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CN-122013110-A - PTFE-SiO2Transparent antireflection hydrophobic film and preparation method and application thereof

CN122013110ACN 122013110 ACN122013110 ACN 122013110ACN-122013110-A

Abstract

PTFE-SiO 2 transparent antireflection hydrophobic film, and a preparation method and application thereof, and relates to the technical field of optical films. The invention uses glass as a substrate, adopts a radio frequency magnetron co-sputtering method, uses a PTFE target and a SiO2 target with the purity of 99.9 percent as target materials and uses high-purity Ar gas as sputtering gas, and deposits a PTFE-SiO2 composite film on the substrate. The average light transmittance of the film in the wave band of 400-1100 nm is 91.0% -93.5%, the peak light transmittance is 94.7%, the surface water contact angle is 100-105 degrees, and the pencil hardness is 4-7H. The process does not need subsequent etching, coating or curing treatment, is suitable for large-area industrialized preparation, and can be applied to solar cells, display equipment, optical lenses, transparent electric heating devices, building glass and automobile glass.

Inventors

  • ZHU KE
  • XU YANFEI
  • OU XINWEI
  • LI SHUKE
  • LI XIAOYANG
  • SHU TING
  • SUN HUI

Assignees

  • 湖南工学院

Dates

Publication Date
20260512
Application Date
20260128

Claims (7)

  1. 1. A preparation method of a PTFE-SiO 2 transparent antireflection hydrophobic film is characterized in that a radio frequency magnetron co-sputtering method is adopted, a PTFE target and a SiO 2 target with the purity of 99.9% are used as targets, ar gas with the purity of more than or equal to 99.99% is used as sputtering gas, and the PTFE-SiO 2 transparent antireflection hydrophobic film is obtained by deposition on a substrate.
  2. 2. The method for preparing a PTFE-SiO 2 transparent antireflection hydrophobic film as claimed in claim 1, wherein the substrate is a glass substrate.
  3. 3. The method for preparing the PTFE-SiO 2 transparent antireflection hydrophobic film according to claim 1, wherein the sputtering pressure of the radio frequency co-sputtering method is 0.3-2 Pa, the sputtering power density of the PTFE target is 2.5-5W/cm 2 ,SiO 2 , the sputtering power of the PTFE target is 1.5-3W/cm 2 , and the substrate temperature is 25-150 ℃.
  4. 4. The method for preparing a PTFE-SiO 2 transparent antireflection hydrophobic film according to claim 1, wherein the thickness of the deposited PTFE-SiO 2 transparent antireflection hydrophobic film is 70-160 nm.
  5. 5. A PTFE-SiO 2 transparent antireflection hydrophobic film is characterized in that the film is prepared by the preparation method of any one of claims 1-4.
  6. 6. The transparent antireflection film of PTFE-SiO 2 , wherein the film is used in optoelectronic devices or glass products, such as solar cells, display devices, optical lenses, transparent electric heating devices, architectural glass and automotive glass.
  7. 7. The application of the PTFE-SiO 2 transparent antireflection hydrophobic film as claimed in claim 5, wherein the transparent electric heating device comprises a substrate, an AZO layer, an Ag layer, a PTFE-SiO 2 composite film layer and a metal electrode layer from bottom to top, and the metal electrode layer is made of Ag or Al.

Description

PTFE-SiO 2 transparent antireflection hydrophobic film and preparation method and application thereof Technical Field The invention relates to the technical field of optical films, in particular to a PTFE-SiO 2 transparent antireflection hydrophobic film, a preparation method and application thereof. Background The transparent anti-reflection hydrophobic coating has the double functions of improving light transmission efficiency and self-cleaning and anti-fouling, and becomes a key technical direction for upgrading products such as solar cells, vehicle-mounted display equipment, optical lenses, building glass and the like. From the technical principle, transparent self-cleaning coatings are mainly classified into hydrophobic and hydrophilic. The hydrophobic coating takes away dirt through water drop rolling, is suitable for outdoor complex environment, is more important by industry, and excellent mechanical properties (hardness and wear resistance) are key preconditions for practical application. However, the practical application of the hydrophobic coating is limited by two major technical bottlenecks, namely that firstly, the optical performance and the mechanical performance are in synergistic contradiction, most of the hydrophobic coatings are introduced with fluorine materials (such as PTFE) for pursuing low surface energy, so that the hardness of the film layer is extremely low (usually less than or equal to 2H), the wear resistance is poor, the daily scraping resistance is difficult to resist, and secondly, the process suitability problem is solved, and the requirements of large-area, low-cost and environment-friendly industrial production are met on the premise of ensuring the uniformity of the performance. At present, the main stream preparation technology of the transparent antireflection hydrophobic film has obvious short plates that although the sol-gel method can realize the functions of transparency, antireflection and hydrophobicity, the film layer is loose, the hardness is less than or equal to 3H, the film layer is easy to scratch and fall off, the process is complex, the environment is polluted, the repeatability is poor, the film is not suitable for large-area industrial production, the chemical vapor deposition method can prepare a dense film with strong adhesive force, but the method still faces challenges in the aspect of realizing comprehensive regulation and control of high light transmittance, high hydrophobicity and good antireflection performance, and the process equipment is complex, the cost is higher, toxic precursors can be used in the reaction process, and certain pressure is formed on the environment and the operation safety. The magnetron sputtering method is used as a preferred technology for preparing the high-quality optical film, has the advantages of environmental friendliness, controllable technological parameters, high film density, suitability for large-area deposition and the like, but the existing related technology based on the magnetron sputtering still has a performance short plate, namely a ZnO-PTFE transparent hydrophobic film reported by Lippili and the like in volume 10 of J. Mater, chem. A & lt 2022 & gt, has a contact angle of 105.2 DEG and hardness of 5.21+/-0.66 and GPa, has a transmittance of only 87.4% at a key wavelength of 550 nm, does not meet the core requirement (usually more than 90%) of a antireflection function, has a SZO/PTFE double-layer film disclosed by volume 10 of ACS Sustainable chem. Eng & lt 2022 & gt, has a 550 nm transmittance of 91.86% and does not exceed the transmittance (92%) of a used glass substrate, has a double-layer structure design which increases the technological complexity and the production cost, has a moth eye structure antireflection film based on a flexible substrate, has high transmittance, scratch resistance and hydrophobicity, has a multilayer fluorine-containing film, is easy to integrate, has a multilayer etching process, has a multilayer etching efficiency, and is difficult to control, and is suitable for the application to be applied to the dry etching process, and has a large scale, and has a high coupling effect, and a multilayer etching process has a high film etching efficiency and a multilayer etching process is difficult to be applied to the production. Disclosure of Invention The invention aims to provide a preparation method of a PTFE-SiO 2 transparent anti-reflection hydrophobic film which has the advantages of simple process, environmental friendliness, mass production, high light transmittance, high hardness and excellent hydrophobicity, so as to overcome the defects that the optical performance and the mechanical performance of the traditional transparent anti-reflection hydrophobic film are difficult to be compatible and the process is complex. In order to solve the technical problems, the preparation method of the PTFE-SiO 2 transparent antireflection hydrophobic film comprises the following ste