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CN-122004689-A - Base station and cleaning system control method

CN122004689ACN 122004689 ACN122004689 ACN 122004689ACN-122004689-A

Abstract

The application relates to the technical field of water supplementing, and provides a base station and a cleaning system control method. The cleaning device comprises a liquid supply system, wherein the liquid supply system comprises a main flow path, a liquid supplementing device, a backflow branch and a control device, the second flow path is matched with the cleaning device, and the liquid supplementing device is connected to the main flow path. One end of the reflux branch is communicated with the main flow path, and the other end is communicated with the liquid supplementing device. The control device is arranged at the junction of the reflux branch and the main flow path and is positioned at the downstream of the fluid supplementing device. When the cleaning device is not completed in the liquid supplementing process on the base station, the cleaning device is disconnected from the base station in the liquid supplementing process, so that the control device is configured to be opened when the water pressure of the second flow channel is larger than a preset value, and then at least part of liquid in the main flow channel enters the backflow branch circuit, so that the liquid circularly flows in a loop formed by the liquid supplementing device and the backflow branch circuit. The water pressure of the second flow channel is effectively reduced, and the situation that cleaning equipment is difficult to match with a base station due to overlarge water pressure of the second flow channel is avoided.

Inventors

  • CHEN YANSONG

Assignees

  • 追觅智净未来(苏州)科技有限公司

Dates

Publication Date
20260512
Application Date
20260306

Claims (20)

