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CN-122018060-A - Local guided mode resonance structure and preparation method thereof

CN122018060ACN 122018060 ACN122018060 ACN 122018060ACN-122018060-A

Abstract

The application provides a local guided mode resonance structure and a manufacturing method thereof, wherein the local guided mode resonance structure comprises a substrate, a reflecting layer, a dielectric layer and a microstructure array, wherein the reflecting layer is arranged on one surface of the substrate, the dielectric layer is arranged on one surface of the reflecting layer, which is far away from the substrate, the refractive index of the dielectric layer is greater than or equal to a preset refractive index threshold value, the microstructure array is embedded into the dielectric layer, the microstructure array comprises a plurality of microstructures, and a gap cavity with a sub-periodic space scale exists between two adjacent microstructures. The local guided mode resonance structure can meet the requirements of high efficiency, wide angle and narrow band.

Inventors

  • WANG SHAOWEI
  • JIA QIXIANG
  • Wang jiuxu
  • Guan Xueyu
  • LU WEI

Assignees

  • 中国科学院上海技术物理研究所

Dates

Publication Date
20260512
Application Date
20251218

Claims (10)

  1. 1. A localized guided mode resonance structure comprising: A substrate; a reflective layer disposed on a surface of the substrate; the medium layer is arranged on one surface, far away from the substrate, of the reflecting layer, and the refractive index of the medium layer is larger than or equal to a preset refractive index threshold value; the micro-structure array is embedded into the dielectric layer and comprises a plurality of micro-structures, and a gap cavity with a sub-periodic space scale exists between two adjacent micro-structures.
  2. 2. The localized guided mode resonance structure of claim 1, wherein a wavelength of incident light entering the dielectric layer via the reflective layer matches a resonance frequency of the localized guided mode resonance structure.
  3. 3. The locally guided mode resonance structure according to claim 2, wherein the width of the interstitial cavities is smaller than the wavelength of the incident light.
  4. 4. The localized guided mode resonance structure of claim 3, wherein the gap cavity has a width greater than or equal to 900 nanometers and less than or equal to 5.2 microns.
  5. 5. The localized guided mode resonance structure of claim 3, wherein the period of the microstructure array is greater than or equal to 1000 nanometers and less than or equal to 6 microns.
  6. 6. The localized guided mode resonance structure of claim 2, wherein the resonant frequency of the localized guided mode resonance structure is determined based on at least one of a material of the microstructure, a width of the microstructure, a thickness of the microstructure, a period of the microstructure array, a thickness of the dielectric layer, and a refractive index of the dielectric layer.
  7. 7. The localized guided mode resonance structure according to claim 6, wherein the width of the microstructure is positively correlated with the resonance frequency; The thickness of the microstructure and the resonance frequency are in negative correlation; the period of the microstructure array and the resonance frequency are in negative correlation; the thickness of the dielectric layer is inversely related to the resonance frequency; the refractive index of the dielectric layer is inversely related to the resonant frequency.
  8. 8. The localized guided mode resonance structure according to any one of claims 1-7, wherein the microstructure comprises at least one of a one-dimensional grating, a two-dimensional grating, and a honeycomb structure.
  9. 9. The local guided mode resonance structure according to any one of claims 1-7, wherein, The material of the substrate at least comprises silicon; the material of the reflecting layer comprises at least one of gold, aluminum, silver and platinum; the material of the dielectric layer comprises at least one of silicon, germanium, silicon dioxide and silicon nitride; The microstructure material comprises at least one of gold, aluminum, silver and platinum.
  10. 10. A method for preparing a local guided-mode resonance structure according to any one of claims 1 to 9, comprising: Depositing a reflective layer of a first thickness on a surface of a substrate; Depositing a dielectric layer with a second thickness on a surface of the reflecting layer far away from the substrate, and coating photoresist on a surface of the dielectric layer far away from the reflecting layer; exposing the photoresist according to a preset arrangement mode of a plurality of microstructures in the microstructure array to form an array pattern of the microstructure array, wherein the arrangement mode comprises a gap cavity with a sub-periodic space scale between two adjacent microstructures; etching the dielectric layer according to the array pattern to form a plurality of grooves with the second thickness; Depositing the plurality of microstructures in the plurality of grooves to obtain the local guided mode resonance structure.

