CN-122018253-A - Homogenizing lighting device and method for exposure machine

Abstract

The invention relates to the technical field of exposure, in particular to a homogenizing lighting device and a homogenizing lighting method of an exposure machine, wherein the device comprises a laser, a light dissipater and a light homogenizer, and the laser is used for emitting target laser; the optical dissipater is arranged on one side of the laser and used for receiving target laser and carrying out homogenization treatment on the target laser to output first homogenized light, the optical dissipater is arranged on one side of the optical dissipater and comprises a collimating piece, a digital micro-mirror device and a miniature lens, the collimating piece is used for receiving the first homogenized light and carrying out collimation and secondary homogenization treatment on the first homogenized light to output second homogenized light which is centrally incident on the digital micro-mirror device, the digital micro-mirror device is used for carrying out spatial modulation on the second homogenized light to output target pattern light, the miniature lens and the digital micro-mirror device are arranged at intervals in sequence, and the miniature lens is used for receiving the target pattern light and carrying out focusing treatment to enable the target pattern light to be projected onto the surface of a target workpiece. The invention effectively improves the homogenization effect and eliminates the local light intensity peak of the laser.

Inventors

• Kong Chundang
• JI LIANQUN
• GUO ZEBIN

Assignees

• 江苏镭创高科光电科技有限公司

Dates

Publication Date

20260512

Application Date

20260409

Claims (10)

