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CN-122018210-A - Preparation and extraction method of electrode for electrochromic device

CN122018210ACN 122018210 ACN122018210 ACN 122018210ACN-122018210-A

Abstract

The invention discloses a preparation method of an electrode for an electrochromic device, which comprises the following steps of S1, mixing water-soluble polyurethane emulsion and isopropanol, stirring until the mixture is uniform, filtering to obtain mask plate precursor liquid, S2, forming a wet film on the upper surface of a substrate by the mask plate precursor liquid through a coating process, heating the substrate at first, taking out the substrate after heat preservation for enough time for drying a film layer, cooling the substrate to form random cracks on the surface of the film, and S3, depositing a metal seed layer Cu and a metal layer Ag on the surface of the film in sequence, and removing a template layer generated by the film to obtain the electrode for the electrochromic device. The method can prepare the electrochromic device with quicker coloring and fading state time and more stability.

Inventors

  • YANG YANG
  • LI GANG
  • WANG TIANQI
  • JIN KEWU
  • Peng saiao

Assignees

  • 中建材玻璃新材料研究院集团有限公司

Dates

Publication Date
20260512
Application Date
20260127

Claims (10)

  1. 1. A method for preparing an electrode for an electrochromic device, comprising the steps of: s1, mixing water-soluble polyurethane emulsion and isopropanol, stirring until the mixture is uniform, and filtering to obtain mask plate precursor liquid; s2, forming a wet film on the upper surface of the substrate by using a coating process through the mask plate precursor liquid, heating the substrate at first, taking out the substrate after heat preservation is enough to enable the film layer to be dried, and cooling the substrate to enable random cracks to be formed on the surface of the film; And S3, sequentially depositing a metal seed layer Cu and a metal layer Ag on the surface of the film, and removing a template layer generated by the film to obtain the electrode for the electrochromic device.
  2. 2. The method for preparing an electrode for electrochromic device according to claim 1, wherein the step S1 of preparing the water-soluble polyurethane emulsion comprises the following steps: S101, dissolving polycaprolactone polyol and dimethylol polyol in acetone to obtain a mixed solution; s102, adding diisocyanate into the mixed solution, and reacting until the reaction is complete; s103, adding ethylene glycol into the reaction system in the step S102, and continuing the reaction until the reaction is stopped; s104, adding triethylamine into the reaction mixture for neutralization, vigorously stirring, adding deionized water for emulsification, and finally removing solvent acetone; Wherein the reaction mole ratio of the polycaprolactone polyol to the dimethylol polyol to the diisocyanate to the ethylene glycol to the triethylamine is 2:3:10:1:3.
  3. 3. The method of manufacturing an electrode for electrochromic device according to claim 1, wherein in the step S1, the water-soluble polyurethane emulsion and isopropyl alcohol are mixed according to a volume ratio of 4:1, and the pore size of the filter membrane for filtration is 50 μm.
  4. 4. The method of manufacturing an electrode for an electrochromic device according to claim 1, wherein in the step S2, a coating process is a doctor blade process, the substrate is a glass substrate, a moving speed of the doctor blade process on the substrate is 30-50 mm/S, and a working pressure of a nitrogen gas knife is 0.7kgf/cm 2 .
  5. 5. The method for manufacturing an electrode for an electrochromic device according to claim 1, wherein in the step S2, the heating temperature is 85 ℃, the heat preservation time is 1h, the cooling temperature is 0 ℃, and the width of the formed random crack is 20-100 μm.
  6. 6. The method for preparing the electrode for the electrochromic device according to claim 1, wherein in the step S3, magnetron sputtering is adopted in the deposition process, the sputtering working vacuum is 0.75Pa, the thickness of the metal seed layer Cu is 1-3 nm, and the thickness of the metal layer Ag is 5-7 nm.
  7. 7. The method for manufacturing an electrode for an electrochromic device according to claim 1, wherein in the step S3, a solvent dissolution method is used for removing the template layer generated by the thin film, and the solvent of the solvent dissolution method is one of dimethylformamide or tetrahydrofuran.
  8. 8. The method for extracting an electrode for an electrochromic device according to the production method of any one of claims 1 to 7, characterized by comprising the steps of: a) Carrying out edge cleaning treatment on the substrate with the prepared electrode by adopting nanosecond laser; b) And bonding the bus bar along the long side of the substrate, bonding half of the bus bar with the electrode, bonding half of the bus bar with the edge cleaning part, and leading out the electrode.
  9. 9. The extraction method of claim 8, wherein in the step a), the width of the edge is 2cm, the wavelength of the laser is 633nm, the power of the laser is 65%, and the frequency is 600kHz.
  10. 10. The method according to claim 8, wherein in the step b), the bus bar is composed of an aluminum-tin alloy.

