CN-122016274-A - Liquid verification tool and method for semiconductor CVD equipment spray header after machining

CN122016274ACN 122016274 ACN122016274 ACN 122016274ACN-122016274-A

Abstract

The invention discloses a liquid verification tool and a liquid verification method after processing a spray header of semiconductor CVD equipment, which relate to the technical field of semiconductor manufacturing and comprise a liquid conveying component, a liquid filtering component and a detection tool; the liquid conveying assembly comprises a booster pump, a stop valve, a pressure reducing valve, a pressure gauge and a flowmeter which are sequentially connected through pipelines, the liquid filtering assembly comprises a filter arranged at the output end of the flowmeter, the detection tool comprises an upper cover tool, a sealing gasket, a spraying disc and a fixing piece, the spraying head is fixed between the upper cover tool and the spraying disc through the fixing piece, the sealing gasket is arranged between the spraying disc and the spraying head, the upper cover tool is connected with the filter through the pipelines, uniform flow holes are distributed on the spraying disc, and a liquid flow uniformity detection unit is arranged below the spraying disc. The full-flow integration from liquid supply, filtration and detection is realized, the uniformity of liquid flow after processing of the spray header can be effectively verified, and key guarantee is provided for the quality of the semiconductor CVD process.

Inventors

MA JIAQI
LIU KAI
MIAO NING
LI HAI
LI LUBO
ZHANG XUEJIN
HE RONG

Assignees

西安航天远征流体控制股份有限公司

Dates

Publication Date: 20260512
Application Date: 20260123

Claims (10)

