Search

CN-122010422-A - Self-cleaning low-emissivity hollow coated glass and preparation process thereof

CN122010422ACN 122010422 ACN122010422 ACN 122010422ACN-122010422-A

Abstract

The invention relates to the technical field of coated glass, in particular to self-cleaning low-emissivity hollow coated glass and a preparation process thereof. A preparation process of self-cleaning low-emissivity hollow coated glass comprises the steps of preparing single-layer coated glass, preparing double-layer coated glass, preparing three-layer coated glass, preparing modified sericite powder and modified talcum powder, and preparing hollow coated glass. According to the invention, tin tetrachloride pentahydrate is dissolved, molybdenum hexacarbonyl and neodymium pentachloride hexahydrate are added, fully stirred and dissolved to prepare precursor sol, then the precursor sol is uniformly coated on the surface of an yttrium doped zinc oxide coating of single-layer coated glass, and after the neodymium-molybdenum co-doped tin dioxide coating is formed by calcining, the carrier concentration and mobility can be improved, an infrared light absorption path is destroyed, the energy loss is reduced, and therefore, the infrared reflection effect is further enhanced, and the emissivity of the hollow coated glass is reduced.

Inventors

  • CHEN CHEN
  • ZHANG YAN
  • SONG LIWEI

Assignees

  • 山东晶成玻璃科技有限公司

Dates

Publication Date
20260512
Application Date
20260226

Claims (10)

