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CN-122011951-A - High-temperature-resistant UV (ultraviolet) curing and viscosity reducing film for vacuum coating and preparation method thereof

CN122011951ACN 122011951 ACN122011951 ACN 122011951ACN-122011951-A

Abstract

The invention relates to the technical field of functional polymer films, in particular to a high-temperature-resistant UV curing and viscosity reducing film for vacuum coating and a preparation method thereof, comprising a base material and a bonding layer; the preparation method comprises the steps of substrate pretreatment, adhesive layer composition preparation, gradient gluing, pre-curing and high-temperature post-treatment, and the adhesive film is high-temperature resistant, controllable in adhesive force, free of residual glue, stable in size, good in interface bonding property and suitable for a high-temperature vacuum coating process. The product of the invention has excellent high temperature resistance, controllable adhesive force, no residual adhesive after stripping, strong dimensional stability and firm interface combination.

Inventors

  • ZHANG HUA
  • LI ZHIMING
  • QIN ZHIXIN

Assignees

  • 湖南优多新材料科技有限公司

Dates

Publication Date
20260512
Application Date
20260225

Claims (10)

  1. 1. The high-temperature-resistant UV curing and film-reducing film for vacuum coating is characterized by comprising a base material and an adhesive layer, wherein the base material is a modified PI film or a modified PET film, the adhesive layer is a quaternary system of a high-temperature-resistant epoxy acrylate prepolymer, a multifunctional UV monomer, a composite photoinitiator and an interface regulator, the epoxy value of the high-temperature-resistant epoxy acrylate prepolymer is 0.4-0.6eq/100g, and the adhesive layer comprises, by weight, 32-38 parts of the high-temperature-resistant epoxy acrylate prepolymer, 48-52 parts of the multifunctional UV monomer, 3-5 parts of the composite photoinitiator and 1-3 parts of the interface regulator.
  2. 2. The high temperature resistant UV curing and film reducing agent for vacuum coating according to claim 1, wherein the multifunctional UV monomer is a compound of ETMPTA and DPHA, the functionality of the ETMPTA is 6, the functionality of the DPHA is 6-8, and the mass ratio of the ETMPTA to the DPHA is 1:1-1:1.2.
  3. 3. The high temperature resistant UV curing adhesive-reducing film for vacuum coating according to claim 1, wherein the substrate is pretreated by argon plasma, and the pretreatment parameters of the substrate are 350-450W and 25-35s.
  4. 4. The high-temperature-resistant UV curing and film-reducing film for vacuum coating according to claim 1, wherein the interface regulator is a compound of a silane coupling agent KH-550 and a titanate coupling agent NDZ-311, the mass ratio of the two is 1:1, wherein the amino content of the silane coupling agent KH-550 is 1.2-1.5mmol/g, and the titanium content of the titanate coupling agent NDZ-311 is 8-10%.
  5. 5. The high temperature resistant UV curing and film reducing agent for vacuum coating according to claim 1, wherein the composite photoinitiator is a compound of 907 and TPO, and the mass ratio of the two is 1.5:1-2:1.
  6. 6. The high temperature resistant UV curable adhesive film for vacuum coating according to claim 1, wherein the adhesive layer is further added with 0.5-1.5 parts of isocyanate-based crosslinking agent, and the heat conduction rate is controlled to be 5-10 ℃.
  7. 7. A method for preparing a high temperature resistant UV curable transmucosal coating film for vacuum coating according to any one of claims 1 to 6, comprising the steps of: S1, preprocessing a substrate, namely preprocessing a modified PI film or a modified PET film by adopting argon plasma, controlling the flow of the argon to be 10-20sccm, preprocessing power to be 350-450W, and processing time to be 25-35s until the surface dyne value of the substrate is 56mN/m and the roughness Ra is 0.05-0.1 mu m; S2, preparing the adhesive layer composition, namely weighing a high-temperature-resistant epoxy acrylate prepolymer, a multifunctional group UV monomer, a composite photoinitiator, an interface regulator and an isocyanate cross-linking agent, mixing for 20-30min at 25-30 ℃ and 500-800rpm, adding 907, stirring for 10min, and then adding TPO to obtain a uniform adhesive layer composition; S3, gradient gluing, namely coating the adhesive layer composition prepared in the step S2 on the surface of the substrate pretreated in the step S1 in a micro-concave coating mode, wherein the glue coating rate is gradually decreased by 10-20% outwards from the surface of the substrate, and the thickness of a wet film is controlled to be 7-40 mu m; s4, pre-curing, namely placing the glued base material in an environment with the temperature of 85-95 ℃ and the humidity of 30-50% RH, gradually heating to the set temperature at the heating rate of 2-3 ℃ per minute, and pre-curing for 3.5-4.5 minutes; S5, high-temperature post-treatment, namely placing the pre-cured base material in a 105-115 ℃ environment for constant-temperature treatment for 2.5-3min, controlling the ventilation rate to be 0.5-1m/s, and conducting heat uniformly to obtain the high-temperature-resistant UV curing and film-reducing film for vacuum coating.
  8. 8. The method for preparing high temperature resistant UV cured and reduced film for vacuum coating according to claim 7, wherein the argon purity of the argon plasma in S1 is not less than 99.99%, the pretreatment power is 400-450W, the treatment time is 30-35S, and the surface roughness Ra of the treated substrate is controlled to be 0.07-0.09 μm.
  9. 9. The preparation method of the high-temperature-resistant UV curing and film-reducing film for vacuum coating according to claim 7, wherein the pre-curing temperature in S4 is 90-95 ℃, the pre-curing time is 4-4.5min, the surface temperature of a substrate is monitored in real time by adopting infrared temperature measurement in the curing process, the error is less than or equal to +/-1 ℃, the high-temperature post-treatment temperature in S5 is 110-115 ℃, the treatment time is 2.8-3min, and the cooling rate is less than or equal to 5 ℃ per min after the treatment is naturally cooled to room temperature.
  10. 10. The method for preparing the high-temperature-resistant UV curing and film-reducing coating for vacuum coating according to claim 7, wherein the isocyanate cross-linking agent in S2 is hexamethylene diisocyanate trimer with purity of more than or equal to 99%, the mass ratio of ETMPTA to DPHA in the multifunctional UV monomer is 1:1.1, the mass ratio of 907 to TPO in the composite photoinitiator is 1.8:1, and the mass ratio of KH-550 to NDZ-311 in the interface regulator is 1:1.

