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CN-224208690-U - Graphene paste washing device

CN224208690UCN 224208690 UCN224208690 UCN 224208690UCN-224208690-U

Abstract

The utility model relates to a graphene paste washing device, which relates to the field of graphene preparation and comprises a reaction kettle, a water inlet pipe, a lifting assembly and a filter plate; the reaction kettle is provided with a feed inlet and a discharge outlet, the water inlet pipe is communicated to the inside of the reaction kettle, the lifting assembly is fixedly arranged in the reaction kettle, the lifting assembly is arranged at the top of the reaction kettle, the filter plate is arranged on the lifting assembly, and the filter plate is provided with a water through hole. According to the utility model, the filter plate is controlled to move up and down, so that liquid in the reaction kettle passes through the water through holes of the filter plate to generate turbulence for mixing and cleaning graphene, the whole process realizes cleaning without mechanical stirring through a fluid dynamics principle, the influence of severe collision on the performance of graphene can be reduced, and the structural integrity of graphene crystals is protected.

Inventors

  • MA JIANPING
  • WANG WENWEN
  • SONG XIAOXIAO
  • FU XIAO

Assignees

  • 微一(山东)生物科技发展有限公司

Dates

Publication Date
20260508
Application Date
20250530

Claims (8)

  1. 1. The graphene paste washing device is characterized by comprising a reaction kettle (100), a water inlet pipe (200), a lifting assembly (300) and a filter plate (400); the reaction kettle (100) is provided with a feed inlet (101) and a discharge outlet (102), and the water inlet pipe (200) is communicated to the inside of the reaction kettle (100); the lifting assembly (300) is fixedly arranged inside the reaction kettle (100), and the lifting assembly (300) is arranged at the top of the reaction kettle (100); the filter plate (400) is installed on the lifting assembly (300), and a water through hole (401) is formed in the filter plate (400).
  2. 2. The graphene paste washing device according to claim 1, wherein a fixed spray head (120) and a movable spray head (130) are further arranged in the reaction kettle (100); The fixed spray heads (120) are arranged in a plurality, the fixed spray heads (120) are annularly distributed on the inner wall above the reaction kettle (100), and the fixed spray heads (120) are all arranged towards the filter plate (400); The movable spray heads (130) are arranged in a plurality, the movable spray heads (130) are annularly distributed on the filter plate (400), and the movable spray heads (130) are all arranged towards the side wall of the reaction kettle (100); the fixed spray head (120) and the movable spray head (130) are communicated with the water inlet pipe (200).
  3. 3. The graphene paste washing device according to claim 2, further comprising a plurality of rotating assemblies (500), wherein the rotating assemblies (500) are all mounted on the inner wall of the reaction kettle (100), and the fixed spray head (120) is mounted on the rotating assemblies (500).
  4. 4. The graphene paste washing device according to claim 3, wherein the rotating assembly (500) comprises a fixing member (510), a rotating member (520) and a driving member (530); The fixed part (510) is fixedly installed on the inner wall of the reaction kettle (100), the rotating part (520) is rotatably arranged on the fixed part (510), the fixed spray head (120) is installed on the rotating part (520), and the driving part (530) is fixedly installed on the fixed part (510) and used for driving the rotating part (520) to rotate.
  5. 5. The graphene paste washing device according to claim 4, wherein the rotating assembly (500) further comprises a protective cover (540), and the protective cover (540) is arranged outside the driving piece (530).
  6. 6. The graphene paste washing device according to any one of claims 1-5, wherein the bottom of the filter plate (400) is arc-shaped, and the middle position of the filter plate (400) is lower than the edge position.
  7. 7. The graphene paste washing device according to any one of claims 1-5, wherein the lifting assembly (300) is of a multi-stage telescopic structure, and the lifting assembly (300) is arranged at the top of the reaction kettle (100) along the vertical direction.
  8. 8. The graphene paste washing device according to any one of claims 1-5, wherein a ph sensor (110) is further arranged inside the reaction kettle (100), and a probe of the ph sensor (110) is arranged at the bottom of the reaction kettle (100).