  1. 1. A base station for carrying a cleaning device, comprising: -a liquid supply system (110), the liquid supply system (110) being for supplying liquid to the cleaning device; The liquid supply system (110) comprises: -a liquid replenishment device (112), the liquid replenishment device (112) being adapted to supply liquid in the liquid supply system to the cleaning apparatus; A main flow path (111), the main flow path (111) comprising a first flow path (1111) and a second flow path (1112), the first flow path (1111) being located upstream of the fluid replenishment device (112) and communicating with the fluid supply system (110), the second flow path (1112) being located downstream of the fluid replenishment device (112), the second flow path (1112) communicating with the cleaning device when the cleaning device is arranged on the base station; -a return branch (116), said return branch (116) communicating at one end with said second flow channel (1112) and at the other end with said first flow channel (1111); -a control device (113), said control device (113) being mounted at the junction of said return branch (116) and said second flow channel (1112); When the cleaning device is configured to be disconnected from the base station in a fluid replacement process, such that the control device (113) is configured to open when the water pressure of the second flow channel (1112) is greater than a preset value, such that at least part of the liquid in the second flow channel (1112) enters the first flow channel (1111) after entering the return branch (116), and then enters the control device (113) again.
  2. 2. The base station according to claim 1, characterized in that the control means (113) comprises a first interface (1131), a second interface (1132) and a third interface (1133); the first interface (1131) is connected with an output port of the fluid infusion device (112), the second interface (1132) is communicated with the second flow channel (1112), and the third interface (1133) is connected with the backflow branch (116); When the water pressure of the second flow channel (1112) is smaller than or equal to the preset value, the first interface (1131) is communicated with the second interface (1132), and the liquid flows from the first interface (1131) to the second interface (1132) and flows to the second flow channel (1112) through the second interface (1132); when the water pressure of the second flow passage (1112) is greater than the preset value, the first port (1131) is communicated with the third port (1133), and the liquid flows from the first port (1131) to the third port (1133) and flows into the backflow branch (116) through the third port (1133).
  3. 3. The base station according to claim 1 or 2, wherein the liquid supply system (110) further comprises a first detection element (114), the first detection element (114) being mounted in the main flow path (111), the first detection element being adapted to detect a flow signal of the main flow path (111).
  4. 4. A base station according to claim 3, characterized in that the first detection member (114) is mounted between the first flow channel (1111) and the fluid replacement device (112).
  5. 5. A base station according to claim 3, further comprising a second detection member for mating with a detection member on the cleaning device to detect whether the cleaning device is in place.
  6. 6. The base station of claim 5, wherein the second sensing member is a hall sensor.
  7. 7. The base station of claim 5, further comprising a charging electrode (120), the charging electrode (120) for cooperating with an electrode on the cleaning device to charge the cleaning device.
  8. 8. The base station of claim 7, further comprising a controller mounted to the base station; The controller is electrically connected with the fluid infusion device (112) and the first detection piece (114), and when the fluid infusion device (112) is controlled to be started, the first detection piece (114) does not detect a flowing water signal, and then the fluid infusion device (112) is controlled to be closed.
  9. 9. The base station of claim 8, wherein the controller is further electrically connected to the second detecting member, and the controller is further configured to control the opening or closing of the fluid replacement device (112) according to the in-place signal detected by the second detecting member; or, the controller is further electrically connected with the charging electrode (120), and is further used for starting the fluid supplementing device (112) after the charging electrode (120) is matched with an electrode on the cleaning equipment, and closing the fluid supplementing device (112) after the charging electrode (120) is disconnected with the electrode on the cleaning equipment.
  10. 10. The base station according to claim 1 or 2, characterized in that the liquid supply system (110) further comprises a communication (115) mounted at the junction of the return branch (116) and the first flow channel (1111) and upstream of the liquid replenishing device (112); The inlet of the fluid infusion device (112) is respectively communicated with the first flow channel (1111) and the return branch (116) through the communication piece (115).
  11. 11. The base station according to claim 10, characterized in that said communication means (115) comprise a fourth interface (1151), a fifth interface (1152) and a sixth interface (1153) communicating with each other; The fourth interface (1151) is connected to an inlet of the fluid infusion device (112), the fifth interface (1152) is in communication with the first flow channel (1111), and the sixth interface (1153) is connected to the return line (116).
  12. 12. The base station according to claim 1 or 2, characterized in that the base station further comprises: The base shell (130), the base shell (130) is formed with a brush disc cleaning cavity (131) and a rolling brush cleaning cavity (132), the brush disc cleaning cavity (131) is used for self-cleaning of the brush disc, and the rolling brush cleaning cavity (132) is used for self-cleaning of the rolling brush; the drainage piece (140), the drainage piece (140) is arranged on the base shell (130), the brush disc cleaning cavity (131) is communicated with the rolling brush cleaning cavity (132) through the drainage piece (140), and sewage in the brush disc cleaning cavity (131) flows into the rolling brush cleaning cavity (132) through the drainage piece (140); The base shell (130) is provided with a effusion cavity (133), the drainage piece (140) is at least partially positioned in the effusion cavity (133), the bottom wall of the effusion cavity (133) is provided with a third detection piece (1331) and a fourth detection piece (1332), the effusion cavity (133) is used for collecting overflow at the drainage piece (140), and when the overflow in the effusion cavity (133) conducts the third detection piece (1331) and the fourth detection piece (1332), the cleaning equipment stops the brush disc or the rolling brush from cleaning.
  13. 13. The base station of claim 12, wherein the base housing (130) further has a fluid-refill connector (134) thereon, the fluid-refill connector (134) being adapted to mate with the cleaning apparatus; The fluid-refill connector (134) is in communication with the second flow channel (1112) to allow fluid from the main flow channel (111) to flow into a tank (150) of the cleaning apparatus through the fluid-refill connector (134); The fluid infusion connector (134) is at least partially located in the fluid infusion cavity (133), the fluid infusion cavity (133) is further used for collecting overflow at the fluid infusion connector (134), and when the overflow in the fluid infusion cavity (133) conducts the third detection piece (1331) and the fourth detection piece (1332), the fluid infusion device (112) stops working.
  14. 14. The base station according to claim 1 or 2, further comprising a base housing (130), the base housing (130) further forming a roll brush cleaning chamber (132), a first support table (1321) and a second support table (1322); the rolling brush cleaning cavity (132) is used for automatically cleaning the rolling brush, the first supporting table (1321) and the second supporting table (1322) are respectively positioned at two ends of the rolling brush cleaning cavity (132), and the first supporting table (1321) and the second supporting table (1322) are respectively used for supporting and lifting the rolling brush so that a gap is reserved between the rolling brush and the bottom wall of the rolling brush cleaning cavity (132).
  15. 15. A cleaning system control method, the cleaning system including a cleaning apparatus and a base station, characterized in that, The base station comprises a liquid supply system (110), the liquid supply system (110) being for supplying liquid to the cleaning device; The liquid supply system (110) comprises: -a liquid replenishment device (112), the liquid replenishment device (112) being adapted to supply liquid in the liquid supply system to the cleaning apparatus; A main flow path (111), the main flow path (111) comprising a first flow path (1111) and a second flow path (1112), the first flow path (1111) being located upstream of the liquid replenishing device (112) and communicating with the liquid supply system, the second flow path (1112) being located downstream of the liquid replenishing device (112), the second flow path (1112) communicating with the cleaning apparatus when the cleaning apparatus is arranged on the base station; -a return branch (116), said return branch (116) communicating at one end with said second flow channel (1112) and at the other end with said first flow channel (1111); A control device (113), wherein the control device (113) is arranged at the junction of the reflux branch (116) and the second flow passage (1112) and is positioned at the downstream of the fluid supplementing device (112), The control method comprises the following steps: Activating a fluid replacement device (112) to replace the cleaning device after the cleaning device is placed in the base station; When the cleaning device is configured to be disconnected from the base station fluid replacement such that the control means (113) is configured to open such that at least part of the fluid in the second flow channel (1112) enters the return branch (116) and then enters the first flow channel (1111) and then enters the control means (113) again when the water pressure of the second flow channel (1112) is greater than a preset value.
  16. 16. The control method according to claim 15, wherein the base station further comprises a first detecting member (114), the first detecting member (114) being installed between the first flow passage (1111) and the fluid replacement device (112), the first detecting member (114) being configured to detect a water flow signal of the main flow passage (111), the control method further comprising: When the first detection piece (114) detects that the main flow path (111) has no water flow signal, the liquid supplementing device (112) is closed.
  17. 17. The control method according to claim 15 or 16, wherein the base station comprises a base housing (130), the base housing (130) being formed with a liquid accumulation chamber (133), the liquid accumulation chamber (133) having a third detecting member (1331) and a fourth detecting member (1332) therein, the cleaning device comprising a brush plate, the control method further comprising: When water is accumulated in the hydrops cavity, the third detection piece (1331) is electrically connected with the fourth detection piece (1332), and the fluid supplementing device (112) is closed when the fluid supplementing device (112) works; Or when water accumulation exists in the liquid accumulation cavity, the third detection piece (1331) is electrically connected with the fourth detection piece (1332), and the brush disc stops self-cleaning when self-cleaning.
  18. 18. The control method of claim 15 or 16, further comprising a second sensing element for mating with a sensing element on the cleaning device, the control method further comprising: And when the second detection piece is matched with the detection piece on the cleaning equipment, starting the liquid supplementing device (112).
  19. 19. The control method according to claim 18, characterized in that the control method further comprises: and closing the fluid supplementing device (112) when the second detection part does not detect the detection part of the cleaning equipment.
  20. 20. The control method according to claim 15 or 16, wherein the base station further comprises a charging electrode (120), the charging electrode (120) being for cooperating with an electrode on the cleaning device for charging the cleaning device, the control method further comprising: activating the fluid-refill device (112) when the charging electrode (120) is mated with an electrode on the cleaning apparatus; The fluid-refill means (112) is closed when the charging electrode (120) is disconnected from an electrode on the cleaning device.

