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CN-224207108-U - Nourishing and soothing type mask base cloth

CN224207108UCN 224207108 UCN224207108 UCN 224207108UCN-224207108-U

Abstract

The utility model relates to the technical field of mask base cloth and discloses a nourishing and soothing mask base cloth, which comprises a protection mechanism, wherein a laminating mechanism is arranged at the top of the protection mechanism, limit rings are fixedly connected to two sides of the protection mechanism, the laminating mechanism comprises two auxiliary grooves I, the outer parts of the two auxiliary grooves I are arranged outside the protection mechanism, two auxiliary grooves II are arranged outside the protection mechanism, an auxiliary groove III is arranged outside the protection mechanism, and a positioning assembly is arranged outside the protection mechanism. In the utility model, the accurate initial positioning is realized through the positioning component. The facial mask covers the face, the eyelets are accurately aligned with the eyes, the nostrils are attached to the nose, the smooth breathing is ensured, the skin around the nose is tightly wrapped by the mask, essence is absorbed, the skin is improved, the mouth holes are aligned with the mouth, the user can normally open the mouth to communicate and do simple actions, and the skin around the mouth can absorb the effective components.

Inventors

  • LU TING
  • ZHAO SIWEI
  • Fang Baiqing

Assignees

  • 余姚市龙翔水刺热轧无纺有限公司

Dates

Publication Date
20260508
Application Date
20250510

Claims (8)

  1. 1. The nourishing and soothing type mask base cloth comprises a protection mechanism (4) and is characterized in that a laminating mechanism (2) is arranged at the top of the protection mechanism (4), and limit rings (3) are fixedly connected to two sides of the protection mechanism (4); The laminating mechanism (2) comprises two auxiliary grooves I (201), the outer parts of the two auxiliary grooves I (201) are arranged outside the protection mechanism (4), two auxiliary grooves II (202) are arranged outside the protection mechanism (4), an auxiliary groove III (203) is arranged outside the protection mechanism (4), and a positioning assembly (1) is arranged outside the protection mechanism (4).
  2. 2. The nourishing and soothing mask base cloth according to claim 1, wherein the positioning assembly (1) comprises eyelets (101), the two eyelets (101) are arranged outside the protection mechanism (4), and nostrils (102) are arranged outside the positioning assembly (1).
  3. 3. The nourishing and soothing mask base cloth according to claim 1, wherein the protection mechanism (4) comprises a protection film (404), an essence layer (401) is fixedly connected to the inner side of the protection film (404), and a maintenance layer (402) is fixedly connected to the inner side of the essence layer (401).
  4. 4. The nourishing and soothing mask base fabric according to claim 2, wherein the outer part of the protection mechanism (4) is provided with a mouth hole (103).
  5. 5. The nourishing and soothing mask base fabric according to claim 3, wherein a supporting layer (403) is fixedly connected to the inner side of the maintenance layer (402).
  6. 6. The nourishing and soothing mask base fabric according to claim 3, wherein one side of the two limit rings (3) close to each other is fixedly connected to the outside of the essence layer (401).
  7. 7. The nourishing and soothing mask base fabric according to claim 6, wherein one side of the two limit rings (3) close to each other is fixedly connected to the outside of the maintenance layer (402).
  8. 8. The nourishing and soothing mask base cloth according to claim 5, wherein one side of the two limit rings (3) close to each other is fixedly connected to the outside of the supporting layer (403).

Description

Nourishing and soothing type mask base cloth Technical Field The utility model relates to the technical field of mask base cloth, in particular to a nourishing and soothing type mask base cloth. Background Along with the increasing demands of people on beauty and skin care, the facial mask is used as a convenient and effective skin care product and is widely applied to the market. The mask base cloth is used as an important component of the mask, and the performance of the mask base cloth directly influences the using effect and the user experience of the mask. The early facial mask base cloth mainly takes non-woven fabrics, and has certain capacity of bearing essence, but has certain limitations in aspects of skin-friendly property, air permeability, nutrient transfer efficiency and the like; According to the retrieval, chinese patent publication No. CN221512918U discloses a camellia facial mask base cloth, which comprises a facial mask assembly, wherein a mouth hole and two eyes are formed in the facial mask assembly, the two eyes are positioned at the top of the mouth hole, the facial mask assembly comprises an outer surface layer, a base cloth layer, a camellia essence liquid layer and a skin-friendly mesh layer, the edge position of one side of the outer surface layer is bonded with the base cloth layer, the edge position of one side of the base cloth layer is bonded with the camellia essence liquid layer, the edge position of one side of the camellia essence liquid layer is bonded with the skin-friendly mesh layer, an alginate strip is movably arranged at the bottom of the facial mask assembly, and the outer surface layer, the base cloth layer, the camellia essence liquid layer and the skin-friendly mesh layer are bonded with the alginate strip. According to the utility model, the edge position of the bottom of the camellia essence liquid layer can be sealed through the alginate strips, so that the condition that the camellia essence liquid drops along the edge position of the bottom is reduced, and the use effect is good. The beneficial effects in the above patent specifications mention "sealing the edges of the face mask to reduce the loss of essence". The above patent, although reducing the loss of essence, is not good for better fitting the face, and therefore proposes a nourishing and soothing type mask base fabric. Disclosure of utility model In order to make up for the defects, the utility model provides a nourishing and soothing type mask base fabric, and aims to solve the problem that the face is not attached in the prior art. In order to achieve the above purpose, the present utility model adopts the following technical scheme: the nourishing and soothing type mask base cloth comprises a protection mechanism, wherein a laminating mechanism is arranged at the top of the protection mechanism, and limit rings are fixedly connected to two sides of the protection mechanism; The laminating mechanism comprises two first auxiliary grooves, the outer parts of the first auxiliary grooves are arranged outside the protection mechanism, the outer parts of the protection mechanism are provided with second auxiliary grooves, the outer parts of the protection mechanism are provided with third auxiliary grooves, and the outer sides of the protection mechanism are provided with positioning components; Through the technical scheme, the functionality and the practicability of the mask base cloth are greatly improved. The positioning component ensures that the mask can accurately cover the corresponding parts of the face by means of the accurate arrangement of the eyelets, the nostrils and the mouth holes, the vision of a user is not blocked when the mask is applied, the user breathes smoothly and can freely move, and meanwhile, the skin in each area of the face can fully absorb essence. The auxiliary groove I, the auxiliary groove II and the auxiliary groove III in the attaching mechanism can realize perfect attachment to the side face of the face, the chin and the forehead according to different facial shapes, increase the contact area of the mask and the skin and promote the efficient permeation of nourishing and soothing components. The spacing collar is firm to fix the facial mask, prevents that it from dropping in use, greatly promotes convenience of use and stability, brings comfortable, efficient nourishing and soothing skin care experience for the user. As a further description of the above technical solution: The positioning assembly comprises eyelets, two eyelets are arranged outside the protection mechanism, and nostrils are arranged outside the positioning assembly; Through above-mentioned technical scheme, locating component brings very big facility for the user. The eye holes enable the sight line of a user not to be blocked when the mask is applied, so that daily activities can be normally performed, meanwhile, the skin around the eyes can be ensured to fully absorb the essence of the mask, and t