CN-122003039-A - Display panel, preparation method thereof and display device

CN122003039ACN 122003039 ACN122003039 ACN 122003039ACN-122003039-A

Abstract

The application provides a display panel, a preparation method thereof and a display device. The display panel comprises a substrate, an insulating layer and a pixel defining layer, wherein the insulating layer is arranged on the substrate, first electrodes are arranged at one side, far away from the substrate, of the insulating layer, the pixel defining layer is arranged on one side, far away from the substrate, of the insulating layer, and provided with pixel openings, the pixel openings expose part of the first electrodes and cover the edges of the first electrodes, gaps exist between the edges of the first electrodes and the insulating layer, inorganic cracks at the boundary of the first electrodes are improved, and the packaging effect of a display area is improved.

Inventors

ZHOU ZHIWEI
QIN PENG
YANG YANG
ZHANG JINFANG

Assignees

合肥维信诺科技有限公司
维信诺科技股份有限公司

Dates

Publication Date: 20260508
Application Date: 20241107

Claims (14)

1. A display panel, comprising: a substrate; The insulating layer is arranged on the substrate, and a first electrode is arranged at one side of the insulating layer away from the substrate at intervals; The pixel defining layer is arranged on one side, far away from the substrate, of the insulating layer and is provided with a pixel opening, the orthographic projection of the pixel opening in the thickness direction of the substrate is overlapped with a partial area of the first electrode and covers the edge of the first electrode, and a gap exists between the edge of the first electrode and the insulating layer.
2. The display panel of claim 1, wherein, The pixel defining layer continuously covers the insulating layer, the edge side surface of the first electrode and part of the surface of the first electrode, which is far away from the substrate, and the gap is formed by enclosing the first electrode, the insulating layer and the pixel defining layer; Preferably, the thickness of the pixel defining layer is between 2000-6000 angstroms; Preferably, the pixel defining layer is silicon nitride or silicon oxide or other inorganic material that does not contain silicon nitride or silicon oxide.
3. The display panel of claim 2, wherein the pixel defining layer comprises: A first sub-pixel defining layer and a second sub-pixel defining layer, the second sub-pixel defining layer being disposed on the first sub-pixel defining layer, and a thickness of the first sub-pixel defining layer being greater than or equal to a thickness of the second sub-pixel defining layer; preferably, the ratio of the thickness of the first sub-pixel defining layer to the thickness of the second sub-pixel defining layer is between 4:1 and 1.5:1; Preferably, the thickness of the first sub-pixel defining layer is between 2000-4000 angstroms; preferably, the thickness of the second sub-pixel defining layer is between 500-2000 angstroms.
4. The display panel of claim 3, wherein, The material of the first sub-pixel defining layer is different from the material of the second sub-pixel defining layer; preferably, the second sub-pixel defining layer has a greater content of oxygen element than the first sub-pixel defining layer; preferably, the first sub-pixel defining layer is made of silicon nitride, and the second sub-pixel defining layer is made of silicon oxide or silicon nitride oxide; Preferably, the first sub-pixel defining layer is silicon nitride oxide and the second sub-pixel defining layer is silicon oxide.
5. The display panel of claim 1, wherein, Indium tin oxide films are respectively covered on the upper side and the lower side of the first electrode; Preferably, the indium tin oxide film located at the edge of the first electrode and close to the insulating layer has a void, the pixel defining layer covers the insulating layer and extends continuously from the side surface of the first electrode to cover a part of the surface of the first electrode away from the substrate side, and the void is surrounded by the first electrode, the indium tin oxide film, the insulating layer and the pixel defining layer.
6. The display panel of claim 1, wherein, The isolation structure is arranged on the pixel defining layer, an isolation opening is defined in the isolation structure, the isolation opening corresponds to the pixel opening, the isolation structure comprises a supporting part and a crown part, the supporting part is arranged on the pixel defining layer, and the crown part is arranged on the side, away from the pixel defining layer, of the supporting part and extends outwards; Preferably, the support portion includes a first sub-support portion and a second sub-support portion, the first sub-support portion is disposed on a side of the pixel defining layer facing away from the substrate, and the second sub-support portion is disposed on the first sub-support portion; Preferably, the first sub-supporting part comprises molybdenum or titanium nitride material, and the second sub-supporting part comprises aluminum material.
7. The display panel of claim 6, further comprising: A display functional layer including a plurality of light emitting devices correspondingly arranged at the isolation openings, each light emitting device including the first electrode, the light emitting functional layer and the second electrode, The light emitting functional layer is at least partially within the pixel opening, The second electrode is arranged on the light-emitting functional layer and is lapped on the supporting part.
8. The display panel of claim 7, further comprising: And the packaging layer covers the second electrode and is lapped on the supporting part.
9. The display panel of claim 1, wherein, A driving layer is arranged on the substrate, the driving layer covers the display area and the non-display area, The part of the driving layer corresponding to the display area comprises a pixel driving circuit, and the display functional layer is positioned on the driving circuit layer.
10. The preparation method of the display panel is characterized by comprising the following steps: An insulating layer is arranged on the substrate; Providing a first conductive layer on the insulating layer and forming a first electrode through patterning; And providing a pixel defining layer with a pixel opening after a patterning process on the insulating layer with the first electrode formed, wherein the pixel defining layer continuously covers the insulating layer, the side surface of the first electrode and a part of the surface far away from the insulating layer side.
11. The method of manufacturing a display panel according to claim 10, The step of disposing a pixel defining layer on the insulating layer on which the first electrode is formed includes: Adjusting a deposition rate at which the pixel defining layer is deposited such that the pixel defining layer continuously covers a side of the first electrode; preferably, the step of adjusting the deposition lateral deposition rate comprises decreasing the deposition rate of the pixel defining layer as deposition time increases.
12. The method of manufacturing a display panel of claim 10, wherein the pixel defining layer comprises a first sub-pixel defining layer and a second sub-pixel defining layer, comprising, prior to the patterning process step of the pixel defining layer: Depositing the first sub-pixel defining layer, depositing the second sub-pixel defining layer on the first sub-pixel defining layer, wherein the material of the second sub-pixel defining layer is different from that of the first sub-pixel defining layer; Patterning the second sub-pixel defining layer, the first sub-pixel defining layer and the second sub-pixel defining layer together defining the pixel opening; preferably, the deposition rate of depositing the first sub-pixel defining layer is greater than the deposition rate of depositing the second sub-pixel defining layer, and the thickness of the first sub-pixel defining layer is greater than or equal to the thickness of the second sub-pixel defining layer; Preferably, the deposition rate of depositing the first sub-pixel defining layer is less than or equal to 5000 angstroms/min and the deposition rate of depositing the second sub-pixel defining layer is greater than or equal to 1000 angstroms/min; preferably, the second sub-pixel defining layer and the first sub-pixel defining layer are patterned by the same process.
13. The method of manufacturing a display panel according to claim 10, The patterning process step of the pixel defining layer is preceded by: And depositing an isolation functional layer on the pixel definition layer, and patterning the isolation functional layer to form an isolation structure, wherein the isolation structure defines an isolation opening.
14. A display device comprising the display panel according to any one of claims 1 to 9 or comprising the display panel produced by the production method according to any one of claims 10 to 13.

