CN-122016058-A - Wavefront aberration measuring method for terminal optical component simplification system

CN122016058ACN 122016058 ACN122016058 ACN 122016058ACN-122016058-A

Abstract

The invention provides a wavefront aberration measuring method for a simplified system of a terminal optical component according to an inverse Hartmann wavefront detection principle. The method comprises the steps of forming a wavefront aberration measuring system by using 1 camera and 1 display, displaying phase shift stripes on the display to serve as a structured light source, acquiring stripe patterns modulated and emitted by a system to be measured by the camera, solving the stripe patterns based on a phase shift algorithm to obtain phase information, further obtaining display coordinates, obtaining the coordinates of an emergent face of the system to be measured by combining system calibration parameters through ray tracing, and finally obtaining the slope of actual emergent rays of the optical system to be measured, further obtaining wavefront aberration. The device has the advantages of simplicity, low detection cost, high precision and high resolution.

Inventors

LI DAHAI
FENG YU
WANG RUIYANG
ZHANG ZEKUN
Ge Renhao
HU WEI
Chen Manwei

Assignees

四川大学

Dates

Publication Date: 20260512
Application Date: 20241111

Claims (1)

1. A wavefront aberration measuring method for a simplified system of a terminal optical component comprises the steps of forming a wavefront aberration measuring system by using 1 camera and 1 display, acquiring a fringe pattern modulated and emergent by the system to be measured, solving the fringe pattern based on a phase shift algorithm to obtain phase information, further obtaining display coordinates, establishing an experimental model in the computer by combining system calibration parameters, obtaining the coordinates of an emergent surface of the system to be measured through ray tracing, finally obtaining the slope of actual emergent rays of the optical system to be measured, and further obtaining wavefront aberration, wherein the method comprises the following steps: Step one, coaxial adjustment of camera and display Coaxial adjustment is carried out by means of a high-precision electric control displacement table provided with a point light source microscope, and firstly, the posture of a display is adjusted to be in a world coordinate system Secondly, installing a custom aperture diaphragm in front of the camera, and adjusting the position of the aperture diaphragm and the posture of the camera by using a point light source microscope to ensure that the optical axis of the camera and the display are coaxial under a world coordinate system; Step two, acquiring the incident ray direction of the system The phase shift fringe pattern is displayed on the display, under the condition that a system to be tested is not introduced, the camera shoots the fringe image of the display, and the display coordinates in the idle state are obtained by calculating the phase shift algorithm Calculating the incident ray direction under the condition that the camera is regarded as a point light source through the total working distance of the system : (1) Wherein, the Respectively is A direction cosine of the direction; Step three, obtaining the coordinates of the emergent face of the system to be tested and the coordinates of the display An experimental model is established in a computer by combining calibration parameters of the system to be tested and an experimental device, and ray tracing is carried out according to a vector refraction law and the incident ray direction to obtain the coordinates of an emergent face after the system to be tested is introduced, wherein the coordinates are respectively as follows 、 At the moment, a camera shoots a stripe image modulated by a system after being introduced into the system to be tested, and the display coordinate in the state is obtained by calculating a phase shift algorithm The optical system o wavefront aberration can be expressed as: (2) In the middle of For the spatial refractive index of the object space, Respectively the actual light and the ideal light The included angle in the direction is then used to integrate the slope data obtained by line of sight calibration by using Zernike polynomial method, and the system e wavefront aberration can be obtained by the same method 。

Description

Wavefront aberration measuring method for terminal optical component simplification system Technical Field The invention relates to a wavefront aberration measuring method of a terminal optical component simplifying device based on Transmission deflection (Transmission-Phase Measuring Deflectometry), in particular to a coaxial optical system comprising a combined transparent element such as a frequency doubling crystal. Background The terminal optical component is used as a key component of the inertial confinement fusion device and has the main functions of realizing laser transmission and frequency conversion. In the system, KDP crystals are widely used because of their excellent nonlinear optical properties and the large caliber of grown KDP crystals. However, the ideal crystal is affected by the nature and external effect, and the lens itself can cause aberration in the processing process, so that the final emergent wavefront is distorted to generate aberration. Wavefront aberration is used as an important index of the design rationality of the optical system, can provide abundant feedback information for the design and processing of the optical system, and especially for a large optical system with a complex structure such as a terminal optical assembly, the problems of element design and assembly and calibration can cause the system to be unable to operate normally. The primary wavefront aberration measurement method at present is interferometer measurement, such as Twyman-Green interferometer, fizeau interferometer and the like. Interferometer accuracy is typically high, but is affected by reference surface accuracy, and is limited by the wavelength of the laser and the spectral sensitivity of the sensor, and the low flexibility is not suitable for on-line or on-line measurement, which makes it limited in-situ applications. And secondly, the method is based on obtaining wavefront slope measurement, such as Hartmann detection and Shack-Hartmann wavefront sensor, wherein the resolution of the former is limited, the precision of the latter is limited by a micro-lens array process, and the dynamic range is low. The moire deflection method has strong anti-interference capability, but the accuracy can be influenced by the quality of the grating, the star point inspection can be influenced by the quality of a light source and the environment. The method comprises the steps of measuring wavefront aberration of a lens by utilizing transmission phase measurement deflection operation, measuring wavefront aberration of an imaging lens based on transmission phase measurement deflection operation, measuring wavefront aberration of an industrial glass tube by utilizing transmission phase measurement deflection operation, obtaining wavefront aberration of a transmission element caused by machining errors, realizing high-precision wavefront detection of a free-form surface spectacle lens by utilizing transmission phase measurement deflection operation, judging whether production requirements are met, obtaining full-field information of a gradient refractive index lens by utilizing transmission phase measurement deflection operation, and providing guidance for lens manufacturing production. Disclosure of Invention In view of the above problems, the present invention proposes a wavefront aberration measuring method for a simplified device of a terminal optical component based on transmission deflection. The method comprises the steps of forming a wavefront aberration measuring system by using 1 camera and 1 display, displaying phase shift stripes on the display to serve as a structured light source, collecting stripe patterns modulated and emitted by a system to be measured by the camera, solving the stripe patterns based on a phase shift algorithm to obtain phase information, further obtaining display coordinates, establishing an experimental model in a computer by combining system calibration parameters, obtaining the coordinates of an emergent surface of the system to be measured through ray tracing, and finally obtaining the slope of actual emergent rays of the optical system to be measured, further obtaining wavefront aberration. The device has the advantages of simplicity, low detection cost, high precision and high resolution. The technical scheme adopted by the invention is a wavefront aberration measuring method of a terminal optical component simplified system based on transmission deflection operation. According to the inverse Hartmann wavefront detection principle, the main factors of the wavefront distortion of the system (KDP crystal and focusing lens, which are called the system to be detected for short hereinafter) are examined, and a transmission deflection operation wavefront aberration measuring system is established. Based on the principle of inverse Hartmann wavefront detection, a camera is regarded as a point light source, and light rays are regarded as being emitted from the center of an entrance