  1. 1. The preparation process of the self-cleaning low-emissivity hollow coated glass is characterized by comprising the following steps of: s1, preparing single-layer coated glass Preparing yttrium-doped zinc oxide powder by taking zinc oxide and yttrium oxide as raw materials, preparing an yttrium-doped zinc oxide target material by cold pressing and sintering, and then performing magnetron sputtering on the outer surface of the pretreated hollow glass substrate by using the yttrium-doped zinc oxide target material to form an yttrium-doped zinc oxide coating, thereby obtaining single-layer coated glass; s2, preparing double-layer coated glass S2.1, adding tin tetrachloride pentahydrate into glycol according to 1g (15-20) mL, heating and stirring for 50-60min at 180-200 ℃ under the protection of nitrogen, adding molybdenum hexacarbonyl and neodymium pentachloride hexahydrate when the temperature is reduced to 100 ℃, continuously stirring for 30-40min, cooling to room temperature, adding absolute ethyl alcohol for dilution, and performing ultrasonic dispersion for 10-20min to obtain precursor sol; s2.2, uniformly coating the precursor sol on the surface of the yttrium doped zinc oxide coating of the single-layer coated glass, airing for 30-40min, placing in a muffle furnace, calcining for 2-3h at 400-500 ℃ to form a neodymium-molybdenum co-doped tin dioxide coating with the thickness of 60-80nm, and obtaining double-layer coated glass; s3, preparing three-layer coated glass On the surface of the neodymium-molybdenum co-doped tin dioxide coating of the double-layer coated glass, taking the yttrium-doped zinc oxide target as a magnetron sputtering target, performing magnetron sputtering for 120-130s at 20-30sccm argon flow, 2-4sccm oxygen flow, 110-120W, 0.5Pa and 130-150 ℃, and annealing for 20-30min at 200-250 ℃ after cooling to form an yttrium-doped zinc oxide coating, thereby obtaining three-layer coated glass; s4, preparing modified sericite powder and modified talcum powder Firstly, aluminum isopropoxide is used as a raw material to prepare alumina sol, sericite is activated and dispersed in deionized water, the alumina sol is added and fully mixed to prepare modified sericite powder, then tetraethoxysilane is used as a raw material to prepare silica sol, and activated talcum powder is added and fully mixed to prepare modified talcum powder; S5, preparing hollow coated glass Dispersing the modified sericite powder and modified talcum powder in absolute ethyl alcohol to prepare suspension, dissolving methyltriethoxysilane in absolute ethyl alcohol, sequentially adding hydrochloric acid and ammonia water to prepare cross-linking liquid, adding the suspension, mixing to form hydrophobic coating, and uniformly coating the surface of yttrium doped zinc oxide coating of the three-layer coated glass to obtain the hollow coated glass.
  2. 2. The process for preparing self-cleaning low-emissivity hollow coated glass of claim 1, wherein S1 comprises the steps of: s1.1, sequentially ultrasonically cleaning a hollow glass substrate with 75% ethanol solution and deionized water for 10-20min, then blow-drying with a nitrogen gun, putting into a magnetron sputtering vacuum chamber, and introducing argon to activate for 5-10min with 80-100W plasma to obtain a pretreated glass substrate; S1.2, drying zinc oxide powder and yttrium oxide powder for 2-3 hours at 110-120 ℃, adding the dried zinc oxide powder and yttrium oxide powder into absolute ethyl alcohol according to (18-20) g (0.5-0.6) g (10-12) mL, ball milling for 8-10 hours at 200-300rpm, heating and stirring in a water bath at 80-90 ℃ until the ethyl alcohol is completely volatilized, and obtaining yttrium doped zinc oxide powder; S1.3, sieving the yttrium doped zinc oxide powder with a 200-mesh sieve, uniformly filling the powder into a mold, cold-pressing and molding the powder for 3-5min under 200MPa, then placing the powder into a muffle furnace, heating the powder to 500-600 ℃ at 5 ℃ per min under an oxygen atmosphere, preserving heat for 2-3h, continuously heating the powder to 1250-1300 ℃ at 3 ℃ per min, preserving heat and sintering the powder for 2-3h, and cooling the powder to room temperature along with the furnace to obtain the yttrium doped zinc oxide target; S1.4, taking the yttrium doped zinc oxide target as a magnetron sputtering target material on the outer surface of the pretreated glass substrate, performing magnetron sputtering for 120-130S at 20-30sccm argon flow, 2-4sccm oxygen flow, 110-120W, 0.5Pa and 130-150 ℃, and annealing for 20-30min at 200-250 ℃ after cooling to form yttrium doped zinc oxide coating, thus obtaining single-layer coated glass.
