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CN-122018062-A - Multifunctional metamaterial perfect absorber and manufacturing method thereof

CN122018062ACN 122018062 ACN122018062 ACN 122018062ACN-122018062-A

Abstract

The application relates to the technical field of electromagnetic wave absorbing devices, in particular to a multifunctional metamaterial perfect absorber and a manufacturing method thereof. The application provides a multifunctional metamaterial perfect absorber and a manufacturing method thereof, wherein the absorber comprises a silicon substrate layer, an adhesion chromium layer, a silicon dioxide film spacing layer, a gold film spacing layer, a broadband absorption super surface and a narrowband absorption super surface, wherein the broadband absorption super surface is provided with a zirconium nitride concentric ring array, the average absorption rate of the broadband absorption super surface in a visible to near infrared region is up to 97.48%, and the narrowband absorption super surface is provided with a 4X 4 square grid array formed by zirconium nitride, so that the absorber has 99.99% of ultra-high narrowband absorption and high refractive index sensitivity. The application has excellent refractive index sensing performance and high thermochemical stability of the zirconium nitride material, is suitable for the fields of solar energy collection, biological sensing, environmental protection and the like, and obviously improves the energy collection efficiency and the sensing sensitivity.

Inventors

  • HAN WEIJIA
  • ZUO YILIN
  • CHEN KAI
  • WANG SHENGXIANG

Assignees

  • 武汉纺织大学

Dates

Publication Date
20260512
Application Date
20260319
Priority Date
20251126

Claims (10)

  1. 1. A preparation method of a multifunctional metamaterial perfect absorber is characterized by comprising the following steps: Step 1, cleaning the surface of a silicon substrate layer, depositing an adhesion chromium layer on the surface of the silicon substrate layer through a thermal evaporation process, and depositing a gold target on the surface of the adhesion chromium layer by utilizing magnetron sputtering to form a gold film spacer layer; step 2, chemical vapor deposition is carried out on the other side of the silicon substrate layer by taking tetraethoxysilane as a silicon source to form a silicon dioxide film spacing layer; Step 3, preparing a zirconium nitride film on the surfaces of a gold film spacer layer and a silicon dioxide film spacer layer by using a magnetron sputtering technology by taking a zirconium metal target as a sputtering source and taking a mixed gas of argon and nitrogen as a carrier gas; and 4, preparing concentric ring arrays on the zirconium nitride film on the surface of the silicon dioxide film spacing layer by using an extreme ultraviolet lithography technology and reactive ion etching and by means of a customized mask pattern to form a broadband absorption super-surface, and preparing square arrays on the gold film spacing layer to form a narrowband absorption super-surface.
  2. 2. The method for manufacturing the multifunctional metamaterial perfect absorber according to claim 1, wherein in step 1, the thickness of the adhesion chromium layer is 2-5 nm.
  3. 3. The method for manufacturing a multifunctional metamaterial perfect absorber according to claim 1, wherein in step1, the thickness of a gold thin film spacer layer is 200-500 nm.
  4. 4. The method for manufacturing a multifunctional metamaterial perfect absorber according to claim 1, wherein in step 2, the thickness of a silica film spacer layer is 110-200 nm.
  5. 5. The method for manufacturing a multifunctional metamaterial perfect absorber according to claim 1, wherein in step 3, the flow rate of argon is 26sccm, and the flow rate of nitrogen is 3-10 sccm.
  6. 6. The method for preparing the multifunctional metamaterial perfect absorber according to claim 1, wherein in step 4, the broadband absorption super surface structure is a concentric ring array formed by periodically arranging a plurality of concentric ring units with identical shapes and sizes, and each concentric ring unit comprises a central cylinder and three annular cylinders coaxially arranged along the radial outer side of the central cylinder.
  7. 7. The method for preparing the multifunctional metamaterial perfect absorber according to claim 6, wherein the thickness of the central cylinder is h 1 , the thicknesses of the annular cylinders from inside to outside are sequentially h 2 、h 3 、h 4 in the direction perpendicular to the silica film spacing layer, the inner diameters of the annular cylinders from inside to outside are respectively R 1 、R 2 、R 3 , the annular widths of the annular cylinders are respectively R, h 1 ,h 2 ,h 3 ,h 4 is 10-60 nm, R 1 ,R 2 ,R 3 is 30-130 nm, and r=10-50 nm.
  8. 8. The method for manufacturing a multifunctional metamaterial perfect absorber according to claim 6, wherein the concentric ring unit period Px=200-400 nm and Py=200-400 nm.
  9. 9. The method for manufacturing the multifunctional metamaterial perfect absorber according to claim 1, wherein in the step 4, the narrow-band absorption super-surface structure is a 4×4 square grid array, the square grid array side length L is 200-500 nm, the width W is 20-80 nm, the square grid array thickness H is 50-100 nm in the direction perpendicular to a gold film spacing layer, and the square grid array period P is 800-1200 nm.
  10. 10. The multifunctional metamaterial perfect absorber prepared by the preparation method according to any one of claims 1 to 9.

