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CN-122028346-A - Sapphire product, preparation method thereof, display screen and electronic equipment

CN122028346ACN 122028346 ACN122028346 ACN 122028346ACN-122028346-A

Abstract

The application relates to the technical field of electronic equipment, and discloses a sapphire product, a preparation method thereof, a display screen and electronic equipment. The sapphire product of the embodiment of the application comprises a sapphire substrate and an antireflection film layer which are mutually laminated, wherein the antireflection film layer can be formed by alternately laminating a high refractive index material layer (for example, a material layer with a refractive index higher than that of sapphire) and a low refractive index material layer (for example, a material layer with a refractive index lower than that of sapphire). And, through reasonable setting up the whole thickness of antireflection coating layer to and the ratio of thickness in whole thickness of material layer that has high refractive index, can promote the hardness, the scratch resistance performance of sapphire goods, simultaneously, can also promote the optical properties on sapphire goods surface, for example, reduce the reflectivity on sapphire goods surface, increase the transmissivity on sapphire goods surface.

Inventors

  • ZHANG YANMING
  • LI FENGXIANG
  • HUANG YIHONG
  • XING CHONG

Assignees

  • 华为终端有限公司

Dates

Publication Date
20260512
Application Date
20241108

Claims (14)

  1. 1. A sapphire article comprising a sapphire substrate and an antireflection film layer laminated on a side of the sapphire substrate facing a first direction; The antireflection film layer comprises at least one high-refractive-index material layer and at least one low-refractive-index material layer, the refractive index of the high-refractive-index material layer is larger than that of the sapphire substrate, the refractive index of the low-refractive-index material layer is smaller than that of the sapphire substrate, and the low-refractive-index material layer and the high-refractive-index material layer are alternately arranged; The thickness of the antireflection film layer is less than or equal to 250nm, the ratio of the thickness of the at least one high refractive index material layer to the thickness of the antireflection film layer is 10% -50%, the reflectivity of the surface of the sapphire product facing the first direction to light rays in a preset wavelength range is less than or equal to 1.3%, and the indentation hardness of the sapphire product under a preset load is more than or equal to 20GPa.
  2. 2. The sapphire article of claim 1, wherein the high refractive index material layer has a refractive index of 1.85 or greater and the low refractive index material layer has a refractive index of 1.52 or less.
  3. 3. The sapphire article of claim 2, wherein the anti-reflective film layer comprises a first high refractive index material layer, a first low refractive index material layer, a second high refractive index material layer, a second low refractive index material layer, laminated sequentially along the first direction; the reflectivity of the surface of the second low-refractive-index material layer facing the first direction to the light rays in the preset wavelength range is less than or equal to 0.5.
  4. 4. The sapphire article of any of claims 1-3, wherein the high refractive index material layer comprises at least one of silicon-containing nitride, aluminum-containing oxynitride, silicon carbide, titanium nitride, si x Al y O z N w 、Si x Ti y O z N w .
  5. 5. The sapphire article of any of claims 1-3, wherein the low refractive index material layer comprises at least one of silicon oxide, magnesium fluoride, si x B y O z .
  6. 6. The sapphire article of claim 1, wherein the high refractive index material layer has a refractive index of 1.85 or more, the at least one low refractive index material layer comprises a first low refractive index material layer having a refractive index of 1.6-1.7 and a second low refractive index material layer having a refractive index of 1.52 or less.
  7. 7. The sapphire article of claim 6, wherein the first low refractive index material layer comprises at least one of nitrogen doped silicon oxide, amorphous aluminum oxide, oxygen doped silicon nitride.
  8. 8. The sapphire article of claim 1, further comprising a diamond-like coating layered on a side of the anti-reflective film layer facing away from the sapphire substrate.
  9. 9. The sapphire article of claim 8, further comprising an anti-fingerprint coating layered on a side of the diamond-like coating facing away from the anti-reflective film layer.
  10. 10. A method of making a sapphire article, for use in making a sapphire article according to any of claims 1-9, the method comprising: Obtaining a sapphire substrate; and forming an antireflection film layer on one side of the sapphire substrate facing the first direction based on a magnetron sputtering coating process.
  11. 11. The method according to claim 10, wherein the magnetron sputtering coating process comprises a vacuum-pumping treatment and an ion sputtering coating treatment, Wherein the vacuumizing time of the vacuumizing treatment is 5-60min, the vacuum degree is less than or equal to 5e-3Pa, and the coating speed of the ion sputtering coating treatment is less than or equal to 10nm/min.
  12. 12. The method of manufacturing according to claim 10, further comprising: Forming a diamond-like coating on one side of the antireflection film layer, which is away from the sapphire substrate; And forming an anti-fingerprint coating on one side of the diamond-like carbon coating, which is away from the anti-reflection film layer.
  13. 13. A display screen comprising the sapphire article of any of claims 1-9 and a display module, wherein the sapphire article is a sapphire cover plate, and the sapphire cover plate covers the display module.
  14. 14. An electronic device comprising the display of claim 13 and a housing for carrying the display.

