CN-122018251-A - Laser direct writing imaging system and method based on single-axis micro-displacement device
Abstract
The embodiment of the invention provides a laser direct-writing imaging system and method based on a single-axis micro-displacement device, which are used for realizing laser direct-writing imaging of an uneven exposure surface and improving the precision of laser direct-writing imaging. The method comprises the steps of obtaining 3D surface morphology model data of a substrate, generating Z-axis target coordinates of each exposure point position of each single-axis micro-displacement device unit on a scanning path according to the 3D surface morphology model data, issuing the Z-axis target coordinates of a plurality of exposure points to each edge computing node, controlling a mobile platform to conduct uniform linear scanning motion, controlling each edge computing node to query a locally stored Z-axis target coordinate lookup table in real time according to physical coordinates of the current single-axis micro-displacement device unit, adjusting the position of a laser light source in the Z-axis direction to keep consistent with the Z-axis target coordinates in real time according to query results, and controlling the laser light source to expose the exposure points.
Inventors
- CHEN NAIQI
- CHEN GANG
- ZHANG XIANGFEI
Assignees
- 深圳市先地图像科技有限公司
Dates
- Publication Date
- 20260512
- Application Date
- 20260331
Claims (10)
- 1. A laser direct-write imaging system based on a single axis micro-displacement device, comprising: the mobile platform is used for carrying a single-axis micro-displacement device array formed by a plurality of single-axis micro-displacement device units which are arranged in an array manner, and adjusting the position of the single-axis micro-displacement device array in the X, Y axial direction, wherein the single-axis micro-displacement device units are used for adjusting the position of a laser light source in the Z axial direction, and the Z axis is perpendicular to a plane where the X, Y axial direction is located; the distributed edge computing module comprises a plurality of edge computing nodes, wherein each single-axis micro-displacement device unit or each group of single-axis micro-displacement device units are connected with the configured independent edge computing nodes; the edge computing node is configured to receive a Z-axis target coordinate lookup table of a plurality of exposure points issued by an upper computer, query a locally stored Z-axis target coordinate lookup table in real time according to physical coordinates of a current single-axis micro-displacement device unit in a constant speed scanning exposure stage, adjust the position of a laser light source in the Z-axis direction in real time according to a query result to keep consistent with the queried Z-axis target coordinates, and control the laser light source to expose the positions of the exposure points.
- 2. The system of claim 1, further comprising: the host computer, the host computer is configured to: Before uniform scanning exposure, obtaining 3D surface morphology model data of a substrate; Generating Z-axis target coordinates of each exposure point position of each lithography head on a scanning path according to the 3D surface morphology model data; and generating X, Y mounting reference coordinates of each single-axis micro-displacement device unit and a Z-axis target coordinate lookup table of a plurality of exposure points according to the physical arrangement layout of the single-axis micro-displacement device array.
- 3. The system of claim 1, wherein the edge computing node is further configured to: loading static physical installation deviation data of each laser light source in the X-axis direction; inquiring a dynamic deflection lookup table according to the current Z-axis depth, and acquiring an X-axis dynamic deflection error caused by Z-axis motion; Performing high-frequency superposition on the static physical installation deviation data and the X-axis dynamic deflection error to obtain the comprehensive space displacement dislocation; converting the comprehensive space displacement offset into a time sequence offset of laser pulses, and controlling a laser to send out exposure pulses according to the time sequence offset so as to eliminate the comprehensive space displacement offset.
- 4. The system of claim 1, wherein the edge computing node is further configured to: When the control system judges that the single-axis micro-displacement device receives a large-amplitude focus tracking instruction and is in a transient defocusing process of high climbing or descending, the instantaneous transmitting power of the corresponding laser is synchronously increased or the pulse width is increased; And after the uniaxial micro-displacement device stably reaches the focal plane, recovering the laser power to a rated power state so as to ensure that the total photoetching energy received under any topography on the exposure surface is kept consistent.
- 5. The system of claim 3 or 4, wherein the edge computing node is implemented using an MCU or FPGA.
- 6. A laser direct-write imaging method based on a single-axis micro-displacement device, which is applied to the laser direct-write imaging system based on a single-axis micro-displacement device as claimed in claim 1, the method comprising: Acquiring 3D surface morphology model data of a substrate; generating Z-axis target coordinates of each single-axis micro-displacement device unit at each position on a scanning path according to the 3D surface topography model data; Issuing Z-axis target coordinates of a plurality of exposure points to each edge computing node, controlling a mobile platform to perform uniform linear scanning motion, controlling each edge computing node to query a locally stored Z-axis target coordinate query table in real time according to the physical coordinates of the current single-axis micro-displacement device unit, adjusting the position of a laser light source in the Z-axis direction to be consistent with the Z-axis target coordinates in real time according to the query result, and controlling the laser light source to expose the positions of the exposure points.
- 7. The method as recited in claim 6, further comprising: when the single-axis micro-displacement device is judged to receive a large-amplitude focus tracking instruction and is in a transient defocusing process of high climbing or descending, the instantaneous transmitting power of the corresponding laser is synchronously increased or the pulse width is increased; and after the uniaxial micro-displacement device stably reaches the focal plane, recovering the laser power to a rated power state so as to ensure that the total photoetching energy received by the exposure surface is kept consistent.
