CN-122003641-A - Surface member

CN122003641ACN 122003641 ACN122003641 ACN 122003641ACN-122003641-A

Abstract

Disclosed herein is a surface member for removable application to cover at least a portion of a surface of an immersion lithographic apparatus. The surface member has two principal orthogonal dimensions and comprises a first layer comprising an adhesive configured to adhere the surface member to the surface of the immersion lithographic apparatus, a second layer disposed on the first layer, a third layer disposed on the second layer, a fourth layer disposed on the third layer, and a fifth layer disposed on the fourth layer. The third layer includes an adhesive configured to adhere the second layer to the fourth layer. At least the second layer is patterned to tune the stiffness of the surface member in at least one of amplitude and directionality.

Inventors

Ppagano's R.
A. T.W. Kempen
J. M.G. Lohmann

Assignees

ASML荷兰有限公司

Dates

Publication Date: 20260508
Application Date: 20240912
Priority Date: 20231012

Claims (15)

1. A surface member for removable application to cover at least a portion of a surface of an immersion lithographic apparatus, the surface member having two principal orthogonal dimensions and comprising: a first layer comprising an adhesive configured to adhere the surface member to the surface of the immersion lithographic apparatus; a second layer disposed on the first layer; A third layer disposed on the second layer; a fourth layer disposed on the third layer, and A fifth layer disposed on the fourth layer; Wherein the third layer comprises an adhesive configured to adhere the second layer to the fourth layer, and at least the second layer is patterned to tune the stiffness of the surface member in at least one of amplitude and directionality.
2. The surface member of claim 1, wherein the fourth layer is patterned to tune a stiffness of the surface member in at least one of amplitude and directionality, desirably wherein the pattern of the fourth layer corresponds to the pattern of the second layer.
3. The surface member of claim 1 or 2, wherein the surface member is configured to at least substantially enclose an edge of a sensor, desirably wherein the surface member is configured to bridge a gap between the sensor and a structure defining a recess in which the sensor is mounted, desirably wherein the sensor is configured for use in the immersion lithographic apparatus, desirably wherein the sensor comprises a parallel integrated lens interferometry sensor at a scanner, an integrated lens interferometry sensor at a scanner, or a transmission image sensor.
4. The surface member according to any one of the preceding claims, wherein the surface member has a substantially annular shape, desirably wherein at least one of the second layer and the fourth layer is patterned such that the thickness of the second layer and/or the thickness of the fourth layer varies with circumferential and/or radial position on the surface member, desirably wherein the second layer and/or the fourth layer defines a pattern of indentations, desirably wherein the pattern comprises one or more indentations, wherein each indentation channel extends in a substantially circumferential direction of the surface member, desirably wherein the pattern of indentations comprises a plurality of indentations arranged at different circumferential positions around the surface member, wherein each indentation channel extends in a substantially radial direction of the surface member, desirably wherein the at least one of the second layer and the fourth layer further comprises a filler material disposed in at least one indentation channel, desirably wherein the filler material completely fills the at least one indentation channel, desirably wherein each indentation channel is disposed in the indentation channel.
5. The surface member according to any of the preceding claims, wherein the second layer is patterned such that the second layer is discontinuous.
6. A surface member according to claim 5 when dependent on claim 3 or 4, wherein the second layer is discontinuous in the circumferential direction of the surface member and/or wherein the second layer is discontinuous in the radial direction of the surface member.
7. The surface member of claim 5 or 6, wherein the second layer is patterned such that the second layer defines a plurality of apertures therein, desirably wherein each of the apertures extends between the first layer and the third layer, and/or wherein the second layer defines one or more spaces, and wherein the second layer includes a filler material disposed therein in at least one of the one or more spaces, desirably wherein the filler material completely fills at least one of the one or more spaces, desirably wherein the filler material is disposed in each of the one or more spaces.
8. The surface member according to claim 4 or 7, wherein the filler material has a different coefficient of thermal expansion than other materials of the second layer, or wherein the filler material comprises a polymer.
9. The surface member according to any one of the preceding claims, wherein the fourth layer is continuous, and/or wherein the fourth layer extends across the entire area covered by the fifth layer in the two main orthogonal dimensions, and/or wherein the second layer has a thickness greater than the fourth layer, desirably wherein the thickness of the second layer is two to six times the thickness of the fourth layer.
10. The surface member of any of the preceding claims, wherein the fourth layer is configured to reflect light.
11. The surface member of claim 10, wherein the fourth layer is configured to reflect light that has passed through the fifth layer away from the third layer, and/or wherein the fourth layer is configured to reflect deep ultraviolet light.
12. The surfacing member according to any one of the preceding claims, wherein the surface of the fourth layer in contact with the fifth layer is a substantially planar surface, and/or wherein at least one of the second layer and the fourth layer comprises a metal.
13. The surface member of claim 12, wherein the metal comprises stainless steel, invar, tungsten, or titanium.
14. The surfacing component according to any one of the preceding claims, wherein at least one of the second layer and the fourth layer comprises carbon fibers, and/or wherein the fifth layer comprises a hydrophobic coating, and/or wherein the thickness of the surfacing component is between 0.1 micrometers and 50 micrometers.
15. An immersion lithographic apparatus comprising the surface member according to any preceding claim, desirably further comprising: Sensor, and A structure defining a recess in which the sensor is mounted; Wherein the surface member extends across a gap between the sensor and the structure.

