CN-122029995-A - System and method for recovering organic contaminants from semiconductor wafers

Abstract

Systems and methods for generating an organic solvent scanning solution and a calibration standard in-line/in-line for semiconductor wafer analysis are described. Method embodiments include, but are not limited to, pumping a first organic solvent from a first organic chemical source via a pump system, pumping a second organic solvent from a second organic chemical source via the pump system, inline mixing the first organic solvent and the second organic solvent to form an organic scanning solution, and directing the organic scanning solution to a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer.

Inventors

• J. Winestar
• B. Dufick
• D, R, Vader
• S Kate Ka Er
• A. SCHULTZ
• K - W - Meyer Ewell
• MATTER BENJAMIN A.

Assignees

• 基础科学公司

Dates

Publication Date

20260512

Application Date

20240827

Priority Date

20230901

Claims (20)

1. 1. A method for in-line generation of an organic scanning solution for recovering and identifying organic contaminants on a semiconductor wafer, the method comprising: pumping the first organic solvent from the first organic chemical source via a pump system; Pumping a second organic solvent from a second organic chemical source via the pump system; In-line mixing the first organic solvent and the second organic solvent to form an organic scanning solution, and The organic scanning solution is directed to a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer.
2. 2. The method of claim 1, further comprising introducing one or more calibration analytes and one or more organic solvents in-line to generate a calibration standard.
3. 3. The method of claim 2, further comprising transmitting the calibration standard to an organic analysis system to generate one or more calibration curves.
4. 4. The method of claim 1, further comprising delivering the organic scanning solution and the one or more organic contaminants via a scanning nozzle to an organic analysis system for analytical determination of one or more of the one or more organic contaminants.
5. 5. The method of claim 1, wherein pumping a first organic solvent from a first organic chemical source via a pump system comprises pumping the first organic solvent from the first organic chemical source via a first pump of the pump system, and Wherein pumping the second organic solvent from the second organic chemical source via the pump system includes pumping the second organic solvent from the second organic chemical source via a second pump of the pump system.
6. 6. The method of claim 5, wherein one or more of the first pump and the second pump is a syringe pump.
7. 7. The method of claim 5, wherein each of the first pump and the second pump is a syringe pump.
8. 8. The method of claim 1, wherein inline mixing the first organic solvent and the second organic solvent to form an organic scanning solution comprises introducing each of the first organic solvent and the second organic solvent to a mixing port of a valve in fluid communication with each of the first organic chemical source and the second organic chemical source.
9. 9. A method for in-line generation of an organic scanning solution for recovering and identifying organic contaminants on a semiconductor wafer, the method comprising: pumping the first organic solvent from the first organic chemical source via a pump system; Pumping a second organic solvent from a second organic chemical source via the pump system; In-line mixing the first organic solvent and the second organic solvent to form a mixed organic solution, and The mixed organic solution is directed to at least one of a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer or an organic analysis system for generating one or more calibration curves.
10. 10. The method of claim 9, further comprising introducing one or more calibration analytes in-line with the mixed organic solution to generate a calibration standard.
11. 11. The method of claim 10, wherein the mixed calibration standard is introduced to the organic analysis system to generate one or more calibration curves.
12. 12. The method of claim 9, wherein the mixed organic solution is directed to the scanning nozzle, and wherein the method further comprises transporting the organic scanning solution with the one or more organic contaminants via the scanning nozzle to an organic analysis system for analytical determination of one or more of the one or more organic contaminants.
13. 13. The method of claim 9, wherein pumping a first organic solvent from a first organic chemical source via a pump system comprises pumping the first organic solvent from the first organic chemical source via a first pump of the pump system, and Wherein pumping the second organic solvent from the second organic chemical source via the pump system includes pumping the second organic solvent from the second organic chemical source via a second pump of the pump system.
14. 14. The method of claim 13, wherein one or more of the first pump and the second pump is a syringe pump.
15. 15. The method of claim 13, wherein each of the first pump and the second pump is a syringe pump.
16. 16. The method of claim 9, wherein in-line mixing the first and second organic solvents to form a mixed organic solution comprises introducing each of the first and second organic solvents to a mixing port of a valve in fluid communication with each of the first and second organic chemical sources.
17. 17. A method for in-line generation of an organic scanning solution for recovering and identifying organic contaminants on a semiconductor wafer, the method comprising: pumping the first organic solvent from the first organic chemical source via a pump system; Pumping a second organic solvent from a second organic chemical source via the pump system; In-line mixing the first and second organic solvents via a mixing manifold or mixing port of a valve to form an organic scanning solution, and The organic scanning solution is directed to a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer.
18. 18. The method of claim 17, further comprising introducing one or more calibration analytes and one or more organic solvents in-line to generate a calibration standard.
19. 19. The method of claim 18, further comprising transmitting the calibration standard to an organic analysis system to generate one or more calibration curves.
20. 20. The method of claim 17, further comprising delivering the organic scanning solution and the one or more organic contaminants via the scanning nozzle to an organic analysis system for analytical determination of one or more of the one or more organic contaminants.

