CN-122012187-A - Atomizing flushing type electrified cleaning system for high-precision electronic and electric equipment and cleaning agent thereof

CN122012187ACN 122012187 ACN122012187 ACN 122012187ACN-122012187-A

Abstract

The invention discloses an atomization flushing type electrified cleaning system of high-precision electronic and electric equipment and a cleaning agent thereof, belonging to the technical field of electrified maintenance of electronic equipment. The cleaning agent comprises, by mass, perfluoro-tripentylamine, novecTM-7300 and/or NovecTM-7500, fluoroether auxiliary solvents, bio-based fluoro-surfactants, metal organic frame stabilizers, alkaline buffer systems and decontamination aids, and can be atomized to form high-insulation fog drops with the particle size D50 of 1-5 mu m, so that the coating, stripping and carrying of pollutants are realized. The system comprises a spraying module, a recovery module, a filtering regeneration module, a liquid storage and supply module and a control module, has the functions of automatic spraying, recovery and cyclic regeneration, can adjust spraying parameters in real time according to potential and temperature and humidity signals, realizes directional flushing and safe drying in an electrified state, has no liquid film residue on the surface after cleaning, and solves the problems that in the prior art, electrified equipment cannot be safely cleaned in an operation state, residual liquid is difficult to recover and pollutants are redeposited.

Inventors

WANG SHUAI
ZHANG ZHIFENG
ZOU WEI
MA PENGZHAN
KANG WENCHAO
SU PEIPEI
JIANG YU
DENG JIANWEI
FU TINGGANG
PI XIAODONG
ZHENG YINNA

Assignees

国网新疆电力有限公司超高压分公司

Dates

Publication Date: 20260512
Application Date: 20251106

Claims (10)