Description

Local guided mode resonance structure and preparation method thereof Technical Field The application relates to the technical field of optics, in particular to a local guided mode resonance structure and a preparation method thereof. Background In modern optical technology, absorbing structures are widely used in various optical devices, such as photodetectors, photovoltaic cells, and photothermal converters. However, existing absorbent structures often have limitations in terms of absorption efficiency, incident angle dependence, bandwidth, etc., and it is difficult to meet the requirements of high efficiency, wide angle, and narrow band at the same time. Accordingly, there is a need for an absorbent structure that can meet the requirements of high efficiency, wide angle and narrow band at the same time. Disclosure of Invention In view of the above, the embodiments of the present application are directed to providing a local guided mode resonance structure and a method for manufacturing the same, which can meet the requirements of high efficiency, wide angle and narrow band at the same time. The application provides the following scheme: The first aspect provides a local guided mode resonance structure, which comprises a substrate, a reflecting layer, a dielectric layer and a microstructure array, wherein the reflecting layer is arranged on one surface of the substrate, the dielectric layer is arranged on one surface, far away from the substrate, of the reflecting layer, the refractive index of the dielectric layer is larger than or equal to a preset refractive index threshold value, the microstructure array is embedded into the dielectric layer, the microstructure array comprises a plurality of microstructures, and a gap cavity with a sub-periodic spatial scale exists between two adjacent microstructures. In one embodiment, the wavelength of the incident light entering the dielectric layer via the reflective layer matches the resonant frequency of the local guided mode resonance structure. In one embodiment, the width of the interstitial cavities is less than the wavelength of the incident light. In one embodiment, the width of the interstitial cavities is greater than or equal to 900 nanometers and less than or equal to 5.2 microns. In one embodiment, the period of the microstructure array is greater than or equal to 1000 nanometers and less than or equal to 6 microns. In one embodiment, the resonant frequency of the localized guided mode resonance structure is determined based on at least one of the material of the microstructure, the width of the microstructure, the thickness of the microstructure, the period of the microstructure array, the thickness of the dielectric layer, the refractive index of the dielectric layer. In one embodiment, the width of the microstructure is positively correlated with the resonant frequency, the thickness of the microstructure is negatively correlated with the resonant frequency, the period of the microstructure array is negatively correlated with the resonant frequency, the thickness of the dielectric layer is negatively correlated with the resonant frequency, and the refractive index of the dielectric layer is negatively correlated with the resonant frequency. In one embodiment, the microstructures include at least one of one-dimensional gratings, two-dimensional gratings, and honeycomb structures. In one embodiment, the material of the substrate comprises at least silicon, the material of the reflective layer comprises at least one of gold, aluminum, silver, and platinum, the material of the dielectric layer comprises at least one of silicon, germanium, silicon dioxide, and silicon nitride, and the material of the microstructure comprises at least one of gold, aluminum, silver, and platinum. The preparation method comprises the steps of depositing a reflecting layer with a first thickness on one surface of a substrate, depositing a dielectric layer with a second thickness on one surface of the reflecting layer far away from the substrate, coating photoresist on one surface of the dielectric layer far away from the reflecting layer, exposing the photoresist according to a preset arrangement mode of a plurality of microstructures in a microstructure array to form an array pattern of the microstructure array, wherein the arrangement mode comprises a gap cavity with a sub-period space dimension between two adjacent microstructures, etching the dielectric layer according to the array pattern to form a plurality of grooves with the second thickness, and depositing the microstructures in the plurality of grooves to obtain the local guided mode resonance structure. According to the local guided mode resonance structure and the preparation method thereof, the micro-structure array is embedded in the medium layer, the gap cavity with the sub-periodic space dimension exists between two adjacent micro-structures in the micro-structure array, a limited unit can be formed, the loc