CN-122025491-A - High-gain microchannel plate and preparation method thereof

CN122025491ACN 122025491 ACN122025491 ACN 122025491ACN-122025491-A

Abstract

The invention relates to the technical field of microchannel plates and discloses a high-gain microchannel plate and a preparation method thereof, wherein the method comprises the steps of removing an original emission layer directly formed in a hydrogen reduction process after the hydrogen reduction step in the production flow of the microchannel plate, and then preparing a functional film layer with high secondary electron emission coefficient on the inner wall of the channel; finally, electrode film layers are respectively plated on the input surface and the output surface to obtain the high-gain ALD-MCP. The method can solve the bottleneck that the original emission layer and the ALD emission layer are directly obtained in the traditional hydrogen reduction process and have limited performance superposition, so that the high secondary electron emission performance of the ALD film layer is fully exerted, the advantages of high delta, low phi and compactness and uniformity are released, and the remarkable improvement of gain and service life is finally realized.

Inventors

QIU XIANGBIAO
LI LONGHUI
NIE HUIJUN
WANG JIAN
JIN GE
CONG XIAOQING
LIU DAN
NIU PENGJIE
WANG PENGFEI
Min Xinjie

Assignees

北方夜视技术股份有限公司
北方夜视科技(南京)研究院有限公司

Dates

Publication Date: 20260512
Application Date: 20251222

Claims (10)

1. A preparation method of a high-gain microchannel plate is characterized in that after a hydrogen reduction step in a microchannel plate production process, an original emission layer directly formed in the hydrogen reduction process is removed, and then a functional film layer with high secondary electron emission coefficient is prepared on the inner wall of the channel; finally, electrode film layers are respectively plated on the input surface and the output surface to obtain the high-gain ALD-MCP.
2. The method for manufacturing a high gain microchannel plate according to claim 1, comprising the steps of: In the preparation process of the microchannel plate based on lead silicate glass, a core rod and a skin material pipe are used as raw materials, and a microchannel array substrate is obtained after the working procedures of wire drawing, screen arrangement, screen pressing, cold processing slicing, corrosion and hydrogen reduction; Removing an original emission layer formed on the inner wall of a channel of the substrate in the hydrogen reduction procedure; Preparing a high secondary electron emission functional film layer again on the inner wall of the channel from which the original emission layer is removed; Electrode film layers are respectively plated on the input surface and the output surface, and the high-gain ALD-MCP is obtained.
3. The method for manufacturing a high-gain microchannel plate according to claim 1, wherein the original emission layer is removed by an ALE process to obtain a substrate without the original emission layer.
4. The method for preparing the high-gain microchannel plate as claimed in claim 3, wherein the precursor system capable of realizing isotropic etching is adopted and comprises 5 precursor matching modes, namely TMA-HF and TMA-CHF 3 -H 2 O、TMA-SF 6 /H 2 、HF-NH 3 、TMA-NH 3 +HF, and the original emission layer removing treatment is carried out by setting atomic layer etching process parameters.
5. The method of claim 1, wherein the high secondary electron emission functional film is a single oxide film.
6. The method for manufacturing a high-gain microchannel plate according to claim 1, wherein the high secondary electron emission functional film layer is a composite oxide film layer formed by stacking two or more oxides.
7. The method for manufacturing a high-gain microchannel plate according to claim 1, wherein the high secondary electron emission functional film layer is a sandwich type composite film layer formed by two oxides.
8. The method of manufacturing a high gain microchannel plate according to claim 1, further comprising: And preparing an ultrathin protective film layer on the surface of the high secondary electron emission functional film layer, wherein the total thickness of the film layer is controlled to be 0.5-20 nm.
9. The method for manufacturing a high-gain microchannel plate according to claim 8, wherein the ultra-thin protective film layer is a waterproof protective layer, and at least one of silicon oxide, hafnium oxide, aluminum oxide and silicon nitride is used.
10. A high gain microchannel plate prepared by the method according to any one of claims 1-9, the gain reaching more than 50000.

