CN-122007997-A - Nickel-based alloy polishing method and device based on photocatalysis-photo-thickening synergy

CN122007997ACN 122007997 ACN122007997 ACN 122007997ACN-122007997-A

Abstract

The invention discloses a nickel-based alloy polishing method and device based on photocatalysis-photo thickening synergy, which realize double-drive processing of surface softening and medium thickening by synchronously triggering surface modification of a photocatalysis workpiece and thickening of a photo-triggering polishing solution through an integrated double-light system. The composite abrasive particles loaded with TiO 2 /ZnO photocatalyst form a low-hardness oxide layer on the surface of the nickel-based alloy under ultraviolet irradiation, so that the processing resistance is reduced, the precise regulation and control of the viscosity of the polishing solution are realized through azobenzene/cinnamic acid photochromic molecules, and a double-thickening system is formed by combining with the aggregation of shear-induced particles, so that the viscosity stability is improved. The invention solves the technical pain points of nickel-based alloy processing hardening, large viscosity fluctuation of the traditional shear thickening polishing solution and poor processing uniformity, improves the processing efficiency and the surface quality of workpieces, and is suitable for high-efficiency precise processing of difficult-to-process nickel-based alloys such as Inconel 718, GH4169 and the like.

Inventors

ZENG XI
HUANG JINGTAO
SHEN JUNHAO
LI YUN
GE MAN
WEN CONG
LUO YUCHEN
GONG ZHENG
ZHOU YUHAO
LUO FEIFAN
WANG JIAYAO

Assignees

浙江工业大学

Dates

Publication Date: 20260512
Application Date: 20260413

Claims (10)

1. A nickel-based alloy polishing method based on photocatalysis-photo thickening synergy comprises the steps of spraying polishing solution on a nickel-based alloy workpiece or immersing the workpiece in the polishing solution, and polishing the surface of the workpiece, and is characterized in that the polishing solution is dual-response polishing solution and comprises base solution, composite abrasive particles and a photochromic thickener, wherein the composite abrasive particles comprise an abrasive particle matrix and a photocatalyst loaded on the surface of the abrasive particle matrix; In the polishing process, ultraviolet light is used for irradiating polishing liquid on the surface of a workpiece, the ultraviolet light simultaneously triggers photocatalytic oxidation on the surface of the workpiece and isomerization viscosity adjustment of a photochromic thickener, meanwhile, visible light pulse is used for irradiating the polishing liquid on the surface of the workpiece, and the viscosity of the dual-response polishing liquid is controlled to be kept in a preset viscosity target interval by adjusting illumination intensity and/or irradiation duty ratio of visible light.
2. The method for polishing the nickel-base alloy according to claim 1, wherein the hardness of the surface of the workpiece is detected during the polishing process, the reaction rate of the photocatalytic oxidation is controlled by adjusting the intensity of ultraviolet light so that the hardness of the surface of the workpiece is less than or equal to a hardness target threshold value, the illumination intensity and/or the illumination duty cycle of visible light are increased when the viscosity is greater than a viscosity target interval, and the illumination intensity and/or the illumination duty cycle of visible light are decreased when the viscosity is less than the viscosity target interval.
3. The method of polishing a nickel-base alloy according to claim 1, wherein the residual dual-response slurry viscosity is reduced by a thermal effect by irradiating the surface of the workpiece with infrared light after the completion of the polishing operation, and the workpiece is rinsed to remove the residual slurry.
4. The method for polishing nickel-base alloy according to claim 1, wherein ultraviolet pre-irradiation is performed on a workpiece sprayed with or immersed in a dual-response polishing solution before polishing is started, combined activation of photocatalysis and photo-thickening is performed, wherein the activation target of photocatalysis is that the concentration of hydroxyl free radicals in the dual-response polishing solution is greater than or equal to a concentration threshold value, the activation target of photo-thickening is that the viscosity of the dual-response polishing solution is within a viscosity target interval, and the viscosity target interval is 200 mPa-s to 300 mPa-s.
5. The method for polishing nickel-base alloy according to claim 1, wherein the base solution is polyethylene glycol with a number average molecular weight of 400-600, the abrasive particle matrix is mixed abrasive particles of SiO 2 and Al 2 O 3 , the photocatalyst is loaded on the surface of the abrasive particle matrix by a sol-gel method by TiO 2 and/or ZnO, and the mass fraction of the photocatalyst in the composite abrasive particles is 5% -15%.
6. The method of claim 5, wherein the composite abrasive particles have a particle size of 50 nm to 200 nm.
7. The method for polishing a nickel-based alloy according to claim 1, wherein the photochromic thickener is an inclusion compound formed by an azobenzene derivative and cyclodextrin, and the molar ratio of the azobenzene derivative to the cyclodextrin is 1 (1-3).
8. The method for polishing nickel-base alloy according to claim 1, wherein the dual-response polishing solution further comprises a pH regulator and a dispersing agent for inhibiting aggregation of abrasive particles, sodium polyacrylate is adopted as the dispersing agent, and the pH value of the dual-response polishing solution is 8-10.
9. The method of claim 1, wherein the volume fraction of the composite abrasive particles in the dual-response polishing solution is 35 vol% -vol%, and the volume fraction of the photochromic thickener is 5: 5 vol% -10: 10 vol%.
10. A nickel-based alloy polishing device based on photocatalysis-photo thickening coordination is characterized by being used for executing the nickel-based alloy polishing method according to claim 1, wherein the nickel-based alloy polishing device comprises a circulating liquid supply module, an industrial five-axis machine tool (6), a combined light source module, a detection module, a polishing head (10) and a workpiece clamp (15), wherein a polishing groove body is arranged on a workbench of the industrial five-axis machine tool (6), the workpiece clamp is arranged in the polishing groove body, the polishing head (10) is arranged on a main shaft of the industrial five-axis machine tool (6), and the industrial five-axis machine tool (6) is configured to polish a machined workpiece (13) by using the polishing head (10); The circulating liquid supply module comprises a polishing liquid output assembly and a polishing liquid backflow assembly, wherein the polishing liquid output assembly comprises a supply metering pump (1), a damper (2), a back pressure valve (3), a pressure gauge (4), a pressure regulating valve (5) and a fluid nozzle (7) which are sequentially connected, the fluid nozzle (7) is arranged above a polishing groove and faces to a workpiece clamp, the polishing liquid backflow assembly comprises a liquid outlet (16), a recovery metering pump (18), a stirring tank and a backflow pipeline (21) which are sequentially connected, the liquid outlet (16) is arranged in the polishing groove, and the backflow pipeline (21) is connected with the supply metering pump (1); the combined light source module comprises a main ultraviolet light source (8), an infrared light source (11) and an auxiliary visible light source (12) which face a workpiece clamp (15), and the detection module comprises a viscosity sensor (9) for detecting the viscosity of polishing liquid and a surface hardness monitor (14) for detecting the hardness of the polished surface of the workpiece.