Description

Base station and cleaning system control method Technical Field The application relates to the technical field of cleaning equipment, in particular to a base station and a cleaning system control method. Background Along with the development of science and technology and the improvement of life quality of people, the cleaning equipment is increasingly applied to the life of people, and the burden of manpower is greatly lightened. Taking a floor washer as an example, the floor washer is usually matched with a base station, and can be placed on the base station after the floor washer finishes cleaning work. The base station can charge the floor washer and also can replenish water to the water tank of the floor washer. However, the current base station is too dead, only a simple water replenishing action can be executed, and the special use conditions are difficult to treat, so that the cleaning equipment with automatic water replenishing is poor in reverse use experience. Disclosure of Invention The base station and the cleaning system control method provided by the application can be more intelligent, and can control and deal with special use situations of cleaning equipment, so that user experience is effectively improved. The application provides a base station for carrying cleaning equipment, comprising: A liquid supply system for supplying liquid to the cleaning device; the liquid supply system includes: a liquid replenishing device for supplying liquid in the liquid supply system to the cleaning apparatus; A main flow path including a first flow path upstream of the liquid replenishing device and communicating with the liquid supply system, and a second flow path downstream of the liquid replenishing device, the second flow path communicating with the cleaning apparatus when the cleaning apparatus is disposed on the base station; A return branch, one end of which is communicated with the second flow channel, and the other end of which is communicated with the first flow channel; The control device is arranged at the junction of the reflux branch and the second flow passage; when the cleaning equipment is configured to be disconnected from the base station in the process of supplementing liquid, so that the control device is configured to be opened when the water pressure of the second flow passage is larger than a preset value, at least part of liquid in the second flow passage enters the first flow passage after entering the backflow branch, and then enters the control device again. In the prior art, a plurality of companies begin to use the base station to supplement water or change water for better use experience of users, but the water supplementing scheme in the current market is quite dead, and only water in the clear water tank can be simply detected, so that water supplementing is started when the clear water tank is not filled with water. However, in the actual use process, many unexpected use scenarios may occur, for example, in the water replenishing process, the user suddenly takes away the machine that is replenishing water, at this time, the machine may not recognize that the machine is taken away or is not in control of the liquid replenishing device to stop, so that the liquid replenishing device is still replenishing water, and the water replenishing port is generally provided with a one-way valve, and on the basis of this, the water replenishing pipeline is blocked quickly during water replenishing. When the cleaning device is used by a user and is placed on the base station, the cleaning device cannot open the valve because the pipeline behind the one-way valve is blocked by water, so that water supplementing cannot be continued. According to the base station provided by the embodiment of the application, the liquid supply system is provided with the reflux branch connected with the liquid supplementing device in parallel, and both ends of the reflux branch are communicated with the main flow path. And a control device is arranged at the junction of the backflow branch and the main flow passage, so that the control device can open the backflow branch when the water pressure of the second flow passage is larger than a preset value, and the liquid of the main flow passage can enter the backflow branch. And the liquid circulates in the return path and the liquid supplementing device, even if the liquid supplementing device does not stop supplying liquid, the liquid can circulate all the time and the pipeline is not blocked. In other words, when the cleaning device is temporarily removed during the fluid infusion, the opening at the fluid infusion device is closed, and the fluid infusion device continues to infuse, so that the water pressure of the second flow channel increases. At this time, the control device recognizes that the water pressure of the second flow passage increases, and may open the return branch, so that a part may also flow into the return branch, and circulate in a loo