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CN-122018255-A - Splicing precision improving method and device based on digital lithography technology

CN122018255ACN 122018255 ACN122018255 ACN 122018255ACN-122018255-A

Abstract

The invention discloses a splicing precision improving method and device based on a digital lithography technology, and belongs to the field of digital lithography. The method comprises the steps of calibrating, namely calibrating an imaging range and an overlapping area according to the arrangement of the inclined directions of the DMDs of all imaging modules, determining a graph cutting starting position, calculating the width of a strip distributed by all lenses, determining the width of the strip based on the difference value of the position coordinates of adjacent lenses and the overlapping allowance, wherein the overlapping allowance comprises at least twice of the width of a triangle exposure area, cutting original graph data according to the graph cutting starting position and the width of the strip, deleting and replacing the area with the width of the triangle exposure area on the left side and the right side of the cut graph data with blank graph data, and filling the blank graph data to the maximum effective exposure width of the DMDs on the right side to generate the exposure graph data of all lenses. The invention simplifies the splicing and debugging of the multi-path DMD exposure patterns and improves the splicing precision and the system stability.

Inventors

  • BAI JINGJIE
  • WANG XU
  • ZHANG LEI

Assignees

  • 源卓微纳科技(苏州)股份有限公司

Dates

Publication Date
20260512
Application Date
20260413

Claims (10)

  1. 1. The splicing precision improving method based on the digital lithography technology is characterized by comprising the following steps of: Calibrating imaging ranges and overlapping areas of the imaging modules according to the arrangement of the DMDs of the imaging modules in the inclined direction, and determining the pattern cutting starting positions of exposure of the lenses according to the imaging ranges and the overlapping areas; Calculating the strip width allocated by each lens according to the imaging range and the overlapping area, wherein the strip width is determined based on the difference value of the adjacent lens position coordinates and the overlapping allowance; Cutting original graphic data according to the graphic cutting starting position and the strip width to obtain cut graphic data, deleting and replacing the graphic data of boundary areas on two sides of the cut graphic data with blank graphic data to generate exposure graphic data corresponding to each lens; and an exposure step of converting the exposure pattern data into control signals and transmitting the control signals to a corresponding imaging module to control the DMD to perform exposure.
  2. 2. The method of claim 1, wherein the overlay margin comprises at least twice a width of a triangular exposure area generated by a tilting scan of the DMD, and wherein a width Δ of the triangular exposure area is calculated by the formula Δ = N x a x β x sin θ, where N is a number of broadside pixels of the DMD, a is a size of a single micromirror, β is a magnification of a projection objective, and θ is a tilting angle of the DMD.
  3. 3. The method of claim 2, wherein the stripe width is calculated by the formula L n =x n+1 -x n +kΔ, wherein L n is the stripe width assigned to the nth lens, x n and x n+1 are the coordinates of the lens positions of the nth lens and the n+1th lens in the horizontal direction, respectively, Δ is the width of the triangle exposure region, and k is an integer greater than or equal to 2.
  4. 4. A method according to claim 3, wherein the stripe width satisfies L n < D, where D is the maximum effective exposure width of the DMD, and the difference in adjacent lens position coordinates satisfies x n+1 -x n +.d-kΔ.
  5. 5. The method according to claim 2, wherein the processing step deletes and replaces the graphic data of the boundary areas on both sides of the cut graphic data with blank graphic data, specifically comprising: and deleting the graphic data in the triangular exposure area with the left side of the cut graphic data and the right side of the cut graphic data with the width L n and the exposure area with the right side of the cut graphic data and the width (k-1) delta, and replacing the cut graphic data with blank graphic data.
  6. 6. The method of claim 5, wherein the processing step further comprises: After the left and right side areas of the cut pattern data with the width of L n are replaced by blank pattern data, the obtained pattern data with the width of (L n -kdelta) is filled with the blank pattern data on the right side until the width is equal to the maximum effective exposure width D of the DMD.
  7. 7. The method of claim 6, wherein the maximum effective exposure width D of the DMD is calculated by the formula D = Mxa x beta x cos θ + Nxa x beta x sin θ, where M is the number of long-side pixels of the DMD, N is the number of wide-side pixels of the DMD, a is the size of a single micromirror, β is the magnification of the projection objective, and θ is the tilt angle of the DMD.
  8. 8. The method of claim 1, wherein in the calibrating step, the pattern cutting start position is determined based on calibration coordinates of each lens center point.
  9. 9. The method of claim 1, wherein when the lens positional relationship changes, the calibration step, the allocation step, and the processing step are re-executed to adaptively adjust exposure pattern data corresponding to each lens, so as to ensure the integrity of pattern stitching.
  10. 10. Splicing accuracy lifting device based on digital lithography technique, characterized by comprising: A plurality of imaging modules, each imaging module comprising a DMD; a controller connected to each of the imaging modules, the controller comprising a processor and a memory, the memory storing a computer program, the processor implementing the steps of the method of any one of claims 1 to 9 when executing the computer program.

