Search

CN-122011837-A - High-temperature-resistant stable water-based ink and preparation method thereof

CN122011837ACN 122011837 ACN122011837 ACN 122011837ACN-122011837-A

Abstract

The invention relates to the technical field of ink, in particular to high-temperature-resistant stable water-based ink and a preparation method thereof, and the high-temperature-resistant stable water-based ink comprises, by weight, 60-70 parts of acrylic resin emulsion, 10-20 parts of pigment, 15-25 parts of deionized water, 4-8 parts of cosolvent, 4-8 parts of additive, 0.5-1.5 parts of wetting agent, 0.2-0.8 part of defoaming agent, 0.5-1.5 parts of flatting agent and 1-2 parts of wax emulsion. In the invention, the water-based ink forms a compact film matrix through the acrylic resin emulsion, and the additive compounded by the auxiliary agent A and the auxiliary agent B is introduced, so that the ink layer formed by the ink after solidification can bear frequent thermal shock, softening and back-sticking phenomena caused by excessive movement of a resin molecular chain are effectively resisted, and the reliability of continuous processing under a high-temperature scene is ensured.

Inventors

  • SHI JUN
  • ZHANG ZHILIN
  • XIA XIAOJUN
  • CHEN HAIFENG

Assignees

  • 湖州乐通新材料科技有限公司

Dates

Publication Date
20260512
Application Date
20260311

Claims (10)

  1. 1. The high-temperature-resistant stable water-based ink is characterized by comprising, by weight, 60-70 parts of acrylic resin emulsion, 10-20 parts of pigment, 15-25 parts of deionized water, 4-8 parts of cosolvent, 4-8 parts of additive, 0.5-1.5 parts of wetting agent, 0.2-0.8 part of defoamer, 0.5-1.5 parts of flatting agent and 1-2 parts of wax emulsion; The additive is prepared by the following method: s1, preparing an auxiliary agent A, wherein the auxiliary agent A comprises a first mixture, a second mixture, nano silicon dioxide, deionized water and BYK190; s2, preparing an auxiliary agent B, wherein the raw materials of the auxiliary agent B comprise deionized water, ethylene glycol diethyl ether acetate, triethanolamine, nano boron nitride, KH550 and organic silicon emulsion, and the mass of the auxiliary agent B is 25-40% of that of the auxiliary agent A; And S3, mixing, namely mixing the auxiliary agent A and the auxiliary agent B to prepare the additive.
  2. 2. The high-temperature-resistant stable water-based ink according to claim 1, wherein the auxiliary agent A is prepared by mixing deionized water and glacial acetic acid, adding the mixture into a mixer, adding KH560 into the mixer, setting 40-60 rpm for stirring for 20-30 min, standing for 1-2 h after stirring is completed to obtain a first mixture, adding amino resin and propylene glycol methyl ether into the mixer for standby, setting 40-60 rpm for stirring for 40-60 min to obtain a second mixture, adding nano silicon dioxide, deionized water and BYK190 into the mixer, setting 100-200 rpm for stirring for 10-20 min, adding the first mixture into the mixer, continuing stirring for 10min, adding the second mixture, and continuing stirring for 20-30 min to obtain the auxiliary agent A.
  3. 3. The high-temperature-resistant stable water-based ink according to claim 2, wherein the mass ratio of deionized water to glacial acetic acid to KH560 is 20:0.5-1:3-5, the mass ratio of amino resin to propylene glycol methyl ether is 1:0.3-0.4, and the mass ratio of nano-silica to deionized water to BYK190 is 1:20-25:2-3.
  4. 4. The high-temperature-resistant stable water-based ink according to claim 2, wherein the mass of the first mixture is 4-6 times that of the nano silicon dioxide, and the mass of the second mixture is 40-80% that of the first mixture.
  5. 5. The high-temperature-resistant stable water-based ink according to claim 1, wherein the auxiliary agent B is prepared by adding deionized water and ethylene glycol diethyl ether acetate into a mixer, setting the rotating speed to 50-60 rpm, stirring for 5-10 min, uniformly mixing to obtain a solution, adding triethanolamine into the solution, continuously setting the rotating speed to 180-220 rpm, stirring for 20-30 min, reducing the rotating speed to 60-80 rpm, slowly dripping KH550, adding an organosilicon emulsion after dripping, setting the stirring for 25-35 min, standing for 1.5-3 h at 35-45 ℃ after the stirring, and cooling to normal temperature to obtain the auxiliary agent B.
  6. 6. The high-temperature-resistant stable water-based ink according to claim 5, wherein the mass ratio of deionized water to glycol ethyl ether acetate is 30:10-15, the mass of triethanolamine is 3-5% of that of deionized water, the mass of nano boron nitride is 2-3 times that of triethanolamine, the mass of KH550 is 3-4 times that of triethanolamine, and the mass of organosilicon emulsion is 15-20 times that of triethanolamine.
  7. 7. The high-temperature-resistant stable water-based ink according to claim 1, wherein the mixing treatment method is characterized in that an auxiliary agent A and an auxiliary agent B are added into a reaction kettle, the temperature is set to be 35-40 ℃, the stirring speed is 150-200 rpm, the constant-temperature stirring treatment is carried out for 20-40min, and the mixing treatment is completed, so that the additive is prepared.
  8. 8. The high temperature resistant stable aqueous ink according to claim 1, wherein the cosolvent is propylene glycol methyl ether and the wetting agent is Surfynol 104E.
  9. 9. The high temperature resistant stable aqueous ink according to claim 1, wherein the defoamer is BYK-024 and the leveling agent is BYK381.
  10. 10. The method for preparing the high-temperature-resistant stable water-based ink according to any one of claims 1 to 9, which is characterized by comprising the steps of weighing pigment, wetting agent, 20% of acrylic resin emulsion and 30% of deionized water according to requirements, adding the pigment, the wetting agent, the 20% of acrylic resin emulsion and the 30% of deionized water into a mixer, setting 600-800 rpm for stirring treatment for 20-40 min to obtain color paste, adding the color paste, 80% of acrylic resin emulsion, 70% of deionized water, cosolvent, additive, defoamer, leveling agent and wax emulsion into the mixer, setting 200-400 rpm for stirring treatment for 40-60 min, and filtering impurities by using a 100-mesh filter screen to obtain the high-temperature-resistant stable water-based ink.

