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CN-122028627-A - Display panel and display device

CN122028627ACN 122028627 ACN122028627 ACN 122028627ACN-122028627-A

Abstract

The application provides a display panel and a display device. The display panel comprises a display area and a non-display area, wherein the non-display area comprises a substrate, an insulating layer and an isolation functional layer, the substrate is provided with a first wiring, the insulating layer is arranged on the substrate and covers at least part of the first wiring, an opening is formed in the insulating layer of the non-display area, orthographic projection of the opening on the substrate and orthographic projection of the first wiring on the substrate are at least partially overlapped, orthographic projection of one side of the insulating layer, far away from the substrate, on the substrate is positioned in orthographic projection of one side, close to the substrate, of the insulating layer, and the isolation functional layer is covered on the insulating layer and is filled in the opening and electrically connected with the first wiring. The included angle of the side wall of the opening on the surface of the substrate is an acute angle, so that the subsequent isolation functional layer is prevented from being broken at the side wall of the opening, the continuity of the isolation functional layer covering the opening is ensured, and the display effect of the display panel is improved.

Inventors

  • DONG ZHENGKUI
  • SUN LUBIAO
  • WU SIZONG
  • WU JIAN
  • GAO DENG
  • LIU YUNJIE
  • WANG WENLONG

Assignees

  • 合肥维信诺科技有限公司
  • 维信诺科技股份有限公司

Dates

Publication Date
20260512
Application Date
20241111

Claims (20)