Description

Preparation and extraction method of electrode for electrochromic device Technical Field The invention relates to the technical field of electronics, in particular to a preparation method and a lead-out method of an electrode for an electrochromic device. Background Electrochromic devices are devices that change color or optical properties by driving electrochromic materials to undergo reversible redox reactions by an applied electric field. The electrochromic device is generally composed of a conductive layer, an electrochromic layer, an electrolyte layer and an ion storage layer, can actively block heat dissipation caused by indoor temperature difference by controlling voltage, effectively reduces energy consumption, and can adjust visible light transmittance. Therefore, the method has more application in the fields of intelligent windows, display devices, thermal control devices and the like. Currently, in order to improve the electrochromic device to achieve faster response times, most research is directed to electrochromic and electrolyte layers, however, there is less interest in how to develop new electrodes and how to introduce external supply voltages to the electrochromic device, thereby achieving faster, more stable colored, fade states of the device. In the prior art, for example, CN107957646a proposes an electrochromic device with four electrode layers, and accurate color change is achieved through a partitioned conductive layer, CN115981065A proposes a binding method of an extraction electrode, and a connection process is simplified, however, both the above methods are concentrated on improving a device structure or a connection structure, and do not fundamentally solve the problem that the conventional transparent electrode layer has larger transverse transmission resistance, so that the electrochromic response time is long, and in addition, the complicated device structure also improves the processing difficulty, so that the production cost of enterprises is increased. To this end, we provide a method of manufacturing an electrode for electrochromic devices that solves the above-mentioned problems. Disclosure of Invention In view of the problems in the prior art, the invention provides a preparation method of an electrode for an electrochromic device, which can prepare an electrochromic device with quicker and more stable coloring and fading state time. In order to achieve the above object, the present invention provides a method for manufacturing an electrode for an electrochromic device, comprising the steps of: s1, mixing water-soluble polyurethane emulsion and isopropanol, stirring until the mixture is uniform, and filtering to obtain mask plate precursor liquid; s2, forming a wet film on the upper surface of the substrate by using a coating process through the mask plate precursor liquid, heating the substrate at first, taking out the substrate after heat preservation is enough to enable the film layer to be dried, and cooling the substrate to enable random cracks to be formed on the surface of the film; And S3, sequentially depositing a metal seed layer Cu and a metal layer Ag on the surface of the film, and removing a template layer generated by the film to obtain the electrode for the electrochromic device. As a further optimization of the above scheme, the preparation steps of the water-soluble polyurethane emulsion in the step S1 are as follows: S101, dissolving polycaprolactone polyol and dimethylol polyol in acetone to obtain a mixed solution; s102, adding diisocyanate into the mixed solution, and reacting until the reaction is complete; s103, adding ethylene glycol into the reaction system in the step S102, and continuing the reaction until the reaction is stopped; s104, adding triethylamine into the reaction mixture for neutralization, vigorously stirring, adding deionized water for emulsification, and finally removing solvent acetone; Wherein the reaction mole ratio of the polycaprolactone polyol to the dimethylol polyol to the diisocyanate to the ethylene glycol to the triethylamine is 2:3:10:1:3. As a further optimization of the above scheme, in the step S1, the water-soluble polyurethane emulsion and isopropyl alcohol are mixed according to a volume ratio of 4:1, and the pore size of the filtering membrane for filtration is 50 μm. As a further optimization of the above scheme, in the step S2, a coating process is a doctor blade process, the substrate is a glass substrate, the moving speed of the doctor blade process on the substrate is 30-50 mm/S, and the working pressure of the nitrogen knife is 0.7kgf/cm 2. In the step S2, the heating temperature is 85 ℃, the heat preservation time is 1h, the cooling temperature is 0 ℃, and the width of the formed random crack is 20-100 μm. In the step S3, magnetron sputtering is adopted in the deposition process, the sputtering working vacuum is 0.75Pa, the thickness of the metal seed layer Cu is 1-3 nm, and the thickness of the metal la