CN-122013147-A - Shower head and processing chamber comprising same

Abstract

The invention relates to a spray head and a processing chamber comprising the same, wherein the spray head comprises a top plate, a bottom plate and a baffle plate, wherein the top plate comprises a gas inlet at the upper end and a gas outlet at the lower end, process gas is received from the outside through the gas inlet, the process gas is discharged downwards through the gas outlet, the bottom plate is fixed on the top plate in a mode that the upper end of the bottom plate is abutted against the lower end of the top plate and covers the gas outlet, a plurality of spray holes are formed to spray the process gas downwards, and the baffle plate is arranged between the top plate and the bottom plate in a liftable mode and covers the gas outlet, and a plurality of adjusting holes are formed to adjust the distribution of the process gas.

Inventors

• HUANG LINGWU
• Che Dongyi
• Jin Guanxi

Assignees

• 盛吉盛(韩国)半导体科技有限公司

Dates

Publication Date

20260512

Application Date

20241101

Claims (10)

1. 1. A spray head of a spray gun, characterized by comprising the following steps: A top plate including a gas inlet at an upper end through which a process gas is received from the outside and a gas outlet at a lower end through which the process gas is discharged downward; a bottom plate fixed to the top plate in such a manner that an upper end thereof abuts a lower end of the top plate and covers the gas outlet, and formed with a plurality of spray holes to spray the process gas downward, and And a baffle plate which is arranged between the top plate and the bottom plate in a lifting manner and covers the gas outlet, and is provided with a plurality of adjusting holes for adjusting the distribution of the process gas.
2. 2. The showerhead of claim 1, it is characterized in that the method comprises the steps of, The outer end of the baffle is in sealing contact with the inner side surface of the top plate and the inner side surface of the bottom plate.
3. 3. The showerhead of claim 1, it is characterized in that the method comprises the steps of, The baffle includes: A frame part forming the outer end of the baffle plate, and A main body part detachably disposed on the frame part and formed with a plurality of the adjustment holes.
4. 4. The showerhead of claim 1, it is characterized in that the method comprises the steps of, The lifting part is arranged on the outer side of the baffle plate and is connected with the outer side end part of the baffle plate so as to adjust the height of the baffle plate.
5. 5. The showerhead of claim 4, it is characterized in that the method comprises the steps of, A storage space is formed between the top plate and the bottom plate, and the storage space is provided with an opening toward the gas outlet of the top plate, The lifting part is arranged in the storage space and is connected with the outer side end part of the baffle plate through the opening.
6. 6. The showerhead of claim 4, it is characterized in that the method comprises the steps of, A connecting part protruding outwards is formed at the outer end part of the baffle plate, The lifting part comprises: A joint part for connecting with the connecting part, and And an operation part coupled to the coupling part for lifting and lowering the coupling part.
7. 7. The showerhead of claim 6, it is characterized in that the method comprises the steps of, One of the coupling portion and the operating portion is formed with an internal thread extending in the up-down direction, and the other is formed with an external thread extending in the up-down direction, The operation part is in threaded connection with the combination part and enables the combination part to lift through rotation.
8. 8. The showerhead of claim 4, it is characterized in that the method comprises the steps of, The lifting part is connected with a plurality of positions of the outer side end part of the baffle plate, and the heights of the positions are respectively adjusted to adjust at least one of the height and the levelness of the baffle plate.
9. 9. The showerhead of claim 8, it is characterized in that the method comprises the steps of, The plurality of places are three places or four places.
10. 10. A processing chamber is characterized in that, A showerhead comprising any of claims 1 to 9.

Description

Shower head and processing chamber comprising same Technical Field The present invention relates to a showerhead and a process chamber including the same, and more particularly, to a showerhead capable of adjusting distribution of process gas so that the process gas uniformly contacts a substrate and a process chamber including the same. Background With the development of semiconductor technology, various semiconductor processing technologies and equipment are layered endlessly, and meanwhile, with the increasing demands on the fineness, the yield and the like of semiconductor products, the demands on the stability and the processing uniformity of the semiconductor processing technologies and equipment are also increasing. In order to form a uniform thin film on a substrate, for example, chemical vapor deposition (Chemical Vapor Deposition; CVD), it is necessary to uniformly supply a process gas to the surface of the substrate to uniformly perform a film formation reaction throughout the surface of the substrate. The method for uniformly providing the process gas is generally used, wherein a bottom plate with densely distributed spray holes is arranged at the lower part of the spray header, so that the process gas in the spray header contacts the bottom plate and diffuses along the surface of the bottom plate before being sprayed to the substrate, and then is sprayed out through each spray hole. When the process gas is sprayed out from each spray hole, the uniformity of the process gas is gradually improved within a certain distance and reaches an optimal state, and then the process gas is distributed and dispersed more and more, and meanwhile, the uniformity is also reduced. Therefore, when the distance between the showerhead and the substrate is too short or too long, the process gas cannot be uniformly brought into contact with the substrate, and only when the distance between the showerhead and the substrate is adjusted to an appropriate distance, the process gas can be brought into contact with the substrate with high uniformity. In order to adjust the distance between the shower head and the substrate, a lifting device is generally provided under the stage to adjust the height of the stage, but the lifting device is generally connected to the stage via only one support shaft and lifted, and thus it is difficult to ensure that the edges of the stage have the same height during or after the lifting, i.e., to ensure the levelness of the substrate carried on the stage. At this time, although the distance between the substrate and the showerhead is adjusted to be an appropriate distance, the process gas still cannot uniformly contact the substrate. In order to solve the above problems, there is another method in the art, i.e., adjusting the height of the showerhead. The position of the showerhead is typically fixed and therefore the bottom plate of the showerhead can only be formed to be movable relative to the top plate of the showerhead to adjust the height of the bottom plate. In this case, although the distance between the showerhead and the substrate can be adjusted, the volume of the showerhead changes, that is, the distance the process gas moves in the showerhead changes, and this factor also affects the uniformity of the process gas ejected from the nozzle holes when the process gas contacts the substrate, and thus, further adjustment is required. It can be seen that there is a need for a showerhead that facilitates adjustment of the distribution of process gases, and in particular, a showerhead that allows for uniform contact of process gases to a substrate without changing the distance between the substrate and the showerhead, and that allows for uniform contact of process gases to the substrate even if the substrate is tilted. Disclosure of Invention Technical problem One embodiment of the present invention provides a showerhead that facilitates adjustment of the distribution of process gases. Another embodiment of the present invention provides a process chamber comprising the showerhead of the present invention. Technical proposal One embodiment of the present invention provides a showerhead including a top plate including a gas inlet at an upper end and a gas outlet at a lower end, receiving a process gas from outside through the gas inlet, discharging the process gas downward through the gas outlet, a bottom plate fixed to the top plate with an upper end thereof abutting a lower end of the top plate and covering the gas outlet and formed with a plurality of spray holes to spray the process gas downward, and a baffle plate arranged between the top plate and the bottom plate to be liftable and covering the gas outlet and formed with a plurality of adjustment holes to adjust distribution of the process gas. As an embodiment, the outer end of the baffle may be in sealing contact with the inner side surface of the top plate and the inner side surface of the bottom plate. As an embodiment, the baf