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CN-122015005-A - Gas transmission structure and gas inlet system of semiconductor device

CN122015005ACN 122015005 ACN122015005 ACN 122015005ACN-122015005-A

Abstract

Embodiments of the present disclosure provide a gas delivery structure and a gas inlet system for a semiconductor device. The gas transmission structure comprises at least two flow paths for gas circulation, wherein each flow path is independently communicated with a gas chamber, at least two flow paths share the same electromagnetic valve group, each flow path comprises a respective normally closed valve, the electromagnetic valve group is used for controlling gas channels of the electromagnetic valve group to correspondingly change according to different control signals, and the on-off state of the normally closed valve is controlled based on the change of the gas channels, wherein under the condition that any one gas channel is conducted, only the normally closed valve of the flow path corresponding to the any gas channel is controlled to be in an on state, and the interlocking of a plurality of flow paths is realized. The embodiment scheme realizes the interlocking among a plurality of flow paths, ensures that different flow paths are not conducted simultaneously, ensures the safety of the gas in the use process, does not need to change the number of required valve blocks, does not need to replace normally closed valves, does not influence surrounding parts, and has smaller logic influence compared with an interlocking-free circuit.

Inventors

  • SUN JINGYI

Assignees

  • 北京北方华创微电子装备有限公司

Dates

Publication Date
20260512
Application Date
20241105

Claims (10)

  1. 1. The gas transmission structure is characterized by comprising at least two flow paths for gas circulation, wherein each flow path is independently communicated with a gas chamber, and the at least two flow paths share the same electromagnetic valve group; The electromagnetic valve group is used for controlling the gas channels of the electromagnetic valve group to correspondingly change step by step according to different control signals, and controlling the switching state of the normally closed valve based on the change of the gas channels, wherein under the condition that any one gas channel is conducted, only the normally closed valve of a flow path corresponding to the any one gas channel is controlled to be in an open state.
  2. 2. The gas delivery structure of claim 1, wherein the solenoid valve block comprises a plurality of valve blocks, the control signal comprises a first control signal, the plurality of valve blocks are multi-stage valve blocks, the multi-stage valve blocks comprise a primary valve block; the primary valve block is used as a total control valve of the valve blocks behind the primary valve block and used for controlling the opening or closing of the gas channel of the primary valve block according to the first control signal so as to control the opening or closing condition of the valve blocks behind the primary valve block; And any one stage of valve block behind the one stage of valve block is used for controlling the gas channel of the any one stage of valve block to be closed or alternatively opened according to a control signal corresponding to the any one stage of valve block and the opening or closing condition of the gas channel of the previous stage of valve block, and controlling the opening and closing state of the normally closed valve of the flow path based on the condition that the gas channel of the any one stage of valve block is closed or alternatively opened.
  3. 3. The gas delivery structure of claim 2, wherein the first control signal comprises a first signal and a second signal, the plurality of valve blocks comprises a first valve block, the first valve block is the primary valve block; The first valve block is used for controlling the gas channel of the first valve block to be opened under the condition of receiving the first signal, and controlling the gas channel of the first valve block to be closed under the condition of receiving the second signal, so that a plurality of flow paths behind the first-stage valve block are closed.
  4. 4. The gas delivery structure of claim 2, wherein the control signal further comprises a second control signal, the any one-stage valve block comprising a two-stage valve block; The second-stage valve block is used for controlling the gas channel of the second-stage valve block to be closed or alternatively opened according to the second control signal and the opening or closing condition of the gas channel of the first-stage valve block, and controlling the opening and closing state of the normally closed valve of the flow path based on the closing or alternatively opened condition of the gas channel of the second-stage valve block.
  5. 5. The gas delivery structure according to claim 4, wherein the second control signal comprises a third signal and a fourth signal, the plurality of valve blocks further comprises a second valve block, the second valve block is the second valve block, the flow path comprises a first flow path and a second flow path, the first flow path comprises a first normally closed valve, the second flow path comprises a second normally closed valve, and the second valve block is used for controlling the first flow path and the second flow path to be closed or alternatively opened; the second valve block is used for controlling the first gas channel and the second gas channel in the second valve block to be closed under the condition that the primary valve block is closed, so that the first flow path and the second flow path are closed; the second valve block is used for controlling the first gas channel to be opened and the second gas channel to be closed under the condition that the third signal is received, and ventilation is carried out through the first gas channel, so that the first normally-closed valve is opened, the first flow path is conducted, and the second flow path is closed; the second valve block is used for controlling the first gas channel to be closed and the second gas channel to be opened under the condition that the fourth signal is received, ventilation is carried out through the second gas channel, so that the second normally-closed valve is opened, the second flow path is conducted, and the first flow path is closed.
  6. 6. The gas delivery structure of claim 4, wherein the control signal further comprises a third control signal, the any one stage valve block comprising a three stage valve block; The third-stage valve block is used for controlling the gas channel of the third-stage valve block to be closed or alternatively opened according to the third control signal and the opening or closing condition of the gas channel of the second-stage valve block, and controlling the opening and closing state of the normally closed valve of the flow path based on the condition that the gas channel of the third-stage valve block is closed or alternatively opened.
  7. 7. The gas transmission structure according to claim 6, wherein the second control signal includes a fifth signal and a sixth signal, the third control signal includes a seventh signal and an eighth signal, the plurality of valve blocks further includes a third valve block and a fourth valve block, the third valve block is the second-stage valve block, the fourth valve block is the third-stage valve block, the flow path includes a third flow path, a fourth flow path, and a fifth flow path, the third flow path includes a third normally closed valve, the fourth flow path includes a fourth normally closed valve, the fifth flow path includes a fifth normally closed valve, the second-stage valve block is used for controlling conduction or closure of the third flow path, and the third-stage valve block is used for controlling total or alternative conduction of the fourth flow path and the fifth flow path; The third valve block is used for controlling the third gas channel and the fourth gas channel in the third valve block to be closed under the condition that the primary valve block is closed, so that the third flow path, the fourth flow path and the fifth flow path are closed; the third valve block is used for controlling the third gas channel to be opened and the fourth gas channel to be closed under the condition that the fifth signal is received, and the third normally-closed valve is opened and the third flow path is communicated through ventilation of the third gas channel; the third valve block is used for controlling the third gas channel to be closed and the fourth gas channel to be opened under the condition that the sixth signal is received, and the fourth valve block is ventilated through the fourth gas channel; the fourth valve block is used for controlling the fifth gas channel and the sixth gas channel in the fourth valve block to be closed under the condition that the second-stage valve block is closed, so that the fourth flow path and the fifth flow path are closed; The fourth valve block is used for controlling the fifth gas channel to be opened and the sixth gas channel to be closed under the condition that the seventh signal is received, and the fourth normally-closed valve is opened, the fourth flow path is communicated and the fifth flow path is closed through ventilation of the fifth gas channel; The fourth valve block is configured to control the fifth gas channel to be closed, the sixth gas channel to be opened, vent the sixth gas channel, so that the fifth normally closed valve is opened, the fifth flow path is turned on, and the fourth flow path is turned off when the eighth signal is received.
  8. 8. The gas delivery structure of claim 2, wherein the one-stage valve block is a two-position three-way valve, and any one-stage valve block following the one-stage valve block is a double three-position four-way valve.
  9. 9. The gas delivery structure of any one of claims 1-8, wherein each of the flow paths comprises any one or more of a hand valve, a filter, and a flow controller.
  10. 10. A gas inlet system for a semiconductor device, comprising a gas delivery structure according to any one of claims 1-9.