1. The liquid verification tool after the spray header of the semiconductor CVD equipment is processed is characterized by comprising a liquid conveying component, a liquid filtering component and a detection tool (10); The liquid conveying assembly comprises a booster pump (11), a stop valve (12), a pressure reducing valve (13), a pressure gauge (14) and a flowmeter (15) which are sequentially connected through pipelines; The liquid filtering component comprises a filter (16) arranged at the output end of the flowmeter (15); The detection tool (10) comprises an upper cover tool (17), a sealing gasket (18), a spray disc (19) and a fixing piece, wherein the spray header is fixed between the upper cover tool (17) and the spray disc (19) through the fixing piece, the sealing gasket (18) is arranged between the spray disc (19) and the spray header, the upper cover tool (17) is connected with the filter (16) through a pipeline, uniform flow holes (20) are distributed on the spray disc (19), and a liquid flow uniformity detection unit is arranged below the spray disc (19).
2. The liquid verification tool after processing a shower head of a semiconductor CVD apparatus according to claim 1, wherein the filter (16) adopts a multi-stage filter structure comprising a coarse filter layer, a fine filter layer and an ultra-filter layer, wherein the coarse filter layer filters out particles with a particle size of more than 5 μm, the fine filter layer entraps impurities with a particle size of 1-5 μm, and the ultra-filter layer entraps impurities with a particle size of less than 1 μm.
3. The liquid verification tool after processing of the spray header of the semiconductor CVD equipment according to claim 1, wherein the liquid flow uniformity detection unit comprises a liquid flow uniformity test table (21), the liquid flow uniformity test table (21) comprises a frame body (22), a guide table (23) fixed on the frame body (22), a collecting table (24) and a collecting measuring cylinder (25), the guide table (23) is rotationally connected with the collecting table (24), a flow positioning dividing component is arranged between the guide table (23) and the collecting table (24), and the collecting measuring cylinder (25) is provided with a plurality of flow positioning dividing components and distributed at the lower end of the collecting table (24) and is matched with the flow positioning dividing component.
4. The liquid verification tool after processing of a spray header of a semiconductor CVD device according to claim 1, wherein the flow positioning and dividing assembly comprises a plurality of flow areas (26) distributed on the flow guiding table (23), a liquid discharge pipe (27) is arranged below each flow area (26), the collecting table (24) is rotationally connected with the frame body (22), a plurality of butt joint pipes (28) are arranged on the collecting table (24), the collecting measuring cylinders (25) are located below the collecting table (24) and are in one-to-one correspondence with the butt joint pipes (28), openings are formed in the middle of the collecting table (24), and liquid discharge grooves (29) are formed below the openings.
5. The liquid verification tool after processing the shower head of the semiconductor CVD equipment according to claim 4, wherein the diversion table (23) is provided with a rotating bracket (30) and a bearing (31), and the collecting table (24) is rotatably connected to the rotating bracket (30) through the bearing (31).
6. The liquid verification tool after processing of a shower head of a semiconductor CVD apparatus according to claim 1, wherein the flowmeter (15) has a real-time data transmission function by using a communication module.
7. A verification method using the tooling of any one of claims 1 to 6, comprising the steps of: Step S1, assembling a detection device, connecting the upper cover tool (17) with the filter (16), setting a feed liquid pressure according to the requirement, primarily debugging the inlet and outlet flow, and detecting the adaptation degree of each instrument and valve; step S2, according to the matching of the to-be-detected area with the corresponding sealing gasket (18), fixing the to-be-detected spray header on the detection tool (10) through the clamping assembly, and calibrating the lower flow guide table (23) and the to-be-detected sampling area below the spray header; Step 3, starting a liquid flow supply system, starting a booster pump (11), introducing liquid into an upper cover tool (17) after filtering, enabling a spray header liquid to fall onto a collecting tray along a corresponding flow area (26) and a liquid discharge pipe (27), and falling onto a liquid discharge groove (29) along an opening for discharging, rotating the collecting tray when all small holes of a spray header outlet are in a jet state, enabling the liquid to be in an open state, enabling the liquid to enter the corresponding flow area (26) from a guide table (23) for guiding and flowing along the liquid discharge pipe (27) below, enabling a butt joint pipe (28) on the collecting tray to be aligned with the liquid discharge pipe (27) at the moment, collecting flow of the corresponding area of the spray header and falling into a collecting measuring cylinder (25) below the collecting tray, and recording the capacity of the collecting measuring cylinder (25) at the characteristic time; S4, after the collection is finished, rotating a collection disc, wherein a butt joint pipe (28) on the collection disc is staggered with a liquid discharge pipe (27), and the liquid of the spray header falls into the collection disc along a corresponding flow area (26) and the liquid discharge pipe (27) and falls into a liquid discharge groove (29) along an opening for discharge, so that statistics is not included; And S5, repeating the operation step S3 and the operation step S4, collecting the data of the measuring cylinder (25) for a plurality of times, carrying out spray header quality inspection, calculating the average value and variance of the collected liquid quality data of the plurality of spray header partitions, and comparing the average value and variance with a preset standard value to judge whether the spray header is qualified or not.
8. The method according to claim 7, wherein in step S2, the lower flow guiding table (23) is calibrated to the sampling area to be detected below the showerhead, specifically, the porous area of the showerhead is divided, so that the upstream area (26) of the flow guiding table (23) is aligned with the corresponding area on the showerhead.
9. The method for verifying liquid after processing a spray head of a semiconductor CVD device according to claim 7, wherein in the step S5, before data processing, the collected data is subjected to filtering processing, random noise in the data is removed by adopting a median filtering algorithm, the authenticity and the effectiveness of the data are ensured, meanwhile, a preset standard value is obtained by repeatedly testing a standard spray head for a plurality of times under the same test condition, statistical analysis and fitting optimization are performed on test data, and meanwhile, a reasonable fluctuation range is set in combination with the actual requirement of the semiconductor CVD process on the liquid flow performance.
10. The method according to claim 9, wherein in step S5, the showerhead is judged to be qualified if the average value is within + -5% of the set standard average value and the variance is smaller than the set maximum variance value, and the showerhead is judged to be failed if the above condition is not satisfied.

