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CN-122015652-A - Gate line width measuring method and measuring device

CN122015652ACN 122015652 ACN122015652 ACN 122015652ACN-122015652-A

Abstract

The application provides a grid line width measuring method and a measuring device, which can be widely applied to the technical field of photovoltaic measurement, wherein the grid line width measuring method comprises the steps of obtaining the shape parameter of a grid line to be measured, adjusting the measuring parameter of a first measuring unit to be a preset measuring parameter if the shape parameter is in a preset parameter interval, and measuring the line width of the grid line to be measured under the preset measuring parameter through the first measuring unit to obtain the measured line width; the preset parameter interval comprises one or more of a preset depth-to-width ratio interval, a preset geometric characteristic interval and a preset side wall angle interval of the cross section of the grid line, the measured line width is calibrated through a calibration model to obtain a calibrated line width of the grid line to be measured, the calibration model is a mapping relation between a first measurement unit and a second measurement unit, and the measurement accuracy of the grid line width of the grid line to be measured by the second measurement unit is higher than that of the first measurement unit. The method is beneficial to improving the accuracy of measuring the line width of the grid line and improving the measuring efficiency.

Inventors

  • PENG MIN

Assignees

  • 通威太阳能（成都）有限公司

Dates

Publication Date
20260512
Application Date
20251229

Claims (10)

  1. 1. The method for measuring the width of the grid line is characterized by comprising the following steps of: Obtaining a morphology parameter of a grid line to be measured, and if the morphology parameter is in a preset parameter interval, adjusting a measurement parameter of a first measurement unit to be a preset measurement parameter, and measuring the line width of the grid line to be measured through the first measurement unit to obtain a measurement line width, wherein the preset parameter interval comprises one or more of a preset depth-to-width ratio interval, a preset geometric characteristic interval and a preset side wall angle interval of the section of the grid line; And calibrating the measured line width through a calibration model to obtain the calibrated line width of the grid line to be measured, wherein the calibration model is a mapping relation between the first measurement unit and the second measurement unit, and the measurement accuracy of the second measurement unit to the grid line width of the grid line to be measured is higher than that of the first measurement unit to the grid line width of the grid line to be measured.
  2. 2. The method for measuring a width of a gate line according to claim 1, wherein before the measuring the width of the gate line by the calibration model to obtain the measured width of the gate line, the method further comprises: Performing line width measurement on each first grid line in the grid line sample set through the second measurement unit to obtain a sample reference value; Performing line width measurement on each first grid line under a plurality of measurement parameters through the first measurement unit to obtain a sample measurement value under each measurement parameter; Carrying out association analysis on the sample measured value under each measuring parameter and the corresponding sample reference value, and establishing an association model under each measuring parameter; and screening and optimizing the plurality of measurement parameters and the plurality of correlation models, wherein the measurement parameters obtained by screening are used as preset measurement parameters, and the correlation models obtained by screening are used as calibration models.
  3. 3. The method of claim 2, wherein the plurality of measurement parameters include a first edge detection threshold and a second edge detection threshold, the correlation model includes a correlation formula and a correlation chart, the performing correlation analysis on the sample measurement value under each measurement parameter and the corresponding sample reference value, and establishing the correlation model under each measurement parameter includes: performing linear regression analysis on the sample measured value and the corresponding sample reference value under the first edge detection threshold to obtain a first association formula; performing linear regression analysis on the sample measured value and the corresponding sample reference value under the second edge detection threshold to obtain a second association formula; Performing fitting analysis on the sample measured value and the corresponding sample reference value under the first edge detection threshold to obtain a first association chart; And carrying out fitting analysis on the sample measured value based on the second edge detection threshold value and the corresponding sample reference value to obtain a second association chart.
  4. 4. The method for measuring the line width of a gate line according to claim 2, wherein the filtering and optimizing process is performed on a plurality of correlation models, and comprises: measuring each second grid line in the grid line verification set under the same measurement parameters to obtain the measurement line width of each second grid line; Calibrating the measured line width of each second grid line through a plurality of correlation models to obtain the calibrated line width of each correlation model to the second grid line; Obtaining a real line width of each second grid line, and comparing the calibrated line width of each correlation model with the real line width to obtain a comparison result of each correlation model, wherein the comparison result is used for representing the calibration precision of the correlation model; And carrying out first sorting on the calibration precision of the plurality of correlation models according to the comparison result, and screening the correlation model ranked first in the first sorting as a calibration model.
  5. 5. The method for measuring a width of a gate line according to claim 2, wherein the step of performing the screening and optimizing process on the plurality of measurement parameters comprises: Calibrating sample measured values under a plurality of measurement parameters through the calibration model to obtain sample predicted values under the plurality of measurement parameters, and determining evaluation values of the plurality of measurement parameters according to the sample predicted values of the plurality of measurement parameters and corresponding sample reference values, wherein the evaluation values are used for representing the calibration accuracy of the calibration model under different measurement parameters; And carrying out second sorting on the evaluation values of the plurality of measurement parameters, and screening the measurement parameters corresponding to the evaluation values ranked first in the second sorting to serve as preset measurement parameters.
  6. 6. The method of claim 5, wherein the calibration model includes a first correlation formula, and wherein determining the evaluation values of the plurality of measurement parameters based on the sample prediction values and the corresponding sample reference values of the plurality of measurement parameters includes: determining a first decision coefficient of the first association formula according to the sample predicted values and the corresponding sample reference values of the plurality of measurement parameters, and taking the first decision coefficient as an evaluation value; Or determining a first residual error of the first association formula according to the sample predicted values and the corresponding sample reference values of the plurality of measurement parameters, and taking the first residual error as an evaluation value.
  7. 7. The method for measuring the line width of the gate line according to claim 2, wherein before the line width of each first gate line is measured by the first measuring unit under a plurality of measurement parameters to obtain a sample measurement value under each measurement parameter, the method further comprises: Marking a measuring position on each first grid line so that the first measuring unit can measure the line width of the measuring position of each first grid line under a plurality of measuring parameters, wherein the measuring position is the measuring position of the first measuring unit for line width measurement.
  8. 8. The method for measuring the width of a gate line according to claim 2, characterized in that the method further comprises: obtaining a design line width of a grid line to be measured; And determining a calibration model according to a preset line width interval to which the design line width belongs.
  9. 9. The method for measuring the width of a gate line according to claim 2, characterized in that the method further comprises: And if the morphological parameters are not in the preset parameter interval, measuring the line width of the grid line to be measured through a first measuring unit to obtain a measuring result.
  10. 10. A gate line width measuring apparatus, characterized in that the gate line width measuring apparatus performs line width measurement on a gate line by the gate line width measuring method according to any one of claims 1 to 9.

