CN-122021547-A - Method, apparatus and storage medium for mask optimization

Abstract

Methods, apparatuses, and storage medium for mask optimization are provided according to example embodiments of the present disclosure. The method includes determining at least one pair of graphic segments and a corresponding violation category of the at least one pair of graphic segments in the mask pattern that violates a predetermined mask rule, determining an optimization strategy for optimizing the pair of graphic segments based on the violation category of each pair of graphic segments, the optimization strategy indicating an adjustment to at least one graphic segment associated with the corresponding pair of graphic segments, adjusting the corresponding optimization strategy of the at least one graphic segment based on an optimization constraint to determine a corresponding target optimization strategy of the at least one pair of graphic segments, and determining an optimization scheme for the mask pattern based on the corresponding target optimization strategy. In this way, the efficiency of mask optimization can be improved.

Inventors

• Request for anonymity
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Assignees

• 全芯智造技术股份有限公司

Dates

Publication Date

20260512

Application Date

20260413

Claims (14)

1. 1. A method for mask optimization, comprising: determining at least one pair of graphic segments in the mask pattern that violates a predetermined mask rule and a corresponding violation category of the at least one pair of graphic segments; determining an optimization strategy for optimizing each graphic segment pair according to the violation category of the graphic segment pair, wherein the optimization strategy indicates adjustment of at least one graphic segment associated with the corresponding graphic segment pair; Adjusting a respective optimization strategy of the at least one graphic segment based on the optimization constraint to determine a respective target optimization strategy of the at least one graphic segment pair, and An optimization scheme for the mask pattern is determined based on the respective target optimization strategy, the optimization scheme indicating that the at least one pair of graphics segments is adjusted based on the respective optimization strategy.
2. 2. The method for mask optimization of claim 1, wherein determining an optimization strategy for optimizing the pair of graphics fragments comprises: Determining a predetermined processing rule corresponding to the offending category of the graphic segment pair from one or more predetermined processing rules, and Based on the determined predetermined processing rules, a respective adjustment direction and adjustment amount of the at least one graphic segment associated with the pair of graphic segments is determined.
3. 3. The method for mask optimization according to claim 2, wherein the violation categories to which the predetermined processing rules correspond include that the graphic segments violate the predetermined mask rules based on distances and/or angles in a predetermined direction, and the predetermined processing rules indicate that adjustment of the graphic segments is performed based on the distances and/or angles.
4. 4. A method for mask optimization according to claim 3, wherein the predetermined processing rule comprises a first processing rule corresponding to a violation category that is a distance between two graphic segments in the pair of graphic segments in a first direction that violates the predetermined mask rule, and determining the respective adjustment direction and adjustment amount of the at least one graphic segment comprises: determining a distance in the first direction between the graphic segments in the pair of graphic segments, and Based on the determined distance in the first direction and the expected distance indicated by the first processing rule, a respective adjustment direction and adjustment amount of the at least one graphic segment is determined.
5. 5. A method for mask optimization according to claim 3, wherein the predetermined processing rules include a second processing rule corresponding to a violation category for which a distance between a first corner and a second corner constituted by one pair of graphic segments and another pair of graphic segments violates the predetermined mask rule, and determining the respective adjustment direction and adjustment amount of the at least one graphic segment includes: determining a first distance between two graphic segments in a first direction and a second distance between two graphic segments in a second direction based on a plurality of graphic segments constituting the first corner and the second corner, the second direction being different from the first direction, and A respective adjustment direction and adjustment amount of the at least one graphic segment is determined based on the first and second distances, the distance between the first and second corners, and the expected distance indicated by the second processing rule.
6. 6. A method for mask optimization according to claim 3, wherein the predetermined processing rules comprise a third processing rule corresponding to the corresponding violation category being that a projected distance between two graphic segments in a first direction violates the predetermined mask rule, and determining the respective adjustment direction and adjustment amount of the at least one graphic segment comprises: Based on the third processing rule, respective adjustment directions and adjustment amounts of respective adjacent graphic segments of the two graphic segments included in the graphic segment are determined so that the projection distance satisfies the predetermined mask rule.
7. 7. The method for mask optimization of claim 1, wherein determining an optimization strategy for optimizing the pair of graphics fragments comprises: Determining a plurality of predetermined processing rules corresponding to the violation categories of the pair of graphic segments from the one or more predetermined processing rules; determining a plurality of candidate optimization strategies for optimizing the pair of graphic segments using the plurality of predetermined processing rules, respectively, and And determining the optimization strategy of the graph segment pair from the candidate optimization strategies according to the strategy evaluation targets.
8. 8. The method for mask optimization of claim 7, wherein the policy evaluation objective is determined based on at least one of: The respective segment adjustment amounts of candidate optimization strategies of the plurality of candidate optimization strategies, The influence degree of the candidate optimization strategies in the plurality of candidate optimization strategies on other graphic fragments, or And adjusting the imaging performance of the mask pattern based on a candidate optimization strategy in the plurality of candidate optimization strategies.
9. 9. The method for mask optimization according to claim 1, wherein the optimization constraints include at least one of: Graphic adjustment constraints, or And the association relation between the at least one graphic fragment pair.
10. 10. The method for mask optimization of claim 9, wherein determining the respective target optimization strategy for the at least one pair of graphics segments comprises: Determining a first graphic segment of the at least one graphic segment pair that is included in at least two graphic segment pairs and has at least two candidate adjustment amounts based on the association relationship; Determining a second graphic fragment of one of the at least two graphic fragment pairs that is different from the first graphic fragment and is included in the at least two graphic fragment pairs, and Based on the amount of compensation adjustment that causes the second graphic segment to satisfy the predetermined mask rule, respective optimization strategies of the at least two graphic segment pairs are adjusted to determine respective optimization strategies of the at least two graphic segment pairs.
11. 11. The method for mask optimization of claim 9, wherein determining the respective target optimization strategy for the at least one pair of graphics segments comprises: for each of the at least one pair of graphics segments, updating at least one of an adjustment direction or an adjustment amount indicated by an optimization strategy for that pair of graphics segments based on the graphics adjustment constraints to determine the target optimization strategy.
12. 12. The method for mask optimization of claim 11, wherein updating the adjustment indicated by the optimization strategy for the pair of graphics fragments comprises: determining a plurality of candidate adjustment amounts of the graphic fragment pairs by rounding the adjustment amounts indicated by the optimization strategy of the graphic fragment pairs; Determining a target adjustment amount that is less than an adjustment threshold and satisfies the predetermined mask rule from the plurality of candidate adjustment amounts, and And updating the adjustment quantity indicated by the optimization strategy based on the target adjustment quantity.
13. 13. An electronic device, comprising: at least one processing unit, and At least one memory coupled to the at least one processing unit and storing instructions for execution by the at least one processing unit, which when executed by the at least one processing unit, cause the electronic device to perform the method of any one of claims 1 to 12.
14. 14. A computer readable storage medium, having stored thereon a computer program, characterized in that the computer program is executable by a processor to implement the method according to any of claims 1 to 12.