Description

Splicing precision improving method and device based on digital lithography technology Technical Field The invention relates to the technical field of digital lithography, in particular to a method and equipment for improving splicing accuracy of multi-path DMD exposure patterns. Background Digital lithography is an advanced lithography technique that uses a digital micromirror device (Digital Micromirror Device, abbreviated DMD) as a spatial light modulator to expose computer-generated pattern data onto a photosensitive material through a projection optical system. In large format lithography applications, due to the limited exposure area of a single DMD, it is often necessary to use multiple imaging modules (each module containing a DMD and its corresponding optical system) for tiled exposure to expand the exposure format. In the prior art, the splicing of the multi-path DMD exposure patterns usually adopts the following scheme that when in physical exposure, exposure areas distributed to all DMDs are overlapped with a certain width, edge pixels corresponding to the overlapped areas are always in a non-turning state (namely, no light is emitted) through setting a fixed binary template for the DMDs, and the splicing of the multi-path DMD exposure patterns is realized through adjusting parameter combinations of splicing areas in the template. Meanwhile, the exposure energy of the pixels in the non-spliced area is adjusted to fade the splice marks possibly generated at the spliced position. However, the prior art scheme has the technical defects that firstly, the debugging is complex and the times are high. Since the stitching effect depends on the combined adjustment of multiple parameters in the stitching template, and the parameters affect each other, the debugging process needs to be tried repeatedly. In practical application, when more than 4 DMDs need to be spliced, the number of parameter combinations increases exponentially, and single debugging may need tens or even hundreds of attempts, and the single debugging is seriously dependent on experience of operators, so that the debugging efficiency is low, and the industrial production is not facilitated. Second, stability is poor, splice precision is low. The prior art adopts a fixed binary template to control the turning state of the edge micromirror, which is a "static" control mode. The static template cannot sense the actual change of the position relation of the lens, and when the lens is slightly displaced due to factors such as temperature change, mechanical vibration, equipment transportation and the like (particularly when the displacement is smaller than one pixel size), the micromirror which is originally set as not to be overturned by the template is not positioned in an actual physical overlapping area any more, so that the graph overlapping or disconnection occurs at the splicing position, and the integrity and the splicing precision of the exposure graph are seriously influenced. At this time, the parameters of the template need to be finely tuned again, so that the debugging workload is further increased. Therefore, how to simplify the splicing and debugging process of the multi-path DMD exposure pattern and realize self-adaptive adjustment when the lens position relationship changes, thereby improving the splicing precision and the system stability is a technical problem to be solved in the field. Disclosure of Invention Aiming at the defects in the prior art, the invention provides a splicing precision improving method and equipment based on a digital lithography technology, which aim to solve the problems of high difficulty in pattern connection debugging and high debugging times caused by more splicing area parameters in the prior art and improve the problems of unstable splicing parameters and difficult guarantee of splicing precision caused by the change of lens position relation. Technical proposal In order to achieve the above purpose, the invention adopts the following technical scheme: A splicing precision improving method based on a digital lithography technology is applied to digital lithography equipment comprising a plurality of imaging modules, and comprises the following steps: Calibrating imaging ranges and overlapping areas of the imaging modules according to the arrangement of the DMDs of the imaging modules in the inclined direction, and determining the pattern cutting starting positions of exposure of the lenses according to the imaging ranges and the overlapping areas; Calculating the strip width allocated by each lens according to the imaging range and the overlapping area, wherein the strip width is determined based on the difference value of the adjacent lens position coordinates and the overlapping allowance; Cutting original graphic data according to the graphic cutting starting position and the strip width to obtain cut graphic data, deleting and replacing the graphic data of boundary areas on two sides of th