  3. 3. The process for preparing self-cleaning low-emissivity hollow coated glass of claim 2, wherein S4 comprises the steps of: S4.1, dissolving aluminum isopropoxide in absolute ethyl alcohol according to 1g (2-4) mL, fully stirring until a transparent solution is formed, adding deionized water with the volume of 26-28% of the absolute ethyl alcohol while stirring, continuously stirring for 30-40min, adding octadecyl trimethyl ammonium bromide, stirring for dissolving, adding citric acid to adjust the pH value to 5-5.5, and continuously stirring and curing for 2-3h to obtain alumina sol; S4.2, adding sericite and absolute ethyl alcohol into deionized water according to a ratio of (2.8-3) g to 1mL, stirring and mixing for 10-20min, heating and stirring for 2-3h at 45-55 ℃, cooling, and performing suction filtration, deionized water washing for 2-3 times and drying to obtain activated sericite powder; S4.3, adding 1mL of the activated sericite powder into deionized water according to (3-4) g, performing ultrasonic dispersion for 10-20min to obtain an activated sericite dispersion liquid, adding the alumina sol while stirring, stirring for 2-3h at 45-50 ℃, performing ultrasonic treatment for 20-30min, cooling, and performing suction filtration, vacuum drying, grinding and sieving to obtain modified sericite powder; S4.4, adding talcum powder into hydrochloric acid solution with pH of 3-4 according to (1.7-1.8) g and 1mL, heating and stirring for 1-2h at 45-50 ℃, cooling, filtering, washing with deionized water for 3 times, and drying to obtain activated talcum powder; S4.5, adding ethyl orthosilicate into absolute ethyl alcohol according to 1g (3.4-3.5) mL, fully stirring and dissolving, adding deionized water with 10% of absolute ethyl alcohol volume and hydrochloric acid with 0.6-0.8% of absolute ethyl alcohol volume and concentration of 12mol/L, continuously stirring for 1-2h, adding polyethylene glycol 6000, and continuously stirring for 2-3h to obtain silica sol; S4.6, adding the activated talcum powder into the silicon dioxide sol according to 1g (1.3-1.5) mL, adding deionized water accounting for 8-10% of the volume of the silicon dioxide sol, stirring to form a suspension, heating and stirring for 3-4h at 35-45 ℃, performing ultrasonic treatment for 20-30min, cooling, and performing suction filtration, vacuum drying, grinding and sieving to obtain the modified talcum powder.
  4. 4. A process for preparing self-cleaning low emissivity hollow coated glass as claimed in claim 3, wherein S5 comprises the steps of: S5.1, according to the mass ratio of 1 (3-5), (20-30), dispersing the modified sericite powder prepared in the step S4.3 and the modified talcum powder prepared in the step S4.6 in absolute ethyl alcohol, adding hexadecyl trimethoxy silane, and stirring for 1-2 hours to obtain a suspension; S5.2, adding methyltriethoxysilane into absolute ethyl alcohol according to the volume ratio of 1 (8-10), fully stirring and mixing, adding hydrochloric acid with the same volume as methyltriethoxysilane and the concentration of 0.01mol/L, stirring and reacting for 1-2h, then adding ammonia water with the mass fraction of 28%, continuing stirring and reacting for 30-40min, standing for 8-10h to obtain a crosslinking liquid, then adding the suspension, fully stirring and mixing uniformly to obtain the hydrophobic coating; And S5.3, uniformly coating the hydrophobic coating on the surface of the yttrium doped zinc oxide coating of the three-layer coated glass prepared in the step S3, and drying and curing to form a hydrophobic protective layer with the thickness of 50-60nm, thereby obtaining the hollow coated glass.
  5. 5. The preparation process of the self-cleaning low-emissivity hollow coated glass, as claimed in claim 1, wherein the addition amount of molybdenum hexacarbonyl is 6-8% of the mass of tin tetrachloride pentahydrate, and the addition amount of neodymium pentachloride hexahydrate is 5-6% of the mass of tin tetrachloride pentahydrate.
  6. 6. The process for preparing self-cleaning low-emissivity hollow coated glass as claimed in claim 3, wherein the addition amount of octadecyl trimethyl ammonium bromide is 0.1% of the mass of aluminum isopropoxide, and the volume ratio of the alumina sol to the activated sericite dispersion liquid is (2.5-3): 1.
  7. 7. The process for preparing self-cleaning low-emissivity hollow coated glass as claimed in claim 3, wherein the addition amount of polyethylene glycol 6000 is 1.7-1.8% of the mass of the tetraethoxysilane.
  8. 8. The process for preparing self-cleaning low-emissivity hollow coated glass as claimed in claim 3, wherein the particle sizes of sericite and talcum powder are 4-6 μm.
  9. 9. The process for preparing the self-cleaning low-emissivity hollow coated glass according to claim 4, wherein the addition amount of hexadecyltrimethoxysilane is 25% of the total mass of modified sericite powder and modified talcum powder, the addition amount of ammonia water is 15-20% of the volume of methyltriethoxysilane, and the addition amount of suspension is 28-32% of the volume of crosslinking liquid.
  10. 10. A self-cleaning low emissivity hollow coated glass, characterized in that it is produced by a process for producing a self-cleaning low emissivity hollow coated glass as defined in any one of claims 1 to 9.