Description

Multifunctional metamaterial perfect absorber and manufacturing method thereof Technical Field The invention relates to the technical field of electromagnetic wave absorbing devices, in particular to a multifunctional metamaterial perfect absorber and a manufacturing method thereof. Background With the continuous improvement of the demand for precise regulation and control of electromagnetic waves, the metamaterial is widely paid attention to in academia and engineering circles because the metamaterial shows characteristics which are difficult to reach by natural materials in electromagnetic, acoustic and mechanical properties through a manually designed periodic structure. Since the concept of a metamaterial absorber is proposed, near perfect electromagnetic radiation absorption is realized based on accurate design of a sub-wavelength structure, a broadband and a narrowband metamaterial absorber are developed successively, the broadband absorber shows high-efficiency capacity capture in a continuous wave band from hundreds of nanometers to several micrometers, the broadband absorber is widely applied to solar energy collection, thermophotovoltaic conversion and electromagnetic interference suppression, the narrowband absorber realizes high absorption peak and high sensing performance from a few nanometers to tens of nanometers, and the broadband absorber shows important value in the fields of high-precision refractive index detection, biomedical sensing, environmental monitoring and the like. Most of the prior devices in the field only have a single function, and are difficult to combine broadband energy capture and high-sensitivity narrowband sensing in the same device, so that the process of miniaturization and systematic integration is restricted. To further improve the multi-functional integration level of the device, some researchers try to superimpose a wide-narrow-band structure on the same substrate, for example, the asymmetric multi-layer metal-dielectric structure [H. Gao, Y. Liang, L. Yu, S. Chu, L. Cai, F. Wang, Q. Wang, and W. Peng, Bifunctional plasmonic metamaterial absorber for narrowband sensing detection and broadband optical absorption, Opt. Laser Technol. 137 (2021), 106807], proposed by Gao et al contains both an upper-side nano-pattern gold array to realize narrow-band detection and a bottom-side four-layer metal-dielectric alternating structure to realize wide-band absorption, and although the wide-narrow-band absorption is integrated, the narrow-band refractive index sensitivity is only 37RIU-1, and the wide-band absorption rate is lower, and the absorption rate in the 400-900 nm band is 84.09%, which is still insufficient in front of the dual requirements of high-precision sensing and ultra-high absorption efficiency. On the other hand, most metamaterial absorbers are designed by adopting noble metal materials such as gold, silver and the like, so that the cost is high, the stability is reduced under extreme environments such as high temperature, strong corrosion and the like, and alternatives with better thermochemical inertia and mechanical durability still need to be explored. In recent years, transition metal nitrides have become powerful candidates for replacing noble metals due to their excellent optical properties, thermal stability and chemical inertness, with zirconium nitride having free electronic behavior like metals, lower resistivity and higher thermochemical stability. Based on the above, the invention provides a novel multifunctional metamaterial absorber, a periodic concentric circular ring array of zirconium nitride is respectively integrated on two sides of a square array, the top concentric circular ring is matched with a silicon dioxide spacing layer to realize near perfect broadband absorption, the bottom square array is precisely tuned through electromagnetic resonance to realize tunable high-sensitivity narrow-band refractive index sensing, high-efficiency energy collection and precise spectrum detection are both considered, the stability advantage of the zirconium nitride material in an extreme environment is fully utilized, and a novel realization path is provided for miniaturized and multifunctional integrated metamaterial devices. Disclosure of Invention The invention aims to provide a multifunctional metamaterial perfect absorber and a manufacturing method thereof, so as to solve the problems in the background technology. In order to solve the technical problems, the invention provides the technical scheme that the multifunctional metamaterial perfect absorber and the manufacturing method thereof. In a first aspect, an embodiment of the present application provides a method for manufacturing a multifunctional metamaterial perfect absorber, where the absorber includes a silicon substrate layer, an adhesion chromium layer, a silicon dioxide thin film spacer layer, a gold thin film spacer layer, a broadband absorption super surface and a narrowband absorpt