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CN-224209702-U - Retaining ring for CMP (chemical mechanical polishing)

CN224209702UCN 224209702 UCN224209702 UCN 224209702UCN-224209702-U

Abstract

The utility model relates to the technical field of shaking research and development of CMP (chemical mechanical polishing) grinding components and discloses a retaining ring for CMP grinding, which comprises a base, wherein one end of the base is fixedly connected with a retainer ring, the outer side of the retainer ring is inserted with a cleaning component, the other end of the base is fixedly connected with an adjusting component, the cleaning component comprises a plurality of groups of dovetail buckles inserted on the outer side of the retainer ring, and one side of each of the plurality of groups of dovetail buckles is fixedly connected with a cleaning ring. This a holding ring for CMP grinds, through the setting of cleaning component, when using, fixed cleaning ring, accomplish through buckle meshing fast assembly, when the holding ring is rotatory or remove, the cleaning ring that fixes on the holding ring rotates, drives the brush that the cleaning was last and washs the processing wafer, and the brush is through removing rotatory piece of clearance wafer surface, prevents that the piece from mixing into the polishing liquid in the follow-up grinding process, and then causes fish tail or other defects to the wafer surface to improve the effect of polishing of wafer.

Inventors

  • CHEN SIWEN
  • YU JIANG

Assignees

  • 黑曼巴半导体(无锡)有限公司

Dates

Publication Date
20260508
Application Date
20250528

Claims (7)

  1. 1. The retaining ring for CMP grinding comprises a base (1) and is characterized in that one end of the base (1) is fixedly connected with a retainer ring (2), the outer side of the retainer ring (2) is inserted with a cleaning component (3), the other end of the base (1) is fixedly connected with an adjusting component (4), The cleaning assembly (3) comprises a plurality of groups of dovetail buckles (301) which are inserted in the outer side of the retainer ring (2), one sides of the plurality of groups of dovetail buckles (301) are fixedly connected with a cleaning ring (302), and one side of the upper end of the cleaning ring (302) is fixedly connected with a hairbrush (303); The adjusting component (4) comprises a telescopic rod (401) fixedly connected to the other end of the base (1), a plurality of groups of springs (402) are nested outside the telescopic rod (401), and an elastic gasket (403) is fixedly connected to the other end of the telescopic rod (401).
  2. 2. The retaining ring for CMP polishing as recited in claim 1, wherein the upper end of the retainer ring (2) is provided with a plurality of groups of liquid flow grooves (5), and one side of the retainer ring (2) is provided with a plurality of groups of first clamping grooves (6).
  3. 3. The retaining ring for CMP polishing as recited in claim 1, wherein a protective cover (7) is arranged on the outer side of the base (1), and a rubber ring (8) is fixedly connected to the top end of the protective cover (7).
  4. 4. The retaining ring for CMP polishing as recited in claim 3, wherein a plurality of sets of drain holes (9) are formed in the outer side of the protective cover (7), and a plurality of sets of air holes (10) are formed in the outer side of the base (1).
  5. 5. A retainer ring for CMP polishing as set forth in claim 1, wherein a plurality of sets of quick locking pins (11) are fixedly connected to the lower end of the elastic pad (403), and a fixing ring (12) is inserted to the other ends of the plurality of sets of quick locking pins (11).
  6. 6. The retaining ring for CMP polishing as recited in claim 5, wherein a plurality of second clamping grooves (13) are formed in the upper side of the fixing ring (12), and a sealing ring (14) is fixedly connected to the upper side of the fixing ring (12).
  7. 7. A retaining ring for CMP polishing according to claim 1, characterized in that one end of the retainer ring (2) is provided with an internal thread and one end of the base (1) is provided with an external thread.

Description

Retaining ring for CMP (chemical mechanical polishing) Technical Field The utility model relates to the technical field of wobble development of CMP (chemical mechanical polishing) grinding components, in particular to a retaining ring for CMP grinding. Background Chemical mechanical polishing is a critical process in semiconductor fabrication for achieving global planarization of the wafer surface. The technology eliminates the uneven topological structure of the surface of the wafer through the synergistic effect of chemical corrosion and mechanical grinding, thereby meeting the extremely high requirements of the processes such as multilayer interconnection, shallow trench isolation and the like on the surface flatness. In the prior art, the flatness of the wafer surface is extremely high in the polishing process, scraps generated in polishing are mixed into polishing liquid in the subsequent polishing process, scratches or other defects are further caused on the wafer surface, and scraps and water stains on the surface need to be cleaned in time, so that the retaining ring for CMP polishing is provided. Disclosure of utility model (One) solving the technical problems The utility model solves the technical problems of providing the retaining ring for CMP grinding, which has higher practicability and simpler structure through simple operation, solves the problems that the prior art proposes extremely high requirements on the flatness of the wafer surface, and fragments generated by grinding are mixed into polishing liquid in the subsequent grinding process, so that scratches or other defects are caused on the wafer surface, and the fragments and water stains on the surface need to be cleaned in time. (II) technical scheme The utility model aims at achieving the purpose, and the retaining ring for CMP grinding comprises a base, wherein one end of the base is fixedly connected with a retainer ring, the outer side of the retainer ring is inserted with a cleaning assembly, the other end of the base is fixedly connected with an adjusting assembly, the cleaning assembly comprises a plurality of groups of dovetail buckles inserted on the outer side of the retainer ring, one side of each of the plurality of groups of dovetail buckles is fixedly connected with a cleaning ring, one side of the upper end of each cleaning ring is fixedly connected with a brush, the adjusting assembly comprises a telescopic rod fixedly connected to the other end of the base, a plurality of groups of springs are nested outside the telescopic rod, and the other end of the telescopic rod is fixedly connected with an elastic gasket. As a further scheme of the utility model, the upper end of the check ring is provided with a plurality of groups of liquid flowing grooves, one side of the check ring is provided with a plurality of groups of first clamping grooves, and the effect of quickly replacing the cleaning component is achieved through the arrangement of the clamping grooves. As a further scheme of the utility model, the outer side of the base is provided with the protective cover, the top end of the protective cover is fixedly connected with the rubber ring, and the protective cover plays a role in preventing liquid from splashing. As a further scheme of the utility model, the outer side of the protective cover is provided with a plurality of groups of drain holes, the outer side of the base is provided with a plurality of groups of air holes, and the exhaust effect is achieved through the arrangement of the air holes. As a further scheme of the utility model, the lower end of the elastic gasket is fixedly connected with a plurality of groups of quick locking pins, and the other ends of the groups of quick locking pins are inserted with a fixed ring, so that the effect of quickly replacing the base is achieved through the arrangement of the quick locking pins. As a further scheme of the utility model, a plurality of second clamping grooves are formed in the upper side of the fixing ring, and the sealing ring is fixedly connected to the upper side of the fixing ring, so that the effect of blocking liquid is achieved through the arrangement of the sealing ring. As a further scheme of the utility model, one end of the check ring is provided with the internal thread, one end of the base is provided with the external thread, and the check ring can be quickly replaced through the arrangement of the internal thread and the external thread. (III) beneficial effects The utility model provides a retaining ring for CMP grinding, which has the following beneficial effects: 1. This a holding ring for CMP grinds, through the setting of cleaning component, when using, fixed cleaning ring, accomplish through buckle meshing fast assembly, when the holding ring is rotatory or remove, the cleaning ring that fixes on the holding ring rotates, drives the brush that the cleaning was last and washs the processing wafer, and the brush is through removing rota