Description

High-gain microchannel plate and preparation method thereof Technical Field The invention relates to the technical field of microchannel plates, in particular to a high-gain microchannel plate and a preparation method thereof. Background The microchannel plate (MicrochannelPlate, MCP) is a two-dimensional array formed by millions to tens of tiny channel electron multipliers, can directly detect weak signals such as electrons, protons, ions, X-rays, UV photons and the like, has the advantages of high gain, low noise, small volume, light weight, quick time response, high spatial resolution and the like, and is widely applied to the fields of low-light night vision, mass spectrum analysis, particle detection, space particle detection, radiation detection and the like. The gain of the microchannel plate comes from the cascade multiplication effect formed by secondary electron emission on the inner wall of the channel, the traditional MCP is formed based on special lead silicate glass preparation, and a bulk resistance layer and an emission layer with a certain secondary electron emission capacity are formed simultaneously in the hydrogen reduction process, so that the electron multiplication function is realized. The ALD functional film layer is overlapped on the traditional MCP based on the hydrogen reduction technology, the cost is low, the traditional MCP is easy to embed into the existing MCP flow, the secondary electron emission performance of the ALD-MCP prepared by the technical approach is determined by the ALD film layer and the secondary electron emission layer formed by hydrogen reduction, the gain and the service life performance are greatly improved compared with those of the traditional MCP, but the optimal state of the application of the ALD functional film layer is not reached yet, the further improvement of the ALD-MCP gain and the service life performance has bottleneck restriction, and the progress is slow. Disclosure of Invention In view of the defects and shortcomings of the prior art, the present invention is directed to a high-gain microchannel plate and a method for manufacturing the same, wherein after a hydrogen reduction step in a conventional microchannel plate production process, an original emission layer formed in the hydrogen reduction step is processed and removed, and then a functional film layer with a high secondary electron emission coefficient is prepared on the inner wall of the channel, for example, an Atomic Layer Deposition (ALD) technology is used, so that the gain of an ALD-MCP is improved and the service life is prolonged. The preparation method of the high-gain microchannel plate according to one aspect of the object of the invention comprises the following steps: In the preparation process of the microchannel plate based on lead silicate glass, a core rod and a skin material pipe are used as raw materials, and a microchannel array substrate is obtained after the working procedures of wire drawing, screen arrangement, screen pressing, cold processing slicing, corrosion and hydrogen reduction; Removing an original emission layer formed on the inner wall of a channel of the substrate in the hydrogen reduction procedure; Preparing a high secondary electron emission functional film layer again on the inner wall of the channel from which the original emission layer is removed; Electrode film layers are respectively plated on the input surface and the output surface, and the high-gain ALD-MCP is obtained. As an alternative embodiment, the foregoing removal of the original emission layer uses an ALE process, so as to achieve precise removal of the original emission layer. As an alternative embodiment, the aforementioned high secondary electron emission functional film (ALD film) employs a single oxide film or a composite oxide film. As an alternative implementation mode, the method further comprises the step of continuously preparing a protective film layer, such as an ultrathin waterproof protective layer, on the surface of the ALD film layer, wherein the total thickness of the film layer is controlled to be 0.5-20 nm by adopting materials such as silicon oxide, hafnium oxide, aluminum oxide, silicon nitride and the like, so that water vapor erosion can be prevented, and electron emission cannot be influenced. According to a second aspect of the present invention, a high gain microchannel plate prepared by the method is provided, the gain can reach more than 50000, even more than 100000, and the high gain microchannel plate is suitable for the detection requirements of low-light-level image intensifier, photomultiplier, space particle detection, atomic molecular physics, scientific instrument, etc. on high gain performance. According to the traditional preparation process of MCP, glass cladding is combined with core material, a micro-channel plate substrate (namely a micro-channel array substrate) with a micro-channel array is obtained through wire drawing, screen arrange