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CN-122005049-A - Method for fitting waveform by low-voltage nanosecond pulse platform

CN122005049ACN 122005049 ACN122005049 ACN 122005049ACN-122005049-A

Abstract

The application discloses a method for fitting waveforms by a low-voltage nanosecond pulse platform, which belongs to the technical field of high-frequency pulse control and comprises the steps of obtaining a set voltage value, calculating an optimal pulse width corresponding to a target cell by using a transmembrane voltage formula according to the set voltage value, calculating the number of equivalent nanosecond pulse sub-pulses capable of replacing the optimal pulse width according to a dose and transmembrane potential accumulation model, calculating the number of pulse strings according to the set total dose and the number of equivalent nanosecond pulse sub-pulses of the optimal pulse width, fitting the nanosecond pulse and replacing the optimal pulse width, storing the calculated number of nanosecond fitting values, the number of pulse strings and preset parameters in a storage chip of the pulse platform, and calling the storage parameters by the pulse platform for energy emission.

Inventors

  • XU XIANGDONG
  • ZHANG KAI
  • XU YUMING

Assignees

  • 上海市嘉定区中心医院(上海健康医学院附属嘉定区中心医院、上海交通大学医学院附属仁济医院嘉定分院)

Dates

Publication Date
20260512
Application Date
20260407

Claims (10)

  1. 1. A method for fitting waveforms by a low-voltage nanosecond pulse platform, comprising the steps of: step 1, acquiring a set voltage value, and calculating an optimal pulse width corresponding to a target cell by using a transmembrane voltage formula according to the set voltage value; step 2, calculating the number of equivalent nanosecond pulse sub-pulses capable of replacing the optimal pulse width according to the dose and transmembrane potential accumulation model; Step 3, calculating the pulse train number according to the total dose set by the optimal pulse width and the equivalent nanosecond pulse sub-pulse number, fitting nanosecond pulses according to the pulse train number, and replacing the optimal pulse width; And step 4, storing the calculated nanosecond fitting value number, the pulse train number and the preset parameters into a storage chip of a pulse platform, and calling the storage parameters by the pulse platform for energy emission.
  2. 2. A low pressure according to claim 1 a method for fitting a waveform by a nanosecond pulse platform, the method is characterized in that the formula of the transmembrane voltage is as follows: Wherein, the E is the intensity of an applied electric field, g is the relative electric permeability constant of the cell membrane of the target cell, a is the cell radius, Is the angle between the electric field and the line between one point on the cell membrane and the center of the cell, The charging time constant is 1.32us.
  3. 3. A method of low voltage nanosecond pulse plateau fitting waveforms as claimed in claim 2, wherein said doses are The calculation formula of (2) is as follows: Where V is the voltage amplitude, tp is the pulse width, N is the number of sub-pulses in each burst, and N is the number of bursts.
  4. 4. A method of fitting waveforms on a low voltage nanosecond pulse platform as recited in claim 3, wherein the model of transmembrane potential accumulation is based on calculated cell transmembrane voltage and other parameters determined to enable voltage accumulation of multiple pulse trains to reach a threshold of transmembrane voltage, and pulse width increase is achieved by membrane transmembrane voltage accumulation to achieve deeper ablation depth.
  5. 5. The method for fitting waveforms on a low-voltage nanosecond pulse platform as recited in claim 4, wherein said voltage accumulation of said multiple pulse trains reaches a threshold of transmembrane voltage by decreasing pulse interval time, and the time required for pulse interval is calculated as follows: where t is the time required for the pulse interval.
  6. 6. The method for fitting waveforms by low-voltage nanosecond pulse platform as recited in claim 4, wherein the voltage accumulation of the multi-pulse train reaches the threshold of the transmembrane voltage by increasing the voltage amplitude, changing the climbing slopes K1 and K2, and making the voltage accumulation of the multi-pulse train reach the threshold of the transmembrane voltage, specifically comprising: When the sub-pulse climbing slope K1 in each pulse train is the same, the descending slope K3 is set to be 0 or the descending slope K3 is fixed through the fixed frequency and the pulse width; obtaining the number of sub-pulses with equivalent nanosecond pulse and an optimal pulse width pulse effect by experiment, and calculating a descending slope K3; when the voltage is the same as the external factors, the rising and falling slopes are the same, and when the preset rising height is reached, the transmembrane voltage reaches the threshold value.
  7. 7. The method for fitting waveforms with low-voltage nanosecond pulse plateau as recited in claim 5, wherein the dose is based on Corresponds to k2=0, t1=n T1, calculating the value of the number n of the sub-pulses in each pulse train, and fitting the effect of microsecond T1 through nanosecond pulse width T1, wherein n pulses are needed, and the theoretical calculation formula of the number n of the sub-pulses is as follows: The actual calculation formula of the number of the sub-pulses is as follows: Wherein, the Is the interference coefficient.
  8. 8. The method for fitting waveforms on low-voltage nanosecond pulse platform as recited in claim 7, wherein under the condition of setting high-voltage pulse voltage, t is calculated through a time calculation formula, and then Inputting to the actual calculation formula of the number of the sub-pulses, solving the number n of the actual sub-pulses to be fitted, the pulse width of one microsecond pulse can be combined by n nanosecond pulses.
  9. 9. The method for fitting waveforms on a low-voltage nanosecond pulse platform as recited in claim 8, wherein the value of the relative electric permeability constant g is determined by the same depth of a fixed pulse width microsecond through experiments and presetting the number of nanosecond combined pulses after calculating the theoretical number of sub-pulses according to a theoretical calculation formula of the number of sub-pulses, and the calculation formula of the relative electric permeability constant g is as follows:
  10. 10. The method of claim 9, wherein the providing an overdose is performed according to the following calculation formula: when the dosage and the voltage are the same, the relation between the number of the sub-pulses and the optimal pulse width t is that ; According to the theoretical calculation formula of the number of the sub-pulses, the value of the number n of the sub-pulses is larger than the value calculated by the conventional dosage, so that the value of the number n of the sub-pulses calculated by the conventional dosage is used as a lower threshold value for verifying the correctness of the number of the sub-pulses calculated by the transmembrane potential pulse accumulation model.

