Search

CN-224205633-U - Slide holder and wafer detection equipment

CN224205633UCN 224205633 UCN224205633 UCN 224205633UCN-224205633-U

Abstract

The application relates to a slide holder and wafer detection equipment, which comprises a sucker, a base and a supporting structure. The suction surface of the suction cup is concavely provided with a plurality of suction grooves, each suction groove is arranged around the center of the suction surface, and the distances from each suction groove to the center are unequal. The base is internally provided with a plurality of paths of first main air passages, and each path of first main air passage is used for externally connecting an air source. The supporting structure is connected between the base and the sucker, a plurality of first air passages are formed in the supporting structure, and at least part of the first main air passages are respectively communicated with different adsorption tanks through different first air passages. The application utilizes the air passage arranged in the base and the supporting structure to replace part of external pipelines to realize the communication between the air source and the adsorption tank, thereby reducing the number of external pipelines, avoiding the complicated pipeline arrangement and simplifying the integral structure of the slide holder.

Inventors

  • CHEN SIXIANG
  • DU ZHENDONG
  • JIANG JIABO
  • ZHAO YIBIN
  • WANG KUN

Assignees

  • 长川科技(苏州)有限公司

Dates

Publication Date
20260505
Application Date
20250530

Claims (10)

  1. 1. A stage (100), comprising: The sucking disc (10) is characterized in that a plurality of sucking grooves (11) are concavely formed on the sucking surface (S), each sucking groove (11) is arranged around the center of the sucking surface (S), and the distances from each sucking groove (11) to the center are unequal; A base (20) in which a plurality of first main air passages (21) are formed, each of the first main air passages (21) is used for externally connecting an air source, and The support structure (30) is connected between the base (20) and the sucker (10), a plurality of first air passages (31) are formed in the support structure, and at least part of the first main air passages (21) are respectively communicated with different adsorption tanks (11) through different first air passages (31).
  2. 2. The stage (100) of claim 1, wherein a multi-way bypass airway (22) in communication with the first main airway (21) is further configured within the base (20); At least part of the branch air passages (22) are communicated with different first main air passages (21), and the communicated branch air passages (22) and the first main air passages (21) are communicated with different positions in the surrounding direction of the same adsorption groove (11) through different first air passages (31).
  3. 3. The stage (100) according to claim 2, wherein the stage (100) comprises a gas collecting plate (40), the gas collecting plate (40) is disposed on the base (20), a plurality of transition air passages (41) are configured therein, and each of the first main air passages (21) is communicated with the corresponding branch air passage (22) via a different transition air passage (41).
  4. 4. The stage (100) of any of claims 1-3, wherein the support structure (30) comprises a plurality of support columns (32) spaced apart from the base (20); The multiple paths of first air passages (31) on the same supporting column (32) are communicated with different adsorption tanks (11), and the corresponding first air passages (31) on different supporting columns (32) communicated with the same adsorption tank (11) through the same first main air passage (21) are communicated with different positions.
  5. 5. The stage (100) of any of claims 1-3, wherein the stage (100) comprises a first suction nozzle (50), the first suction nozzle (50) being mounted at the support structure (30); the sucking disc (10) is internally provided with an air passing hole (12), one end of the air passing hole (12) is communicated with the adsorption groove (11), and the first suction nozzle (50) is in sealing connection with the first air passing channel (31) and the other end of the air passing hole (12).
  6. 6. A stage (100) according to any one of claims 1-3, wherein the stage (100) comprises a mounting table (60) and a push rod (70), the suction cup (10) is provided with a through hole (13) penetrating the suction surface (S), the through hole (13) avoids the suction groove (11), the mounting table (60) is movably arranged along the extending direction of the through hole (13), and the push rod (70) can be driven to move along the through hole (13) in the moving process, and the push rod (70) is provided with a propping end (D) capable of penetrating the through hole (13); The mounting table (60) is internally provided with a second main air passage (61) which can be externally connected with an air source, the ejector rod (70) is internally provided with a second air passage (71) which penetrates through the ejector end (D), and the second air passage (71) is communicated with the second main air passage (61) and the atmosphere.
  7. 7. The stage (100) of claim 6, wherein a plurality of the ejector pins (70) are configured, and wherein a plurality of the ejector pins (70) are disposed around a center of the adsorption surface (S); The supporting structure (30) comprises a plurality of supporting columns (32), a plurality of first air passages (31) communicated with different adsorption tanks (11) are arranged on each supporting column (32), and all the supporting columns (32) are arranged on the peripheries of the mounting table (60) and all the ejector rods (70).
  8. 8. The stage (100) according to claim 6, wherein the mounting table (60) is provided with a mounting hole (62), and the ejector rod (70) is sealingly mounted to the mounting hole (62) via a sealing device (90); the propping end (D) of the ejector rod (70) is provided with a second suction nozzle (80).
  9. 9. The stage (100) according to any one of claims 1 to 3, wherein the base (20) has a gas receiving side (J), the gas receiving side (J) being provided with a plurality of first gas nozzles (23), one end of each of the first main gas passages (21) penetrating the gas receiving side (J), and the first gas nozzles (23) being mounted.
  10. 10. Wafer inspection apparatus, characterized in that it comprises inspection means for inspecting wafers located on the suction surface (S) and a carrier (100) according to any one of claims 1 to 9.

