Search

CN-224208441-U - Photoresist recovery device

CN224208441UCN 224208441 UCN224208441 UCN 224208441UCN-224208441-U

Abstract

The invention discloses a photoresist recycling device which comprises a first shell, a second shell, a sealing component, a photoresist collecting part and a sealing component, wherein the first shell is provided with a first accommodating cavity, the second shell is arranged in the first accommodating cavity and is provided with a second accommodating cavity, a communicating channel is formed in the side wall of the second shell to communicate the first accommodating cavity and the second accommodating cavity, the sealing component is arranged in the second shell to control the opening and closing of the communicating channel, the first pipeline is communicated with the first accommodating cavity, the sealing component controls the opening of the communicating channel when photoresist is sprayed on a wafer, and redundant photoresist enters the first accommodating cavity in the spraying process and is collected by the photoresist collecting part after passing through the first pipeline. The invention can solve the problem of waste of photoresist in the spraying process.

Inventors

  • CAO SHULI

Assignees

  • 芯恩（青岛）集成电路有限公司

Dates

Publication Date
20260508
Application Date
20250411

Claims (10)

  1. 1. A photoresist recycling apparatus, comprising: A first housing (100) having a first accommodation chamber (110); The second shell (200) is arranged in the first accommodating cavity (110) and is provided with a second accommodating cavity (210), and a communication channel (220) is formed in the side wall of the second shell (200) so as to communicate the first accommodating cavity (110) with the second accommodating cavity (210); A closing assembly (300) provided to the second housing (200) to control opening and closing of the communication passage (220); And when the photoresist is sprayed on the wafer, the sealing assembly (300) controls the communication channel (220) to be opened, and the excessive photoresist enters the first accommodating cavity (110) in the spraying process and is collected by the photoresist collecting part (400) after passing through the first pipeline (420).
  2. 2. The photoresist recycling apparatus according to claim 1, further comprising: A solvent collection unit (500) having a second pipe (520), wherein one end of the second pipe (520) penetrates the first casing (100) and is provided in the second casing (200), and the second pipe (520) communicates with the second accommodation chamber (210); When the wafer sprays clean up other solvents outside the photoresist, the sealing component (300) controls the communication channel (220) to be closed, and the excessive other solvents enter the second accommodating cavity (210) and are collected by the solvent collecting part (500) after passing through the second pipeline (520).
  3. 3. The photoresist recycling apparatus according to claim 2, wherein the bottom wall of the first housing (100) is inclined, and the first pipe (420) is provided at the bottom wall of the first housing (100) so that the photoresist in the first accommodating chamber (110) enters the first pipe (420) in an inclined direction of the bottom wall of the first housing (100).
  4. 4. The photoresist recycling apparatus according to claim 2, wherein the bottom wall of the second housing (200) is inclined, and the second pipe (520) is provided at the bottom wall of the second housing (200) so that the other solvent in the second accommodating chamber (210) enters the second pipe (520) in an inclined direction of the bottom wall of the second housing (200).
  5. 5. The photoresist recycling apparatus according to claim 1, wherein the side wall of the communication channel (220) is symmetrically provided with receiving grooves (221) along a vertical direction, and the closing assembly (300) comprises: An electromagnetic adsorption member (310) movably disposed in the storage groove (221) and configured to be attracted to the adjacent electromagnetic adsorption member (310) when energized; An elastic member (320) having one end provided on the inner wall of the storage groove (221) and the other end provided on the electromagnetic adsorption member (310); The electromagnetic adsorption parts (310) are electrified, the symmetrically arranged electromagnetic adsorption parts (310) are mutually adsorbed and drive the elastic parts (320) to move so as to close the communication channel (220), the electromagnetic adsorption parts (310) are powered off, and the elastic parts (320) drive the electromagnetic adsorption parts (310) to be separated so as to open the communication channel (220).
  6. 6. The photoresist recycling apparatus according to claim 1, wherein the closing assembly (300) comprises: The electromagnetic absorption parts (310) are symmetrically arranged on the side wall of the communication channel (220) along the vertical direction; The second housing (200) is made of flexible materials, so that when the electromagnetic absorption parts (310) are electrified, the electromagnetic absorption parts (310) which are symmetrically arranged absorb each other to drive the side wall of the second housing (200) to deform so as to seal the communication channel (220).
  7. 7. The photoresist recycling apparatus according to claim 5 or 6, further comprising a controller electrically connected to the electromagnetic absorbing member (310) to control on or off of a circuit at the electromagnetic absorbing member (310).
  8. 8. The photoresist recycling apparatus according to claim 1, wherein the first housing (100) and the second housing (200) are each ring-shaped, and an edge of the first housing (100) and an edge of the second housing (200) are hermetically connected to form a passing space (710), the passing space (710) being for passing a wafer.
  9. 9. The photoresist recycling apparatus according to claim 8, wherein a baffle plate (720) is provided on the bottom wall of the second housing (200) along the circumference of the passing space (710), and the baffle plates (720) are connected end to form an annular structure to intercept the photoresist or other solvents.
  10. 10. The photoresist recycling apparatus according to claim 9, wherein the first housing (100) and the second housing (200) are made of flexible materials, and the side walls of the first housing (100) and the second housing (200) are provided with the baffle (720), so that the first housing (100) and the second housing (200) form a ring structure to collect the photoresist or the other solvent.