Description

Liquid verification tool and method for semiconductor CVD equipment spray header after machining Technical Field The invention relates to the technical field of semiconductor manufacturing. Background In the field of semiconductor fabrication, chemical Vapor Deposition (CVD) equipment is a critical core piece of equipment, wherein the showerhead, as a critical component in the CVD equipment, has properties that directly affect the uniformity, quality, and final performance of the deposited film. With the rapid growth of the semiconductor industry, the performance requirements for CVD showerheads are increasing. At present, a CVD showerhead is generally disc-shaped and is divided into an upper layer and a lower layer and is distributed with a porous structure, after the CVD showerhead is machined, the detection method is to detect the aperture through optical equipment, and the gas quality of the outlet of the showerhead is determined by the small-aperture quality, but the size detection cannot represent the overall performance effect of the showerhead, which often lacks of systematicness and pertinence, and cannot comprehensively and accurately detect and evaluate the key performance indexes such as the gas flow distribution of the showerhead in the actual working state, and the like of the small-aperture surface quality, the form and position tolerance, the burrs, and the like of the showerhead, so that the machined showerhead cannot meet the strict requirements of the semiconductor CVD process, and the quality of the whole CVD equipment and the yield of semiconductor manufacturing may be affected. Disclosure of Invention In order to solve the technical problems, the invention provides a liquid verification tool for a semiconductor CVD device after processing a spray header. The invention adopts the following technical scheme for realizing the purposes: a liquid verification tool after processing a spray header of a semiconductor CVD device comprises a liquid conveying component, a liquid filtering component and a detection tool; The liquid conveying component comprises a booster pump, a stop valve, a pressure reducing valve, a pressure gauge and a flowmeter which are sequentially connected through pipelines; the liquid filtering component comprises a filter arranged at the output end of the flowmeter; The detection tool comprises an upper cover tool, a sealing gasket, a spraying disc and a fixing piece, wherein the spraying head is fixed between the upper cover tool and the spraying disc through the fixing piece, the sealing gasket is arranged between the spraying disc and the spraying head, the upper cover tool is connected with the filter through a pipeline, uniform flow holes are distributed on the spraying disc, and a liquid flow uniformity detection unit is arranged below the spraying disc. According to the technical scheme, a complete liquid verification tool system is constructed, a liquid conveying component provides stable pressure through a booster pump, fluid parameters are accurately regulated and controlled through a stop valve and a pressure reducing valve, a pressure meter and a flowmeter monitor the system state in real time, a filtering component ensures the cleanliness of liquid entering a detection tool, the detection tool forms a sealing test environment through an upper cover tool, a sealing gasket and a fixing piece, the liquid flows out evenly from micropores below the spray header after flowing through the spray header, and finally the distribution performance is evaluated by a liquid flow uniformity detection unit. The scheme realizes the whole-flow integration from liquid supply, filtration to detection, can effectively verify the uniformity of liquid flow after the processing of the spray header, and provides key guarantee for the quality of the semiconductor CVD process. Further, the filter adopts a multi-stage filtering structure and comprises a coarse filtering layer, a fine filtering layer and an ultrafiltration layer, wherein the coarse filtering layer filters out particles with the particle size of more than 5 mu m, the fine filtering layer entraps impurities with the particle size of 1-5 mu m, and the ultrafiltration layer entraps impurities with the particle size of less than 1 mu m. Through the scheme, a multistage filtering structure consisting of a coarse filtering layer, a fine filtering layer and an ultrafiltration layer is adopted to sequentially remove the particle impurities larger than 5 mu m, 1-5 mu m and smaller than 1 mu m. The graded filtering design gradually improves the cleanliness of liquid, avoids the problems of easy blockage or low efficiency of single-stage filtering, protects the downstream precise spray header micropores, ensures that the detection result is not interfered by particle pollution, and remarkably improves the reliability and process consistency of verification data. Further, the liquid flow uniformity detecting unit comprises a liquid