Description

Method for fitting waveform by low-voltage nanosecond pulse platform Technical Field The application belongs to the technical field of high-frequency pulse control, and particularly relates to a method for fitting waveforms by a low-voltage nanosecond pulse platform. Background The high-frequency pulse ablation is used for changing the permeability of a cell membrane through the action of an electric field in a catheter ablation scene, and after a transmembrane voltage threshold is reached, the cell membrane is irreversibly perforated, a traditional microsecond pulse width platform is easy to form irreversible electroporation under low pressure, but cells which are unevenly ablated and blocked by nerves or blood vessels are omitted, the defect can be avoided in the traditional nanosecond, but the voltage is required to be very high, and the problems of hemolysis, damage to vascular endothelium and smooth muscle, damage to nerves and the like exist. In order to compensate for the short action time of single pulse, the conventional nanosecond ablation often adopts a higher voltage amplitude, the electric field strength can exceed the tolerance threshold value of the vascular endothelial smooth muscle and the nerve of the red blood cells to introduce the risk of hemolysis and structural damage, and the rapid fallback of the bipolar electrode scene is caused to be difficult to accumulate under the low pressure condition especially after the transmembrane potential of the bipolar electrode scene is increased, so that microsecond prescription parameters cannot be directly converted into nanosecond subpulse parameters, and the requirement of consistency of the coverage of the transmembrane potential threshold value and dose equivalence is met. Therefore, a set of fitting waveform generation method for a low-voltage nanosecond pulse platform is needed, target ablation effect parameters are calculated to restrict nanosecond sub-pulse and pulse train structures by setting reference prescription parameters or empirical values, the advantages of nanoseconds and microseconds are achieved, and the defects of the nanoseconds and the microseconds are overcome. Disclosure of Invention In order to solve the problems and the technical defects, the application adopts the following technical scheme that the method for fitting waveforms by using the low-voltage nanosecond pulse platform is characterized by comprising the following steps: step 1, acquiring a set voltage value, and calculating an optimal pulse width corresponding to a target cell by using a transmembrane voltage formula according to the set voltage value; step 2, calculating the number of equivalent nanosecond pulse sub-pulses capable of replacing the optimal pulse width according to the dose and transmembrane potential accumulation model; Step 3, calculating the pulse train number according to the total dose set by the optimal pulse width and the equivalent nanosecond pulse sub-pulse number, fitting nanosecond pulses according to the pulse train number, and replacing the optimal pulse width; And step 4, storing the calculated nanosecond fitting value number, the pulse train number and the preset parameters into a storage chip of a pulse platform, and calling the storage parameters by the pulse platform for energy emission. Preferably, the formula of the transmembrane voltage is as follows: Wherein, the E is the intensity of an applied electric field, g is the relative electric permeability constant of the cell membrane of the target cell, a is the cell radius,Is the angle between the electric field and the line between one point on the cell membrane and the center of the cell,The charging time constant is 1.32us. Further, the dosage isThe calculation formula of (2) is as follows: Where V is the voltage amplitude, tp is the pulse width, N is the number of sub-pulses in each burst, and N is the number of bursts. Furthermore, the transmembrane potential accumulation model enables the voltage accumulation of the multi-pulse strings to reach the threshold value of the transmembrane voltage according to the calculated cell transmembrane voltage and other determined parameters, and achieves pulse width increase through cell membrane transmembrane voltage accumulation to achieve deeper ablation depth. Still further, the voltage accumulation of the multi-pulse train reaches the threshold value of the transmembrane voltage by reducing the time between pulses, and the time required by the pulse intervals is calculated as follows: where t is the time required for the pulse interval. Still further, the voltage accumulation of the multi-pulse train reaches the threshold value of the transmembrane voltage, and the climbing slopes K1 and K2 can be changed by increasing the voltage amplitude, so that the voltage accumulated by the multi-pulse train reaches the threshold value of the transmembrane voltage, which specifically comprises: When the sub-pulse climbing slope K1 in each