CN-122020975-A - Glass key shape forming method and device

CN122020975ACN 122020975 ACN122020975 ACN 122020975ACN-122020975-A

Abstract

The invention provides a glass key shape forming method and device, the glass key shape forming method comprises the steps of obtaining target three-dimensional geometric parameters of a glass key to be manufactured, establishing a reverse thermal forming model based on thermal rheological characteristics of glass materials, calculating intermediate blind hole parameters required on a glass substrate according to surface area stretching variation and edge shrinkage effect caused by target bulge height, establishing a nonlinear etching compensation model based on isotropy characteristics and depth-width ratio dependence of wet etching, taking the intermediate blind hole parameters as input values, calculating mask pattern parameters capable of counteracting side etching effect and corner diffusion effect, forming mask patterns on the glass substrate according to the mask pattern parameters, etching the glass substrate with the mask patterns, performing thermal treatment on the etched glass substrate, enabling the blind hole structures to deform under control in a thermal softening state, and finally forming the glass key which accords with the target three-dimensional geometric parameters.

Inventors

LIN ZHIJIAN
DING LI
WANG HAI
ZENG XINYONG

Assignees

康惠（惠州）半导体有限公司

Dates

Publication Date: 20260512
Application Date: 20251230

Claims (10)

1. A glass button shape forming method, comprising: Obtaining target three-dimensional geometric parameters of a glass key to be manufactured, wherein the target three-dimensional geometric parameters at least comprise a target base length and width dimension, a target fillet radius and a target bump height; establishing a reverse thermoforming model based on the thermal rheological property of the glass material, and calculating the parameters of the intermediate blind holes required on the glass substrate according to the surface area stretching variation and the edge shrinkage effect caused by the target bulge height; Establishing a nonlinear etching compensation model based on isotropic characteristics and depth-to-width ratio dependence of wet etching, and calculating mask pattern parameters capable of counteracting side etching effect and corner diffusion effect by taking the intermediate blind hole parameters as input values; Forming a mask pattern on the glass substrate according to the mask pattern parameters; Etching the glass substrate with the mask pattern to form a blind hole structure with the intermediate blind hole parameters; And carrying out heat treatment on the etched glass substrate to enable the blind hole structure to be subjected to controlled deformation in a heat softening state, and finally forming the glass key conforming to the target three-dimensional geometric parameters.
2. The method according to claim 1, wherein in the step of establishing a reverse thermal molding model based on the thermal rheological property of the glass material and calculating the intermediate blind hole parameters required on the glass substrate based on the surface area stretching variation and the edge shrinkage effect caused by the target ridge height, the intermediate blind hole parameters include blind hole lengths, and the calculation formula of the blind hole lengths satisfies: Wherein: represents the length of the blind hole; representing a target base length; Representing a target bump height; Representing the original thickness of the glass substrate; representing a preset thermal expansion correction coefficient; Represents the amount of edge shrinkage compensation during thermoforming; the thermal expansion correction coefficient and the edge shrinkage compensation amount are obtained by carrying out a thermal rheological test on the standard sample wafer of the same material in advance.
3. The method according to claim 1, wherein in the step of creating a nonlinear etching compensation model based on isotropic features and aspect ratio dependence of wet etching, using the intermediate blind hole parameters as input values, and calculating mask pattern parameters capable of canceling side etching effect and corner diffusion effect, the mask pattern parameters include mask opening lengths satisfying the following formula: Wherein: represents the mask opening length; represents the length of the intermediate blind hole; representing a predetermined etching depth; representing the basal undercut rate; represents an aspect ratio hysteresis factor; The aspect ratio hysteresis factor is a decreasing function of the ratio of the etching depth to the width of the blind hole, and is used for compensating the vertical etching rate attenuation and the nonlinear change of the lateral etching amount caused by the increase of the etching depth.
4. The method for forming a glass key shape according to claim 3, wherein the step of establishing a nonlinear etching compensation model based on isotropic features and aspect ratio dependence of wet etching, and calculating mask pattern parameters capable of counteracting side etching effects and corner diffusion effects by using the intermediate blind hole parameters as input values, further comprises: Determining a mask corner pattern based on the relation between the required rounded corner of the intermediate blind hole and the etching depth; Generating a mask corner pattern with negative geometric compensation characteristics when the required round angle of the intermediate blind hole is smaller than or equal to the product of the etching depth and the basic side etching rate; The negative geometry compensation characteristic is characterized in that a notch or a micro fillet shrinking toward the center of the pattern is arranged at the corner of the mask pattern, and the radius calculation formula of the micro fillet meets the following conditions: Wherein: a micro fillet radius representing a corner of the mask; Representing the required fillet of the intermediate blind hole; Represents the etching depth; representing the basal undercut rate; Represents the corner diffusion-blocking coefficient; The value range of the corner diffusion blocking coefficient is between 0 and 1, and the corner diffusion blocking coefficient is used for representing the etching liquid exchange hysteresis degree of a corner area relative to a straight edge area.
5. The glass key shape forming method according to claim 1, further comprising: Calculating the distribution density of the mask pattern on the glass substrate; And constructing a position compensation function, and adjusting the mask pattern parameters according to the coordinate positions of the keys on the glass substrate, so that the size of the mask opening in the edge area of the glass substrate is smaller than that in the central area of the glass substrate, thereby compensating the hydrodynamic differences of different areas.
6. The method for forming a glass key shape according to any one of claims 1 to 5, wherein the step of forming a mask pattern on a glass substrate according to the mask pattern parameters comprises converting the calculated mask pattern parameters into digitized layout data; the step of carrying out heat treatment on the etched glass substrate to enable the blind hole structure to be subjected to controlled deformation in a heat softening state and finally forming the glass key conforming to the target three-dimensional geometric parameter comprises the steps of heating the etched glass substrate to a temperature above the glass transition temperature and assisting in forming the glass substrate by utilizing gravity or mould limitation.
7. A glass button shape forming device, comprising: The parameter acquisition module is used for acquiring three-dimensional geometric parameters of the target glass key, wherein the target three-dimensional geometric parameters at least comprise a target base length and width dimension, a target fillet radius and a target bump height; The modeling operation module is used for storing and operating a reverse thermoforming model and a nonlinear etching compensation model, calculating intermediate blind hole parameters based on the three-dimensional geometric parameters, and calculating mask pattern parameters; the data output module is used for converting the generated mask pattern parameters into the mask parameters which can be identified by the lithography equipment; and the process control module is used for controlling the operation of the photoetching equipment, the etching equipment and the heat treatment equipment according to preset process parameters.
8. An electronic device, comprising: A processor; a memory for storing the processor-executable instructions; wherein the processor is configured to execute instructions to implement the glass key shape forming method of any one of claims 1 to 6.
9. A computer-readable storage medium, on which a computer program is stored, characterized in that the computer program, when being executed by a processor, implements the glass key shape forming method according to any one of claims 1 to 6.
10. A computer program product comprising a computer program which, when executed by a processor, implements the glass key shape forming method according to any one of claims 1 to 6.

