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CN-122018237-A - Glue spreading method for improving arrow shadow defect

CN122018237ACN 122018237 ACN122018237 ACN 122018237ACN-122018237-A

Abstract

A glue coating method for improving arrow shadow defects comprises the steps of S1, providing a product sheet before a photoetching process, forming grooves on each corresponding area of every other row of crystal grains according to row and column distribution, S2, gluing to obtain a glue coated sheet, wherein in the glue coated spin-on spin-glue of the glue coated film, dripping glue solution to the center position of a dynamic product sheet, rotating the product sheet in at least three steps after the glue solution is dripped, wherein the rotating speed of the latter step is higher than that of the former step and the time of the latter step is not less than that of the former step, S3, exposing to obtain an exposure sheet, S4, developing to obtain a developing sheet, S5, forming a finished product through the latter process, testing the finished product, observing a display image of a testing end, determining the influence on the arrow shadow defects, and determining the optimization parameters and the optimization process of mass production of the photoetching process. Therefore, arrow shadow defects can be effectively improved, and the yield of finished products is improved.

Inventors

  • WANG YUE
  • SUN SHANSHAN
  • ZHOU HONGYU
  • LI HAITAO

Assignees

  • 安徽晶微科技有限公司

Dates

Publication Date
20260512
Application Date
20260305

Claims (9)

  1. 1. A gluing method for improving arrow shadow defects is characterized by comprising the following steps: S1, providing a product sheet before a photoetching process, wherein crystal grains of the product sheet are distributed according to rows and columns, and grooves are formed in the corresponding areas of every other crystal grain; S2, gluing to obtain a glue-coated sheet, wherein in spin-coating glue-homogenizing of gluing, glue solution is dripped to the center position of a dynamic product sheet, after the glue solution is dripped, the product sheet is rotated in at least three steps, the rotating speed of the latter step is higher than that of the former step, and the time of the latter step is not less than that of the former step; s3, exposing to obtain an exposure sheet; s4, developing to obtain a developing film; s5, forming a finished product by the subsequent process of the developing film, testing and observing a display image of a testing end, determining the influence on arrow shadow defects, and determining optimization parameters and optimization processes of mass production of the photoetching process.
  2. 2. The method for coating an adhesive for improving arrow defects according to claim 1, wherein, In the step S1 of the process, The product piece is a wafer with the diameter of 8 inches and the surface being plated with a SIN film layer with the thickness of 150A; Each groove had a depth of 2.5 μm, a length of 60 μm, and a width of 20. Mu.m.
  3. 3. The method for coating an adhesive for improving arrow defects according to claim 2, wherein, The gluing of step S2 comprises the sub-steps of: s21, forming an HMDS film on the surface of a product sheet in a gas phase mode; s22, cooling before spin coating, and cooling the product sheet with the HMDS film formed on the surface to the temperature required by spin coating in a cooling tank; s23, coating, namely spin-coating the product piece with spin-coating glue in a glue-coating process groove, wherein the spin-coating glue is the spin-coating glue coated with glue; s24, pre-baking, namely pre-baking the product sheet after spin coating and spin coating in a pre-baking process tank.
  4. 4. A glue coating method for improving arrow shadow defect according to claim 3, wherein, In substep S21, the operation of forming the HMDS film in a gas phase mode is that a product piece is placed on a stage of a vacuum chamber and the stage is heated to 110 ℃, nitrogen is used as carrier gas, the pressure of the nitrogen is 25kPa, HMDS steam carried by the nitrogen is introduced, the pressure of the vacuum chamber is kept at 20Pa, the time of introducing the HMDS steam carried by the nitrogen is 60S, and the thickness of the formed HMDS film is 6A.
  5. 5. A glue coating method for improving arrow shadow defect according to claim 3, wherein, In sub-step S22, the temperature required for spin is 23 ℃.
  6. 6. A glue coating method for improving arrow shadow defect according to claim 3, wherein, In a sub-step S23, The glue is of the type DHK-BF511, The spin coating process comprises the steps of dripping 1.5mL of glue solution to the center position of a 2500rmp dynamic product sheet, rotating the product sheet in three steps after the glue solution is dripped for 2s, rotating the product sheet in the first step at 500rpm for 1.5s, rotating the product sheet in the second step at 1000rpm for 1.5s, rotating the product sheet in the third step at 2000rpm for 2s, and finally coating the glue with the thickness of 4700A.
  7. 7. A glue coating method for improving arrow shadow defect according to claim 3, wherein, In sub-step S24, the pre-bake temperature is 90 ℃ and the time is 60S.
  8. 8. A glue coating method for improving arrow shadow defect according to claim 3, wherein, The exposure of step S3 comprises the sub-steps of: s31, cooling before exposure, and cooling the glued pre-baked glue spreading sheet in a cooling tank to the temperature of 23 ℃ required by exposure; s32, exposure, namely performing step-and-scan exposure by adopting a VOT612-010-BE plate and a Nikon S205C machine with the requirements of a layout design linewidth of 290+/-20 nm, wherein the step X direction is 12949 mu m, the step Y direction is 250389 mu m, the exposure dose of each step-and-scan exposure is 22mj/cm 2 , the imaging focal length is 0.1 mu m and the NA value is 0.68; S33, performing post-exposure baking in a post-exposure baking process tank, wherein the temperature of the post-exposure baking is 110 ℃ and the time is 120S.
  9. 9. The method for improving arrow defects according to claim 8, wherein, The development of step S4 includes the sub-steps of: s41, cooling before developing, namely cooling the exposed sheet baked after exposure to the temperature of 23 ℃ required by developing in a cooling tank; s42, developing, namely placing the exposure sheet cooled before developing on a rotary table of a developing machine, dripping developing solution to the center of the exposure sheet while rotating, flushing while rotating, rotating to unidirectional rotation at a rotation speed of 2000rpm, adopting positive photoresist developing solution, wherein the model of the developing solution is ZX-238 type, and the developing time is 60S and the flushing time is 30S; S43, post-baking in a post-baking process tank, wherein the post-baking temperature is 110 ℃ and the post-baking time is 90S.

