting unit, which is far away from the substrate; Forming a first etching barrier layer positioned on one side, far away from the substrate, of a first packaging material layer of the first light-emitting unit in the first isolation opening, wherein the orthographic projection of the first etching barrier layer on the substrate covers the orthographic projection of the first isolation opening on the substrate and covers part of orthographic projection of the isolation structure on the substrate; And removing the first packaging material layer, the second electrode material layer and the luminescent material layer of the first luminescent unit which are not covered by the first etching barrier layer, and removing the first etching barrier layer to form a luminescent part, a second electrode and the packaging unit of the first luminescent unit in the first isolation opening, wherein the second electrode extends to be electrically connected with the isolation structure corresponding to the first luminescent unit.
- 14. The method of manufacturing a display panel according to claim 13, further comprising, after the step of removing the first encapsulation material layer, the second electrode material layer, and the light emitting material layer of the first light emitting unit not covered by the first etching stopper layer: forming a luminescent material layer of a second luminescent unit in the second isolation opening, wherein the luminescent material layer of the second luminescent unit extends to one side, far away from the substrate, of the packaging unit of the first luminescent unit; Sequentially forming a second electrode material layer and a first packaging material layer on one side of the light-emitting material layer of the second light-emitting unit, which is far away from the substrate; Forming a second etching barrier layer positioned on one side, far away from the substrate, of the first packaging material layer of the second light-emitting unit in the second isolation opening, wherein orthographic projection of the second etching barrier layer on the substrate covers orthographic projection of the second isolation opening on the substrate and orthographic projection of a part of isolation structure on the substrate; And removing the first packaging material layer, the second electrode material layer and the luminescent material layer of the second luminescent unit which are not covered by the second etching barrier layer, and removing the second etching barrier layer to form a luminescent part, a second electrode and a packaging unit of the second luminescent unit in the second isolation opening, wherein the second electrode extends to be electrically connected with an isolation structure corresponding to the second luminescent unit.
- 15. A method for manufacturing a display panel, the method comprising: Providing a substrate; and the pixel defining layer comprises a first pixel defining sub-layer and a second pixel defining sub-layer which are sequentially stacked along the thickness direction of the substrate, wherein the density of the first pixel defining sub-layer is greater than that of the second pixel defining sub-layer.
- 16. An electronic device comprising the display panel according to any one of claims 1 to 9 or a display panel produced by the production method of a display panel according to any one of claims 10 to 15.
Description
Display panel, preparation method of display panel and electronic equipment Technical Field The application relates to the technical field of display, in particular to a display panel, a preparation method of the display panel and electronic equipment. Background Organic LIGHT EMITTING (OLED) and flat display devices based on light emitting Diode (LIGHT EMITTING) technology have been widely used in various consumer electronic products such as mobile phones, televisions, notebook computers, and desktop computers, as they have advantages of high image quality, power saving, thin body, and wide application range. However, there are still some problems of the display panel that need to be solved. Disclosure of Invention In order to overcome the technical problems mentioned in the background of the application, embodiments of the present application provide a display panel, including: a substrate; The pixel defining layer comprises a first pixel defining sub-layer and a second pixel defining sub-layer which are sequentially stacked along the thickness direction of the substrate, wherein the density of the first pixel defining sub-layer is greater than that of the second pixel defining sub-layer. In some possible embodiments, the first pixel defining sub-layer includes a first pixel defining sub-layer and a second pixel defining sub-layer stacked in sequence along a thickness direction of the substrate, the first pixel defining sub-layer having a density greater than a density of the second pixel defining sub-layer; Preferably, the thickness of the first pixel defining sub-layer is smaller than the thickness of the second pixel defining sub-layer along the thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer along a thickness direction of the substrate is greater than or equal to 7/20 and less than or equal to 4/5; Preferably, the first pixel defines a sub-layer having a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the second pixel defines a sub-layer having a thickness greater than or equal to the thickness of the substrateAnd less than or equal to Preferably, the ratio of the density of the first pixel defining sub-layer to the density of the second pixel defining sub-layer is greater than or equal to 7/4 and less than or equal to 5. In some possible embodiments, the ratio of the density of the first pixel defining sub-layer to the density of the second pixel defining sub-layer is greater than or equal to 2 and less than or equal to 10; Preferably, the display panel further includes a first electrode located at one side of the substrate, and the first pixel defining sub-layer covers a sidewall of the first electrode; Preferably, the first pixel defining sub-layer extends to a side of the first electrode away from the substrate through a sidewall of the first electrode, and covers a portion of the first electrode away from the substrate; preferably, the first pixel defining sub-layer fills a gap between adjacent first electrodes; preferably, the pixel defining layer includes a pixel opening exposing a portion of the first electrode. In some possible embodiments, the thickness of the first pixel defining sub-layer is greater than the thickness of the second pixel defining sub-layer along the thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer is greater than or equal to 2 and less than or equal to 6 along a thickness direction of the substrate; preferably, the first pixel defining sub-layer has a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the thickness of the second pixel defining sub-layer is greater than or equal toAnd less than or equal to Preferably, the material of the first pixel defining sub-layer comprises silicon nitride; Preferably, the material of the second pixel defining sub-layer comprises silicon oxide. In some possible embodiments, the thickness of the first pixel defining sub-layer is less than the thickness of the second pixel defining sub-layer along the thickness direction of the substrate; Preferably, a ratio of a thickness of the first pixel defining sub-layer to a thickness of the second pixel defining sub-layer is greater than or equal to 1/5 and less than or equal to 4/5 along a thickness direction of the substrate; preferably, the first pixel defining sub-layer has a thickness greater than or equal to the thickness of the substrate And less than or equal to Preferably, the thickness of the second pixel defining sub-layer is greater than or equal toAnd less than or equal to Preferably, the material of the first pixel defining sub-layer comprises silicon nitride or silicon oxide; Preferably, the material of the second pixel defining sub-layer comprise