1. 1. An exposure machine homogenizing illumination device, characterized by comprising: A laser for emitting a target laser; The light dissipater is arranged at one side of the laser and is used for receiving the target laser and carrying out homogenization treatment on the target laser to output first homogenized light; The optical homogenizer is arranged on one side of the optical dissipater and comprises a collimation piece, a digital micro-mirror device and a miniature lens, wherein the collimation piece is used for receiving the first homogenized light, carrying out collimation and secondary homogenization on the first homogenized light and outputting second homogenized light which is centrally incident into the digital micro-mirror device, the digital micro-mirror device is used for carrying out spatial modulation on the second homogenized light and outputting target pattern light, the miniature lens and the digital micro-mirror device are sequentially arranged at intervals, and the miniature lens is used for receiving the target pattern light and carrying out focusing on the target pattern light so that the target pattern light is projected onto the surface of a target workpiece.
2. 2. The exposure-machine homogenizing illumination apparatus according to claim 1, wherein the collimator includes: The diffraction optical element is used for receiving the first homogenized light and redistributing the spot energy of the first homogenized light to obtain intermediate light; the collimating lens is used for receiving the intermediate light, carrying out collimation and secondary homogenization on the intermediate light and outputting second homogenized light; and the first reflecting mirror is arranged between the diffraction optical element and the collimating lens and is used for receiving the intermediate light and enabling the intermediate light to be centrally incident on the collimating lens.
3. 3. The exposure machine homogenizing illumination apparatus according to claim 2, wherein: The first reflecting mirror and the collimating lens are sequentially arranged at intervals along a second direction, and the second direction is perpendicular to the first direction; the light homogenizer also comprises a second reflecting mirror, wherein the second reflecting mirror is arranged on one side of the collimating lens, which is far away from the first reflecting mirror, along the second direction; Along the second direction, the digital micro-mirror device and the micro-lens are arranged between the collimating lens and the second reflecting mirror, and along the first direction, the digital micro-mirror device and the micro-lens are respectively arranged on two sides of the second reflecting mirror.
4. 4. The exposure machine homogenizing illumination apparatus according to claim 1, wherein: the collimating element comprises a collimating lens and a first reflecting mirror, wherein the collimating lens is used for receiving the first homogenized light, carrying out collimation and secondary homogenization on the first homogenized light and outputting the second homogenized light; the first reflecting mirror is used for receiving the second homogenized light and adjusting the deviation of the propagation direction of the second homogenized light; the light homogenizer further comprises a second reflecting mirror, wherein the first reflecting mirror and the second reflecting mirror are sequentially arranged at intervals along a second direction, and the second direction is perpendicular to the first direction; the second reflector is used for receiving the second homogenized light and enabling the second homogenized light to be centrally incident on the digital micro-mirror device; The digital micro-mirror device and the micro lens are arranged between the first reflecting mirror and the second reflecting mirror along the second direction, and the digital micro-mirror device and the micro lens are respectively arranged on two sides of the second reflecting mirror along the first direction.
5. 5. The exposure-machine homogenizing illumination apparatus according to any one of claims 1 to 4, further comprising: the light field shaper is arranged between the light dissipater and the light homogenizer and is provided with a plurality of micro-nano units which are arranged in an array mode, wherein the micro-nano units are used for receiving the first homogenized light, performing wave front phase modulation and energy space redistribution on the first homogenized light, and inputting the processed first homogenized light into the light homogenizer.
6. 6. The exposure-machine homogenizing illumination apparatus according to any one of claims 1 to 4, wherein: the light homogenizer further comprises a polarization control element and a phase retarder; The polarization control piece is arranged on the output side of the collimating piece and is used for receiving the second homogenized light, carrying out polarization state adjustment treatment on the second homogenized light and inputting the treated second homogenized light to the phase retarder; The phase delay plate is arranged between the polarization control piece and the digital micro-mirror device, and is used for receiving the second homogenized light, carrying out phase deviation correction processing on the second homogenized light, and inputting the processed second homogenized light to the digital micro-mirror device.
7. 7. The exposure machine homogenizing illumination apparatus according to claim 1, wherein: the light dissipater comprises a first lens, a second lens, a diffusion wheel, a third lens, a third reflecting mirror and a fourth lens which are sequentially arranged at intervals; The first lens is used for receiving the target laser, carrying out collimation treatment on the target laser and inputting the treated target laser to the second lens; the second lens is used for focusing the target laser and inputting the processed target laser to the diffusion wheel; The diffusion wheel is used for homogenizing the target laser and inputting the processed target laser to the third lens; The third lens is used for carrying out collimation treatment on the target laser and inputting the treated target laser to the third reflector; The third reflecting mirror is used for enabling the target laser to enter the fourth lens in a centered mode; the fourth lens is used for shaping the target laser and outputting the first homogenized light.
8. 8. The exposure-machine homogenizing illumination apparatus according to claim 1 or 7, characterized in that: the light dissipater and the laser, and the light dissipater and the light homogenizer are all connected through optical fibers.
9. 9. The exposure-machine homogenizing illumination apparatus according to any one of claims 1 to 4, wherein: The light homogenizer further comprises a focusing adjusting piece, the focusing adjusting piece comprises a guide cylinder, an adjusting guide nail, a connecting seat and a locking screw, a curved groove and a locking screw hole are formed in the cylinder wall of the guide cylinder, the adjusting guide nail is movably arranged in the curved groove, the connecting seat is arranged in the guide cylinder and is respectively connected with the adjusting guide nail and the miniature lens, the connecting seat can rotate and axially move relative to the guide cylinder, the locking screw is in threaded connection with the locking screw hole, and the locking screw rotates relative to the locking screw hole to fix or unlock the connecting seat.
10. 10. A homogenizing illumination method of an exposure machine applied to the homogenizing illumination apparatus of an exposure machine as claimed in any one of claims 1 to 9, comprising the steps of: controlling a laser to emit target laser, and enabling a light dissipater to receive the target laser and perform homogenization treatment on the target laser to output first homogenized light, wherein the light dissipater is arranged on one side of the laser; The collimating part of the light homogenizer receives the first homogenized light, performs collimation and secondary homogenization treatment on the first homogenized light and outputs second homogenized light, wherein the light homogenizer is arranged on one side of the light dissipater, and the light homogenizer further comprises a digital micro-mirror device and a micro-lens, and the micro-lens and the digital micro-mirror device are sequentially arranged at intervals; The second homogenized light is centrally incident to the digital micro-mirror device, and the digital micro-mirror device spatially modulates the second homogenized light and outputs target pattern light; And the miniature lens receives the target pattern light, and focuses the target pattern light to enable the target pattern light to be projected to the surface of a target workpiece.