  1. 1. A display panel comprising a display region and a non-display region, wherein the display panel comprises: The substrate is provided with a plurality of grooves, the substrate is provided with a first wiring; the insulation layer is arranged on the substrate and covers part of the first wiring, an opening is formed in the insulation layer in the non-display area, orthographic projection of the opening on the substrate and orthographic projection of the first wiring on the substrate are at least partially overlapped, orthographic projection of one side of the insulation layer, which is far away from the substrate, on the substrate is located in orthographic projection of one side of the insulation layer, which is close to the substrate, on the substrate; and the isolation functional layer is arranged on one side of the insulating layer away from the substrate and fills the opening.
  2. 2. The display panel of claim 1, wherein, The semiconductor device further comprises a planarization layer arranged between the substrate and the insulating layer, wherein the planarization layer covers part of the first wiring, The planarization layer is provided with at least one via hole, at least one via hole is communicated with the opening, the orthographic projection of the via hole on the substrate and the orthographic projection of the first wiring on the substrate are at least partially overlapped, and the insulating layer is arranged on one side of the planarization layer far away from the substrate and extends into the via hole; preferably, the via hole extends along a direction perpendicular to the substrate, and the orthographic projection of the via hole on the substrate is located in the orthographic projection of the first trace on the substrate; preferably, the orthographic projection of the opening on the substrate is located within the orthographic projection of the via on the substrate.
  3. 3. The display panel of claim 1, wherein, And a section along a direction perpendicular to the substrate, wherein the side wall of the opening is a straight line or an arc line.
  4. 4. The display panel as claimed in claim 3, it is characterized in that the method comprises the steps of, The included angle between the side wall of the opening and the plane of the substrate is less than or equal to 70 degrees, Preferably, the included angle between the side wall of the opening and the plane of the substrate is less than or equal to 60 degrees, Preferably, the included angle between the side wall of the opening and the plane of the substrate is 30-60 degrees.
  5. 5. The display panel of claim 1, wherein, The isolation functional layer is filled in the opening and is electrically connected with the first wiring.
  6. 6. The display panel of claim 1, wherein, The isolation functional layer comprises a first isolation functional layer and a second isolation functional layer, the first isolation functional layer is arranged on one side of the insulating layer, which is far away from the substrate, and the second isolation functional layer is arranged on one side of the first isolation functional layer, which is far away from the substrate; Preferably, the thickness of the second isolation functional layer is smaller than the thickness of the first isolation functional layer; Preferably, the first isolation functional layer comprises an aluminum material, and the second isolation functional layer comprises a titanium material.
  7. 7. The display panel of claim 6, wherein, The isolation functional layer comprises a third isolation functional layer, the third isolation functional layer is arranged between the insulating layer and the first isolation functional layer, and the third isolation functional layer is filled in the opening and is electrically connected with the first wiring; preferably, the third isolation functional layer comprises molybdenum material, Preferably, the thickness of the third isolation functional layer is less than or equal to the thickness of the second isolation functional layer.
  8. 8. The display panel of claim 6, wherein, The first isolation functional layer and the second isolation functional layer which are arranged in the non-display area are continuous film layers; The first isolation functional layer is arranged on one side of the insulating layer, which is far away from the substrate, and continuously extends into the opening from the side wall of the opening; The second isolation functional layer is arranged on one side of the insulating layer far away from the substrate and continuously extends into the opening from the side wall of the opening.
  9. 9. The display panel according to any one of claims 6-8, wherein, The ratio of the thickness of the second isolation functional layer to the thickness of the first isolation functional layer is between 0.05 and 0.5, Preferably, the ratio of the thickness of the second isolation functional layer to the thickness of the first isolation functional layer is between 0.1 and 0.3.
  10. 10. The display panel of claim 1, wherein The isolation functional layer is arranged in the display area and the non-display area, the isolation functional layer arranged in the display area comprises an isolation structure, and a plurality of isolation openings are formed by enclosing the isolation structure.
  11. 11. The display panel of claim 10, wherein, Also included is a display functional layer including a plurality of light emitting devices including a first electrode, a light emitting functional layer, and a second electrode, At least part of the light emitting device is arranged in the isolation opening, and the second electrode is arranged on one side of the light emitting functional layer, which is far away from the substrate, and is in lap joint with the isolation structure.
  12. 12. The display panel of claim 10, wherein, The first wiring is electrically connected with the isolation functional layer arranged in the non-display area and is electrically connected with the isolation structure arranged in the display area through the isolation functional layer arranged in the non-display area.
  13. 13. The display panel of claim 11, wherein, The non-display area side of the substrate is provided with a second wire, and the second wire is electrically connected with the first electrode.
  14. 14. The display panel of claim 10, wherein, The non-display area side of the substrate is provided with a third wiring, the third wiring and the first wiring are arranged on the same layer, and one side of the third wiring, which is far away from the substrate, is provided with a dam.
  15. 15. A display panel comprising a display region and a non-display region, wherein the display panel comprises: The substrate is provided with a plurality of grooves, the substrate is provided with a first wiring; The insulation layer is arranged on the substrate and covers at least part of the first wiring, an opening is formed in the insulation layer in the non-display area, orthographic projection of the opening on the substrate and orthographic projection of the first wiring on the substrate are at least partially overlapped, and an included angle between the side wall of the opening and the plane where the substrate is located is smaller than or equal to 70 degrees.
  16. 16. The display panel of claim 15, wherein, And a section along a direction perpendicular to the substrate, wherein the side wall of the opening is a straight line or an arc line.
  17. 17. The display panel of claim 15, it is characterized in that the method comprises the steps of, The included angle between the side wall of the opening and the plane of the substrate is smaller than or equal to 60 degrees; preferably, the included angle between the side wall of the opening and the plane of the substrate is 30-60 degrees.
  18. 18. The display panel of claim 15, it is characterized in that the method comprises the steps of, The display panel further comprises an isolation functional layer which is arranged on one side of the insulating layer away from the substrate and fills the opening; preferably, the isolation functional layer comprises a first isolation functional layer and a second isolation functional layer, the first isolation functional layer is arranged on one side of the insulating layer away from the substrate, and the second isolation functional layer is arranged on one side of the first isolation functional layer away from the substrate.
  19. 19. The display panel of claim 18, wherein, The first isolation functional layer and the second isolation functional layer are continuous film layers; The first isolation functional layer is arranged on one side of the insulating layer, which is far away from the substrate, and continuously extends into the opening from the side wall of the opening; The second isolation functional layer is arranged on one side of the insulating layer far away from the substrate and continuously extends into the opening from the side wall of the opening.
  20. 20. A display device comprising the display panel of any one of claims 1-19.