1. An atomized flushing type cleaning agent for high-precision electronic and electrical equipment is characterized by comprising, by mass, 20-40 parts of perfluoro-tripentylamine, 30-60 parts of one or two combinations of NovecTM-7300 and NovecTM-7500, 1-5 parts of fluoroether auxiliary solvent (selected from HFE-347mcc or HFE-449 sl), 2-5 parts of biological fluorine surfactant, 3-5 parts of metal organic framework stabilizer (Hf-MOF and/or Zr-MOF), 0.1-0.3 part of alkaline buffer system (lithium carbonate or anhydrous salt thereof), 0.5-1.0 part of volatile control agent and 0.2-0.5 part of quick drying accelerator, and 0.5-2.0 parts of decontamination auxiliary agent, wherein the cleaning agent can be atomized to form droplets with the particle diameter D50 of 1-5 mu m, and the volume resistivity is not lower than Omega cm, is suitable for batch spraying and recycling in a charged state.
2. The atomized flushing type cleaning agent for high-precision electronic and electrical equipment according to claim 1, wherein the decontamination auxiliary agent comprises a high-molecular dispersing agent for enhancing the capability of atomized particles for coating and carrying away pollutants, and the dispersing agent can form an instantaneous elastic interface when the atomized droplets strike the polluted particles, so that the coating, stripping and synchronous recovery of the particles are realized, and the desorption and carrying efficiency of the dirt particles is improved.
3. The atomized rinsing type cleaning agent for high-precision electronic and electrical equipment according to claim 1, wherein the decontamination auxiliary agent comprises a surface regulating agent with redeposition preventing effect, and the surface regulating agent is used for enhancing the suspension stability of particles in fog drops and forming a lyophobic protective film with low adhesion energy on the surface to be cleaned after cleaning so as to prevent redeposition of tiny dust and oily impurities.
4. The atomized flushing type cleaning agent for high-precision electronic and electrical equipment according to claim 1, wherein the decontamination auxiliary agent comprises a microporous structure material with oxidized dust adsorption and complexation functions, and the material can remove oxidized particles and polar particles through physical adsorption and chemical complexation of the material, and meanwhile, the high insulation property and atomization stability of the cleaning agent are maintained.
5. The method for applying the atomized flushing type cleaning agent to the high-precision electronic and electrical equipment, which is characterized in that the atomized spraying is performed in a batch pulse mode, the single spraying time is 0.2-0.5 s, the intermittent time is 0.3-0.6 s, the spraying distance is 25-45 mm, the spray beam opening angle is 15-45 degrees, and the residual liquid amount on the inner surface of 20-30 s after spraying is less than 0.1 mu L/cm < 2 >, so that the charged flushing without liquid film residues is realized.
6. An atomization flushing type electrified cleaning system for high-precision electronic and electric equipment is characterized by using the cleaning agent as a cleaning medium according to any one of claims 1-4, and comprising a spraying module, a recovery module, a filtering regeneration module, a liquid storage and supply module and a control module, wherein the spraying module is used for atomizing the cleaning agent into mist drops with the particle size D50 of 1-5 mu m and spraying the mist drops in batches according to the parameters of claim 5, the recovery module is coaxially arranged with the spraying module and forms a negative pressure backflow flow field, the ratio of recovery quantity to ejection quantity is not lower than 0.95, the filtering regeneration module is used for separating particle impurities and monitoring concentration and volume resistivity of the recovery liquid, and the liquid storage and supply module is used for switching the liquid supply between a basic formula and an auxiliary agent-containing formula when the concentration and volume resistivity deviate from a set range, and the control module is used for automatically adjusting the spraying frequency and the recovery flow according to pollution degree, temperature and surface potential signals.
7. The atomization flushing type electrified cleaning system for high-precision electronic and electric equipment, which is disclosed in claim 6, is characterized in that the spraying module and the recovery module are integrated in the equipment shell, the spray nozzle is fixed right above a part to be cleaned, the spray direction is inclined by 30-60 degrees relative to the normal direction of an equipment installation surface, the spray mist can cover dust-accumulating areas such as a yin-yang angle, a heat dissipation air duct and a terminal row of an electronic element, the control module triggers automatic cleaning according to a period of 24-72 h, the single spray amount is not more than 0.2mL, and synchronous recovery and drying are completed within 30 seconds after spraying.
8. The atomizing flushing type electrified cleaning system of high-precision electronic and electric equipment, as set forth in claim 6, is characterized in that the system main body is an independent external device, a closed cleaning passage is formed by abutting with an air outlet or an overhaul port of the electronic equipment through a sealing interface, a nozzle is arranged at an external position corresponding to a to-be-cleaned area and positioned right in front of or right above the to-be-cleaned area, the spraying direction is inclined by 30 degrees to 60 degrees relative to the normal line of the surface of the equipment and is used for carrying out directional flushing aiming at dust accumulation areas such as a yin-yang angle, a heat dissipation gap and a terminal area on the surface of the electronic equipment, and a recovery module is arranged in the downstream area of the spraying path and connected with a filtering regeneration module to realize synchronous recovery of mist drops and dust mixed liquid, and a closed cycle of spraying, flushing, recovery and regeneration is formed during operation of the system.
9. The atomizing flushing type live cleaning system for high-precision electronic and electric equipment according to claim 1, wherein the spraying module and the recovery module are arranged in a flow ratio / The method comprises the steps of 1.4 or more proportion linkage, dynamically adjusting a control module according to a negative pressure signal of a recovery end and a surface potential monitoring signal, automatically stopping spraying and switching to an enhanced recovery and gas dry blowing mode when the surface potential drift of a cleaned surface is detected to be more than 50mV or the recovery negative pressure is detected to be lower than 2.5kPa, dropwise adding an alkaline buffer solution into a circulation loop at the speed of 0.05-0.2 mL/s by a filtering regeneration module, so as to maintain the cleaning agent in a weak base region of equivalent pH 7.5-8.5, and realizing real-time stable control of the cleaning agent components through dual detection of refraction and resistivity.
10. An electrified atomization cleaning method is characterized by adopting the cleaning agent according to any one of claims 1-4 and being implemented in the system according to any one of claims 6-9, and comprises the following steps that step 1, corresponding cleaning agents are selected from a basic formula or an auxiliary agent-containing formula A, B, C according to the pollution type and cleaning requirement of electronic equipment; step 2, atomizing the cleaning agent into mist drops with the particle diameter D50 of 1-5 mu m by a spraying module, intermittently spraying according to batch parameters of claim 5, wherein the nozzle position is arranged right above or in front of the outer side of a part to be cleaned, the spraying direction is inclined by 30-60 degrees relative to the normal line of the surface of the equipment so as to cover dust accumulation areas such as yin-yang angles of electronic components and a heat dissipation air duct, step 3, starting a recovery module synchronously, maintaining negative pressure of 2.5-6.0 kPa to recover dust-containing mist drops to a filtering regeneration module along with air flow, step 4, sequentially carrying out microporous filtering and concentration and resistivity detection by the filtering regeneration module, automatically starting a microfluidic dripping unit to supplement alkaline buffer solution when the detection value deviates from a preset range, monitoring the surface potential of the equipment in real time, automatically stopping spraying when the potential drifts by more than 50mV until the detection value is recovered stably, and step 6, enabling the surface residual liquid of the equipment to be less than 0.1 mu L/cm2 after the spraying, recovering and regenerating cycle is completed, and keeping the volume resistivity not lower than the preset value Omega cm, thereby realizing safe atomization cleaning without liquid film residue in a charged state.