Description

Sapphire product, preparation method thereof, display screen and electronic equipment Technical Field The application relates to the technical field of electronic equipment, in particular to a sapphire product, a preparation method thereof, a display screen and electronic equipment. Background With the popularity of electronic devices, consumer demand for electronic devices is increasing. The cover plate is arranged above the display screen of the electronic equipment, and is generally made of common glass, so that strong light can be reflected by the cover plate to enter human eyes in an environment with strong light, for example, in outdoor strong sunlight, and display contents on the display screen cannot be read normally, and the use of products is affected. Currently, by forming an anti-reflection (AR) film layer on a cover plate, the reflectivity (the ratio of light reflected by the surface of the cover plate to incident light) of the cover plate can be reduced. However, the AR film layer is generally low in hardness and is easily pierced by hard substances, so that the cover plate is easily scratched, the scratch resistance of the display screen is affected, and the appearance of the electronic device is affected. Disclosure of Invention In order to solve the problems, the embodiment of the application provides a sapphire product, a preparation method thereof, a display screen and electronic equipment. According to the embodiment of the application, a sapphire product comprises a sapphire substrate and an antireflection film layer, wherein the antireflection film layer is laminated on one side of the sapphire substrate facing a first direction, the antireflection film layer comprises at least one layer of high-refractive-index material layer and at least one layer of low-refractive-index material layer, the refractive index of the high-refractive-index material layer is larger than that of the sapphire substrate, the refractive index of the low-refractive-index material layer is smaller than that of the sapphire substrate, the low-refractive-index material layer and the high-refractive-index material layer are alternately arranged, the thickness of the antireflection film layer is smaller than or equal to 250nm, the ratio of the thickness of the at least one layer of high-refractive-index material layer to the thickness of the antireflection film layer is 10% -50%, the reflectivity of the surface of the sapphire product facing the first direction to light rays in a preset wavelength range is smaller than or equal to 1.3%, and the indentation hardness of the sapphire product under a preset load is larger than or equal to 20GPa. It can be appreciated that, by reasonably setting the overall thickness of the antireflection film layer and the ratio of the thickness of the material layer with high refractive index to the overall thickness of the antireflection film layer, the hardness and scratch resistance of the sapphire product can be improved, and meanwhile, the optical performance of the surface of the sapphire product can be improved, for example, the reflectivity of the surface of the sapphire product can be reduced, and the transmittance of the surface of the sapphire product can be increased. In addition, the first direction mentioned in the present application may be parallel to the thickness direction of the sapphire article, and the first direction may be referred to as the positive Z-axis direction in the embodiment of the present application. In some implementations of the first aspect, the refractive index of the high refractive index material layer is equal to or greater than 1.85, and the refractive index of the low refractive index material layer is equal to or less than 1.52. It will be appreciated that the formation of the anti-reflective film layer using layers of materials of different refractive indices may cause interference of incident light between the different layers, thereby acting to attenuate the intensity of reflected light. In some implementations of the first aspect, the antireflection film layer includes a first high refractive index material layer, a first low refractive index material layer, a second high refractive index material layer, and a second low refractive index material layer sequentially stacked along a first direction, where a reflectivity of a surface of the second low refractive index material layer facing the first direction to light rays in a preset wavelength range is less than or equal to 0.5. It can be appreciated that the second low refractive index material layer is the outermost layer of the anti-reflective film layer, which is more beneficial for achieving a smaller reflectivity of the surface of the anti-reflective film layer. In some implementations of the first aspect described above, the high refractive index material layer includes at least one of silicon-containing nitride, aluminum-containing oxynitride, silicon carbide, titanium nitride, s