Description

Photoresist recovery device Technical Field The invention relates to the technical field of semiconductor equipment, in particular to a photoresist recycling device. Background With the rapid development of the semiconductor industry, the demand for photoresist as one of the core materials is increasing. However, the production cost of the photoresist is high, and the price thereof is affected by various factors such as the price of raw materials, complexity of the production process, and the like. Therefore, saving photoresist is an important issue for semiconductor manufacturing enterprises from the standpoint of resource efficiency and cost control. In the prior art, when photoresist is recovered, a lifting table is usually used for enabling wafers to be at different heights, and the separation of the photoresist and a cleaning solvent is realized by combining the effect of a protective cover, but the lifting table occupies space, the lifting process needs the wafers to be static, the spraying processing progress of the wafers is influenced, and meanwhile, when the lifting precision is inaccurate, the alignment of the wafers with a wafer inlet and a wafer outlet is influenced, and the photoresist is still wasted. Accordingly, there is a need to provide a new photoresist recycling apparatus to solve the above-mentioned problems in the prior art. Disclosure of Invention The invention aims to provide a photoresist recycling device which is used for recycling photoresist and can solve the problem of waste of the photoresist in the spraying process. In order to achieve the above purpose, the technical scheme of the invention is as follows: A photoresist recycling apparatus comprising: a first housing having a first accommodation chamber; The side wall of the second shell is provided with a communication channel for communicating the first accommodating cavity and the second accommodating cavity; The sealing component is arranged on the second shell to control the opening and closing of the communication channel; And when the photoresist is sprayed on the wafer, the sealing component controls the communication channel to be opened, and the redundant photoresist enters the first accommodating cavity in the spraying process and is collected by the photoresist collecting part after passing through the first pipeline. By adopting the technical scheme, the photoresist is recovered in a double-shell mode by arranging the first shell and the second shell, the communication channel can be controlled to be opened and closed by the sealing component, so that the photoresist can enter the first accommodating cavity and be collected through the first pipeline when the photoresist is sprayed on a wafer, the communication channel is closed when other solvents are sprayed on the wafer, and the other solvents enter the second accommodating cavity, namely, different solutions enter different pipelines in a double-shell mode, thereby realizing the recycling of the photoresist and improving the problem that the photoresist is wasted in the spraying process of the photoresist in the prior art. Optionally, the method further comprises: the solvent collecting part is provided with a second pipeline, one end of the second pipeline penetrates through the first shell and is arranged on the second shell, and the second pipeline is communicated with the second accommodating cavity; When the wafer sprays clean up other solvents outside the photoresist, the sealing component controls the communication channel to be closed, and the excessive other solvents enter the second accommodating cavity and are collected by the solvent collecting part after passing through the second pipeline. Optionally, the bottom wall of the first housing is obliquely arranged, and the first pipeline is arranged on the bottom wall of the first housing, so that the photoresist in the first accommodating cavity enters the first pipeline along the oblique direction of the bottom wall of the first housing. Optionally, the bottom wall of the second housing is obliquely arranged, and the second pipeline is arranged on the bottom wall of the second housing, so that the other solvents in the second accommodating cavity enter the second pipeline along the oblique direction of the bottom wall of the second housing. Optionally, the side wall of the communication channel is symmetrically provided with a storage groove along the vertical direction, and the sealing assembly comprises: The electromagnetic absorption parts are movably arranged in the accommodating grooves and are mutually absorbed with the adjacent electromagnetic absorption parts when the electric current is supplied; one end of the elastic piece is arranged on the inner wall of the accommodating groove, and the other end of the elastic piece is arranged on the electromagnetic absorption piece; The electromagnetic adsorption parts are electrified, the electromagnetic adsorption parts are symmetrically arranged