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CN-122013129-A - Cylindrical polyhedron rotary magnetron sputtering device capable of balancing unbalanced magnetic field coupling

CN122013129ACN 122013129 ACN122013129 ACN 122013129ACN-122013129-A

Abstract

The invention provides a cylindrical polyhedron rotary magnetron sputtering device coupled by a balanced and unbalanced magnetic field, which relates to the technical field of magnetron sputtering and comprises a bracket and an outer cylinder, wherein a bearing piece is arranged in the outer cylinder, a plurality of targets are arranged on the bearing piece, a strip-shaped permanent magnet is arranged in the bearing piece, an opening is formed in the side part of the outer cylinder, the permanent magnet is opposite to one of the targets and faces the opening, in the sputtering process, a second driving part enables the permanent magnet to move along a first direction so as to switch the relative positions of the permanent magnet and the targets facing the opening in the width direction, and a strong magnetic field can change the positions of plasmas relative to the surfaces of the targets, so that the positions of grooves formed on the surfaces of the targets are changed, the utilization rate of the targets is improved, the times of stopping and changing the targets are reduced, and continuous production is facilitated. The first driving part can switch the target material facing the opening, can form a single-layer or multi-layer composite coating, further reduces the times of stopping and replacing the target material, and is convenient for continuous production.

Inventors

  • Cheng Mingwang
  • ZHANG YONG
  • CHENG YONG
  • SUN YONGBO

Assignees

  • 辽宁纳太科技有限公司

Dates

Publication Date
20260512
Application Date
20260409

Claims (10)

  1. 1. A cylindrical polyhedral rotary magnetron sputtering device coupled by a balanced and unbalanced magnetic field is characterized by comprising a support and an outer cylinder arranged on the support, wherein a bearing piece is arranged in the outer cylinder, a plurality of plate-shaped targets are uniformly distributed on the bearing piece along the circumferential direction of the outer cylinder, the thickness direction of each target is parallel to the radial direction of the outer cylinder, a containing space is formed in the bearing piece, a strip-shaped permanent magnet is arranged in the containing space, the length direction of each target and the length direction of each permanent magnet are parallel to the axis of the outer cylinder, the permanent magnet is uniformly distributed in a first direction, the first direction is parallel to the width direction of each target facing the opening, an opening is formed in the side part of the outer cylinder, the permanent magnet is opposite to one of the targets and faces the opening, a first driving part and a second driving part are arranged on the support, the first driving part is used for enabling the bearing piece to rotate along the circumferential direction of the outer cylinder so as to switch the targets facing the opening, and the second driving part is used for enabling the permanent magnet to move along the first direction so as to switch the relative positions of the permanent magnet and the targets facing the opening.
  2. 2. The balanced unbalanced field coupled cylindrical polyhedral rotary magnetron sputtering device of claim 1, wherein all the permanent magnets are capable of moving synchronously relative to the support in a second direction parallel to a thickness direction of the target toward the opening, and the support is provided with an elastic member for causing all the permanent magnets to have a tendency to approach the target synchronously in the second direction.
  3. 3. The cylindrical polyhedral rotary magnetron sputtering device coupled by the balanced and unbalanced magnetic fields according to claim 2, wherein a runner group is arranged in the bearing piece, and water is filled in the runner group to dissipate heat of the target.
  4. 4. The cylindrical polyhedral rotary magnetron sputtering device coupled by the balanced and unbalanced magnetic fields according to claim 3, wherein the bearing piece comprises a first partition plate and a second partition plate, the target material, the first partition plate and the second partition plate are sequentially arranged and contacted, the first partition plate is made of a heat conducting material, the second partition plate is made of a heat insulating material and can be contacted with the permanent magnet, the runner group comprises a first runner arranged in the first partition plate and a second runner arranged in the second partition plate, the first runner and the second runner are provided with a first end and a second end in the axial direction of the outer cylinder, the first end of the first runner is provided with a liquid inlet, the first end of the second runner is provided with a liquid outlet, and the second end of the first runner is communicated with the second end of the second runner.
  5. 5. The balanced unbalanced field coupled cylindrical polyhedral rotary magnetron sputtering device of claim 4, wherein the first flow channel and the second flow channel are each symmetrically arranged in two groups about a first plane, the first plane being perpendicular to the axis of the outer cylinder and passing through the middle of the outer cylinder in the axial direction thereof.
  6. 6. The balanced unbalanced field coupled cylindrical polyhedral rotary magnetron sputtering device of claim 4, wherein the carrier further comprises a press frame for securing the target to the first spacer.
  7. 7. The cylindrical polyhedral rotary magnetron sputtering device coupled by the balanced and unbalanced magnetic fields according to claim 4, wherein the directions of the first runner and the second runner are parallel to the length direction of the target, the first runner and the second runner are uniformly distributed in a plurality along the width direction of the target, the number of the first runner and the second runner is equal to or greater than that of the permanent magnets, the support is further provided with an adjusting part, and when the second driving part moves the permanent magnets along the first direction, the adjusting part enables the liquid inlet and the liquid outlet between the two adjacent permanent magnets to be opened, and enables other liquid inlets and liquid outlets to be closed.
  8. 8. The cylindrical polyhedral rotary magnetron sputtering device coupled by the balanced and unbalanced magnetic fields, as set forth in claim 7, is characterized in that a plurality of end plates are arranged at the end part of the bearing piece, the end plates are in one-to-one correspondence with a plurality of targets, a plurality of first connecting holes and a plurality of second connecting holes are formed in the end plates, the first connecting holes are in one-to-one correspondence with a plurality of liquid inlets, and the second connecting holes are in one-to-one correspondence with a plurality of liquid outlets; When the second driving part moves the permanent magnets along the first direction, the swivel rotates to enable the first control hole to be communicated with the first connecting hole between the two adjacent permanent magnets, and the second control hole is communicated with the second connecting hole between the two adjacent permanent magnets.
  9. 9. The balanced and unbalanced magnetic field coupled cylindrical polyhedral rotary magnetron sputtering device of claim 8, wherein flow equalization members are arranged in all first connecting holes, and the flow equalization members are used for equalizing water flow entering all first flow channels.
  10. 10. The balanced and unbalanced magnetic field coupled cylindrical polyhedral rotary magnetron sputtering device according to claim 8, wherein the first control hole and the second control hole are elongated in the circumferential direction of the swivel, the length of the first control hole is larger than the diameter of the first connecting hole, and the length of the second control hole is larger than the diameter of the first connecting hole.