Description

Gas transmission structure and gas inlet system of semiconductor device Technical Field The present disclosure relates to the field of semiconductor technologies, and in particular, to a gas transmission structure and an air intake system of a semiconductor device. Background Semiconductor devices typically use gases to perform deposition processes by chemical reaction to form solids, and gases are used to perform chamber cleaning by etching. One semiconductor device is often designed to be compatible with a variety of similar processes, and therefore, the variety of gases introduced is also large. Unexpected gas chemistry may lead to the formation of solids by chemical reactions at piping or other unexpected locations, leading to equipment failure. The violent reaction generated by the meeting of the highly oxidizing and reducing gases may cause explosion, thereby causing safety accidents. It is therefore necessary to provide an interlock so that some gases are not allowed to open at the same time throughout. That is, the gas is mutually exclusive, one path is opened, and the corresponding other part of the gas paths are closed. The software interlock has the characteristic of good flexibility, but is easy to edit and trigger by mistake because of the flexibility, so that setting errors are generated. Disclosure of Invention Embodiments of the present disclosure provide a gas delivery structure and a gas inlet system for a semiconductor device. In a first aspect, an embodiment of the present disclosure provides a gas transmission structure, including at least two flow paths for gas circulation, each of the flow paths being independently in communication with a gas chamber, the at least two flow paths sharing a same set of solenoid valve blocks; The electromagnetic valve group is used for controlling the gas channels of the electromagnetic valve group to correspondingly change according to different control signals, and controlling the switching state of the normally closed valve based on the change of the gas channels, wherein when any one gas channel is conducted, only the normally closed valve of the flow path corresponding to the any one gas channel is controlled to be in an open state. In a second aspect, an embodiment of the present disclosure provides an air intake system of a semiconductor device, which includes the gas delivery structure. The embodiment of the disclosure comprises at least two flow paths for gas circulation, wherein each flow path is independently communicated with a gas chamber, the at least two flow paths share the same electromagnetic valve group, each flow path comprises a respective normally closed valve, the electromagnetic valve group is used for controlling own gas channels step by step to correspondingly change according to different control signals, and the on-off state of the normally closed valves is controlled based on the change of the gas channels, wherein under the condition that any one gas channel is conducted, only the normally closed valve of the flow path corresponding to any one gas channel is controlled to be in an on state. Through this embodiment scheme, can realize the interlocking between the multiple flow paths through the hardware, ensure that different flow paths can not switch on simultaneously, guaranteed the security of gas use to compare with no interlock circuit, the valve piece that need not change, the normal close valve of need not changing, the surrounding parts of influence, the logic influence is less. Drawings In the drawings of the embodiments of the present disclosure: FIG. 1 is a schematic diagram of a related art gas flow path; Fig. 2 is a schematic view of 3 flow paths according to an embodiment of the disclosure; FIG. 3 is a schematic view of 2 flow paths provided in an embodiment of the present disclosure; fig. 4 is a schematic diagram of a control structure of an electromagnetic valve set according to an embodiment of the disclosure; FIG. 5 is a schematic diagram of a two-position three-way valve provided in an embodiment of the present disclosure; FIG. 6 is a schematic diagram of a dual three-position four-way valve provided by an embodiment of the present disclosure; FIG. 7 is a schematic diagram of the structure of a primary valve block and a secondary valve block according to an embodiment of the present disclosure; FIG. 8 is a schematic control diagram of a normally closed diaphragm valve 112 provided in an embodiment of the present disclosure in a conducting condition; FIG. 9 is a control schematic diagram of a normally closed diaphragm valve 122 provided in an embodiment of the present disclosure in a conducting condition; FIG. 10 is a schematic diagram of control of a normally closed diaphragm valve 112 provided in an embodiment of the present disclosure in a conducting condition, with a valve block 303 not conducting; FIG. 11 is a control schematic diagram of the valve block 303 in the case of venting provided by an embodim