Description

Glass key shape forming method and device Technical Field The invention relates to the technical field of glass key manufacturing, in particular to a glass key shape forming method and device. Background With the development of integration and high-end consumer electronics, it has become an industry trend to directly integrate physical keys (i.e., glass keys) with a touch feedback function on a glass panel. The prior manufacturing process generally comprises two core stages, namely, firstly processing a concave blind hole structure on the surface of a glass substrate by wet chemical etching to thin a key region, and then reversely uplifting the thinned blind hole region under the action of internal stress or gravity by utilizing the rheological property of glass near a softening point through high-temperature heat treatment (such as baking or thermal effect in a chemical strengthening process) to form a convex solid key. However, in the related art, the design of the mask pattern often depends on simplified linear geometry calculation. Specifically, the prior art generally considers only a single undercut ratio (i.e., assuming that the undercut amount is a fixed linear relationship to the etch depth), and directly subtracts twice the theoretical undercut amount from the target size to determine the mask opening size. This approach ignores two key physical phenomena: the wet etching has complex depth-to-width ratio dependence, with the increase of etching depth, the exchange of etching liquid at the bottom of the blind hole is blocked, so that the vertical etching rate and the lateral etching rate are in nonlinear dynamic change, the accurate blind hole size cannot be obtained only by linear compensation, the subsequent thermoforming process is not simple in volume expansion, and the surface area stretching and the shrinking effect of the edge area can occur when the glass material is converted from a plane to a curved surface to be raised. The mask designed by adopting the related technology often causes large dimensional deviation of the finally formed glass key, particularly the round angle cannot be accurately controlled, an oversized round angle is often formed, the sharp appearance required by design cannot be met, and the mask is required to be repaired by repeated trial-and-error in the trial-and-manufacture process, so that the research and development cost is greatly increased, and the production yield is reduced. Accordingly, there is a need for improvements in existing glass key shape forming techniques to overcome the shortcomings of the prior art. Disclosure of Invention In order to overcome the problems in the related art, the invention aims to provide a glass key shape forming method, which solves the problems of low key shape control precision, difficult R angle forming and high trial and error cost caused by neglecting etching nonlinearity and thermal rheological effect in the prior art by establishing a reverse thermoforming model and a nonlinear etching compensation model. A glass key shape forming method, comprising: Obtaining target three-dimensional geometric parameters of a glass key to be manufactured, wherein the target three-dimensional geometric parameters at least comprise a target base length and width dimension, a target fillet radius and a target bump height; establishing a reverse thermoforming model based on the thermal rheological property of the glass material, and calculating the parameters of the intermediate blind holes required on the glass substrate according to the surface area stretching variation and the edge shrinkage effect caused by the target bulge height; Establishing a nonlinear etching compensation model based on isotropic characteristics and depth-to-width ratio dependence of wet etching, and calculating mask pattern parameters capable of counteracting side etching effect and corner diffusion effect by taking the intermediate blind hole parameters as input values; Forming a mask pattern on the glass substrate according to the mask pattern parameters; Etching the glass substrate with the mask pattern to form a blind hole structure with the intermediate blind hole parameters; And carrying out heat treatment on the etched glass substrate to enable the blind hole structure to be subjected to controlled deformation in a heat softening state, and finally forming the glass key conforming to the target three-dimensional geometric parameters. Further, in the step of establishing a reverse thermal forming model based on the thermal rheological property of the glass material and calculating the intermediate blind hole parameters required on the glass substrate according to the surface area stretching variation and the edge shrinkage effect caused by the target bump height, the intermediate blind hole parameters comprise the blind hole length, and the calculation formula of the blind hole length satisfies: Wherein: represents the length of the blind hole; representing