Description

Method, apparatus and storage medium for mask optimization Technical Field Embodiments of the present disclosure relate generally to the field of integrated circuit technology and, more particularly, relate to a method, apparatus, and storage medium for mask optimization. Background With the continued development of integrated circuit fabrication processes, device feature sizes continue to shrink, and the accuracy and reliability of mask patterns during actual fabrication has an increasingly important impact on final product performance. Mask patterns are typically composed of a large number of interrelated geometric patterns that are adjacent to each other and that are required to satisfy a predetermined set of process rules in terms of spatial location, size, and interrelationships. In the mask design and manufacturing process, a case where a predetermined rule is not satisfied easily occurs in the mask pattern, thereby affecting the subsequent exposure imaging effect and manufacturing yield. Therefore, how to effectively optimize the local pattern with rule conflict on the premise of ensuring the reasonability of the whole structure of the mask pattern becomes one of the problems to be paid attention in the related technical field. Disclosure of Invention In a first aspect of the present disclosure, a method for mask optimization is provided. The method includes determining at least one pair of graphic segments and a corresponding violation category of the at least one pair of graphic segments in the mask pattern that violates a predetermined mask rule, determining an optimization strategy for optimizing the pair of graphic segments based on the violation category of each pair of graphic segments, the optimization strategy indicating an adjustment to at least one graphic segment associated with the corresponding pair of graphic segments, adjusting the corresponding optimization strategy of the at least one graphic segment based on an optimization constraint to determine a corresponding target optimization strategy of the at least one pair of graphic segments, and determining an optimization scheme for the mask pattern based on the corresponding target optimization strategy, the optimization scheme indicating an adjustment to the graphic segments included in the at least one pair of graphic segments based on the corresponding optimization strategy. In a second aspect of the present disclosure, an electronic device is provided. The electronic device includes a processor, and a memory coupled to the processor. The memory has instructions stored therein that, when executed by the processor, cause the electronic device to perform a method according to the first aspect of the present disclosure. In a third aspect of the present disclosure, a computer-readable storage medium is provided. The computer readable storage medium has a computer program stored thereon. The computer program, when executed by a processor, implements a method according to the first aspect of the present disclosure. As will be appreciated from the following description, according to an embodiment of the present disclosure, at least one pair of graphic segments and a corresponding violation category of the at least one pair of graphic segments in a mask pattern that violates a predetermined mask rule are first determined. Further, an optimization strategy for optimizing each pair of graphic segments is determined based on the violation category of the pair, the optimization strategy indicating an adjustment to at least one graphic segment associated with the corresponding pair of graphic segments. Still further, based on the optimization constraints, respective optimization strategies of the at least one graphic segment are adjusted to determine respective target optimization strategies of the at least one graphic segment pair. And determining an optimization scheme for the mask pattern based on the respective target optimization strategy, the optimization scheme indicating an adjustment of at least one graphic segment pair included based on the respective optimization strategy. It should be understood that what is described in this summary is not intended to limit the critical or essential features of the embodiments of the disclosure nor to limit the scope of the disclosure. Other features of the present disclosure will become apparent from the following description. Drawings The above and other features, advantages and aspects of embodiments of the present disclosure will become more apparent by reference to the following detailed description when taken in conjunction with the accompanying drawings. In the drawings, wherein like or similar reference numerals designate like or similar elements, and wherein: FIG. 1 illustrates a schematic diagram of an example environment in which embodiments of the present disclosure can be implemented; FIG. 2 illustrates a flow chart of a process for optimizing a mask pattern according to some embodimen