Description

Homogenizing lighting device and method for exposure machine Technical Field The invention relates to the technical field of exposure, in particular to a homogenizing lighting device and a homogenizing lighting method of an exposure machine. Background In the technical field of high-precision exposure such as semiconductor packaging and micro-nano processing, the homogenizing effect of an optical-mechanical structure directly determines the exposure precision and the product yield, and is a core technical requirement of industries such as photoelectric manufacturing and semiconductor packaging. In the prior art, homogenization illumination is generally realized by adopting an integrating rod/fly-eye lens combination or a high-diffusion-coefficient diffusion sheet matched with a lens group, wherein the integrating rod/fly-eye lens combination realizes homogenization by means of multiple reflection/refraction, and the high-diffusion-coefficient diffusion sheet matched with the lens group realizes homogenization by means of a scattering effect. The homogenization effect of the mode is insufficient, local light intensity peaks of laser cannot be thoroughly eliminated, and the homogenization requirement of high-precision exposure cannot be met. Disclosure of Invention The homogenizing lighting device and the homogenizing lighting method of the exposure light machine at least solve the problems that the existing device is insufficient in homogenizing effect and has local laser light intensity peaks, effectively improve the homogenizing effect through the cooperation of the light dissipater and the light homogenizer, and eliminate the local laser light intensity peaks. The invention provides a homogenizing lighting device of an exposure machine, which comprises a laser, a light dissipater, a light homogenizer and a digital micro mirror device, wherein the laser is used for emitting target laser, the light dissipater is arranged on one side of the laser, the light dissipater is used for receiving the target laser and carrying out homogenizing treatment on the target laser to output first homogenized light, the light homogenizer is arranged on one side of the light dissipater, the light homogenizer comprises a collimating piece, a digital micro mirror device and a micro lens, the collimating piece is used for receiving the first homogenized light and carrying out collimating and secondary homogenizing treatment on the first homogenized light to output second homogenized light which is centrally incident on the digital micro mirror device, the digital micro mirror device is used for carrying out spatial modulation on the second homogenized light to output target pattern light, and the micro lens and the digital micro mirror device are sequentially arranged at intervals and are used for receiving the target pattern light and carrying out focusing treatment on the target pattern light to enable the target pattern light to be projected on the surface of a target workpiece. In one embodiment of the invention, the collimating component comprises a diffraction optical element, a collimating lens and a first reflecting mirror, wherein the diffraction optical element is used for receiving the first homogenized light and redistributing the spot energy of the first homogenized light to obtain intermediate light, the collimating lens is arranged on one side of the diffraction optical element and used for receiving the intermediate light and collimating and secondarily homogenizing the intermediate light to output the second homogenized light, and the first reflecting mirror is arranged between the diffraction optical element and the collimating lens and used for receiving the intermediate light and making the intermediate light enter the collimating lens in a centered mode. In one embodiment of the invention, the diffractive optical element and the first reflecting mirror are sequentially arranged at intervals along a first direction, the first reflecting mirror and the collimating lens are sequentially arranged at intervals along a second direction, the second direction is perpendicular to the first direction, the light homogenizer further comprises a second reflecting mirror, the second reflecting mirror is arranged on one side, away from the first reflecting mirror, of the collimating lens, the second reflecting mirror is used for receiving the second homogenized light and enabling the second homogenized light to enter the digital micro-mirror device in a centered mode, and the digital micro-mirror device and the micro-lens are arranged between the collimating lens and the second reflecting mirror along the second direction and are respectively arranged on two sides of the second reflecting mirror along the first direction. In one embodiment of the invention, the collimating element comprises a collimating lens and a first reflecting mirror, wherein the collimating lens is used for receiving the first homogenized light and c