Description

High-temperature-resistant stable water-based ink and preparation method thereof Technical Field The invention relates to the technical field of ink, in particular to high-temperature-resistant stable water-based ink and a preparation method thereof. Background The water-based ink is a liquid mixture taking water as a main dispersion medium, generally comprises auxiliary components such as a binder, a pigment, a cosolvent, a defoaming agent and the like, and is increasingly focused in the fields of package printing, publication printing and the like, and the technical development of the water-based ink accords with the general trend of green chemical industry. In the prior art, the molecular chain of the resin binder in the water-based ink system is easy to weaken due to the aggravation of thermal motion under the condition of continuous heating, so that the stability of the whole polymer network structure is reduced, and further, the phenomenon of adhesion and caking of an ink layer occurs due to the attenuation of adhesive force under the environment of higher temperature, so that the reliability of the water-based ink in a high-temperature scene is poor. Based on the above, the invention provides high-temperature-resistant stable water-based ink and a preparation method thereof. Disclosure of Invention The invention aims to provide high-temperature-resistant stable water-based ink and a preparation method thereof, and the stable water-based ink prepared by the invention not only has good stability in a high-temperature environment, but also has good storage stability. The high-temperature-resistant stable water-based ink comprises, by weight, 60-70 parts of acrylic resin emulsion, 10-20 parts of pigment, 15-25 parts of deionized water, 4-8 parts of cosolvent, 4-8 parts of additive, 0.5-1.5 parts of wetting agent, 0.2-0.8 part of defoaming agent, 0.5-1.5 parts of flatting agent and 1-2 parts of wax emulsion; The additive is prepared by the following method: s1, preparing an auxiliary agent A, wherein the auxiliary agent A comprises a first mixture, a second mixture, nano silicon dioxide, deionized water and BYK190; s2, preparing an auxiliary agent B, wherein the raw materials of the auxiliary agent B comprise deionized water, ethylene glycol diethyl ether acetate, triethanolamine, nano boron nitride, KH550 and organic silicon emulsion, and the mass of the auxiliary agent B is 25-40% of that of the auxiliary agent A; And S3, mixing, namely mixing the auxiliary agent A and the auxiliary agent B to prepare the additive. Preferably, the auxiliary agent A is prepared by the following steps of mixing deionized water and glacial acetic acid, adding the deionized water and glacial acetic acid into a mixer, adding KH560 into the mixer, setting 40-60 rpm for stirring for 20-30 min, standing for 1-2 h after stirring to obtain a first mixture, adding amino resin and propylene glycol methyl ether into the mixer, setting 40-60 rpm for stirring for 40-60 min to obtain a second mixture, adding nano silicon dioxide, deionized water and BYK190 into the mixer, setting 100-200 rpm for stirring for 10-20 min, adding the first mixture into the mixer, continuing stirring for 10min, adding the second mixture, and continuing stirring for 20-30 min to obtain the auxiliary agent A. Preferably, the mass ratio of deionized water to glacial acetic acid to KH560 is 20:0.5-1:3-5, the mass ratio of amino resin to propylene glycol methyl ether is 1:0.3-0.4, and the mass ratio of nano-silica to deionized water to BYK190 is 1:20-25:2-3. Preferably, the mass of the first mixture is 4-6 times of that of the nano silicon dioxide, and the mass of the second mixture is 40-80% of that of the first mixture. Preferably, the auxiliary agent B is prepared by adding deionized water and ethylene glycol diethyl ether acetate into a mixer, setting the rotating speed to be 50-60 rpm, stirring for 5-10 min, uniformly mixing to obtain a solution, adding triethanolamine into the solution, continuously setting the stirring for 3-5 min at 50-60 rpm, adjusting the pH value of the product to 7.5-8.5, adding nano boron nitride, setting the rotating speed to be 180-220 rpm, stirring for 20-30 min, reducing the rotating speed to be 60-80 rpm, slowly dropwise adding KH550, adding an organosilicon emulsion after the dropwise adding, setting the stirring for 25-35 min at 60-80 rpm, standing for 1.5-3 h at 35-45 ℃ after the stirring, and cooling to normal temperature to obtain the auxiliary agent B. Preferably, the mass ratio of the deionized water to the glycol monoethyl ether acetate is 30:10-15, the mass of the triethanolamine is 3-5% of the mass of the deionized water, the mass of the nano boron nitride is 2-3 times of the mass of the triethanolamine, the mass of KH550 is 3-4 times of the mass of the triethanolamine, and the mass of the organosilicon emulsion is 15-20 times of the mass of the triethanolamine. Preferably, the mixing treatment method comprises the st