CN-122010390-A - OLED glass substrate production equipment and glass production method based on LTPO process
Abstract
The application provides OLED glass substrate production equipment and a glass production method based on LTPO manufacturing procedures, wherein the OLED glass substrate production equipment based on LTPO manufacturing procedures comprises a kiln assembly, a platinum channel assembly, a forming assembly and a detecting assembly, wherein the platinum channel assembly comprises a clarifying structure, a stirring structure and a cooling structure, the clarifying structure, the stirring structure and the cooling structure are sequentially communicated, one end of the clarifying structure, which is far away from the stirring structure, is communicated with the kiln assembly, the forming assembly comprises a forming overflow brick and a detecting structure, the forming overflow brick is communicated with one end of the cooling structure, which is far away from the stirring structure, and the detecting structure is arranged towards the forming overflow brick. The technical scheme of the application effectively solves the problem that obvious platinum rhodium needle defects exist in the glass in the OLED display glass substrate process based on LTPO process technology produced by overflow downdraw method in the prior art.
Inventors
- LI HERAN
- ZHAO YULE
- SHI ZHIQIANG
- LI QING
- ZHANG JIAN
- SHAO LIMING
- JI SHENGKAI
- ZHOU WEI
- WANG XIAOHU
- YAO WENLONG
- HE HUAISHENG
- LI ZHEN
Assignees
- 芜湖东旭光电科技有限公司
Dates
- Publication Date
- 20260512
- Application Date
- 20260205
Claims (10)
- 1. OLED glass substrate production facility based on LTPO processes, characterized by comprising: A kiln assembly (10); The platinum channel assembly (20), the platinum channel assembly (20) comprises a clarification structure (21), a stirring structure (22) and a cooling structure (23), the clarification structure (21), the stirring structure (22) and the cooling structure (23) are sequentially communicated, and one end, far away from the stirring structure (22), of the clarification structure (21) is communicated with the kiln assembly (10); shaping subassembly (30), shaping subassembly (30) include shaping overflow brick (31) and detection structure, shaping overflow brick (31) with cooling structure (23) are kept away from the one end of stirring structure (22) is linked together, detection structure detects by the fashioned product of shaping overflow brick (31).
- 2. The OLED glass substrate production device based on LTPO processes of claim 1, wherein the clarification structure (21) includes a first connection section (211) and a second connection section (212), the first connection section (211) is disposed obliquely, a first end of the first connection section (211) is communicated with the kiln assembly (10), a second end of the first connection section (211) is communicated with a first end of the second connection section (212), and a height of the first end of the first connection section (211) in a vertical direction is lower than a height of the second end of the first connection section (211) in a vertical direction, and the second connection section (212) is disposed horizontally.
- 3. The OLED glass substrate production device based on LTPO processes according to claim 2, wherein the clarification structure (21) further includes a third connection section (213) and a fourth connection section (214), the third connection section (213) is obliquely disposed, a first end of the third connection section (213) is communicated with a second end of the second connection section (212), a second end of the third connection section (213) is communicated with a first end of the fourth connection section (214), a height of the first end of the third connection section (213) in a vertical direction is higher than a height of the second end of the third connection section (213) in a vertical direction, and a second end of the fourth connection section (214) is communicated with the stirring structure (22).
- 4. The OLED glass substrate production device based on LTPO process of claim 3, wherein the stirring structure (22) includes a stirring section (221), a stirring portion (222), a fifth connecting section (223) and a sixth connecting section (224), the stirring portion (222) is rotatably connected to the stirring section (221), the stirring portion (222) is partially located in the stirring section (221), a first end of the fifth connecting section (223) is in communication with the stirring section (221), and a second end of the fifth connecting section (223) is in communication with the sixth connecting section (224).
- 5. The LTPO process-based OLED glass substrate production device of claim 4, wherein the second end of the fourth connection section (214) is higher in the vertical direction than the first end of the fifth connection section (223).
- 6. The LTPO process-based OLED glass substrate production device of claim 4, wherein the sixth connection section (224) is inclined, and the height of the second end of the sixth connection section (224) in the vertical direction is higher than the height of the first end of the sixth connection section (224) in the vertical direction.
- 7. A glass production method using the LTPO process-based OLED glass substrate production apparatus according to any one of claims 1 to 6, the glass production method comprising the steps of: feeding the platinum channel component (20) through the kiln component (10) to perform glass production; Detecting glass products flowing down from the forming overflow bricks (31) by using the detection structure; If the needle-like defects of platinum and rhodium are obvious in the glass product, reducing the temperature of the clarification structure (21) and the stirring structure (22); Stopping feeding of the kiln assembly (10) and reducing the stirring speed in the stirring structure (22); after a predetermined time, the kiln assembly (10) begins charging; Raising the temperature of the cooling structure (23) such that a large amount of molten glass flows out of the cooling structure (23) until it is difficult to flow molten glass in the cooling structure (23); The temperature of the cooling structure (23) is reduced, and the cooled glass liquid is wrapped outside the forming overflow brick (31); And (5) restoring the glass production.
