CN-122008682-A - Microstructure holographic anti-counterfeiting UV platemaking method and system

CN122008682ACN 122008682 ACN122008682 ACN 122008682ACN-122008682-A

Abstract

The invention relates to the technical field of anti-counterfeiting printing, in particular to a microstructure holographic anti-counterfeiting UV platemaking method and a microstructure holographic anti-counterfeiting UV platemaking system, wherein the method is used for acquiring the focusing depth and the mounting position of a target layout image through a target CCD camera, constructing an optical path positioning model and realizing the accurate mapping of the microstructure coordinates of an image pixel and the physical position in a three-dimensional platemaking coordinate system; combining the depth characteristics of the microstructure in the target range with the light path positioning model, determining the layout range and the micro unit size of the UV printing plate, accurately projecting each micro unit to the target layout image based on the light path positioning model with aberration correction, and generating the corresponding holographic anti-counterfeiting UV printing plate. The method combines depth perception, coordinate mapping and aberration correction, realizes automatic positioning and self-adaptive division of microstructure platemaking, improves projection definition and solidification consistency, solves the problems of positioning deviation, pattern distortion and edge blurring in the traditional platemaking, and improves the precision, identification degree and anti-counterfeiting performance of the holographic anti-counterfeiting pattern.

Inventors

CHEN HUAN
ZHANG SHUAIJUN
ZHOU WENLONG
GAO FUYUAN
LIU SUO
CHAI XIN
LI ZHIWEI
WU YAOYONG
ZHU GUOHONG
DUAN XIUJIE

Assignees

浙江亚欣包装材料有限公司

Dates

Publication Date: 20260512
Application Date: 20251230

Claims (10)