Description

Display panel and display device Technical Field The present application relates to the field of display technologies, and in particular, to a display panel and a display device. Background The development of semiconductor technology has a significant role in the advancement of the electronics industry. Organic Light-Emitting Diode (OLED) has been greatly focused by people and widely used in electronic display products because of its advantages of simple manufacturing process, low cost, low power consumption, high brightness, wide viewing angle, high contrast ratio, and capability of realizing flexible display. However, the technological properties of the current OLED display products are to be improved. Disclosure of Invention In view of the above, the present application is directed to a display panel and a display device, which aim to improve the process performance of the display panel. In order to achieve the above purpose, the present application adopts the following technical scheme. A display panel comprising a display region and a non-display region, wherein in the non-display region: The display panel includes: a substrate provided with a first trace, The insulation layer is arranged on the substrate and covers part of the first wiring, an opening is formed in the insulation layer in the non-display area, orthographic projection of the opening on the substrate and orthographic projection of the first wiring on the substrate are at least partially overlapped, orthographic projection of one side of the insulation layer, which is far away from the substrate, on the substrate is located in orthographic projection of one side of the insulation layer, which is close to the substrate, on the substrate; and the isolation functional layer is arranged on one side of the insulating layer away from the substrate and fills the opening. In one embodiment, the semiconductor device further comprises a planarization layer disposed between the substrate and the insulating layer, the planarization layer covering a portion of the first trace, The planarization layer is provided with at least one via hole, at least one via hole is communicated with the opening, the orthographic projection of the via hole on the substrate and the orthographic projection of the first wiring on the substrate are at least partially overlapped, and the insulating layer is arranged on one side of the planarization layer far away from the substrate and extends into the via hole; preferably, the via hole extends along a direction perpendicular to the substrate, and the orthographic projection of the via hole on the substrate is located in the orthographic projection of the first trace on the substrate; preferably, the orthographic projection of the opening on the substrate is located within the orthographic projection of the via on the substrate. In an embodiment, the side wall of the opening is a straight line or an arc in a cross section perpendicular to the substrate. In one embodiment, the included angle between the side wall of the opening and the plane of the substrate is less than or equal to 70 degrees, Preferably, the included angle between the side wall of the opening and the plane of the substrate is less than or equal to 60 degrees, Preferably, the included angle between the side wall of the opening and the plane of the substrate is 30-60 degrees. In an embodiment, the isolation functional layer is filled in the opening and is electrically connected with the first wire. In an embodiment, the isolation functional layer includes a first isolation functional layer and a second isolation functional layer, where the first isolation functional layer is disposed on a side of the insulating layer away from the substrate, and the second isolation functional layer is disposed on a side of the first isolation functional layer away from the substrate; Preferably, the thickness of the second isolation functional layer is smaller than the thickness of the first isolation functional layer; Preferably, the first isolation functional layer comprises an aluminum material, and the second isolation functional layer comprises a titanium material. In an embodiment, the isolation functional layer includes a third isolation functional layer, the third isolation functional layer is disposed between the insulating layer and the first isolation functional layer, and the third isolation functional layer is filled in the opening and is electrically connected with the first wire; preferably, the third isolation functional layer comprises molybdenum material, Preferably, the thickness of the third isolation functional layer is less than or equal to the thickness of the second isolation functional layer. In an embodiment, the first isolation functional layer and the second isolation functional layer disposed in the non-display area are continuous film layers; The first isolation functional layer is arranged on one side of the insulating layer, which is far away