Description

Graphene paste washing device Technical Field The utility model relates to the field of graphene preparation, in particular to a graphene paste water washing device. Background The oxidation-reduction method is a common method for preparing graphene, has the advantages of low cost and suitability for large-scale production, and after preparing graphene (particularly graphene oxide or reduced graphene obtained by the oxidation-reduction method) in a reaction kettle, water washing is a key step for removing impurities (such as residual acid, metal ions, unreacted oxidant/reducing agent and the like) in the graphene, and because acidic substances exist in the impurities of the graphene, the water washing of the graphene is generally performed in the reaction kettle. At present, chinese patent with bulletin number CN214159596U and bulletin day 2021, 09 and 10 proposes a novel water-washing reaction kettle, an accommodating space is formed inside the reaction kettle body, a stirring device is arranged in the accommodating space, a feeding port is arranged at the top of the accommodating space, a discharging port is arranged at the bottom of the accommodating space, a plurality of spray heads are arranged in the accommodating space, and the spray heads are communicated with an alkaline water storage tank. When the device is used, after materials enter the reaction kettle from the feed inlet, the stirring device is started to stir the materials, after stirring is stopped, the spray header is started to spray alkaline water onto the materials to start washing, and as the density of the alkaline water is higher than that of the materials, the alkaline water gradually sinks in the washing process, and the materials are washed layer by layer and uniformly. To above-mentioned correlation technique, when rinsing graphene, stirring device in the reation kettle constantly rotates and can take place violently to collide with the graphene sheet layer, leads to the graphene sheet layer to take place fracture or local deformation, influences the performance of graphene. Disclosure of utility model In order to reduce collision between a stirring device and graphene in the washing process and reduce influence on the performance of the graphene, the utility model provides a graphene paste washing device. The utility model provides a graphene paste washing device, which adopts the following technical scheme: The graphene paste washing device comprises a reaction kettle, a water inlet pipe, a lifting assembly and a filter plate, wherein a feed inlet and a discharge outlet are formed in the reaction kettle, the water inlet pipe is communicated to the inside of the reaction kettle, the lifting assembly is fixedly arranged in the reaction kettle, the lifting assembly is arranged at the top of the reaction kettle, the filter plate is arranged on the lifting assembly, and a water through hole is formed in the filter plate. When the graphene paste is washed, the graphene paste is required to be added into a reaction kettle, and clean water is added to enable the graphene to be in a liquid state for washing. Through adopting above-mentioned technical scheme, at first add graphene paste through the feed inlet in the reation kettle to pour into the washing water into inside reation kettle through the inlet tube, drive the filter plate at lifting unit afterwards and reciprocate inside reation kettle and mix graphene and clean water, and then wash graphene paste, the filter plate is at the decline in-process, and the filter plate extrudees the liquid of below in the reation kettle, and the liquid of filter plate below receives the extrusion and upwards extrudes in the filtration pore of filter plate, and then disturbance graphene realizes paste dispersion and mixing. So, when washing the operation, the filter plate drives the interior liquid of reation kettle in the lift in-process and passes the limbers of leading to produce turbulent motion, both realized the mixed washing of graphite alkene and reduced the influence of violent collision to the graphite alkene performance, through the stirring mode of extrusion vortex, effectively reduced graphite alkene crystal structure and in the mechanical damage risk of cleaning the in-process. The reaction kettle is characterized in that a plurality of fixed spray heads and movable spray heads are arranged in the reaction kettle, the fixed spray heads are annularly distributed on the inner wall above the reaction kettle, the fixed spray heads are all arranged towards a filter plate, the movable spray heads are provided with the movable spray heads and are annularly distributed on the filter plate, the movable spray heads are all arranged towards the side wall of the reaction kettle, and the fixed spray heads and the movable spray heads are all communicated with the water inlet pipe. Through the technical scheme, the filter plate drives the movable spray head to move up and down in the process of movi