Description

High-temperature-resistant UV (ultraviolet) curing and viscosity reducing film for vacuum coating and preparation method thereof Technical Field The invention relates to the technical field of functional polymer films, in particular to a high-temperature-resistant UV curing and viscosity reducing film for vacuum coating and a preparation method thereof. Background The UV curing and film reducing film is used as a core matching functional material in a vacuum coating process, the performance of the UV curing and film reducing film directly determines the processing precision and the quality of a finished product of a coated product, and the UV curing and film reducing film plays an irreplaceable role in the high-end manufacturing fields of optical devices, precise hardware and the like. The material has the core functions of realizing temporary fixation of a substrate to be processed in the technical processes of vacuum evaporation coating, magnetron sputtering coating, ion plating and the like, effectively avoiding scratch or uneven thickness of a coating layer caused by substrate displacement and vibration, and after coating is finished, triggering chemical crosslinking reaction of a bonding layer through ultraviolet irradiation to quickly reduce the bonding force so as to realize nondestructive accurate stripping, thus becoming an indispensable key consumable in the precise coating processing flow. With the rapid development of the emerging industries such as 5G communication, semiconductors, optical displays and the like, the requirements of the market on the precision, environmental stability and the like of a film plating product are continuously improved, the film plating process is gradually upgraded to the high temperature and the fine direction, and the vacuum film plating environment temperature is generally 150-180 ℃. However, the UV film-reducing film mainstream in the market at present has obvious technical bottlenecks, and is difficult to adapt to a high-end high-temperature film-coating scene. The existing product mostly uses PET and PP as base materials, and the adhesive layer adopts a common acrylic ester system, so that the product can only meet the low-temperature coating requirement of 80-100 ℃, and the application in a high-temperature environment is severely limited. The core defects of the prior art are mainly characterized in that firstly, the heat resistance is insufficient, the low-temperature base material is extremely poor in heat stability in a high-temperature environment of more than 150 ℃, obvious shrinkage and buckling deformation are easy to occur, further a surface coating layer is driven to crack and fall off, the product is directly scrapped, secondly, the high-temperature stability design of the adhesive layer is lost, the common acrylate adhesive layer is easy to generate phenomena of molecular chain breakage, component migration and crosslinking failure at high temperature, the problem of adhesive residue after coating is outstanding, the residual adhesive layer not only affects the appearance cleanliness of the product, but also seriously damages the optical property, the electrical property and the adhesive force of the coating layer, thirdly, the interface bonding force design is unbalanced, the interface acting force of the adhesive layer and special coating base materials such as metal targets, optical glass and ceramics is not reasonable, or the peeling force before UV irradiation is too small, the base material is not firmly fixed, the slight stress in the coating process cannot be resisted, or the peeling force after UV irradiation is too large, the peeling process is difficult, the coating layer is easy to damage or the base material is damaged, and the production efficiency and the product yield are seriously affected. In this context, industry is increasingly pressing to technological upgrade appeal of UV-transmucosal films. Along with the continuous improvement of the requirements of the high-end manufacturing field on the precision, weather resistance and reliability of the film plating product, the development of a UV film-reducing film with high temperature resistance, strong high-temperature stability of the adhesive layer, excellent interface suitability and controllable stripping force is needed to solve the core pain point in the high-temperature film plating process, fill the blank of the middle-high-end market and support the high-quality development of industries such as 5G, semiconductors, optical displays and the like. Disclosure of Invention (One) solving the technical problems Aiming at the defects of the prior art, the invention provides a high-temperature-resistant UV curing and viscosity reducing film for vacuum coating and a preparation method thereof. (II) technical scheme The high-temperature-resistant UV curing and viscosity reducing film for the vacuum coating comprises a base material and an adhesive layer, wherein the base material