Description

Glue spreading method for improving arrow shadow defect Technical Field The present disclosure relates to the field of semiconductors, and more particularly, to a gumming method for improving arrow defects. Background The semiconductor product is usually inspected at a test end, and whether a display area has a brightness difference is observed through a display screen at the test end and is restored to a wafer to determine whether there is any radial pattern (i.e. arrow shadow) matched with the photoresist spin coating. This requires improvements to the lithographic process to reduce or eliminate the arrow shadows, if any. Disclosure of Invention In view of the problems in the prior art, an object of the present disclosure is to provide a glue coating method for improving arrow defects, which can effectively improve the arrow defects. The glue coating method for improving arrow shadow defects comprises the steps of S1, providing a product sheet before a photoetching process, wherein crystal grains of the product sheet are distributed according to rows and columns, grooves are formed in each corresponding area of every other crystal grain, S2, gluing to obtain a glue coated sheet, wherein in spin coating glue coating, glue solution is dripped to the center position of a dynamic product sheet, at least three steps are adopted to rotate the product sheet after glue solution is dripped, the rotating speed of the latter step is higher than that of the former step and the time of the latter step is not less than that of the former step, S3, exposure is carried out to obtain an exposure sheet, S4, development is carried out to obtain a developing sheet, S5, the developing sheet is subjected to the latter process to form a finished product, a finished product test and a display image of a test end is observed, influence on the arrow shadow defects is determined, and optimization parameters and an optimization process of mass production of the photoetching process are determined. In the glue coating method for improving arrow shadow defects, according to the glue coating method, aiming at the situation that crystal grains of a product sheet are distributed according to rows and columns and grooves are formed in corresponding areas of every other crystal grain, glue solution is dripped to the center position of a dynamic product sheet in glue coating spin-coating glue, the product sheet is rotated at least three steps after glue solution is dripped, the rotating speed of the latter step is higher than that of the former step, the time of the latter step is not less than that of the former step, and the effect on the arrow shadow defects and the optimization parameters and the optimization process of mass production of a photoetching process are determined by testing a finished product and observing display images of a testing end. As verified by the test process, compared with the situation that the glue solution is dripped to the center position of the dynamic product piece in the spin-coating glue spreading process of the glue, and the product piece is rotated in one step after the glue solution is dripped, the glue spreading method for improving the arrow shadow defect can effectively improve the arrow shadow defect, so that the yield of finished products is improved. Drawings Fig. 1 is a schematic view of a product piece prior to gumming. Fig. 2 is a schematic diagram of the structural relationship of the mask, the glue spreading sheet and the die. Fig. 3 is a display image of the finished product corresponding to comparative example 1 at the test end. Fig. 4 is a display image of the finished product at the test end corresponding to example 1. Detailed Description It is to be understood that the disclosed embodiments are merely examples of the disclosure, which may be embodied in various forms and, therefore, specific details disclosed herein are not to be interpreted as limiting, but merely as a basis for the claims and as a representative basis for teaching one skilled in the art to variously employ the disclosure. [ Gluing method for improving arrow shadow defect ] Referring to fig. 1 and 2, a glue coating method for improving arrow shadow defect according to the present disclosure includes the steps of: S1, providing a product sheet before a photoetching process, wherein crystal grains of the product sheet are distributed according to rows and columns, and grooves are formed in the corresponding areas of every other crystal grain; S2, gluing to obtain a glue-coated sheet, wherein in spin-coating glue-homogenizing of gluing, glue solution is dripped to the center position of a dynamic product sheet, after the glue solution is dripped, the product sheet is rotated in at least three steps, the rotating speed of the latter step is higher than that of the former step, and the time of the latter step is not less than that of the former step; s3, exposing to obtain an exposure sheet; s4, developing to obtain a dev