Description

Nickel-based alloy polishing method and device based on photocatalysis-photo-thickening synergy Technical Field The invention belongs to the technical field of metal material precision machining, and particularly relates to a nickel-based alloy polishing method and device based on photocatalysis-photo thickening synergy. Background Nickel-based alloys (such as Inconel 718 and GH 4169) are widely applied to key fields of aeroengine core components, nuclear reactor structural members and the like due to excellent high-temperature strength, corrosion resistance and fatigue resistance. However, nickel-based alloys have high hardness (HRC 38-45) and high toughness, are extremely easy to produce work hardening phenomena in the traditional machining process, lead to high material removal resistance and severe tool wear, and have the problems of easy occurrence of grain boundary damage, excessive residual stress and the like on the machined surface, and seriously affect the service life and reliability of parts. As a novel precision machining technology, shear Thickening Polishing (STP) utilizes viscosity mutation (shear thickening effect) of polishing solution under high shear rate to realize uniform coating and controllable cutting of abrasive particles, and can effectively improve the quality of machined surfaces. However, the traditional shear thickening polishing solution has the remarkable limitations that on one hand, the viscosity of the traditional shear thickening polishing solution mainly depends on particle agglomeration induced by shear force, is easily influenced by temperature and shear rate fluctuation, has poor stability, causes uneven dispersion of abrasive particles and insufficient processing uniformity, and on the other hand, for ultrahigh-hardness materials such as nickel-base alloys, the material removal resistance is difficult to effectively reduce by simply relying on the shear thickening effect, the processing efficiency is low, and the requirement of high-efficiency precise processing cannot be met. In order to solve the problems, two types of improvement schemes appear in the prior art, namely a light-triggered thickening polishing solution technology (such as CN 112518561A), the viscosity of the polishing solution is regulated and controlled through isomerization reaction of photochromic molecules, the viscosity stability is improved, but the scheme only acts on the polishing solution, the surface hardness of a workpiece is not improved, the processing efficiency of a nickel-based alloy is improved to a limited extent, and the other type is a photocatalysis surface modification technology, wherein active free radicals generated by a semiconductor photocatalyst under illumination are utilized to oxidize and soften the surface of the workpiece, so that the processing resistance is reduced, but the scheme does not optimize the performance of the polishing solution, and the problems of uneven dispersion of abrasive particles and fluctuation of surface quality exist. In addition, traditional single photocatalysis modification and single light trigger thickening are single light source, fixed mode, have not the simple irradiation scheme of linkage regulation and control, do not have auxiliary light source cooperation, do not have the dynamic regulation of real-time feedback yet, lead to unable formation even low hardness oxide layer, polishing solution viscosity is unstable, but the reaction process accurate control influences machining efficiency and precision. At present, a double-light cooperative processing scheme combining 'photocatalytic workpiece surface modification' and 'light triggering polishing solution thickening' does not exist in the prior art, three core pain points of nickel-based alloy processing hardening, unstable viscosity of polishing solution and poor processing uniformity cannot be solved at the same time, and development of a nickel-based alloy precision processing technology is restricted. The conventional light triggering/shearing thickening agent is a single-function material, a composite system which can not simultaneously meet the requirements of photocatalysis, light triggering thickening and shearing thickening is not adopted, the conventional shearing thickening polishing solution core only meets the basic functions of shearing induction thickening and abrasive grain cutting, the components are mainly base solution, abrasive grains and conventional thickening agents, the nickel-based alloy surface modification liquid (such as photocatalysis modification liquid) core only realizes the surface oxidation softening of a workpiece, the components are mainly photocatalyst and solvent, the two types of liquid are single-function guiding, the compatibility design is not adopted between the components, and the problems of abrasive grain aggregation, photocatalyst deactivation, thickening effect failure and the like can occur in direct mixing. Therefore, developing a pr