1. A method for micro-structured holographic anti-counterfeiting UV platemaking, the method comprising: Acquiring an optical path positioning model corresponding to a target CCD camera based on the focusing depth of the target layout image acquired by the target CCD camera and the installation position of the target CCD camera; the optical path positioning model is used for indicating the mapping relation between the microstructure coordinates of the pixels in the target layout image and the physical positions of the anti-counterfeiting microstructures corresponding to the pixels in a three-dimensional platemaking coordinate system, wherein the target layout image is obtained by shooting a holographic anti-counterfeiting UV printing plate in a target range by the target CCD camera; Acquiring a layout range and a micro unit size corresponding to a UV printing plate based on the depth characteristics of the anti-counterfeiting microstructure in the target range and the light path positioning model, wherein the depth characteristics of the anti-counterfeiting microstructure in the target range are determined based on the initial distance between the target CCD camera and the layout, the maximum height difference of the microstructure in the target range and the reference position of the target CCD camera in the three-dimensional platemaking coordinate system; and projecting each micro unit of the UV printing plate to the target layout image based on the optical path positioning model with aberration correction corresponding to the target CCD camera to obtain the holographic anti-counterfeiting UV printing plate corresponding to the target layout image, wherein the micro units are obtained by dividing the layout range based on the sizes of the micro units.
2. The method for micro-structured holographic anti-counterfeiting UV platemaking according to claim 1, wherein the acquiring the optical path positioning model corresponding to the target CCD camera based on the focusing depth of the target CCD camera for acquiring the target layout image and the mounting position of the target CCD camera comprises: Acquiring a light path calibration matrix based on the focusing depth of the target layout image acquired by the target CCD camera; Acquiring a reference coordinate of the target CCD camera in the three-dimensional platemaking coordinate system based on the installation position of the target CCD camera; And acquiring the light path positioning model based on the internal reference matrix of the target CCD camera, the light path calibration matrix and the reference coordinates of the target CCD camera in the three-dimensional platemaking coordinate system.
3. The method for holographic anti-counterfeit UV platemaking of the microstructure according to claim 1, wherein the obtaining of the layout range and the microcell size corresponding to the UV printing plate based on the depth feature of the anti-counterfeit microstructure in the target range and the light path positioning model comprises: Based on the light path positioning model, resolving microstructure coordinates of four boundary points of the target layout image and a maximum depth value and a minimum depth value of microstructures in the target range to obtain the layout range; And acquiring the size of the micro unit based on the light path positioning model, the average depth value of the microstructure in the target range and the layout range.
4. The method for holographic anti-counterfeit UV platemaking of microstructure according to claim 3, wherein said calculating the microstructure coordinates of four boundary points of the target layout image and the maximum depth value and the minimum depth value of the microstructure in the target range based on the optical path positioning model, to obtain the layout range, comprises: based on the light path positioning model, resolving the microstructure coordinates of four boundary points of the target layout image and the maximum depth value and the minimum depth value of the microstructure in the target range to obtain physical coordinates of eight corresponding structure points in the three-dimensional platemaking coordinate system; Acquiring a first target coordinate corresponding to the minimum value of the X-axis coordinate and the minimum value of the Y-axis coordinate in the coordinates of the eight structural points in the three-dimensional platemaking coordinate system, and a second target coordinate corresponding to the maximum value of the X-axis coordinate and the maximum value of the Y-axis coordinate; And determining a range corresponding to a rectangle taking a point corresponding to the first target coordinate and the second target coordinate as a diagonal line on a printing plate plane as the layout range.
5. The method of claim 4, wherein the obtaining the microcell size based on the light path positioning model, the average depth value of the microstructures in the target range, and the layout range comprises: determining a reference structure point based on the first target coordinates and the average depth value and based on the second target coordinates and the average depth value, respectively; acquiring microstructure coordinates corresponding to each reference structure point based on the light path positioning model and the coordinates of each reference structure point in the three-dimensional platemaking coordinate system; and acquiring the size of the micro unit based on the first target coordinate, the second target coordinate and the microstructure coordinates corresponding to the two reference structure points.
6. The method of claim 5, wherein the obtaining the microcell size based on the first target coordinate, the second target coordinate, and the microstructure coordinates corresponding to the two reference structure points comprises: Acquiring the physical size of the micro unit in the X-axis direction based on the minimum value of the X-axis coordinate, the maximum value of the X-axis coordinate and the pixel span in the X-axis direction in the microstructure coordinates corresponding to the two reference structure points; and acquiring the physical size of the micro unit in the Y-axis direction based on the minimum value of the Y-axis coordinate, the maximum value of the Y-axis coordinate and the pixel span in the Y-axis direction in the microstructure coordinates corresponding to the two reference structure points.
7. The method for holographic anti-counterfeit UV platemaking of the microstructure according to any one of claims 1 to 6, wherein said projecting each micro unit of a UV plate onto said target plate image based on said optical path positioning model with aberration correction corresponding to said target CCD camera, obtaining a holographic anti-counterfeit UV plate corresponding to said target plate image, comprises: dividing the layout range based on the microcell sizes to generate each microcell of the UV printing plate; Based on the optical path positioning model with aberration correction, projecting each micro unit to the target layout image, and obtaining floating point type focusing coordinates corresponding to the micro units; Carrying out dynamic light intensity compensation on the floating point type focusing coordinates through an LED light fixation module to obtain UV curing energy values of each micro unit; and carrying out regional exposure on the microstructure resin layer based on the UV curing energy value to form a holographic anti-counterfeiting microstructure with depth coding, thereby obtaining the holographic anti-counterfeiting UV printing plate corresponding to the target layout image.
8. A microstructured holographic anti-counterfeit UV platemaking system, the system comprising: The system comprises a target CCD camera, an optical path calibration module, an optical path positioning module, a holographic anti-counterfeiting UV printing plate, a holographic anti-counterfeiting printing plate and a computer-readable storage medium, wherein the optical path calibration module is used for acquiring the focusing depth of a target layout image and the installation position of the target CCD camera based on the target CCD camera to acquire an optical path positioning model corresponding to the target CCD camera, the target CCD camera is a focusing module installed on UV plate-making equipment, and the optical path positioning model is used for indicating the mapping relation between the microstructure coordinates of pixels in the target layout image and the physical positions of anti-counterfeiting microstructures corresponding to the pixels in a three-dimensional plate-making coordinate system; the layout delimitation module is used for acquiring a layout range and a micro unit size corresponding to the UV printing plate based on the depth characteristics of the anti-counterfeiting microstructure in the target range and the light path positioning model, wherein the depth characteristics of the anti-counterfeiting microstructure in the target range are determined based on the initial distance between the target CCD camera and the layout, the maximum height difference of the microstructure in the target range and the reference position of the target CCD camera in the three-dimensional platemaking coordinate system; The projection curing module is used for projecting each micro unit of the UV printing plate to the target layout image based on the optical path positioning model with aberration correction corresponding to the target CCD camera to obtain the holographic anti-counterfeiting UV printing plate corresponding to the target layout image, and the micro units are obtained after the layout range is divided based on the sizes of the micro units.
9. A microstructured holographic anti-counterfeit UV platemaking apparatus comprising a memory, a processor and a microstructured holographic anti-counterfeit UV platemaking program stored on the memory and executable on the processor, the microstructured holographic anti-counterfeit UV platemaking program being configured to implement the steps of the microstructured holographic anti-counterfeit UV platemaking method of any of claims 1 to 8.
10. A medium, characterized in that it has stored thereon a microstructured holographic anti-counterfeit UV platemaking program which, when executed by a processor, implements the steps of the microstructured holographic anti-counterfeit UV platemaking method of any of claims 1 to 8.