Description

Gate line width measuring method and measuring device Technical Field The application relates to the technical field of photovoltaic measurement, in particular to a grid line width measurement method and a measurement device. Background In the current manufacturing field of crystalline silicon solar cells, the fineness and uniformity of electrode grid lines are important for improving the cell conversion efficiency and reducing the cost. The traditional screen printing technology is mature and reliable, but is limited by high cost and line width of silver paste, so that the requirements of high-efficiency solar cells are difficult to meet. In recent years, copper-plated electrode technology has attracted much attention as a low-cost, high-efficiency alternative, which enables finer, higher aspect ratio gate line appearances, significantly reducing light shielding losses and series resistance, and thus improving battery efficiency. However, the application of this leading edge technique suffers from bottlenecks in process monitoring. In particular, for metal gate lines having steep side walls (side wall angles greater than 80 °) and approximately rectangular cross sections (e.g., electroplated copper gate lines), accurate measurement of line widths becomes complicated and difficult. Scanning Electron Microscope (SEM) is used as a high-precision measuring tool, can provide nanoscale resolution, is a gold standard for measuring the width of a steep grid line, but is not suitable for batch test and online monitoring because of complex operation, time consumption and certain destructiveness on a sample. In contrast, three-dimensional laser microscopy (3D laser microscopy) is an ideal measurement option due to its high speed, non-destructive, non-contact properties. In practical applications, however, for a grid line with a steep structure, the 3D laser microscope measurement result shows significant systematic errors, which ultimately results in a larger measurement value. Disclosure of Invention The application mainly aims to provide a method and a device for measuring the line width of a grid line, which at least solve the problems of complicated measurement or low measurement accuracy in the prior art. In order to achieve the above purpose, according to one aspect of the present application, a method for measuring a line width of a gate line is provided, which includes obtaining a profile parameter of the gate line to be measured, adjusting a measurement parameter of a first measurement unit to be a preset measurement parameter if the profile parameter is in a preset parameter interval, and measuring the line width of the gate line to be measured by the first measurement unit under the preset measurement parameter to obtain a measured line width, wherein the preset parameter interval includes one or more of a preset aspect ratio interval, a preset geometric feature interval and a preset sidewall angle interval of a cross section of the gate line, calibrating the measured line width by a calibration model to obtain a calibrated line width of the gate line to be measured, wherein the calibration model is a mapping relation between the first measurement unit and a second measurement unit, and the measurement accuracy of the line width of the gate line to be measured by the second measurement unit is higher than that of the first measurement unit. When the grid line with the preset morphology is measured, the second measuring unit with higher measuring accuracy is used for calibrating the measured line width of the first measuring unit to obtain the calibrated line width, so that the accuracy of measuring the line width of the grid line is improved, and meanwhile, the first measuring unit with lower measuring complexity is used for measuring the line width of the grid line, so that the measuring efficiency is improved. Optionally, before calibrating the measured line width by using the calibration model to obtain the calibrated line width of the gate line to be measured, the method further includes: Performing line width measurement on each first grid line in the grid line sample set through the second measurement unit to obtain a sample reference value; Performing line width measurement on each first grid line under a plurality of measurement parameters through the first measurement unit to obtain a sample measurement value under each measurement parameter; Carrying out association analysis on the sample measured value under each measuring parameter and the corresponding sample reference value, and establishing an association model under each measuring parameter; and screening and optimizing the plurality of measurement parameters and the plurality of correlation models, wherein the measurement parameters obtained by screening are used as preset measurement parameters, and the correlation models obtained by screening are used as calibration models. Optionally, the plurality of measurement parameters include a fi