Description

Cylindrical polyhedron rotary magnetron sputtering device capable of balancing unbalanced magnetic field coupling Technical Field The invention relates to the technical field of magnetron sputtering, in particular to a cylindrical polyhedral rotary magnetron sputtering device coupled by a balanced unbalanced magnetic field. Background The magnetron sputtering is used as a key technology of Physical Vapor Deposition (PVD), and the principle is that a film coating material is used as a target cathode, and argon ions are utilized to bombard the surface of the target material in a vacuum environment to generate cathode sputtering, so that target atoms are deposited on the surface of a workpiece in a solid state form to form a film. The technology has become the mainstream method for preparing functional films such as metals and compounds in industry by virtue of the comprehensive advantages of the technology in terms of deposition rate, film quality and material universality since the magnetron sputtering technology is put into practical application, and is widely applied to the fields of preparation of functional coatings such as metal wiring of integrated circuits, optical antireflection and filter film layers, tool surface hardening coatings, energy-saving glass of automobiles and buildings and the like. In the existing planar magnetron sputtering device, the permanent magnet array on the back of the target is fixed in space. This results in plasma being confined by a strong magnetic field in a specific region of the target surface during sputtering, thereby forming grooves in a local part of the target surface, and the target utilization rate is low and the replacement needs to be stopped. The information disclosed in the background section of the invention is only for enhancement of understanding of the general background of the invention and should not be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art. Disclosure of Invention In view of the foregoing, it is desirable to provide a cylindrical polyhedral rotary magnetron sputtering apparatus that balances unbalanced magnetic field coupling, in order to solve the problems of the conventional magnetron sputtering apparatus. The above purpose is achieved by the following technical scheme: A cylindrical polyhedral rotary magnetron sputtering device coupled by a balanced and unbalanced magnetic field comprises a support and an outer cylinder arranged on the support, wherein a bearing piece is arranged in the outer cylinder, a plurality of plate-shaped targets are uniformly distributed on the bearing piece along the circumferential direction of the outer cylinder, the thickness direction of each target is parallel to the radial direction of the outer cylinder, a containing space is formed in the bearing piece, a strip-shaped permanent magnet is arranged in the containing space, the length direction of each target and the length direction of each permanent magnet are parallel to the axis of the outer cylinder, the permanent magnet is uniformly distributed in a plurality of directions, the directions of the permanent magnet are parallel to the width direction of each target facing the opening, an opening is formed in the side part of the outer cylinder, the permanent magnet is opposite to one of the targets and faces the opening, a first driving part and a second driving part are arranged on the support, and the first driving part is used for enabling the bearing piece to rotate along the circumferential direction of the outer cylinder so as to switch the targets facing the opening, and the second driving part is used for enabling the permanent magnet to move along the first direction so as to switch the relative positions of the permanent magnet and the targets facing the opening. Further, all the permanent magnets can synchronously move along a second direction relative to the support, the second direction is parallel to the thickness direction of the target facing the opening, and the elastic piece is arranged on the support and used for enabling all the permanent magnets to have a trend of synchronously approaching the target along the second direction. Further, a runner group is arranged in the bearing piece, and water is filled in the runner group so as to radiate heat of the target. Further, the bearing piece comprises a first partition board and a second partition board, the target material, the first partition board and the second partition board are sequentially arranged and contacted, the first partition board is made of a heat conducting material, the second partition board is made of a heat insulating material and can be contacted with the permanent magnet, the runner group comprises a first runner arranged in the first partition board and a second runner arranged in the second partition board, the first runner and the second runner are provided with a first e