- 8. The glass production method according to claim 7, wherein in lowering the temperature of the fining structure (21) and the stirring structure (22), the temperature of the fining structure (21) is lowered to 1400 ± 100 ℃, and the temperature of the stirring structure (22) is lowered to 1300 ± 100 ℃.
- 9. The glass production method according to claim 7, characterized in that during the lowering of the temperature of the cooling structure (23), the temperature of the cooling structure (23) is lowered at a constant speed, at a rate of 0.42 ℃ to 1.25 ℃ until the temperature is 1200 ℃ plus or minus 100 ℃.
- 10. The glass production method according to claim 7, characterized in that during the restoration of the glass production, the temperature of the fining structure (21) is raised to more than 1500 ℃ and the temperature of the stirring structure (22) is raised to more than 1400 ℃.
Description
OLED glass substrate production equipment and glass production method based on LTPO process Technical Field The application relates to the technical field of glass production, in particular to OLED glass substrate production equipment and a glass production method based on LTPO manufacturing procedures. Background An OLED (Organic Light-Emitting Diode) new display based on LTPO (LowTemperaturePolycrystallineOxide) low-temperature polycrystalline oxide process is a core carrier for modern information output, and a rigid and flexible display (folding mobile phone, bending television) with high resolution, high contrast, high color gamut range and wide refresh rate range has become a mainstream. The OLED display glass substrate based on LTPO process technology needs to meet the comprehensive physicochemical property requirements of high heat resistance, low heat shrinkage, high Young's modulus and the like, and compared with the traditional substrate glass for the display, the OLED display glass substrate has greatly improved production and manufacturing difficulty, and is a glass variety with the largest globally recognized manufacturing difficulty. At present, an OLED display glass substrate based on LTPO process technology is generally produced by adopting an overflow down-draw method, raw materials are melted by a kiln, enter a platinum channel for clarification, and finally are drawn into an ultrathin glass substrate in a forming furnace body. In the prior art, the platinum channel is mainly made of platinum-rhodium alloy, the platinum-rhodium alloy material has high melting point and excellent corrosion resistance and oxidation resistance, but the platinum-rhodium alloy is subjected to physical corrosion of a high-temperature glass raw material melt, oxidation in air and chemical corrosion caused by impurities such as iron powder and the like brought in by glass raw materials for the first time, so that the platinum channel is uneven in material quality, a special platinum-rhodium needle defect is generated in the platinum channel body, the platinum-rhodium needle defect flows along with glass liquid, and obvious defects such as CN115974368A exist in formed glass. Disclosure of Invention The technical problem to be solved by the application is that in the OLED display glass substrate process based on LTPO process technology produced by overflow down-draw method, obvious platinum rhodium needle defects exist in the glass. In order to solve the technical problems, the application provides OLED glass substrate production equipment and a glass production method based on LTPO manufacturing procedures. The OLED glass substrate production equipment based on LTPO manufacturing procedures comprises a kiln assembly, a platinum channel assembly, a forming assembly and a detection assembly, wherein the platinum channel assembly comprises a clarifying structure, a stirring structure and a cooling structure, the clarifying structure, the stirring structure and the cooling structure are sequentially communicated, one end of the clarifying structure, which is far away from the stirring structure, is communicated with the kiln assembly, the forming assembly comprises a forming overflow brick and a detection structure, the forming overflow brick is communicated with one end of the cooling structure, which is far away from the stirring structure, and the detection structure detects a product formed by the forming overflow brick. In some embodiments, the clarification structure comprises a first connection section and a second connection section, the first connection section is obliquely arranged, a first end of the first connection section is communicated with the kiln assembly, a second end of the first connection section is communicated with a first end of the second connection section, the first end of the first connection section is lower in vertical direction than the second end of the first connection section, and the second connection section is horizontally arranged. In some embodiments, the clarification structure further comprises a third connection section and a fourth connection section, the third connection section is arranged in an inclined manner, a first end of the third connection section is communicated with a second end of the second connection section, a second end of the third connection section is communicated with a first end of the fourth connection section, a height of the first end of the third connection section in a vertical direction is higher than a height of the second end of the third connection section in a vertical direction, and a second end of the fourth connection section is communicated with the stirring structure. In some embodiments, the stirring structure comprises a stirring section, a stirring portion, a fifth connecting section, and a sixth connecting section, the stirring portion is rotatably connected with the stirring section, the stirring portion is partially located in the s