Description

Microstructure holographic anti-counterfeiting UV platemaking method and system Technical Field The invention relates to the technical field of anti-counterfeiting printing, in particular to a microstructure holographic anti-counterfeiting UV platemaking method and system. Background In the field of anti-counterfeiting printing, the micro-structure holographic UV platemaking technology is widely applied because of being capable of generating micron-sized three-dimensional anti-counterfeiting patterns, and the core is that the uncopyable optical anti-counterfeiting effect is realized by precisely controlling the exposure forming of the UV resin layer. However, the traditional platemaking relies on manual adjustment of an optical system, and a dynamic calibration mechanism based on CCD automatic focusing is lacking, so that the mapping deviation between pixel coordinates and the physical position of an actual microstructure is large, and the micrometer-level precision requirement is difficult to meet, and particularly, when a three-dimensional microstructure with a height difference is processed, pattern distortion caused by focus offset is easy to occur. In addition, the prior method does not fully combine the depth characteristics of the microstructure (such as the maximum height difference and the distance between a camera and a layout) to calculate the effective area of the layout, and fixed grids are often adopted to divide micro units, so that the microstructure of the edge area is invalid due to exceeding the actual exposure range, or the curing energy is uneven due to the mismatching of the size of the units and the depth of the structure, and the consistency of the anti-counterfeiting pattern is affected. In addition, the aberration (such as distortion and chromatic aberration) of an optical system is not brought into a projection model by the traditional UV platemaking, and the LED light curing process lacks dynamic energy compensation linked with the depth of the microstructure, so that the problems of blurring edges, losing three-dimensional layers and the like occur in the microstructure during projection curing, and the identification degree and the replication resistance of holographic anti-counterfeiting are reduced. The foregoing is provided merely for the purpose of facilitating understanding of the technical solutions of the present invention and is not intended to represent an admission that the foregoing is prior art. Disclosure of Invention The invention mainly aims to provide a microstructure holographic anti-counterfeiting UV plate making method and system, which aim to solve the technical problems that the traditional microstructure holographic UV plate making technology relies on manual optical adjustment, lacks a CCD automatic focusing dynamic calibration mechanism, does not combine microstructure depth characteristic to calculate a layout area and fixedly divide micro units, does not bring optical system aberration into a projection model, lacks dynamic energy compensation linked with microstructure depth in an LED light curing process, and causes large mapping deviation between pixel coordinates and physical positions, pattern distortion, uneven curing energy and reduction of holographic anti-counterfeiting recognition and replication resistance. In order to achieve the above purpose, the invention provides a microstructure holographic anti-counterfeiting UV platemaking method, which comprises the following steps: Acquiring an optical path positioning model corresponding to a target CCD camera based on the focusing depth of the target layout image acquired by the target CCD camera and the installation position of the target CCD camera; the optical path positioning model is used for indicating the mapping relation between the microstructure coordinates of the pixels in the target layout image and the physical positions of the anti-counterfeiting microstructures corresponding to the pixels in a three-dimensional platemaking coordinate system, wherein the target layout image is obtained by shooting a holographic anti-counterfeiting UV printing plate in a target range by the target CCD camera; Acquiring a layout range and a micro unit size corresponding to a UV printing plate based on the depth characteristics of the anti-counterfeiting microstructure in the target range and the light path positioning model, wherein the depth characteristics of the anti-counterfeiting microstructure in the target range are determined based on the initial distance between the target CCD camera and the layout, the maximum height difference of the microstructure in the target range and the reference position of the target CCD camera in the three-dimensional platemaking coordinate system; and projecting each micro unit of the UV printing plate to the target layout image based on the optical path positioning model with aberration correction corresponding to the target CCD camera to obtain the holographic a