Description

Self-cleaning low-emissivity hollow coated glass and preparation process thereof Technical Field The invention relates to the technical field of coated glass, in particular to self-cleaning low-emissivity hollow coated glass and a preparation process thereof. Background In the energy consumption, the building energy consumption occupies a large part, and in the building energy consumption, the heat dissipation ratio of doors and windows is 30% -40%. The Low-emissivity (Low-E) glass can obviously reduce the heating and refrigerating energy consumption of a building by depositing a film with high reflectivity to infrared rays on the surface of the glass and effectively preventing the heat radiation exchange inside and outside a compartment, so that the adoption of the Low-emissivity glass to reduce the energy consumption loss of the building is the center of gravity of the current research. However, the Low-emissivity coated glass is a common Low-E film prepared by magnetron sputtering or chemical vapor deposition, and the core functional layer of the Low-emissivity coated glass effectively reflects infrared rays and has natural absorption and reflection on visible light wave bands, so that the visible light transmittance of the glass can be reduced. The low-emissivity glass is mainly of two types, namely SnO 2 -based low-emissivity glass and silver-based low-emissivity glass, but the silver-based low-emissivity glass has the characteristics of higher production cost, unstable film structure, relatively poor durability, lower production cost of SnO 2 -based low-emissivity glass, good transmittance, stable chemical property and the like. However, the free carriers of the common SnO 2 are mainly derived from intrinsic oxygen vacancy defects, the natural concentration is low, the defect distribution is uneven, the requirement of high-efficiency infrared reflection cannot be met, meanwhile, more impurities and lattice distortion exist in pure SnO 2 lattices, the carrier scattering is aggravated, the mobility is reduced, and the infrared reflection capability is further weakened, so that the emissivity of the prepared coated glass is higher, the surface of a glass substrate is mainly composed of silica bonds, the chemical inertness of the surface of a common SnO 2 coating is higher, active groups capable of forming stable chemical bonds with silicon hydroxyl groups are absent, the interface between the two is dependent on weak van der Waals force or physical adsorption, the bonding force is poor, the influence of external environment is very easy, and the SnO 2 coating is easy to drop. In addition, the outer surface of the building glass is exposed to the atmosphere for a long time, dust, pollutants and organic stains are easy to adhere, the attractive appearance and lighting of the building are seriously affected, high maintenance cost and safety risk are brought about by frequent manual cleaning, in the prior art, the glass is mostly provided with a self-cleaning function by preparing a hydrophobic self-cleaning coating on the outer surface of the glass so as to prevent pollution, but the cross-linking structure of the existing hydrophobic self-cleaning coating is easy to be damaged under long-term ultraviolet irradiation, and the coating loses hydrophobicity. Therefore, it is necessary to provide a self-cleaning low-emissivity hollow coated glass with high visible light transmittance, coating binding force and ultraviolet aging resistance and a preparation process thereof. Disclosure of Invention Aiming at the defects existing in the prior art, the invention aims to provide self-cleaning low-emissivity hollow coated glass and a preparation process thereof. The invention provides a preparation process of self-cleaning low-emissivity hollow coated glass, which comprises the following steps: s1, preparing single-layer coated glass Preparing yttrium-doped zinc oxide powder by taking zinc oxide and yttrium oxide as raw materials, preparing an yttrium-doped zinc oxide target material by cold pressing and sintering, and then performing magnetron sputtering on the outer surface of the pretreated hollow glass substrate by using the yttrium-doped zinc oxide target material to form an yttrium-doped zinc oxide coating, thereby obtaining single-layer coated glass; s2, preparing double-layer coated glass S2.1, adding tin tetrachloride pentahydrate into glycol according to 1g (15-20) mL, heating and stirring for 50-60min at 180-200 ℃ under the protection of nitrogen, adding molybdenum hexacarbonyl and neodymium pentachloride hexahydrate when the temperature is reduced to 100 ℃, continuously stirring for 30-40min, cooling to room temperature, adding absolute ethyl alcohol for dilution, and performing ultrasonic dispersion for 10-20min to obtain precursor sol; s2.2, uniformly coating the precursor sol on the surface of the yttrium doped zinc oxide coating of the single-layer coated glass, airing for 30-40min, placing in a muffl