Description

Surface member Cross Reference to Related Applications The present application claims priority from EP application 23203323.3 filed on 10/12 of 2023 and incorporated herein by reference in its entirety. Technical Field The present invention relates to a surface member and a lithographic apparatus comprising a surface member. Background A lithographic apparatus is a machine that is configured to apply a desired pattern onto a substrate. For example, lithographic apparatus can be used to manufacture Integrated Circuits (ICs). For example, a lithographic apparatus may use a projection system to project a pattern (also commonly referred to as a "design layout" or "design") of a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer). Known lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at one time, and so-called scanners, in which each target portion is irradiated by scanning the pattern through the radiation beam in a given direction (the "scanning" -direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. As semiconductor manufacturing processes continue to advance, the size of circuit elements has continuously decreased, while the number of functional elements (such as transistors) per device has steadily increased for decades, a trend being followed commonly known as 'moore's law. To keep pace with moore's law, the semiconductor industry is continually striving for techniques that can create smaller and smaller features. To project a pattern on a substrate, a lithographic apparatus may use electromagnetic radiation. The wavelength of this radiation determines the minimum size of the features patterned on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm, and 13.5 nm. Further improvement in resolution of smaller features can be achieved by providing an immersion fluid (such as water) with a relatively high refractive index on the substrate during exposure. The effect of the immersion fluid is to enable imaging of smaller features, since the exposure radiation will have a shorter wavelength in the fluid than in the gas. The effect of immersion fluid can also be seen as increasing the effective Numerical Aperture (NA) of the system and also increasing the depth of focus. The substrate is mounted on a substrate table for aligning the substrate with the patterned beam of radiation. A sensor may be used for the substrate table t. The sensors may include a parallel integrated lens interferometry sensor (PARIS) at the scanner, a Transmission Image Sensor (TIS), a spectral purity viewing tool (SPOT) sensor, and an integrated lens interferometry sensor (ILIAS) at the scanner. There may be a gap between the substrate table and the sensor. An adhesive, also known as a surface member, may be provided to reduce the likelihood of immersion liquid leaking into the gap. For example, a surface member may be positioned to bridge the gap between the top surface of the sensor and the top surface of the substrate table WT, thereby sealing the gap between the sensor and the substrate table. Mechanical strain may be generated in the surface member due to expansion and/or contraction of one or more layers of the surface member. Such expansion and/or contraction may result in undesirable product overlay errors due to sensor displacement. Disclosure of Invention The present invention relates to providing a surface member and a lithographic apparatus comprising a surface member. According to an aspect of the invention, there is provided a surface member for removable application to cover at least a portion of a surface of an immersion lithographic apparatus. The surface member has two principal orthogonal dimensions and includes a first layer including an adhesive configured to adhere the surface member to a surface of an immersion lithographic apparatus, a second layer disposed on the first layer, a third layer disposed on the second layer, a fourth layer disposed on the third layer, and a fifth layer disposed on the fourth layer. The third layer includes an adhesive configured to adhere the second layer to the fourth layer. At least the second layer is patterned to tune the stiffness of the surface member in at least one of amplitude (magnitide) and directivity. According to another aspect of the disclosure, there is provided a lithographic apparatus comprising the above surface member. Further embodiments, features, and advantages of the present inventions, as well as the structure and operation of the various embodiments, features, and advantages of the present invention, are described in detail below with reference to the accompanying drawings. Drawings Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings i