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CN-122013155-A - Film forming equipment, air inlet device of film forming equipment and spray plate of film forming equipment

CN122013155ACN 122013155 ACN122013155 ACN 122013155ACN-122013155-A

Abstract

The application discloses film forming equipment, an air inlet device of the film forming equipment and a spray plate of the film forming equipment, wherein the spray plate is applied to the air inlet device of the film forming equipment and is provided with a central plate section and an edge plate section, the projection of the central plate section can cover the projection of an air inlet hole of the air inlet device along the normal direction of the spray plate, the central plate section and the edge plate section are both provided with spray holes, the spray holes are multi-section holes and comprise throat sections and outlet sections, the outlet sections are positioned on the downstream side of the throat sections, the flow area of the throat sections is smaller than the flow area of the outlet sections, and the depth of the outlet sections of the spray holes of the central plate section is smaller than the depth of the outlet sections of the spray holes of the edge plate sections. The spraying plate can improve the uniformity of the film thickness of the substrate so as to improve the yield of products.

Inventors

  • YANG SHIMENG
  • SONG GUANGHUA
  • YOU YUWEN

Assignees

  • 江苏微导纳米科技股份有限公司

Dates

Publication Date
20260512
Application Date
20260415

Claims (15)

  1. 1. A shower plate of a film forming apparatus, characterized in that the shower plate (3100) is applied to an air intake device (3000) of the film forming apparatus, the shower plate (3100) has a center plate section (3110) and an edge plate section (3120), and a projection of the center plate section (3110) can cover a projection of an air intake hole (3210) of the air intake device (3000) along a normal direction of the shower plate (3100); The center plate section (3110) and the edge plate section (3120) are both provided with spray holes (3130), the spray holes (3130) are multi-section holes, each of which comprises a throat section (3131) and an outlet section (3132), the outlet sections (3132) are positioned on the downstream side of the throat section (3131), the flow area of the throat section (3131) is smaller than that of the outlet sections (3132), and the depth of the outlet sections (3132) of the spray holes (3130) of the center plate section (3110) is smaller than that of the outlet sections (3132) of the spray holes (3130) of the edge plate section (3120).
  2. 2. The shower plate of a film forming apparatus according to claim 1, wherein the edge plate section (3120) includes at least two sub-plate sections (3121) in a direction away from the center plate section (3110), each sub-plate section (3121) being provided with the shower hole (3130); And, in each of the segment (3121), a depth of the outlet section (3132) of the shower hole (3130) of the segment (3121) relatively close to the center plate segment (3110) is smaller than a depth of the outlet section (3132) of the shower hole (3130) of the segment (3121) relatively far from the center plate segment (3110).
  3. 3. The shower plate of a film forming apparatus according to claim 2, wherein a relation between a depth H 0 of the outlet section (3132) of the shower hole (3130) of the sub-plate section (3121) farthest from the center plate section (3110) and a thickness T of the shower plate (3100) among the sub-plate sections (3121) satisfies: H 0 =0.5T~0.8T。
  4. 4. A shower plate of a film forming apparatus according to claim 3, wherein a relation between a depth H 0 of the outlet section (3132) of the shower hole (3130) of the sub-plate section (3121) furthest from the center plate section (3110) and a thickness T of the shower plate (3100) in each of the sub-plate sections (3121) satisfies: H 0 =0.55T~0.76T。
  5. 5. The shower plate of the film forming apparatus according to claim 4, wherein a relation between a depth H 0 of the outlet section (3132) of the shower hole (3130) of the sub-plate section (3121) farthest from the center plate section (3110) and a thickness T of the shower plate (3100) among the sub-plate sections (3121) satisfies: H 0 =0.6T~0.7T。
  6. 6. The shower plate of a film forming apparatus according to claim 1, wherein a relation between a depth H 0 ′ of the outlet section (3132) of the shower hole (3130) of the center plate section (3110) and a thickness T of the shower plate (3100) satisfies: H 0 ′ =0.4T~0.6T。
  7. 7. The shower plate of a film forming apparatus as claimed in any one of claims 1 to 6, wherein the shower holes (3130) are two-stage holes; the outlet section (3132) is a constant diameter hole section, or at least part of the outlet section (3132) is gradually expanded along the direction away from the throat section (3131).
  8. 8. The shower plate of any one of claims 1 to 6, wherein the number of segments of the shower holes (3130) is 3 or more, the shower holes (3130) further include an inlet segment (3133), the inlet segment (3133) is located on an upstream side of the throat segment (3131), and a flow area of the inlet segment (3133) is larger than a flow area of the throat segment (3131).
  9. 9. The shower plate of a film forming apparatus as claimed in claim 8, wherein the outlet section (3132) comprises at least two orifice sections (3132A); Of each of the orifice segments (3132A), the orifice segment (3132A) relatively closer to the throat segment (3131) has a smaller flow area than the orifice segment (3132A) relatively farther away.
  10. 10. The shower plate of a film forming apparatus as claimed in claim 9, wherein at least one of the orifice segments (3132A) is an equal diameter orifice segment.
  11. 11. The shower plate of a film forming apparatus according to claim 9, wherein at least part of at least one of the orifice segments (3132A) is provided in a diverging manner in a direction away from the throat section (3131) in each of the orifice segments (3132A).
  12. 12. An air inlet device of a film forming apparatus, characterized by comprising a shower plate (3100) of the film forming apparatus according to any one of claims 1 to 11.
  13. 13. The air inlet device of a film forming apparatus according to claim 12, wherein the air inlet device (3000) further comprises an air inlet plate (3200), the air inlet plate (3200) being provided with an air inlet hole (3210), the air inlet plate (3200) and the shower plate (3100) being butted along a normal direction of the shower plate (3100).
  14. 14. Film forming apparatus, characterized by comprising an air inlet device (3000) of the film forming apparatus according to claim 12 or 13.
  15. 15. The film forming apparatus according to claim 14, further comprising a cabinet (1000) and a carrying device (2000), wherein a reaction chamber (1300) is formed inside the cabinet (1000), the carrying device (2000) and the air inlet device (3000) are both disposed in the reaction chamber (1300), the carrying device (2000) and the air inlet device (3000) are disposed opposite to each other along a normal direction of the shower plate (3100), and the carrying device (2000) is configured to carry a substrate.

Description

Film forming equipment, air inlet device of film forming equipment and spray plate of film forming equipment Technical Field The application relates to the technical field of photovoltaic equipment, in particular to film forming equipment, an air inlet device of the film forming equipment and a spray plate of the film forming equipment. Background With increasing productivity, the size of shower plates of film forming apparatuses such as plasma enhanced chemical Vapor Deposition (PLASMA ENHANCED CHEMICAL Vapor Deposition (PECVD)) apparatuses is also increasing, for example, for square shower plates, the single side size of the shower plate may be up to 2 meters. Under the condition, no matter what gas feeding scheme is adopted by the spray plate, the gas flow rate at each spray hole of the spray plate is greatly different, especially at some corners of the spray plate, the flow rate of process gas is obviously reduced, so that the film thickness uniformity difference of film forming on the surface of the substrate is large, and the application requirement is difficult to meet. Therefore, how to provide a solution to overcome or alleviate the above-mentioned drawbacks is still a technical problem to be solved by those skilled in the art. Disclosure of Invention The application aims to provide film forming equipment, an air inlet device of the film forming equipment and a spray plate of the film forming equipment, which can improve the film thickness uniformity of a substrate so as to improve the product yield. In order to solve the technical problems, in a first aspect, the application provides a spray plate of film forming equipment, which is applied to an air inlet device of the film forming equipment, wherein the spray plate is provided with a central plate section and an edge plate section, the projection of the central plate section can cover the projection of an air inlet hole of the air inlet device along the normal direction of the spray plate, the central plate section and the edge plate section are both provided with spray holes, the spray holes are multi-section holes and comprise throat sections and outlet sections, the outlet sections are positioned on the downstream side of the throat sections, the flow area of the throat sections is smaller than the flow area of the outlet sections, and the depth of the outlet sections of the spray holes of the central plate section is smaller than the depth of the outlet sections of the spray holes of the edge plate sections. In an embodiment of the application, the shower plate comprises a center plate section and an edge plate section, the depth of the outlet section of the shower hole of the center plate section being smaller than the depth of the outlet section of the shower hole of the edge plate section. Therefore, the hollow cathode effect at the outlet section of the edge plate section is stronger than that of the outlet section of the central plate section, so that plasma can be better enriched at the edge plate section to have adverse effects on the flow of the flushing process gas at the edge plate section, the distribution uniformity of the plasma at each position of the spraying plate can be improved, the film thickness uniformity of the substrate surface can be improved, and the product yield can be improved. In some embodiments, the edge plate segments include at least two sub-plate segments in a direction away from the center plate segment, each of the sub-plate segments being provided with the spray holes, and a depth of the outlet segment of the sub-plate segment that is relatively closer to the center plate segment than a depth of the outlet segment of the spray holes of the sub-plate segment that is relatively farther from the center plate segment. In some embodiments, the depth H 0 of the outlet section of the shower hole of the sub-plate section furthest from the center plate section and the thickness T of the shower plate in each sub-plate section satisfy the relationship of H 0 =0.5t to 0.8t. In some embodiments, the depth H 0 of the outlet section of the shower hole of the sub-plate section furthest from the center plate section and the thickness T of the shower plate in each sub-plate section satisfy the relationship of H 0 = 0.55T-0.76T. In some embodiments, the depth H 0 of the outlet section of the spray hole of the sub-plate section furthest from the center plate section and the thickness T of the spray plate in each sub-plate section satisfy the following relationship of H 0 = 0.6T-0.7T. In some embodiments, the relationship between the depth H 0′ of the outlet section of the shower hole of the center plate section and the thickness T of the shower plate is H 0′ = 0.4t-0.6T. In some embodiments, the spray holes are two-stage holes, the outlet section is an equal-diameter hole section, or at least part of the outlet section is gradually expanded along the direction away from the throat section. In some embodiments, the number of