Description

Atomizing flushing type electrified cleaning system for high-precision electronic and electric equipment and cleaning agent thereof Technical Field The invention relates to the field of electronic equipment maintenance and precise electric system protection, in particular to an atomization flushing type electrified cleaning system of high-precision electronic and electric equipment and a cleaning agent thereof. Background With the rapid development of industrial automation, energy equipment and communication systems, the integration level and precision of electronic and electric equipment are continuously improved, and the internal components are in high-voltage, high-frequency, high-heat load and micro dust environments for a long time. In the long-term operation process of the equipment, dust, metal oxide particles, oily mist and scaling powder residues suspended in the air can be gradually attached to the surfaces of the circuit board, the terminals, the radiating fins and the insulating layer. Although the surface conductivity of the pollutants is weak, extremely thin conductive films are easy to form under the conditions of high humidity or high temperature, so that local electric field distortion and micro discharge phenomena are caused, and potential safety hazards of signal interference, overheating, electric leakage and even element burnout are further caused. In the production field, the pollution problem tends to rise year by year. Taking an electric control cabinet and a communication cabinet as examples, the air duct and the heat dissipation structure are complex, the air circulation system can continuously suck external tiny dust into the internal space, and in seasons with higher environmental temperature, the air flow containing trace oil gas or volatile organic compounds can be combined with dust to form a stubborn putty film in the metal terminal and connector areas. Such a contaminated layer not only reduces heat dissipation efficiency, but also is liable to absorb moisture, resulting in a decrease in insulation resistance. For precision equipment requiring high insulation and low noise, this micro-contamination has become one of the major hazards affecting stable operation. The current maintenance mode still takes the wiping by manual shutdown or high-pressure gas purging as the main mode. The manual wiping has obvious limitations that the equipment is in an electrified running state, the shutdown cleaning often means production interruption, and the cleaning effect is not ideal because the equipment is difficult to reach in narrow spaces such as a high-density wiring area, a multi-layer heat dissipation channel and the like. The gas purge can carry away surface dust, but is almost ineffective against oily films, ionic residues or oxidized particles, and is prone to secondary floating contamination inside the closed equipment. More importantly, the partial use of liquid cleaning requires a power-off operation, otherwise the conductivity of conventional cleaning fluids can cause short-circuit or discharge risks, without safety conditions for use in an operating state. Some improvements attempt to use fluorinated solvents with higher insulation as cleaning media, but because of the lower surface tension of the fluorinated liquid itself, it is difficult to sufficiently wet complex surfaces, and at the same time, single component systems tend to accumulate fine impurities after repeated use, resulting in reduced transparency and reduced decontamination efficiency. In addition, most of the charged cleaning agents on the market are only suitable for spraying or wiping, directional spraying and automatic recovery cannot be realized, the consumption of solvents is large, the cost is high, and the problem of environmental emission exists. On the other hand, even fluorinated cleaning agents having good insulating properties are generally lacking in a treatment mechanism against "dynamic contamination generation". In continuously operating equipment, dust and oil film deposition is a dynamic process, and if the dust and oil film cannot be periodically and automatically cleaned, the dust and oil film still can be accumulated again in a short time even if the primary cleaning is thorough, so that the maintenance frequency is high and the labor cost is high. In continuous operation equipment such as a power system, a communication base station, a rail transit signal system and the like, the shutdown maintenance cost is high. In view of the above problems, a spray rinsing type live cleaning system for high-precision electronic and electrical equipment and a cleaning agent thereof are provided. Disclosure of Invention The invention aims to provide an atomization flushing type electrified cleaning system of high-precision electronic and electric equipment and a cleaning agent thereof, so as to solve the problems in the background technology. The invention provides an atomization flushing type cleaning ag