- 8. The method as recited in claim 6, further comprising: loading static physical installation deviation data of each laser light source in the X-axis direction; inquiring a dynamic deflection lookup table according to the current Z-axis depth, and acquiring an X-axis dynamic deflection error caused by Z-axis motion; Performing high-frequency superposition on the static physical installation deviation data and the X-axis dynamic deflection error to obtain the comprehensive space displacement dislocation; converting the comprehensive space displacement offset into a time sequence offset of laser pulses, and controlling a laser to send out exposure pulses according to the time sequence offset so as to eliminate the comprehensive space displacement offset.
- 9. The method according to any one of claims 6 to 8, further comprising: Based on the repeated precision characteristic of the single-axis micro-displacement devices, an off-line calibration program is executed, and the exclusive current grade of the motor and the nonlinear hysteresis curve data of the displacement of each single-axis micro-displacement device are obtained to be used as a displacement mapping table; Storing the displacement mapping table in an edge computing node; When the position of the laser light source in the Z-axis direction is adjusted, a terrain change instruction detected by a displacement sensor is received, and the terrain change instruction is subjected to filtering processing by combining a delay jitter elimination algorithm with a specific step length so as to inhibit millisecond-level natural jitter; inquiring the displacement mapping table according to the filtered terrain change instruction, and generating an open-loop feedforward driving signal, wherein the open-loop feedforward driving signal is used for driving the single-axis micro-displacement device to execute the position action of the laser light source in the Z-axis direction, so that the Z-axis open-loop feedforward control without real-time position feedback is realized.
- 10. The method of claim 9, wherein the edge computing node is implemented using an MCU or FPGA.
Description
Laser direct writing imaging system and method based on single-axis micro-displacement device Technical Field The invention relates to the technical field of data processing, in particular to a laser direct writing imaging system and method based on a single-axis micro-displacement device. Background In the related art, a laser direct-writing imaging device (for example, a laser direct-printing plate making device for a planar screen printing plate disclosed in the application number 201310084860.3) reciprocally scans a photosensitive coating on an exposure surface back and forth in a preset horizontal direction of a plane in which a X, Y axis direction is located by controlling a laser array. The applicant found that the distance between each laser in the laser array in the related art and the vertical direction of the exposure surface is fixed, if the exposure surface is uneven or the exposure surface itself is undulating, the spot size of the exposure surface is changed due to the change of the object distance, so that the exposure precision is lost, or the existing laser direct writing imaging device cannot be used for exposure imaging of the undulating exposure surface at all. Disclosure of Invention The embodiment of the invention provides a laser direct-writing imaging system and method based on a single-axis micro-displacement device, which are used for realizing laser direct-writing imaging of an uneven exposure surface and improving the precision of laser direct-writing imaging. A first aspect of the present invention provides a laser direct-writing imaging system based on a uniaxial micro-displacement device, which may include: the mobile platform is used for carrying a single-axis micro-displacement device array formed by a plurality of single-axis micro-displacement device units which are arranged in an array manner, and adjusting the position of the single-axis micro-displacement device array in the X, Y axial direction, wherein the single-axis micro-displacement device units are used for adjusting the position of a laser light source in the Z axial direction, and the Z axis is perpendicular to a plane where the X, Y axial direction is located; the distributed edge computing module comprises a plurality of edge computing nodes, wherein each single-axis micro-displacement device unit or each group of single-axis micro-displacement device units are connected with the configured independent edge computing nodes; the edge computing node is configured to receive a Z-axis target coordinate lookup table of a plurality of exposure points issued by an upper computer, query a locally stored Z-axis target coordinate lookup table in real time according to physical coordinates of a current single-axis micro-displacement device unit in a constant speed scanning exposure stage, adjust the position of a laser light source in the Z-axis direction in real time according to a query result to keep consistent with the queried Z-axis target coordinates, and control the laser light source to expose the positions of the exposure points. Optionally, as a possible implementation manner, the laser direct-writing imaging system based on the single-axis micro-displacement device in the embodiment of the invention may further include a host computer configured to: Before uniform scanning exposure, obtaining 3D surface morphology model data of a substrate; Generating Z-axis target coordinates of each exposure point position of each lithography head on a scanning path according to the 3D surface morphology model data; and generating X, Y mounting reference coordinates of each single-axis micro-displacement device unit and a Z-axis target coordinate lookup table of a plurality of exposure points according to the physical arrangement layout of the single-axis micro-displacement device array. Optionally, as a possible implementation manner, in an embodiment of the present invention, the edge computing node may be further configured to: loading static physical installation deviation data of each laser light source in the X-axis direction; inquiring a dynamic deflection lookup table according to the current Z-axis depth, and acquiring an X-axis dynamic deflection error caused by Z-axis motion; Performing high-frequency superposition on the static physical installation deviation data and the X-axis dynamic deflection error to obtain the comprehensive space displacement dislocation; converting the comprehensive space displacement offset into a time sequence offset of laser pulses, and controlling a laser to send out exposure pulses according to the time sequence offset so as to eliminate the comprehensive space displacement offset. Optionally, as a possible implementation manner, in an embodiment of the present invention, the edge computing node may be further configured to: When the control system judges that the single-axis micro-displacement device receives a large-amplitude focus tracking instruction and is in a transient defoc