Description

Display panel, preparation method thereof and display device Technical Field The application relates to the technical field of display, in particular to a display panel, a preparation method thereof and a display device. Background The development of semiconductor technology has a significant role in the advancement of the electronics industry. Organic Light-Emitting Diode (OLED) has been greatly focused by people and widely used in electronic display products because of its advantages of simple manufacturing process, low cost, low power consumption, high brightness, wide viewing angle, high contrast ratio, and capability of realizing flexible display. However, the technological properties of the current OLED display products are to be improved. Disclosure of Invention In view of the above, the present application provides a display panel, a manufacturing method thereof, and a display device, which aim to improve the process performance of the display panel. In order to achieve the above purpose, the present application adopts the following technical scheme. A display panel comprises a substrate, an insulating layer and a pixel defining layer, wherein the insulating layer is arranged on the substrate, a first electrode is arranged on one side, away from the substrate, of the insulating layer at intervals, the pixel defining layer is arranged on one side, away from the substrate, of the insulating layer, a pixel opening is formed in the pixel defining layer, part of the first electrode is exposed out of the pixel opening, the edge of the first electrode is covered by the pixel opening, and a gap exists between the edge of the first electrode and the insulating layer. In an embodiment, the pixel defining layer continuously covers the insulating layer, the edge side surface of the first electrode, and a part of the surface of the first electrode away from the substrate, and the gap is formed by enclosing the first electrode, the insulating layer, and the pixel defining layer. Preferably, the thickness of the pixel defining layer is between 2000-6000 angstroms. Preferably, the pixel defining layer is silicon nitride or silicon oxide or other inorganic material that does not contain silicon nitride or silicon oxide. In an embodiment, the pixel defining layer further comprises at least one first sub-pixel defining layer and a second sub-pixel defining layer, the second sub-pixel defining layer is disposed on the first sub-pixel defining layer, and the thickness of the first sub-pixel defining layer is greater than or equal to the thickness of the second sub-pixel defining layer. Preferably, the ratio of the thickness of the first sub-pixel defining layer to the thickness of the second sub-pixel defining layer is between 4:1 and 1.5:1. Preferably, the thickness of the first sub-pixel defining layer is between 2000 and 4000 angstroms. Preferably, the thickness of the second sub-pixel defining layer is between 500-2000 angstroms. In one embodiment, the first sub-pixel defining layer is different from the second sub-pixel defining layer. Preferably, the content of oxygen element in the second sub-pixel defining layer is larger than that of the first sub-pixel defining layer, preferably, the first sub-pixel defining layer adopts silicon nitride, the second sub-pixel defining layer adopts silicon oxide or silicon nitride oxide, preferably, the first sub-pixel defining layer adopts silicon nitride, and the second sub-pixel defining layer adopts silicon oxide. In one embodiment, the upper and lower opposite sides of the first electrode are respectively covered with indium tin oxide films. Preferably, the indium tin oxide film located at the edge of the first electrode and close to one side of the insulating layer has a void, and the pixel defining layer covers the insulating layer and extends continuously from the side surface of the first electrode to cover the surface of the first electrode away from the substrate side, and the void is surrounded by the first electrode, the indium tin oxide film, the insulating layer and the pixel defining layer. In an embodiment, the display panel further includes an isolation structure disposed on the pixel defining layer, the isolation structure defining an isolation opening, the isolation opening corresponding to the pixel opening, the isolation structure including a support portion disposed on the pixel defining layer and a crown portion disposed on a side of the support portion away from the pixel defining layer and extending outward. Preferably, the support portion includes a first sub-support portion and a second sub-support portion, the first sub-support portion is disposed on the pixel defining layer, and the second sub-support portion is disposed on the first sub-support portion. Preferably, the first sub-support comprises molybdenum or titanium nitride material and the second sub-support comprises aluminum material. In an embodiment, the display panel further includes a dis