Description

Slide holder and wafer detection equipment Technical Field The application relates to the technical field of semiconductor detection, in particular to a slide holder and wafer detection equipment. Background In the wafer detection industry, the wafer holder is generally compatible with wafers of different sizes, and each size of wafer needs to be connected with a positive pressure gas path or a negative pressure gas path for interaction to realize functions when vacuum is sucked or broken, and the gas pipes of the wafers of different sizes are required to be independently controlled, so that multiple gas pipes exposed outside are often required to be connected with the wafer holder, the pipeline layout of the wafer holder is complicated, and the whole structure is not concise. Disclosure of utility model Based on the above, it is necessary to provide a stage and a wafer inspection apparatus for solving the problems of complicated pipeline layout and not simple overall structure of the stage. In a first aspect, the present application provides a stage comprising: the sucking disc is characterized in that a plurality of sucking grooves are concavely formed on the sucking surface, and each sucking groove is arranged around the center of the sucking surface and has different radial distances from the center; The base is internally provided with a plurality of paths of first main air passages, and each path of first main air passage is used for externally connecting an air source; The support structure is connected between the base and the sucker, a plurality of first air passages are formed in the support structure, and at least part of the first main air passages are respectively communicated with different adsorption tanks through different first air passages. In some embodiments, a plurality of branch air passages communicated with the first main air passage are also constructed in the base; at least part of the branch air passages are communicated with different first main air passages, and the communicated branch air passages and the first main air passages are communicated with different positions of the same adsorption groove through different first air passages. In some embodiments, the slide holder comprises a gas collecting plate, the gas collecting plate is arranged on the base, a plurality of transition air passages are formed in the gas collecting plate, and each path of the first main air passage is communicated with the corresponding branch air passage through different transition air passages. In some embodiments, the support structure includes a plurality of support columns spaced apart from the base; The multiple paths of first air passages on the same supporting column are communicated with different adsorption tanks, and the corresponding first air passages on different supporting columns, which are communicated through the same first main air passage, are communicated with different positions on the same adsorption tank in the surrounding direction. In some embodiments, the stage includes a first suction nozzle mounted at the support structure; The sucking disc is internally provided with an air passing hole, one end of the air passing hole is communicated with the adsorption groove, and the first suction nozzle is connected with the first air passing passage and the other end of the air passing hole in a sealing mode. In some embodiments, the slide holder comprises a mounting table and a push rod, the sucker is provided with a through hole penetrating through the adsorption surface, the through Kong Bikai is provided with the adsorption groove, the mounting table is movably arranged along the extending direction of the through hole and can drive the push rod to move along the through hole in the moving process, and the push rod is provided with a propping end capable of penetrating through the through hole. In some embodiments, a second main air passage capable of being externally connected with an air source is formed in the mounting table, a second air passage penetrating through the propping end is formed in the ejector rod, and the second air passage is communicated with the second main air passage and the atmosphere. In some embodiments, the ejector pins are configured in plurality, and the plurality of ejector pins are disposed around the center of the suction surface. In some embodiments, the support structure comprises a plurality of support columns, a plurality of first air passages communicated with different adsorption tanks are arranged on each support column, and all the support columns are arranged on the periphery of the mounting table and all the ejector rods. In some embodiments, the mounting table is provided with a mounting hole, and the ejector rod is hermetically mounted in the mounting hole through a sealing device; the top support end of the ejector rod is provided with a second suction nozzle. In some embodiments, the base has a gas receiving side surface, the gas r