Description

System and method for recovering organic contaminants from semiconductor wafers Cross Reference to Related Applications The present application claims priority from U.S. provisional application No.63/536,194, titled "SYSTEMS AND METHODS FOR RECOVERY AND IDENTIFICATION OF ORGANIC CONTAMINANTS AND RESIDUE ON SEMICONDUCTOR WAFER SURFACES", U.S. provisional application No.63/585,787, titled "COLLECTION AND COMBINATION OF MULTIPLE SCAN SAMPLES FOR SEMICONDUCTOR WAFER ANALYSIS", U.S. provisional application No.63/585,805, titled "INLINE GENERATION OF ORGANIC SOLVENT SCAN SOLUTION FOR SEMICONDUCTOR WAFER ANALYSIS", and U.S. provisional application No.63/585,805, titled "SYSTEMS AND METHODS FOR RECOVERING ORGANIC CONTAMINANTS FROM SEMICONDUCTING WAFERS", titled "2023, 9, 27, 35, and U.S. provisional application No.63/585,810, titled" 2023, 9, 27, according to clause 119 (e) of the American code 35. U.S. provisional application Ser. Nos. 63/536,194, 63/585,787, 63/585,805 and 63/585,810 are incorporated herein by reference in their entireties. Background Mass spectrometry is an analytical technique for determining trace amounts of impurities (e.g., elements, organics, or other impurities) in a liquid or gas sample. A sample introduction system may be used to introduce a fluid sample into various analytical instruments. The sample introduction system may transport an aliquot of the liquid sample to a nebulizer that converts the sample into a polydisperse aerosol suitable for ionization in a mass spectrometry instrument. Inductively Coupled Plasma (ICP) ionization sources are used for elemental impurities, while electrospray, atmospheric Pressure Chemical Ionization (APCI) or other ionization sources are used for organic impurities. These ionization sources are coupled to a mass spectrometer, such as a quadrupole mass spectrometer, a time-of-flight mass spectrometer, an ion trap mass spectrometer, or the like. Disclosure of Invention Systems and methods for in-line/in-line (inline) generation of organic solvent scanning solutions and calibration standards for semiconductor wafer analysis are described. Method embodiments include, but are not limited to, pumping a first organic solvent from a first organic chemical source via a pump system, pumping a second organic solvent from a second organic chemical source via the pump system, inline mixing the first organic solvent and the second organic solvent to form an organic scanning solution, and directing the organic scanning solution to a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer. In one aspect, a method of in-line generation of an organic scanning solution for recovery and identification of organic contaminants on a semiconductor wafer includes, but is not limited to, pumping a first organic solvent from a first organic chemical source via a pump system, pumping a second organic solvent from a second organic chemical source via the pump system, in-line mixing the first organic solvent and the second organic solvent to form a mixed organic solution, and directing the mixed organic solution to at least one of a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer, or an organic analysis system for generating one or more calibration curves. In one aspect, a method of in-line generating an organic scanning solution for use in recovering and identifying organic contaminants on a semiconductor wafer includes, but is not limited to, pumping a first organic solvent from a first organic chemical source via a pump system, pumping a second organic solvent from a second organic chemical source via the pump system, in-line mixing the first organic solvent and the second organic solvent via a mixing manifold or mixing port of a valve to form an organic scanning solution, and directing the organic scanning solution to a scanning nozzle for directing to one or more surfaces of a semiconductor wafer to remove one or more organic contaminants from the semiconductor wafer. This summary is provided to introduce a selection of concepts in a simplified form that are further described below in the detailed description. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter. Drawings The detailed description is described with reference to the accompanying drawings. The same reference numbers in different examples in the description and the figures may identify similar or identical elements. Fig. 1A is an isometric view of a system for recovering organic contaminants from a semiconductor wafer in accordance with an embodiment of the invention. Figure 1B is an isometric view of the system of figure 1A wherein a semiconductor wafer is positioned with